KR20090016019A - 고 굴절률 폴리실록산 및 이의 제조방법 - Google Patents

고 굴절률 폴리실록산 및 이의 제조방법 Download PDF

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Publication number
KR20090016019A
KR20090016019A KR1020097001646A KR20097001646A KR20090016019A KR 20090016019 A KR20090016019 A KR 20090016019A KR 1020097001646 A KR1020097001646 A KR 1020097001646A KR 20097001646 A KR20097001646 A KR 20097001646A KR 20090016019 A KR20090016019 A KR 20090016019A
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South Korea
Prior art keywords
units
polysiloxane
refractive index
formula
siloxane
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Ceased
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KR1020097001646A
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English (en)
Korean (ko)
Inventor
피에르 슈발리에
도안 리 어우
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다우 코닝 코포레이션
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Publication of KR20090016019A publication Critical patent/KR20090016019A/ko
Ceased legal-status Critical Current

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/14Polysiloxanes containing silicon bound to oxygen-containing groups
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04Polysiloxanes
    • C09D183/08Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02Silicon compounds
    • C07F7/08Compounds having one or more C—Si linkages
    • C07F7/12Organo silicon halides
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02Silicon compounds
    • C07F7/08Compounds having one or more C—Si linkages
    • C07F7/12Organo silicon halides
    • C07F7/121Preparation or treatment not provided for in C07F7/14, C07F7/16 or C07F7/20
    • C07F7/122Preparation or treatment not provided for in C07F7/14, C07F7/16 or C07F7/20 by reactions involving the formation of Si-C linkages
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/06Preparatory processes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/22Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • C08G77/24Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen halogen-containing groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/38Polysiloxanes modified by chemical after-treatment
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/38Polysiloxanes modified by chemical after-treatment
    • C08G77/382Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon
    • C08G77/385Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon containing halogens
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04Polysiloxanes
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Silicon Polymers (AREA)
  • Paints Or Removers (AREA)
KR1020097001646A 2001-07-28 2002-07-18 고 굴절률 폴리실록산 및 이의 제조방법 Ceased KR20090016019A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB0118473.8 2001-07-28
GBGB0118473.8A GB0118473D0 (en) 2001-07-28 2001-07-28 High refractive index polysiloxanes and their preparation

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR10-2004-7001259A Division KR20040030870A (ko) 2001-07-28 2002-07-18 고 굴절률 폴리실록산 및 이의 제조방법

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020107001483A Division KR20100024506A (ko) 2001-07-28 2002-07-18 클로로실란 및 이의 제조방법

Publications (1)

Publication Number Publication Date
KR20090016019A true KR20090016019A (ko) 2009-02-12

Family

ID=9919401

Family Applications (3)

Application Number Title Priority Date Filing Date
KR1020097001646A Ceased KR20090016019A (ko) 2001-07-28 2002-07-18 고 굴절률 폴리실록산 및 이의 제조방법
KR1020107001483A Ceased KR20100024506A (ko) 2001-07-28 2002-07-18 클로로실란 및 이의 제조방법
KR10-2004-7001259A Ceased KR20040030870A (ko) 2001-07-28 2002-07-18 고 굴절률 폴리실록산 및 이의 제조방법

Family Applications After (2)

Application Number Title Priority Date Filing Date
KR1020107001483A Ceased KR20100024506A (ko) 2001-07-28 2002-07-18 클로로실란 및 이의 제조방법
KR10-2004-7001259A Ceased KR20040030870A (ko) 2001-07-28 2002-07-18 고 굴절률 폴리실록산 및 이의 제조방법

Country Status (9)

Country Link
US (1) US7429638B2 (https=)
EP (1) EP1417252B1 (https=)
JP (1) JP2004536210A (https=)
KR (3) KR20090016019A (https=)
CN (2) CN101633735B (https=)
AU (1) AU2002321283A1 (https=)
CA (1) CA2455331A1 (https=)
GB (1) GB0118473D0 (https=)
WO (1) WO2003011944A2 (https=)

