KR20080085902A - 리드프레임 기반 플래시 메모리 카드 - Google Patents
리드프레임 기반 플래시 메모리 카드 Download PDFInfo
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- KR20080085902A KR20080085902A KR1020087018744A KR20087018744A KR20080085902A KR 20080085902 A KR20080085902 A KR 20080085902A KR 1020087018744 A KR1020087018744 A KR 1020087018744A KR 20087018744 A KR20087018744 A KR 20087018744A KR 20080085902 A KR20080085902 A KR 20080085902A
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- 239000004065 semiconductor Substances 0.000 claims abstract description 65
- 238000000034 method Methods 0.000 claims abstract description 49
- 238000005520 cutting process Methods 0.000 claims abstract description 39
- 150000001875 compounds Chemical class 0.000 claims description 17
- 238000000465 moulding Methods 0.000 claims description 17
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 238000004080 punching Methods 0.000 claims description 8
- 238000005530 etching Methods 0.000 claims description 2
- 238000005538 encapsulation Methods 0.000 abstract description 5
- 229910052751 metal Inorganic materials 0.000 description 10
- 239000002184 metal Substances 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- 238000003698 laser cutting Methods 0.000 description 9
- 229920002120 photoresistant polymer Polymers 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 238000003486 chemical etching Methods 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 229910000881 Cu alloy Inorganic materials 0.000 description 2
- 229910003460 diamond Inorganic materials 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 1
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- BSIDXUHWUKTRQL-UHFFFAOYSA-N nickel palladium Chemical compound [Ni].[Pd] BSIDXUHWUKTRQL-UHFFFAOYSA-N 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
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- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
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Abstract
Description
Claims (16)
- 다수의 리드프레임을 포함하는 리드프레임 패널로부터 형성되는 반도체 패키지용 리드프레임에 있어서,리드프레임 내에 형성된 하나 이상의 굴곡형 슬롯을 포함하며,상기 하나 이상의 굴곡형 슬롯의 하나의 굴곡형 슬롯은,리드프레임 패널로부터 개별화 시에 리드프레임이 절단될 직선형 가장자리에 대응하는 제1 기준선(reference line) 상에 위치하는 제1 단부와,리드프레임 패널로부터 개별화 시에 리드프레임이 절단될 직선형 가장자리에 대응하는 제2 기준선 상에 위치하는 제2 단부를 구비하는 것을 특징으로 하는 반도체 패키지용 리드프레임.
- 제1항에 있어서,제1 기준선과 제2 기준선은, 리드프레임 패널로부터 개별화 시에, 리드프레임이 절단될 동일한 직선형 가장자리에 대응하는 것을 특징으로 하는 반도체 패키지용 리드프레임.
- 제1항에 있어서,제1 기준선과 제2 기준선은, 리드프레임 패널로부터 개별화 시에, 리드프레임이 절단될 서로 다른 직선형 가장자리에 대응하는 것을 특징으로 하는 반도체 패 키지용 리드프레임.
- 제1항에 있어서,제1 기준선, 슬롯 및 제2 기준선은 함께 반도체 패키지의 인접한 가장자리들을 한정하는 것을 특징으로 하는 반도체 패키지용 리드프레임.
- 제1항에 있어서,슬롯은 반도체 패키지의 모서리부를 한정하는 것을 특징으로 하는 반도체 패키지용 리드프레임.
- 제1항에 있어서,제1 기준선은, 제1 기준선과 제2 기준선 사이의 반도체 패키지의 둥근 모서리부에 위치하는 것을 특징으로 하는 반도체 패키지용 리드프레임.
- 제1항에 있어서,슬롯은 반도체 패키지의 외측 가장자리 내에 노치를 한정하는 것을 특징으로 하는 반도체 패키지용 리드프레임.
- 제1항에 있어서,슬롯은 반도체 패키지의 외측 가장자리 내에 리세스부를 한정하는 것을 특징 으로 하는 반도체 패키지용 리드프레임.
- 제1항에 있어서,리드프레임은 트랜스플래시 플래시 메모리 소자 내에 사용 가능하고, 하나 이상의 슬롯은 상기 소자의 굴곡형 가장자리를 한정하는 것을 특징으로 하는 반도체 패키지용 리드프레임.
- 봉입된 반도체 패키지를 제조하는 방법에 있어서,(a) 반도체 패키지의 외측 가장자리 형상의 리드프레임의 구획부(portion) 주위에 연장된 슬롯을 구비하는 리드프레임을 형성하는 단계로서, 상기 구획부는 이산된 지점들(discrete points)에서 상기 구획부를 둘러싸는 리드프레임에 연결되도록 구성되는 단계,(b) 슬롯에 의해 한정된 리드프레임의 구획부에 반도체 다이를 부착하는 단계,(c) 슬롯에 의해 한정된 리드프레임의 구획부를 성형 화합물 내에 봉입하는 단계, 및(d) 리드프레임으로부터 반도체 패키지를 개별화하기 위하여, 이산된 지점들을 절단하는 단계를포함하는 것을 특징으로 하는 봉입된 반도체 패키지 제조 방법.
