KR20100068737A - 차폐판 및 전해도금장치 - Google Patents
차폐판 및 전해도금장치 Download PDFInfo
- Publication number
- KR20100068737A KR20100068737A KR1020080127194A KR20080127194A KR20100068737A KR 20100068737 A KR20100068737 A KR 20100068737A KR 1020080127194 A KR1020080127194 A KR 1020080127194A KR 20080127194 A KR20080127194 A KR 20080127194A KR 20100068737 A KR20100068737 A KR 20100068737A
- Authority
- KR
- South Korea
- Prior art keywords
- plate
- anode
- plating
- substrate
- electroplating apparatus
- Prior art date
Links
- 238000009713 electroplating Methods 0.000 title claims abstract description 22
- 238000007747 plating Methods 0.000 claims abstract description 61
- 239000007788 liquid Substances 0.000 claims abstract description 28
- 239000000758 substrate Substances 0.000 claims description 37
- 239000002184 metal Substances 0.000 claims description 12
- 229910052751 metal Inorganic materials 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 7
- 239000007921 spray Substances 0.000 claims description 2
- 230000000694 effects Effects 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 239000011889 copper foil Substances 0.000 description 2
- 230000014509 gene expression Effects 0.000 description 2
- 229910021645 metal ion Inorganic materials 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000009429 electrical wiring Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 238000000844 transformation Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/02—Electroplating of selected surface areas
- C25D5/022—Electroplating of selected surface areas using masking means
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/10—Electrodes, e.g. composition, counter electrode
- C25D17/12—Shape or form
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
- H05K3/188—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by direct electroplating
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Electroplating Methods And Accessories (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
Description
Claims (6)
- 전해도금 시 전기력선을 차단하는 플레이트; 및상기 플레이트에 형성된 허니콤(honeycomb) 형상의 복수개의 홀을 포함하는 것을 특징으로 하는 차폐판.
- 제1항에 있어서,상기 플레이트는가운데에 개구부를 포함하는 사진틀 형상의 사각판재인 것을 특징으로 하는 차폐판.
- 기판을 도금하기 위한 전해도금장치에 있어서,도금액이 수용된 도금조;상기 도금조 내에 도금액을 공급하는 매니폴드;상기 도금조 내에 배치되는 양극;상기 양극에 대향하는 위치에 상기 기판을 고정하는 음극;상기 양극과 상기 음극에 전기적으로 연결된 전원부; 및전류밀도를 균등하게 하기 위해 상기 양극과 상기 음극의 사이에 개재되고, 허니콤(honeycomb) 형상의 복수개의 홀이 형성된 차폐판을 포함하는 전해도금장치.
- 제3항에 있어서,상기 차폐판은가운데에 개구부를 포함하는 사진틀 형상의 사각판재인 것을 특징으로 하는 전해도금장치.
- 제3항에 있어서,상기 매니폴드는 상기 양극에서 상기 기판 방향으로 도금액을 분사하고,상기 양극은 메쉬(mesh)형상인 것을 특징으로 하는 전해도금장치.
