KR20080007604A - 이축-배향된 열경화성 폴리에스터 필름으로부터 유도된전도성 코팅된 기판 - Google Patents
이축-배향된 열경화성 폴리에스터 필름으로부터 유도된전도성 코팅된 기판 Download PDFInfo
- Publication number
- KR20080007604A KR20080007604A KR1020077026577A KR20077026577A KR20080007604A KR 20080007604 A KR20080007604 A KR 20080007604A KR 1020077026577 A KR1020077026577 A KR 1020077026577A KR 20077026577 A KR20077026577 A KR 20077026577A KR 20080007604 A KR20080007604 A KR 20080007604A
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- KR
- South Korea
- Prior art keywords
- substrate
- film
- mole percent
- temperature
- polyester
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 229920006267 polyester film Polymers 0.000 title claims abstract description 34
- 239000000758 substrate Substances 0.000 title claims description 73
- 229920001187 thermosetting polymer Polymers 0.000 title description 3
- 230000008018 melting Effects 0.000 claims abstract description 43
- 238000002844 melting Methods 0.000 claims abstract description 43
- 229920000728 polyester Polymers 0.000 claims abstract description 40
- 238000000576 coating method Methods 0.000 claims abstract description 21
- 239000011248 coating agent Substances 0.000 claims abstract description 15
- 229920000642 polymer Polymers 0.000 claims description 46
- 238000000034 method Methods 0.000 claims description 34
- YIMQCDZDWXUDCA-UHFFFAOYSA-N [4-(hydroxymethyl)cyclohexyl]methanol Chemical group OCC1CCC(CO)CC1 YIMQCDZDWXUDCA-UHFFFAOYSA-N 0.000 claims description 28
- KKEYFWRCBNTPAC-UHFFFAOYSA-N terephthalic acid group Chemical group C(C1=CC=C(C(=O)O)C=C1)(=O)O KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 claims description 19
- 150000002009 diols Chemical group 0.000 claims description 14
- KYTZHLUVELPASH-UHFFFAOYSA-N naphthalene-1,2-dicarboxylic acid Chemical group C1=CC=CC2=C(C(O)=O)C(C(=O)O)=CC=C21 KYTZHLUVELPASH-UHFFFAOYSA-N 0.000 claims description 13
- 229910052809 inorganic oxide Inorganic materials 0.000 claims description 12
- 229910021417 amorphous silicon Inorganic materials 0.000 claims description 10
- 230000009477 glass transition Effects 0.000 claims description 10
- 229920006254 polymer film Polymers 0.000 claims description 10
- 238000000113 differential scanning calorimetry Methods 0.000 claims description 9
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 8
- 239000002253 acid Substances 0.000 claims description 7
- 239000004973 liquid crystal related substance Substances 0.000 claims description 7
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical group [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 claims description 5
- 238000013007 heat curing Methods 0.000 description 36
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 24
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 16
- 229910052757 nitrogen Inorganic materials 0.000 description 16
- 238000003756 stirring Methods 0.000 description 16
- 239000003054 catalyst Substances 0.000 description 14
- 239000010936 titanium Substances 0.000 description 14
- 230000000052 comparative effect Effects 0.000 description 13
- 239000000203 mixture Substances 0.000 description 13
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 12
- 229910052719 titanium Inorganic materials 0.000 description 12
- 238000001723 curing Methods 0.000 description 11
- 229910052751 metal Inorganic materials 0.000 description 11
- 239000002184 metal Substances 0.000 description 11
- 238000004458 analytical method Methods 0.000 description 10
- 229920001634 Copolyester Polymers 0.000 description 9
- 238000002360 preparation method Methods 0.000 description 9
- 230000008569 process Effects 0.000 description 9
- 238000005481 NMR spectroscopy Methods 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 8
- 238000001816 cooling Methods 0.000 description 8
- WOZVHXUHUFLZGK-UHFFFAOYSA-N dimethyl terephthalate Chemical compound COC(=O)C1=CC=C(C(=O)OC)C=C1 WOZVHXUHUFLZGK-UHFFFAOYSA-N 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- 229920000139 polyethylene terephthalate Polymers 0.000 description 8
- 239000005020 polyethylene terephthalate Substances 0.000 description 8
- 238000000151 deposition Methods 0.000 description 7
- 239000008188 pellet Substances 0.000 description 7
- 229910000679 solder Inorganic materials 0.000 description 7
