KR20090066218A - 노광장치, 노광 방법 및 디바이스 제조 방법 - Google Patents

노광장치, 노광 방법 및 디바이스 제조 방법 Download PDF

Info

Publication number
KR20090066218A
KR20090066218A KR1020080125683A KR20080125683A KR20090066218A KR 20090066218 A KR20090066218 A KR 20090066218A KR 1020080125683 A KR1020080125683 A KR 1020080125683A KR 20080125683 A KR20080125683 A KR 20080125683A KR 20090066218 A KR20090066218 A KR 20090066218A
Authority
KR
South Korea
Prior art keywords
optical system
projection optical
aberration
region
axis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020080125683A
Other languages
English (en)
Korean (ko)
Inventor
노부히코 야부
Original Assignee
캐논 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20090066218A publication Critical patent/KR20090066218A/ko
Ceased legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/54—Lamp housings; Illuminating means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020080125683A 2007-12-18 2008-12-11 노광장치, 노광 방법 및 디바이스 제조 방법 Ceased KR20090066218A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007326584A JP2009152251A (ja) 2007-12-18 2007-12-18 露光装置、露光方法及びデバイス製造方法
JPJP-P-2007-326584 2007-12-18

Publications (1)

Publication Number Publication Date
KR20090066218A true KR20090066218A (ko) 2009-06-23

Family

ID=40752758

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020080125683A Ceased KR20090066218A (ko) 2007-12-18 2008-12-11 노광장치, 노광 방법 및 디바이스 제조 방법

Country Status (4)

Country Link
US (1) US20090153828A1 (enExample)
JP (1) JP2009152251A (enExample)
KR (1) KR20090066218A (enExample)
TW (1) TW200942975A (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102010041746A1 (de) * 2010-09-30 2012-04-05 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage der EUV-Mikrolithographie und Verfahren zur mikrolithographischen Belichtung
DE102012205096B3 (de) * 2012-03-29 2013-08-29 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage mit mindestens einem Manipulator
DE102015209051B4 (de) * 2015-05-18 2018-08-30 Carl Zeiss Smt Gmbh Projektionsobjektiv mit Wellenfrontmanipulator sowie Projektionsbelichtungsverfahren und Projektionsbelichtungsanlage
JP6730850B2 (ja) * 2016-06-01 2020-07-29 キヤノン株式会社 露光条件の決定方法、プログラム、情報処理装置、露光装置、および物品製造方法
JP6477850B2 (ja) * 2017-12-15 2019-03-06 株式会社ニコン 算出装置及び方法、プログラム、並びに露光方法
EP3702839B1 (en) * 2019-02-27 2021-11-10 ASML Netherlands B.V. Method of reducing effects of lens heating and/or cooling in a lithographic process
JP7390804B2 (ja) * 2019-05-17 2023-12-04 キヤノン株式会社 露光装置、露光方法、決定方法および物品製造方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6304317B1 (en) * 1993-07-15 2001-10-16 Nikon Corporation Projection apparatus and method
JP3368091B2 (ja) * 1994-04-22 2003-01-20 キヤノン株式会社 投影露光装置及びデバイスの製造方法
TWI256484B (en) * 2000-02-23 2006-07-01 Asml Netherlands Bv Method of measuring aberration in an optical imaging system
JP4005763B2 (ja) * 2000-06-30 2007-11-14 株式会社東芝 投影光学系の収差補正方法及び半導体装置の製造方法
JP4174660B2 (ja) * 2000-12-28 2008-11-05 株式会社ニコン 露光方法及び装置、プログラム及び情報記録媒体、並びにデバイス製造方法
DE10124474A1 (de) * 2001-05-19 2002-11-21 Zeiss Carl Mikrolithographisches Belichtungsverfahren sowie Projektionsobjektiv zur Durchführung des Verfahrens
EP1413870A4 (en) * 2001-07-05 2006-11-15 Nikon Corp OPTICAL ELEMENT FOR OPTICAL LITHOGRAPHY, AND RELATIVE EVALUATION METHOD
DE10146499B4 (de) * 2001-09-21 2006-11-09 Carl Zeiss Smt Ag Verfahren zur Optimierung der Abbildungseigenschaften von mindestens zwei optischen Elementen sowie Verfahren zur Optimierung der Abbildungseigenschaften von mindestens drei optischen Elementen
JP2004111579A (ja) * 2002-09-17 2004-04-08 Canon Inc 露光方法及び装置
EP1496397A1 (en) * 2003-07-11 2005-01-12 ASML Netherlands B.V. Method and system for feedforward overlay correction of pattern induced distortion and displacement, and lithographic projection apparatus using such a method and system
JP2005051145A (ja) * 2003-07-31 2005-02-24 Nikon Corp 露光方法及び露光装置
JP2005175407A (ja) * 2003-12-15 2005-06-30 Canon Inc 計測方法及び装置、それを利用した露光方法及び装置、並びに、デバイス製造方法
JP4497949B2 (ja) * 2004-02-12 2010-07-07 キヤノン株式会社 露光装置
JP2006165398A (ja) * 2004-12-09 2006-06-22 Toshiba Corp 収差測定方法及び半導体装置の製造方法
JP2006173305A (ja) * 2004-12-15 2006-06-29 Canon Inc 露光装置及び方法、並びに、デバイス製造方法
JP2007157824A (ja) * 2005-12-01 2007-06-21 Nikon Corp 結像光学系の評価方法、結像光学系の調整方法、露光装置、露光方法、およびデバイスの製造方法
US7580113B2 (en) * 2006-06-23 2009-08-25 Asml Netherlands B.V. Method of reducing a wave front aberration, and computer program product
US8134683B2 (en) * 2007-02-09 2012-03-13 Asml Netherlands B.V. Device manufacturing method, computer program and lithographic apparatus

