KR20070026481A - 물 및 수용성 매체에서의 미세립 분말의 분산 및 부동화방법 - Google Patents
물 및 수용성 매체에서의 미세립 분말의 분산 및 부동화방법 Download PDFInfo
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- KR20070026481A KR20070026481A KR1020067022263A KR20067022263A KR20070026481A KR 20070026481 A KR20070026481 A KR 20070026481A KR 1020067022263 A KR1020067022263 A KR 1020067022263A KR 20067022263 A KR20067022263 A KR 20067022263A KR 20070026481 A KR20070026481 A KR 20070026481A
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- South Korea
- Prior art keywords
- water
- powders
- powder
- dispersion
- polyvinylamine
- Prior art date
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- 239000000843 powder Substances 0.000 title claims abstract description 80
- 238000000034 method Methods 0.000 title claims abstract description 39
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims abstract description 36
- 239000012736 aqueous medium Substances 0.000 title claims abstract description 14
- 229910052751 metal Inorganic materials 0.000 claims abstract description 22
- 239000002184 metal Substances 0.000 claims abstract description 22
- 239000000919 ceramic Substances 0.000 claims abstract description 7
- 239000006185 dispersion Substances 0.000 claims description 16
- 239000000725 suspension Substances 0.000 claims description 13
- 238000003756 stirring Methods 0.000 claims description 12
- 239000011859 microparticle Substances 0.000 claims description 10
- 238000002161 passivation Methods 0.000 claims description 9
- 239000007787 solid Substances 0.000 claims description 9
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 8
- 239000001301 oxygen Substances 0.000 claims description 8
- 229910052760 oxygen Inorganic materials 0.000 claims description 8
- 239000002671 adjuvant Substances 0.000 claims description 7
- 229910052575 non-oxide ceramic Inorganic materials 0.000 claims description 6
- 239000011225 non-oxide ceramic Substances 0.000 claims description 6
- 230000000737 periodic effect Effects 0.000 claims description 5
- 150000001247 metal acetylides Chemical class 0.000 claims description 4
- 239000010419 fine particle Substances 0.000 claims description 3
- 150000004767 nitrides Chemical class 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 2
- 229910021332 silicide Inorganic materials 0.000 claims description 2
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 claims 3
- 229910045601 alloy Inorganic materials 0.000 claims 1
- 239000000956 alloy Substances 0.000 claims 1
- 239000012752 auxiliary agent Substances 0.000 abstract description 4
- 230000001419 dependent effect Effects 0.000 abstract 1
- 239000000203 mixture Substances 0.000 description 10
- 238000000227 grinding Methods 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 3
- 239000002612 dispersion medium Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 238000001694 spray drying Methods 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 239000007900 aqueous suspension Substances 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 230000003100 immobilizing effect Effects 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- -1 polyethylene Polymers 0.000 description 2
- 238000009700 powder processing Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 229920002101 Chitin Polymers 0.000 description 1
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical group NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 1
- 229920000663 Hydroxyethyl cellulose Polymers 0.000 description 1
- 239000004354 Hydroxyethyl cellulose Substances 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 229920002873 Polyethylenimine Polymers 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229920002472 Starch Polymers 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- 229910009043 WC-Co Inorganic materials 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 150000001991 dicarboxylic acids Chemical class 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 235000019447 hydroxyethyl cellulose Nutrition 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- 150000002466 imines Chemical class 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002609 medium Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 239000011224 oxide ceramic Substances 0.000 description 1
- 229910052574 oxide ceramic Inorganic materials 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920000867 polyelectrolyte Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 230000009993 protective function Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 235000019698 starch Nutrition 0.000 description 1
- 235000000346 sugar Nutrition 0.000 description 1
- 150000008163 sugars Chemical class 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K23/00—Use of substances as emulsifying, wetting, dispersing, or foam-producing agents
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K23/00—Use of substances as emulsifying, wetting, dispersing, or foam-producing agents
- C09K23/16—Amines or polyamines
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/09—Mixtures of metallic powders
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Emulsifying, Dispersing, Foam-Producing Or Wetting Agents (AREA)
- Compositions Of Oxide Ceramics (AREA)
- Detergent Compositions (AREA)
- Manufacture Of Metal Powder And Suspensions Thereof (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Manufacturing Of Micro-Capsules (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
- Powder Metallurgy (AREA)
Abstract
Description
Claims (13)
- 공정 상 보조제가 첨가되는, 물 및 수용성 매체에서의 미세립 분말의 분산 및 부동화 방법에 있어서, 수용성 폴리비닐아민 및/또는 그 일차 산물이 보조제로서 사용되는 것을 특징으로 하는 물 및 수용성 매체에서의 미세립 분말의 분산 및 부동화 방법.