- 229910052782 aluminium Inorganic materials 0.000 description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 6
- 238000000429 assembly Methods 0.000 description 6
- 230000000712 assembly Effects 0.000 description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 5
- 238000000137 annealing Methods 0.000 description 5
- 239000006085 branching agent Substances 0.000 description 5
- 230000008021 deposition Effects 0.000 description 5
- QPFMBZIOSGYJDE-UHFFFAOYSA-N 1,1,2,2-tetrachloroethane Chemical compound ClC(Cl)C(Cl)Cl QPFMBZIOSGYJDE-UHFFFAOYSA-N 0.000 description 4
- 238000002425 crystallisation Methods 0.000 description 4
- 230000008025 crystallization Effects 0.000 description 4
- 238000001125 extrusion Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 150000002334 glycols Chemical class 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000012071 phase Substances 0.000 description 4
- 238000011282 treatment Methods 0.000 description 4
- NEQFBGHQPUXOFH-UHFFFAOYSA-N 4-(4-carboxyphenyl)benzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1C1=CC=C(C(O)=O)C=C1 NEQFBGHQPUXOFH-UHFFFAOYSA-N 0.000 description 3
- 229920002799 BoPET Polymers 0.000 description 3
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 3
- 239000004642 Polyimide Substances 0.000 description 3
- 150000008064 anhydrides Chemical class 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 3
- 239000002800 charge carrier Substances 0.000 description 3
- 150000001991 dicarboxylic acids Chemical class 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000006260 foam Substances 0.000 description 3
- 238000007654 immersion Methods 0.000 description 3
- 239000000155 melt Substances 0.000 description 3
- 238000006068 polycondensation reaction Methods 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- 238000001029 thermal curing Methods 0.000 description 3
- 230000037303 wrinkles Effects 0.000 description 3
- DYLIWHYUXAJDOJ-OWOJBTEDSA-N (e)-4-(6-aminopurin-9-yl)but-2-en-1-ol Chemical compound NC1=NC=NC2=C1N=CN2C\C=C\CO DYLIWHYUXAJDOJ-OWOJBTEDSA-N 0.000 description 2
- QUVMSYUGOKEMPX-UHFFFAOYSA-N 2-methylpropan-1-olate;titanium(4+) Chemical compound [Ti+4].CC(C)C[O-].CC(C)C[O-].CC(C)C[O-].CC(C)C[O-] QUVMSYUGOKEMPX-UHFFFAOYSA-N 0.000 description 2
- BJLUCDZIWWSFIB-UHFFFAOYSA-N 5-tert-butylbenzene-1,3-dicarboxylic acid Chemical compound CC(C)(C)C1=CC(C(O)=O)=CC(C(O)=O)=C1 BJLUCDZIWWSFIB-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 125000005907 alkyl ester group Chemical group 0.000 description 2
- QMKYBPDZANOJGF-UHFFFAOYSA-N benzene-1,3,5-tricarboxylic acid Chemical compound OC(=O)C1=CC(C(O)=O)=CC(C(O)=O)=C1 QMKYBPDZANOJGF-UHFFFAOYSA-N 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 230000003197 catalytic effect Effects 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- HNRMPXKDFBEGFZ-UHFFFAOYSA-N ethyl trimethyl methane Natural products CCC(C)(C)C HNRMPXKDFBEGFZ-UHFFFAOYSA-N 0.000 description 2
- 230000003301 hydrolyzing effect Effects 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 150000003018 phosphorus compounds Chemical class 0.000 description 2
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 2
- DNIAPMSPPWPWGF-VKHMYHEASA-N (+)-propylene glycol Chemical compound C[C@H](O)CO DNIAPMSPPWPWGF-VKHMYHEASA-N 0.000 description 1
- YPFDHNVEDLHUCE-UHFFFAOYSA-N 1,3-propanediol Substances OCCCO YPFDHNVEDLHUCE-UHFFFAOYSA-N 0.000 description 1
- IWEATXLWFWACOA-UHFFFAOYSA-N 2,6-dimethylnaphthalene-1-carboxylic acid Chemical compound OC(=O)C1=C(C)C=CC2=CC(C)=CC=C21 IWEATXLWFWACOA-UHFFFAOYSA-N 0.000 description 1
- OECUOXBUDHUERH-UHFFFAOYSA-N 3-methyl-6-(4-methylphenyl)phthalic acid Chemical compound C1=CC(C)=CC=C1C1=CC=C(C)C(C(O)=O)=C1C(O)=O OECUOXBUDHUERH-UHFFFAOYSA-N 0.000 description 1
- NEQFBGHQPUXOFH-UHFFFAOYSA-L 4-(4-carboxylatophenyl)benzoate Chemical compound C1=CC(C(=O)[O-])=CC=C1C1=CC=C(C([O-])=O)C=C1 NEQFBGHQPUXOFH-UHFFFAOYSA-L 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 102220628249 Hemoglobin subunit alpha_N10T_mutation Human genes 0.000 description 1
- 239000004609 Impact Modifier Substances 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- -1 PEN Polymers 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 229910000611 Zinc aluminium Inorganic materials 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- HXFVOUUOTHJFPX-UHFFFAOYSA-N alumane;zinc Chemical compound [AlH3].[Zn] HXFVOUUOTHJFPX-UHFFFAOYSA-N 0.000 description 1
