KR20080001647A - 감광성 전사재료, 적층체 및 그 제조방법, 액정표시장치용기판, 액정표시 소자, 및 액정표시장치 - Google Patents

감광성 전사재료, 적층체 및 그 제조방법, 액정표시장치용기판, 액정표시 소자, 및 액정표시장치 Download PDF

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Publication number
KR20080001647A
KR20080001647A KR1020070064162A KR20070064162A KR20080001647A KR 20080001647 A KR20080001647 A KR 20080001647A KR 1020070064162 A KR1020070064162 A KR 1020070064162A KR 20070064162 A KR20070064162 A KR 20070064162A KR 20080001647 A KR20080001647 A KR 20080001647A
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KR
South Korea
Prior art keywords
resin layer
liquid crystal
photosensitive
substrate
transfer material
Prior art date
Application number
KR1020070064162A
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English (en)
Korean (ko)
Inventor
고토 히데노리
Original Assignee
후지필름 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 후지필름 가부시키가이샤 filed Critical 후지필름 가부시키가이샤
Publication of KR20080001647A publication Critical patent/KR20080001647A/ko

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials For Photolithography (AREA)
  • Liquid Crystal (AREA)
  • Laminated Bodies (AREA)
  • Optical Filters (AREA)
KR1020070064162A 2006-06-28 2007-06-28 감광성 전사재료, 적층체 및 그 제조방법, 액정표시장치용기판, 액정표시 소자, 및 액정표시장치 KR20080001647A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2006-00177772 2006-06-28
JP2006177772A JP2008009030A (ja) 2006-06-28 2006-06-28 感光性転写材料、積層体及びその製造方法、液晶表示装置用基板、液晶表示素子、並びに液晶表示装置

Publications (1)

Publication Number Publication Date
KR20080001647A true KR20080001647A (ko) 2008-01-03

Family

ID=39011300

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020070064162A KR20080001647A (ko) 2006-06-28 2007-06-28 감광성 전사재료, 적층체 및 그 제조방법, 액정표시장치용기판, 액정표시 소자, 및 액정표시장치

Country Status (4)

Country Link
JP (1) JP2008009030A (zh)
KR (1) KR20080001647A (zh)
CN (1) CN101097402A (zh)
TW (1) TW200809404A (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112785920A (zh) * 2019-11-07 2021-05-11 乐金显示有限公司 显示装置

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103091989B (zh) * 2008-01-29 2016-03-09 旭化成电子材料株式会社 感光性树脂层压体
JP6949050B2 (ja) * 2016-12-20 2021-10-13 旭化成株式会社 ２層感光層ロール
CN107244099A (zh) * 2017-07-11 2017-10-13 成都远洋蓝猫科技有限公司 一种间隔网采样袋制造机
CN107984776B (zh) * 2017-11-30 2019-10-29 清华大学深圳研究生院 一种功能性薄膜及其制备方法
JP6989711B2 (ja) * 2018-10-18 2022-01-05 富士フイルム株式会社 転写フィルム、硬化膜の製造方法、積層体の製造方法、及び、タッチパネルの製造方法
WO2020203502A1 (ja) * 2019-04-05 2020-10-08 富士フイルム株式会社 感光性転写材料、樹脂パターンの製造方法、回路配線の製造方法、及び、タッチパネルの製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112785920A (zh) * 2019-11-07 2021-05-11 乐金显示有限公司 显示装置
CN112785920B (zh) * 2019-11-07 2023-01-17 乐金显示有限公司 显示装置

Also Published As

Publication number Publication date
CN101097402A (zh) 2008-01-02
JP2008009030A (ja) 2008-01-17
TW200809404A (en) 2008-02-16

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