- 제1항에 있어서, 상기 폴리비닐아민 및/또는 그 일차 산물이 5,000 내지 350,000의 몰 질량을 갖는 것을 특징으로 하는 물 및 수용성 매체에서의 미세립 분말의 분산 및 부동화 방법.
- 제2항에 있어서, 상기 폴리비닐아민 및/또는 그 일차 산물로 5,000 내지 100,000의 몰 질량을 갖는 것이 사용되는 것을 특징인 물 및 수용성 매체에서의 미세립 분말의 분산 및 부동화 방법.
- 제1항 내지 제3항 중 어느 하나의 항에 있어서, 상기 폴리비닐아민 및/또는 그 일차 산물로 현탁액의 고체 농도를 기준으로 0.01 내지 10 질량% 농도를 가지는 것이 사용되는 것을 특징으로 하는 물 및 수용성 매체에서의 미세립 분말의 분산 및 부동화 방법.
- 제4항에 있어서, 상기 폴리비닐아민 및/또는 그 일차 산물로, 현탁액의 고체 농도를 기준으로 0.1 내지 0.5 질량% 농도의 것이 사용되는 것을 특징으로 하는 물 및 수용성 매체에서의 미세립 분말의 분산 및 부동화 방법.
- 제1항 내지 제5항 중 어느 하나ㅡ이 항에 있어서, 상기 폴리비닐아민 및/또는 그 일차 산물이 교반되는 조건에서 미세립 분말의 투입 전에 물에 용해되는 것을 특징으로 하는 물 및 수용성 매체에서의 미세립 분말의 분산 및 부동화 방법.
- 제1항 내지 제6항 중 어느 한 항에 있어서, 상기 폴리비닐아민의 일차 산물이 보조제로서 사용되는 것을 특징으로 하는 물 및 수용성 매체에서의 미세립 분말의 분산 및 부동화 방법.
- 제1항 내지 제6항 중 어느 한 항에 있어서, 폴리비닐포름아미드가 사용되는 것을 특징으로 하는 물 및 수용성 매체에서의 미세립 분말의 분산 및 부동화 방법.
- 제1항 내지 제8항 중 어느 한 항에 있어서, 상기 미세립 분말로서 경금속 분말, 비산화물 세라믹 분말 및/또는 원소 분말이 사용되는 것을 특징으로 하는 물 및 수용성 매체에서의 미세립 분말의 분산 및 부동화 방법.
- 제9항에 있어서, 원소주기율표(PSE)의 제IV, V 및/또는 VI 분족 원소의 탄화 물, 질소화물 및/또는 탄질화물 및 개별적, 혼합된 형태 또는 결합 금속상을 포함하는 금속으로서 합금된 형태의 Fe, Co, Ni이 경금속 분말로서 사용되는 것을 특징으로 하는 물 및 수용성 매체에서의 미세립 분말의 분산 및 부동화 방법.
- 제9항에 있어서, 비산화물 세라믹 분말로서 질소화물, 탄화물, 붕소화물 및/또는 규화물이 사용되는 것을 특징으로 하는 물 및 수용성 매체에서의 미세립 분말의 분산 및 부동화 방법.