- 229920001871 amorphous plastic Polymers 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- GVFOJDIFWSDNOY-UHFFFAOYSA-N antimony tin Chemical compound [Sn].[Sb] GVFOJDIFWSDNOY-UHFFFAOYSA-N 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000010923 batch production Methods 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- DMHQQKCWHVVMKL-UHFFFAOYSA-N butyl 4-(4-butoxycarbonylphenyl)sulfonylbenzoate Chemical compound C1=CC(C(=O)OCCCC)=CC=C1S(=O)(=O)C1=CC=C(C(=O)OCCCC)C=C1 DMHQQKCWHVVMKL-UHFFFAOYSA-N 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- MMCOUVMKNAHQOY-UHFFFAOYSA-N carbonoperoxoic acid Chemical compound OOC(O)=O MMCOUVMKNAHQOY-UHFFFAOYSA-N 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- CJOJIAKIRLKBOO-UHFFFAOYSA-N dimethyl 2-hydroxybenzene-1,4-dicarboxylate Chemical compound COC(=O)C1=CC=C(C(=O)OC)C(O)=C1 CJOJIAKIRLKBOO-UHFFFAOYSA-N 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- UHPJWJRERDJHOJ-UHFFFAOYSA-N ethene;naphthalene-1-carboxylic acid Chemical compound C=C.C1=CC=C2C(C(=O)O)=CC=CC2=C1 UHPJWJRERDJHOJ-UHFFFAOYSA-N 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 125000003827 glycol group Chemical group 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 239000012760 heat stabilizer Substances 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- NJWNEWQMQCGRDO-UHFFFAOYSA-N indium zinc Chemical compound [Zn].[In] NJWNEWQMQCGRDO-UHFFFAOYSA-N 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical class [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000006078 metal deactivator Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- RXOHFPCZGPKIRD-UHFFFAOYSA-N naphthalene-2,6-dicarboxylic acid Chemical group C1=C(C(O)=O)C=CC2=CC(C(=O)O)=CC=C21 RXOHFPCZGPKIRD-UHFFFAOYSA-N 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 239000012038 nucleophile Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920000166 polytrimethylene carbonate Polymers 0.000 description 1
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 1
- 238000004549 pulsed laser deposition Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 102220330036 rs1555864368 Human genes 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000011877 solvent mixture Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- KKEYFWRCBNTPAC-UHFFFAOYSA-L terephthalate(2-) Chemical compound [O-]C(=O)C1=CC=C(C([O-])=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-L 0.000 description 1
- 150000000000 tetracarboxylic acids Chemical class 0.000 description 1
- 238000002076 thermal analysis method Methods 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- QHGNHLZPVBIIPX-UHFFFAOYSA-N tin(ii) oxide Chemical class [Sn]=O QHGNHLZPVBIIPX-UHFFFAOYSA-N 0.000 description 1
- 150000003628 tricarboxylic acids Chemical class 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- 150000004072 triols Chemical class 0.000 description 1
- 239000000326 ultraviolet stabilizing agent Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 235000014692 zinc oxide Nutrition 0.000 description 1
- RNWHGQJWIACOKP-UHFFFAOYSA-N zinc;oxygen(2-) Chemical class [O-2].[Zn+2] RNWHGQJWIACOKP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/044—Forming conductive coatings; Forming coatings having anti-static properties
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/048—Forming gas barrier coatings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/06—Coating with compositions not containing macromolecular substances
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L67/00—Compositions of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Compositions of derivatives of such polymers
- C08L67/02—Polyesters derived from dicarboxylic acids and dihydroxy compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2367/00—Characterised by the use of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Derivatives of such polymers
- C08J2367/02—Polyesters derived from dicarboxylic acids and dihydroxy compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2323/00—Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition
- C09K2323/06—Substrate layer characterised by chemical composition
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31786—Of polyester [e.g., alkyd, etc.]