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GB0118473D0 (en) 2001-07-28 2001-09-19 Dow Corning High refractive index polysiloxanes and their preparation
JP5296297B2 (ja) 2005-04-04 2013-09-25 東レ・ファインケミカル株式会社 縮合多環式炭化水素基を有するシリコーン共重合体及びその製造方法
CN101163748B (zh) * 2005-05-26 2011-04-13 陶氏康宁公司 用于模塑小的型材的方法和有机硅封装剂组合物
KR101325792B1 (ko) * 2006-01-17 2013-11-04 다우 코닝 코포레이션 열 안정성 투명 실리콘 수지 조성물 및 이의 제조 방법 및용도
CN101336383B (zh) * 2006-02-01 2012-05-09 陶氏康宁公司 抗冲击的光波导管及其制造方法
WO2007100445A2 (en) * 2006-02-24 2007-09-07 Dow Corning Corporation Light emitting device encapsulated with silicones and curable silicone compositions for preparing the silicones
WO2007120628A2 (en) * 2006-04-11 2007-10-25 Dow Corning Corporation A composition including a siloxane and a method of forming the same
US20070272934A1 (en) * 2006-05-23 2007-11-29 Kee Yean Ng LED device with improved life performance
US20070284687A1 (en) * 2006-06-13 2007-12-13 Rantala Juha T Semiconductor optoelectronics devices
TWI473255B (zh) * 2006-07-13 2015-02-11 Silecs Oy 半導體光電裝置
JP5035770B2 (ja) * 2007-02-16 2012-09-26 東レ・ファインケミカル株式会社 縮合多環式炭化水素基を有するシリコーン共重合体、及び、その製造方法
KR101430261B1 (ko) * 2007-02-23 2014-08-14 삼성전자주식회사 유기 실리콘 나노클러스터, 이의 제조방법, 이를 이용한박막형성 방법
JP5318383B2 (ja) * 2007-08-07 2013-10-16 デクセリアルズ株式会社 光学部品封止材及び発光装置
EP2422845B1 (en) 2010-08-24 2013-04-24 Polyphotonix Limited Lightguide phototherapy apparatus
EP2422844A1 (en) 2010-08-24 2012-02-29 Polyphotonix Limited Wearable phototherapy device
US8257988B1 (en) 2011-05-17 2012-09-04 Rohm And Haas Electronic Materials Llc Method of making light emitting diodes
US8258636B1 (en) 2011-05-17 2012-09-04 Rohm And Haas Electronic Materials Llc High refractive index curable liquid light emitting diode encapsulant formulation
EP2733160A4 (en) * 2011-07-07 2014-12-17 Dow Corning Toray Co Ltd ORGANOPOLYSILOXAN AND MANUFACTURING METHOD THEREFOR
US20140191161A1 (en) * 2011-07-07 2014-07-10 Masaaki Amako Curable Silicon Composition, Cured Product Thereof, And Optical Semiconductor Device
US8450445B2 (en) 2011-08-17 2013-05-28 Rohm And Haas Electronic Materials Llc Light emitting diode manufacturing method
US8455607B2 (en) 2011-08-17 2013-06-04 Rohm And Haas Electronic Materials Llc Curable liquid composite light emitting diode encapsulant
JP6022236B2 (ja) * 2012-06-28 2016-11-09 東レ・ダウコーニング株式会社 コーティング剤、電気・電子機器、および電気・電子機器の金属部の保護方法
JP6176248B2 (ja) * 2012-07-19 2017-08-09 東レ株式会社 ポリシロキサン組成物、電子デバイスおよび光学デバイス
JP2014077117A (ja) * 2012-09-21 2014-05-01 Dow Corning Toray Co Ltd 高屈折性表面処理剤、それを用いて表面処理された微細部材および光学材料
TWI689533B (zh) * 2014-03-28 2020-04-01 美商道康寧公司 包含與多氟聚醚矽烷反應的固化聚有機矽氧烷中間物之共聚物組成物及其相關形成方法
JP7357505B2 (ja) * 2018-11-21 2023-10-06 信越化学工業株式会社 ヨウ素含有熱硬化性ケイ素含有材料、これを含むeuvリソグラフィー用レジスト下層膜形成用組成物、及びパターン形成方法
JP7368324B2 (ja) 2019-07-23 2023-10-24 信越化学工業株式会社 ケイ素含有レジスト下層膜形成用組成物及びパターン形成方法
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Also Published As

Publication number Publication date
WO2003011944A3 (en) 2003-05-08
CN101633735A (zh) 2010-01-27
WO2003011944A2 (en) 2003-02-13
US7429638B2 (en) 2008-09-30
AU2002321283A1 (en) 2003-02-17
EP1417252B1 (en) 2015-07-01
CN101633735B (zh) 2011-07-20
KR20100024506A (ko) 2010-03-05
CA2455331A1 (en) 2003-02-13
GB0118473D0 (en) 2001-09-19
JP2004536210A (ja) 2004-12-02
KR20040030870A (ko) 2004-04-09
CN1636031A (zh) 2005-07-06
US20040236057A1 (en) 2004-11-25
CN100547014C (zh) 2009-10-07
EP1417252A2 (en) 2004-05-12

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