- 제9항에 있어서, 원소주기율표 제3 및 4 족의 결정질 및/또는 무형질 원소가 원소 분말로서 사용되는 것을 특징으로 하는 물 및 수용성 매체에서의 미세립 분말의 분산 및 부동화 방법.
- 제1항 내지 제12항 중 어느 한 항에 있어서, 경금속 세라믹 분말 및 원소 분말과 같은 사용된 비산화물 미세립 분말의 산소 농도가 증가하지 않거나 단지 경미하게 증가하는 것을 특징으로 하는 물 및 수용성 매체에서의 미세립 분말의 분산 및 부동화 방법.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102004020559.0 | 2004-04-27 | ||
DE102004020559A DE102004020559A1 (de) | 2004-04-27 | 2004-04-27 | Verfahren zur Dispergierung und Passivierung von feinteiligen Pulvern in Wassern und wässrigen Medien |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20070026481A true KR20070026481A (ko) | 2007-03-08 |
KR100881072B1 KR100881072B1 (ko) | 2009-01-30 |
Family
ID=34964742
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020067022263A KR100881072B1 (ko) | 2004-04-27 | 2005-04-13 | 물 및 수용성 매체에서의 미세립 분말의 분산 및 부동화방법 |
Country Status (12)
Country | Link |
---|---|
US (1) | US20070259970A1 (ko) |
EP (1) | EP1742726B1 (ko) |
JP (1) | JP4792589B2 (ko) |
KR (1) | KR100881072B1 (ko) |
CN (1) | CN101027120B (ko) |
AT (1) | ATE497835T1 (ko) |
CA (1) | CA2564450C (ko) |
DE (2) | DE102004020559A1 (ko) |
ES (1) | ES2362739T3 (ko) |
IL (1) | IL178780A (ko) |
NO (1) | NO20065421L (ko) |
WO (1) | WO2005107934A1 (ko) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9475945B2 (en) | 2013-10-03 | 2016-10-25 | Kennametal Inc. | Aqueous slurry for making a powder of hard material |
IN2013CH04500A (ko) | 2013-10-04 | 2015-04-10 | Kennametal India Ltd |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
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NL141316B (nl) * | 1968-04-13 | 1974-02-15 | Tdk Electronics Co Ltd | Werkwijze voor het maken van magnetische lichamen, alsmede op deze wijze gemaakte magnetische lichamen. |
US3917778A (en) * | 1968-04-13 | 1975-11-04 | Tdk Electronics Co Ltd | Method for slip casting soft ferromagnetic ferrites |
US4070184A (en) * | 1976-09-24 | 1978-01-24 | Gte Sylvania Incorporated | Process for producing refractory carbide grade powder |
US4610726A (en) * | 1984-06-29 | 1986-09-09 | Eltech Systems Corporation | Dense cermets containing fine grained ceramics and their manufacture |
DE4212514A1 (de) * | 1992-04-14 | 1993-10-21 | Inst Neue Mat Gemein Gmbh | Verfahren zur Herstellung von Siliciumcarbid-Grünkörpern |
DE4212633A1 (de) * | 1992-04-15 | 1993-10-21 | Inst Neue Mat Gemein Gmbh | Verfahren zur Herstellung oberflächenmodifizierter nanoskaliger keramischer Pulver |
DE4336694A1 (de) | 1993-10-27 | 1995-05-04 | Inst Neue Mat Gemein Gmbh | Verfahren zur Herstellung von Metall- und Keramiksinterkörpern und -schichten |
RU2144910C1 (ru) | 1994-07-15 | 2000-01-27 | Фраунхофер - Гезельшафт Цур Фердерунг Дер Ангевандтен Форшунг Е.Ф. | Способ получения спекаемых полуфабрикатов |
WO1998000256A1 (en) | 1996-06-28 | 1998-01-08 | Sandvik Ab (Publ) | Method of spray drying powder mixtures |