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Manufacturing & Machinery (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Laminated Bodies (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Shaping By String And By Release Of Stress In Plastics And The Like (AREA)
- Non-Insulated Conductors (AREA)
- Liquid Crystal (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US68164705P | 2005-05-17 | 2005-05-17 | |
| US60/681,647 | 2005-05-17 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20080007604A true KR20080007604A (ko) | 2008-01-22 |
Family
ID=37431857
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020077026577A Withdrawn KR20080007604A (ko) | 2005-05-17 | 2006-05-11 | 이축-배향된 열경화성 폴리에스터 필름으로부터 유도된전도성 코팅된 기판 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20060275558A1 (enExample) |
| EP (1) | EP1882006A2 (enExample) |
| JP (1) | JP2008545822A (enExample) |
| KR (1) | KR20080007604A (enExample) |
| CN (1) | CN101175799A (enExample) |
| TW (1) | TW200700476A (enExample) |
| WO (1) | WO2006124480A2 (enExample) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7524920B2 (en) * | 2004-12-16 | 2009-04-28 | Eastman Chemical Company | Biaxially oriented copolyester film and laminates thereof |
| JP2007177136A (ja) * | 2005-12-28 | 2007-07-12 | Asahi Kasei Chemicals Corp | 太陽電池用裏面保護シート |
| CN101564720B (zh) * | 2009-05-20 | 2012-01-11 | 哈尔滨工业大学 | 双向拉伸聚酯薄膜表面耐磨抗划伤性涂层的制备方法 |
| WO2012081500A1 (ja) * | 2010-12-17 | 2012-06-21 | 富士フイルム株式会社 | ポリエステルフィルムおよびポリエステルフィルムの製造方法、太陽電池用バックシート、ならびに太陽電池モジュール |
| CN103370183B (zh) * | 2011-02-15 | 2016-05-04 | 富士胶片株式会社 | 双轴拉伸聚酯膜及其制造方法、太阳能电池用背板、以及太阳能电池模块 |
| CN103384694B (zh) * | 2011-03-09 | 2015-04-15 | 富士胶片株式会社 | 聚酯膜的制造方法、聚酯膜和太阳能电池用背板 |
| US10767041B2 (en) | 2015-11-24 | 2020-09-08 | Eastman Chemical Company | Polymer compositions and substrates for high temperature transparent conductive film applications |
| KR102586724B1 (ko) * | 2019-08-09 | 2023-10-10 | 에프이아이 컴파니 | 공진 rf 캐비티의 유전체 삽입체 상의 코팅물 |
| CN113771346A (zh) * | 2021-09-08 | 2021-12-10 | 南京贝迪新材料科技股份有限公司 | 一种用于lcp膜的双轴延伸工艺 |
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| US3284223A (en) * | 1965-05-19 | 1966-11-08 | Eastman Kodak Co | Magnetic recording tape supported on terephthalate polyesters of 1, 4-cyclohexanedimethanol |
| UST876001I4 (en) * | 1969-07-29 | 1970-07-28 | Defensive publication | |
| DE2428532C3 (de) * | 1973-06-20 | 1984-02-23 | Matsushita Electric Industrial Co., Ltd., Kadoma, Osaka | Zusammensetzungen für einen Hochtemperatur-Heißleiter |
| JPS556317B2 (enExample) * | 1973-06-20 | 1980-02-15 | ||
| US3907754A (en) * | 1974-06-19 | 1975-09-23 | Eastman Kodak Co | Process and catalyst-inhibitor system for preparing synthetic linear polyester |
| US3962189A (en) * | 1974-11-01 | 1976-06-08 | Eastman Kodak Company | Process and catalyst-inhibitor systems for preparing synthetic linear polyesters |
| US4010145A (en) * | 1975-05-12 | 1977-03-01 | Eastman Kodak Company | Process and catalyst inhibitor systems for preparing synthetic linear polyesters |
| JPS5610451A (en) * | 1979-07-05 | 1981-02-02 | Toray Industries | Resin coated metallic plate for vessel |
| US4356299A (en) * | 1982-02-04 | 1982-10-26 | Rohm And Haas Company | Catalyst system for a polyethylene terephthalate polycondensation |
| US4557982A (en) * | 1983-04-07 | 1985-12-10 | Teijin Limited | Magnetic recording flexible disc |
| US4446303A (en) * | 1983-07-26 | 1984-05-01 | Eastman Kodak Company | Process for preparing high molecular weight polyesters |
