KR20080026539A - 스테이지 장치 - Google Patents
스테이지 장치 Download PDFInfo
- Publication number
- KR20080026539A KR20080026539A KR1020077028590A KR20077028590A KR20080026539A KR 20080026539 A KR20080026539 A KR 20080026539A KR 1020077028590 A KR1020077028590 A KR 1020077028590A KR 20077028590 A KR20077028590 A KR 20077028590A KR 20080026539 A KR20080026539 A KR 20080026539A
- Authority
- KR
- South Korea
- Prior art keywords
- gantry
- substrate
- guide
- pair
- processed
- Prior art date
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/682—Mask-wafer alignment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70975—Assembly, maintenance, transport or storage of apparatus
Abstract
Description
Claims (2)
- 피처리기판을 지지하는 기판 지지면과,상기 기판 지지면을 사이에 두어 대향 배치된 한쌍의 가이드 프레임과,상기 한쌍의 가이드 프레임간에 걸쳐서 늘려져 있고 상기 한쌍의 가이드 프레임에 대해서 이동자재하게 지지된 갠트리와,상기 갠트리에 설치된 기판처리유닛을 구비한 스테이지 장치에 있어서,상기 한쌍의 가이드 프레임중 한쪽의 가이드 프레임을 포함한 제1 구성체와,상기 한쌍의 가이드 프레임중 다른 쪽의 가이드 프레임을 포함한 제2 구성체와,상기 갠트리를 포함한 제3 구성체의 결합으로 되는것을 특징으로 하는 스테이지 장치.
- 피처리기판을 설치하고, 상기 피처리기판상에서 갠트리를 이동시켜, 상기 피처리기판의 처리 또는 검사를 하기 위한 스테이지 장치에 있어서,상기 갠트리의 양다리부를 이동자재하게 지지하는 한쌍의 가이드부를 구비하고,상기 한쌍의 가이드부는 분리운반 가능하게 구성되어 있는것을 특징으로 하는 스테이지 장치.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2006-00059836 | 2006-03-06 | ||
JP2006059836 | 2006-03-06 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20080026539A true KR20080026539A (ko) | 2008-03-25 |
KR100969554B1 KR100969554B1 (ko) | 2010-07-12 |
Family
ID=38474760
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020077028590A KR100969554B1 (ko) | 2006-03-06 | 2007-02-23 | 스테이지 장치 |
Country Status (6)
Country | Link |
---|---|
US (1) | US20090092467A1 (ko) |
JP (1) | JP5027108B2 (ko) |
KR (1) | KR100969554B1 (ko) |
CN (1) | CN101326625B (ko) |
TW (1) | TWI371077B (ko) |
WO (1) | WO2007102321A1 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101139043B1 (ko) * | 2009-04-28 | 2012-04-30 | 가부시키가이샤 히타치플랜트테크놀로지 | 페이스트 도포 장치 및 도포 방법 |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2009028525A1 (ja) * | 2007-08-28 | 2009-03-05 | Ulvac, Inc. | ステージ装置組み立て方法 |
JP5274960B2 (ja) * | 2008-09-26 | 2013-08-28 | 株式会社ディスコ | 切削装置 |
JP4881965B2 (ja) * | 2009-02-16 | 2012-02-22 | 株式会社日立ハイテクノロジーズ | 液晶露光装置 |
JP5525182B2 (ja) * | 2009-05-14 | 2014-06-18 | 株式会社日立製作所 | ペースト塗布装置及び塗布方法 |
CN108972627B (zh) * | 2018-08-31 | 2019-05-31 | 南京涵铭置智能科技有限公司 | 一种便于进行安装机械臂用固定装置 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07124831A (ja) * | 1993-06-11 | 1995-05-16 | Mori Seiki Co Ltd | リニアガイド装置 |
JP3011367B2 (ja) * | 1997-11-11 | 2000-02-21 | 川崎重工業株式会社 | 3次元自動計測装置 |
JP3701882B2 (ja) * | 2001-05-25 | 2005-10-05 | 株式会社 日立インダストリイズ | ペースト塗布機 |
TW200507946A (en) * | 2003-07-18 | 2005-03-01 | Sumitomo Heavy Industries | Working table device for table type coating applicator |
US20050020338A1 (en) * | 2003-07-24 | 2005-01-27 | Jeremy Stein | Casino card game |
US7077019B2 (en) * | 2003-08-08 | 2006-07-18 | Photon Dynamics, Inc. | High precision gas bearing split-axis stage for transport and constraint of large flat flexible media during processing |
US7625198B2 (en) * | 2004-08-11 | 2009-12-01 | Cornell Research Foundation, Inc. | Modular fabrication systems and methods |
US7255747B2 (en) * | 2004-12-22 | 2007-08-14 | Sokudo Co., Ltd. | Coat/develop module with independent stations |
JP4664117B2 (ja) * | 2005-03-03 | 2011-04-06 | 住友重機械工業株式会社 | 搬送物浮上ユニット、搬送物浮上装置、及びステージ装置 |
US20090173278A1 (en) * | 2006-02-28 | 2009-07-09 | Yasuzou Tanaka | Stage apparatus |
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2007
- 2007-02-23 WO PCT/JP2007/053359 patent/WO2007102321A1/ja active Application Filing
- 2007-02-23 US US11/989,646 patent/US20090092467A1/en not_active Abandoned
- 2007-02-23 CN CN2007800006326A patent/CN101326625B/zh active Active
- 2007-02-23 JP JP2008503776A patent/JP5027108B2/ja not_active Expired - Fee Related
- 2007-02-23 KR KR1020077028590A patent/KR100969554B1/ko active IP Right Grant
- 2007-02-27 TW TW096106641A patent/TWI371077B/zh not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101139043B1 (ko) * | 2009-04-28 | 2012-04-30 | 가부시키가이샤 히타치플랜트테크놀로지 | 페이스트 도포 장치 및 도포 방법 |
Also Published As
Publication number | Publication date |
---|---|
JPWO2007102321A1 (ja) | 2009-07-23 |
WO2007102321A1 (ja) | 2007-09-13 |
CN101326625B (zh) | 2010-04-21 |
US20090092467A1 (en) | 2009-04-09 |
CN101326625A (zh) | 2008-12-17 |
KR100969554B1 (ko) | 2010-07-12 |
JP5027108B2 (ja) | 2012-09-19 |
TW200746347A (en) | 2007-12-16 |
TWI371077B (en) | 2012-08-21 |
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