DE19749082A1 (de) * | 1997-11-06 | 1999-05-12 | Bayer Ag | Nanoskalige anorganische Pigmente enthaltende Ink-Jet-Tinten |
DE19751355A1 (de) | 1997-11-20 | 1999-05-27 | Fraunhofer Ges Forschung | Verfahren zur Dispergierung von feinstteiligen anorganischen Pulvern |
DE19800310A1 (de) | 1998-01-07 | 1999-07-08 | Bayer Ag | Oberflächenbelegte, nichtoxidische Keramiken |
DE19846096A1 (de) * | 1998-10-07 | 2000-04-13 | Bayer Ag | Präparation von Suspensionen ternärer Oxide für Drucktinten |
GB9922039D0 (en) * | 1999-09-18 | 1999-11-17 | Avecia Ltd | Polyester dispersants |
SE516324C2 (sv) | 2000-05-09 | 2001-12-17 | Sandvik Ab | Framställning av väldispergerade suspensioner lämpliga för spraytorkning |
US6964923B1 (en) * | 2000-05-24 | 2005-11-15 | International Business Machines Corporation | Selective polishing with slurries containing polyelectrolytes |
JP4289802B2 (ja) * | 2001-02-06 | 2009-07-01 | キヤノン株式会社 | トナー及びトナーの製造方法 |
DE10130161B4 (de) | 2001-06-22 | 2011-10-20 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Konditionierung nichtoxidischer Feinstpulver |
JP2005048122A (ja) * | 2003-07-31 | 2005-02-24 | Hitachi Chem Co Ltd | Cmp研磨剤、研磨方法及び半導体装置の製造方法 |
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2004
- 2004-04-27 DE DE102004020559A patent/DE102004020559A1/de not_active Ceased
-
2005
- 2005-04-13 JP JP2007509912A patent/JP4792589B2/ja not_active Expired - Fee Related
- 2005-04-13 EP EP05732731A patent/EP1742726B1/de active Active
- 2005-04-13 CA CA2564450A patent/CA2564450C/en not_active Expired - Fee Related
- 2005-04-13 WO PCT/EP2005/003886 patent/WO2005107934A1/de active Application Filing
- 2005-04-13 AT AT05732731T patent/ATE497835T1/de active
- 2005-04-13 ES ES05732731T patent/ES2362739T3/es active Active
- 2005-04-13 KR KR1020067022263A patent/KR100881072B1/ko active IP Right Grant
- 2005-04-13 DE DE502005010955T patent/DE502005010955D1/de active Active
- 2005-04-13 US US11/568,374 patent/US20070259970A1/en not_active Abandoned
- 2005-04-13 CN CN2005800135991A patent/CN101027120B/zh active Active
-
2006
- 2006-10-22 IL IL178780A patent/IL178780A/en active IP Right Grant
- 2006-11-24 NO NO20065421A patent/NO20065421L/no not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
JP2007534476A (ja) | 2007-11-29 |
DE502005010955D1 (de) | 2011-03-24 |
CN101027120A (zh) | 2007-08-29 |
DE102004020559A1 (de) | 2005-12-01 |
US20070259970A1 (en) | 2007-11-08 |
IL178780A (en) | 2013-05-30 |
WO2005107934A1 (de) | 2005-11-17 |
CA2564450C (en) | 2011-06-14 |
EP1742726B1 (de) | 2011-02-09 |
ES2362739T3 (es) | 2011-07-12 |
NO20065421L (no) | 2006-11-24 |
IL178780A0 (en) | 2007-03-08 |
CN101027120B (zh) | 2011-05-11 |
JP4792589B2 (ja) | 2011-10-12 |
ATE497835T1 (de) | 2011-02-15 |
CA2564450A1 (en) | 2005-11-17 |
EP1742726A1 (de) | 2007-01-17 |
KR100881072B1 (ko) | 2009-01-30 |
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