Also Published As

Publication number Publication date
US20090153828A1 (en) 2009-06-18
TW200942975A (en) 2009-10-16
JP2009152251A (ja) 2009-07-09

Similar Documents

Publication Publication Date Title
JP4817702B2 (ja) 光学装置及びそれを備えた露光装置
US7088426B2 (en) Projection optical system adjustment method, prediction method, evaluation method, adjustment method, exposure method and exposure apparatus, program, and device manufacturing method
US7800732B2 (en) Projection exposure method and projection exposure apparatus for microlithography
JP4489783B2 (ja) リソグラフィ投影装置およびデバイス製造方法
US7771905B2 (en) Method and program for calculating exposure dose and focus position in exposure apparatus, and device manufacturing method
CN103154818B (zh) 微光刻投射曝光设备的光学系统以及降低图像位置误差的方法
CN102834776A (zh) 具有对由掩模引起的成像像差的校正的操作投射曝光设备的方法
KR20090066218A (ko) 노광장치, 노광 방법 및 디바이스 제조 방법
JP2004347821A (ja) 露光装置、収差低減方法及び光学部材調整機構
US7417712B2 (en) Exposure apparatus having interferometer and device manufacturing method
JP4630611B2 (ja) 干渉計を備えた露光装置及び方法、並びに、デバイス製造方法
US9104119B2 (en) Exposure apparatus and device fabrication method for reducing a change in aberration due to driving error
JP2008186912A (ja) 収差評価方法、調整方法、露光装置、露光方法、およびデバイス製造方法
JP2008172004A (ja) 収差評価方法、調整方法、露光装置、露光方法、およびデバイス製造方法
JP2006080444A (ja) 測定装置、テストレチクル、露光装置及びデバイス製造方法
JP2003045794A (ja) 光学特性計測方法、投影光学系の調整方法、露光方法、及び露光装置の製造方法、並びにマスク検査方法
KR20220163870A (ko) 보정방법 및 물품제조방법
JP2022185783A (ja) 露光装置、アライメント計測方法、及び物品の製造方法
JP2010205925A (ja) 露光装置、調整方法及びデバイスの製造方法
JP2008108851A (ja) 照明装置及び当該照明装置を有する露光装置、並びに、デバイス製造方法

Legal Events

Date Code Title Description
A201 Request for examination
PA0109 Patent application

Patent event code: PA01091R01D

Comment text: Patent Application

Patent event date: 20081211

PA0201 Request for examination
PG1501 Laying open of application
E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 20101021

Patent event code: PE09021S01D

E601 Decision to refuse application
PE0601 Decision on rejection of patent

Patent event date: 20110127

Comment text: Decision to Refuse Application

Patent event code: PE06012S01D

Patent event date: 20101021

Comment text: Notification of reason for refusal

Patent event code: PE06011S01I