- 제10항에 있어서,리드프레임으로부터 반도체 패키지를 개별화하기 위하여, 이산된 지점들을 절단하는 상기 단계 (d)는 리드프레임으로부터 반도체 패키지를 펀칭하는 단계를 포함하는 것을 특징으로 하는 봉입된 반도체 패키지용 리드프레임.
- 제10항에 있어서,리드프레임의 구획부 주위에 연장된 슬롯을 구비하는 리드프레임을 형성하는 상기 단계 (a)는 리드프레임 내에 슬롯을 식각하는 단계를 포함하는 것을 특징으로 하는 봉입된 반도체 패키지용 리드프레임.
- 제10항에 있어서,리드프레임의 구획부 주위에 연장된 슬롯을 구비하는 리드프레임을 형성하는 상기 단계 (a)는 리드프레임 내에 슬롯을 스탬핑하는 단계를 포함하는 것을 특징으로 하는 봉입된 반도체 패키지용 리드프레임.
- 제10항에 있어서,리드프레임의 구획부 주위에 연장된 슬롯을 구비하는 리드프레임을 형성하는 상기 단계 (a)는 트랜스플래시 플래시 메모리 소자의 외측 가장자리의 형상의 슬롯을 형성하는 단계를 포함하는 것을 특징으로 하는 봉입된 반도체 패키지용 리드프레임.
- 제10항에 있어서,리드프레임의 구획부 주위에 연장된 슬롯을 구비하는 리드프레임을 형성하는 상기 단계 (a)는 시큐어 디지털 플래시 메모리 소자의 외측 가장자리의 형상의 슬롯을 형성하는 단계를 포함하는 것을 특징으로 하는 봉입된 반도체 패키지용 리드프레임.
- 제10항에 있어서,리드프레임으로부터 반도체 패키지를 개별화한 후에, 반도체 패키지를 버 제거(deburring) 처리하는 단계를 또한 포함하는 것을 특징으로 하는 봉입된 반도체 패키지용 리드프레임.
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US11/321,350 | 2005-12-29 | ||
US11/321,350 US7488620B2 (en) | 2005-12-29 | 2005-12-29 | Method of fabricating leadframe based flash memory cards including singulation by straight line cuts |
Publications (2)
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KR20080085902A true KR20080085902A (ko) | 2008-09-24 |
KR101015268B1 KR101015268B1 (ko) | 2011-02-18 |
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US (2) | US7488620B2 (ko) |
EP (1) | EP1969628A2 (ko) |
KR (1) | KR101015268B1 (ko) |
CN (3) | CN103035606B (ko) |
TW (1) | TWI335656B (ko) |
WO (1) | WO2007079125A2 (ko) |
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-
2005
- 2005-12-29 US US11/321,350 patent/US7488620B2/en active Active
-
2006
- 2006-12-27 EP EP06849020A patent/EP1969628A2/en not_active Withdrawn
- 2006-12-27 CN CN201210240463.6A patent/CN103035606B/zh not_active Expired - Fee Related
- 2006-12-27 CN CN2010100006442A patent/CN101847584B/zh not_active Expired - Fee Related
- 2006-12-27 KR KR1020087018744A patent/KR101015268B1/ko active IP Right Grant
- 2006-12-27 WO PCT/US2006/049383 patent/WO2007079125A2/en active Application Filing
- 2006-12-27 CN CNA200680049955XA patent/CN101351883A/zh active Pending
- 2006-12-28 TW TW095149569A patent/TWI335656B/zh not_active IP Right Cessation
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2009
- 2009-01-30 US US12/363,311 patent/US7795715B2/en active Active
Also Published As
Publication number | Publication date |
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KR101015268B1 (ko) | 2011-02-18 |
US7488620B2 (en) | 2009-02-10 |
US20090134502A1 (en) | 2009-05-28 |
CN101847584B (zh) | 2012-10-03 |
CN101847584A (zh) | 2010-09-29 |
US20070155046A1 (en) | 2007-07-05 |
WO2007079125A2 (en) | 2007-07-12 |
US7795715B2 (en) | 2010-09-14 |
CN103035606B (zh) | 2016-01-06 |
EP1969628A2 (en) | 2008-09-17 |
WO2007079125A3 (en) | 2007-10-04 |
CN101351883A (zh) | 2009-01-21 |
CN103035606A (zh) | 2013-04-10 |
TWI335656B (en) | 2011-01-01 |
TW200735316A (en) | 2007-09-16 |
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