- 제5항에 있어서,상기 양극은 메쉬(mesh)형상의 바스켓에 금속볼이 수용되어 있는 형상인 것을 특징으로 하는 전해도금장치.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020080127194A KR20100068737A (ko) | 2008-12-15 | 2008-12-15 | 차폐판 및 전해도금장치 |
TW098116445A TW201022481A (en) | 2008-12-15 | 2009-05-18 | Shield plate and electroplating apparatus |
JP2009168658A JP2010138483A (ja) | 2008-12-15 | 2009-07-17 | 遮蔽板及び電解メッキ装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020080127194A KR20100068737A (ko) | 2008-12-15 | 2008-12-15 | 차폐판 및 전해도금장치 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20100068737A true KR20100068737A (ko) | 2010-06-24 |
Family
ID=42348852
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020080127194A KR20100068737A (ko) | 2008-12-15 | 2008-12-15 | 차폐판 및 전해도금장치 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP2010138483A (ko) |
KR (1) | KR20100068737A (ko) |
TW (1) | TW201022481A (ko) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102477576A (zh) * | 2010-11-30 | 2012-05-30 | 加贺开发科技有限公司 | 电镀装置及其电镀槽中的电极板结构 |
KR20150104823A (ko) * | 2014-03-06 | 2015-09-16 | 삼성전기주식회사 | 도금 장치 |
KR101603503B1 (ko) * | 2015-03-09 | 2016-03-15 | 김종학 | 롤투롤 공정의 인쇄회로기판 수직 도금에서 플러드 박스를 이용한 도금 장치 |
KR20180034234A (ko) * | 2016-09-26 | 2018-04-04 | 노바테크인더스트리 주식회사 | 금속 메쉬의 미세 선폭 도금용 진공 및 차폐 척 |
KR102680532B1 (ko) * | 2022-12-27 | 2024-07-02 | 주식회사 에스엠비코퍼레이션 | 릴투릴 방식의 극세선 전해 후막 도금 장치 및 도금 방법 |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011096628A (ja) | 2009-09-30 | 2011-05-12 | Hirose Electric Co Ltd | 電気コネクタ |
KR20130045081A (ko) * | 2011-10-25 | 2013-05-03 | 삼성전기주식회사 | 전기도금 장치 |
CN108004575B (zh) * | 2017-12-29 | 2024-04-16 | 上海新阳半导体材料股份有限公司 | 电镀用屏蔽装置 |
JP7070012B2 (ja) * | 2018-04-17 | 2022-05-18 | 住友金属鉱山株式会社 | 電解めっき装置、および金属張積層板の製造方法 |
CN110344102A (zh) * | 2019-08-14 | 2019-10-18 | 重庆方正高密电子有限公司 | 陪镀板以及电镀线 |
CN112504327B (zh) * | 2020-11-23 | 2022-05-17 | 中国电子科技集团公司第十八研究所 | 一种观测电解液流动轨迹的装置 |
CN112779591A (zh) * | 2021-01-29 | 2021-05-11 | 昆山东威科技股份有限公司 | 一种阳极结构、电极机构及电镀系统 |
CN117552071B (zh) * | 2024-01-11 | 2024-03-29 | 宁波惠金理化电子有限公司 | 一种五金电镀设备及其使用方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000256891A (ja) * | 1999-03-04 | 2000-09-19 | Oki Electric Ind Co Ltd | 電解めっき方法および陽極構造体 |
JP2002054000A (ja) * | 2000-08-02 | 2002-02-19 | Nitto Denko Corp | 基板の電解めっき方法 |
JP3352081B2 (ja) * | 2001-02-01 | 2002-12-03 | 株式会社アスカエンジニアリング | プリント基板の銅めっき装置 |
JP2002302799A (ja) * | 2001-04-05 | 2002-10-18 | Sumitomo Metal Mining Co Ltd | 電気めっき方法および電気めっき方法で用いる遮へい板 |
-
2008
- 2008-12-15 KR KR1020080127194A patent/KR20100068737A/ko not_active Application Discontinuation
-
2009
- 2009-05-18 TW TW098116445A patent/TW201022481A/zh unknown
- 2009-07-17 JP JP2009168658A patent/JP2010138483A/ja active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102477576A (zh) * | 2010-11-30 | 2012-05-30 | 加贺开发科技有限公司 | 电镀装置及其电镀槽中的电极板结构 |
KR20150104823A (ko) * | 2014-03-06 | 2015-09-16 | 삼성전기주식회사 | 도금 장치 |
KR101603503B1 (ko) * | 2015-03-09 | 2016-03-15 | 김종학 | 롤투롤 공정의 인쇄회로기판 수직 도금에서 플러드 박스를 이용한 도금 장치 |
KR20180034234A (ko) * | 2016-09-26 | 2018-04-04 | 노바테크인더스트리 주식회사 | 금속 메쉬의 미세 선폭 도금용 진공 및 차폐 척 |
KR102680532B1 (ko) * | 2022-12-27 | 2024-07-02 | 주식회사 에스엠비코퍼레이션 | 릴투릴 방식의 극세선 전해 후막 도금 장치 및 도금 방법 |
Also Published As
Publication number | Publication date |
---|---|
TW201022481A (en) | 2010-06-16 |
JP2010138483A (ja) | 2010-06-24 |
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