| US5017680A (en) * | 1990-07-03 | 1991-05-21 | Eastman Kodak Company | Process and catalyst-inhibitor systems for preparing poly(ethylene terephthalate) |
| JPH0659686B2 (ja) * | 1990-10-29 | 1994-08-10 | ダイアホイルヘキスト株式会社 | コンデンサー用二軸配向ポリエステルフィルム |
| JPH05170961A (ja) * | 1991-12-25 | 1993-07-09 | Toray Ind Inc | コンデンサ用ポリエステルフイルム |
| JPH05274719A (ja) * | 1992-03-27 | 1993-10-22 | Diafoil Co Ltd | 光テープ |
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| US5608031A (en) * | 1995-11-30 | 1997-03-04 | Eastman Chemical Company | Polyesters modified with 1,4-cyclohexaned imethanol having high clarity prepared utilizing an antimony containing catalyst/stabilizer system |
| TW381104B (en) * | 1996-02-20 | 2000-02-01 | Eastman Chem Co | Process for preparing copolyesters of terephthalic acid, ethylene glycol, and 1,4-cyclohexanedimethanol |
| JP3309851B2 (ja) * | 1998-05-15 | 2002-07-29 | 東洋紡績株式会社 | 透明導電性フィルムおよびタッチパネル |
| US6583935B1 (en) * | 1998-05-28 | 2003-06-24 | Cpfilms Inc. | Low reflection, high transmission, touch-panel membrane |
| JP3859108B2 (ja) * | 1998-08-19 | 2006-12-20 | 東レ株式会社 | 金属板貼合わせ成形加工用ポリエステルフィルム |
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| US20020018883A1 (en) * | 2000-07-05 | 2002-02-14 | Iwao Okazaki | Thermoplastic resin film and production process thereof, and optical film |
| DE10045602A1 (de) * | 2000-09-15 | 2002-03-28 | Mitsubishi Polyester Film Gmbh | Magnetbandträgerfolie mit niedrigem Skew |
| JP2002196106A (ja) * | 2000-12-27 | 2002-07-10 | Seiko Epson Corp | マイクロレンズアレイ及びその製造方法並びに光学装置 |
| US6743488B2 (en) * | 2001-05-09 | 2004-06-01 | Cpfilms Inc. | Transparent conductive stratiform coating of indium tin oxide |
| KR100852373B1 (ko) * | 2001-08-07 | 2008-08-14 | 데이진 듀폰 필름 가부시키가이샤 | 이축 배향 적층 폴리에스테르필름 및 하드코팅 적층필름 |
| US7147927B2 (en) * | 2002-06-26 | 2006-12-12 | Eastman Chemical Company | Biaxially oriented polyester film and laminates thereof with copper |
| US7015640B2 (en) * | 2002-09-11 | 2006-03-21 | General Electric Company | Diffusion barrier coatings having graded compositions and devices incorporating the same |
| KR100509763B1 (ko) * | 2003-03-11 | 2005-08-25 | 엘지전자 주식회사 | 플라즈마 디스플레이 패널의 전면필터 |
| US7005226B2 (en) * | 2003-11-12 | 2006-02-28 | Eastman Kodak Company | High speed imaging assembly for radiography |
| US6967071B2 (en) * | 2003-11-12 | 2005-11-22 | Eastman Kodak Company | High speed radiographic imaging assembly |
| US7029819B2 (en) * | 2003-11-12 | 2006-04-18 | Eastman Kodak Company | Phosphor screen and imaging assembly |
| US7524920B2 (en) * | 2004-12-16 | 2009-04-28 | Eastman Chemical Company | Biaxially oriented copolyester film and laminates thereof |
-
2006
- 2006-05-10 US US11/431,238 patent/US20060275558A1/en not_active Abandoned
- 2006-05-11 WO PCT/US2006/018170 patent/WO2006124480A2/en not_active Ceased
- 2006-05-11 KR KR1020077026577A patent/KR20080007604A/ko not_active Withdrawn
- 2006-05-11 JP JP2008512356A patent/JP2008545822A/ja active Pending
- 2006-05-11 EP EP20060759531 patent/EP1882006A2/en not_active Withdrawn
- 2006-05-11 CN CNA2006800168148A patent/CN101175799A/zh active Pending
- 2006-05-17 TW TW095117476A patent/TW200700476A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| WO2006124480A2 (en) | 2006-11-23 |
| CN101175799A (zh) | 2008-05-07 |
| TW200700476A (en) | 2007-01-01 |
| EP1882006A2 (en) | 2008-01-30 |
| JP2008545822A (ja) | 2008-12-18 |
| US20060275558A1 (en) | 2006-12-07 |
| WO2006124480A3 (en) | 2007-05-24 |
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