JP2007534476A - 微細粉末を水及び水性媒体中で分散及び不動態化するための方法 - Google Patents
微細粉末を水及び水性媒体中で分散及び不動態化するための方法 Download PDFInfo
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- JP2007534476A JP2007534476A JP2007509912A JP2007509912A JP2007534476A JP 2007534476 A JP2007534476 A JP 2007534476A JP 2007509912 A JP2007509912 A JP 2007509912A JP 2007509912 A JP2007509912 A JP 2007509912A JP 2007534476 A JP2007534476 A JP 2007534476A
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- polyvinylamine
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- cemented carbide
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- 239000000843 powder Substances 0.000 title claims abstract description 79
- 238000000034 method Methods 0.000 title claims abstract description 35
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims abstract description 28
- 239000012736 aqueous medium Substances 0.000 title claims abstract description 11
- 239000002243 precursor Substances 0.000 claims abstract description 14
- 239000000919 ceramic Substances 0.000 claims abstract description 10
- 239000007787 solid Substances 0.000 claims description 10
- 239000000725 suspension Substances 0.000 claims description 10
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 9
- 229910052760 oxygen Inorganic materials 0.000 claims description 9
- 239000001301 oxygen Substances 0.000 claims description 9
- 229910052575 non-oxide ceramic Inorganic materials 0.000 claims description 6
- 239000011225 non-oxide ceramic Substances 0.000 claims description 6
- 150000004767 nitrides Chemical class 0.000 claims description 5
- 230000000737 periodic effect Effects 0.000 claims description 5
- 150000001247 metal acetylides Chemical class 0.000 claims description 3
- 229910052751 metal Inorganic materials 0.000 claims description 2
- 239000002184 metal Substances 0.000 claims description 2
- 229910052759 nickel Inorganic materials 0.000 claims description 2
- 229910021332 silicide Inorganic materials 0.000 claims description 2
- 238000003756 stirring Methods 0.000 claims description 2
- 239000012752 auxiliary agent Substances 0.000 claims 3
- 239000011230 binding agent Substances 0.000 claims 1
- 239000000203 mixture Substances 0.000 description 11
- 239000006185 dispersion Substances 0.000 description 8
- 238000002156 mixing Methods 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 239000007788 liquid Substances 0.000 description 5
- 238000000227 grinding Methods 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 229920002873 Polyethylenimine Polymers 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 230000000996 additive effect Effects 0.000 description 3
- 239000007900 aqueous suspension Substances 0.000 description 3
- 230000007062 hydrolysis Effects 0.000 description 3
- 238000006460 hydrolysis reaction Methods 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 238000010298 pulverizing process Methods 0.000 description 3
- 238000001694 spray drying Methods 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 239000002270 dispersing agent Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 238000002161 passivation Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000000375 suspending agent Substances 0.000 description 2
- 238000011282 treatment Methods 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 229920002101 Chitin Polymers 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical group NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 1
- 229920000663 Hydroxyethyl cellulose Polymers 0.000 description 1
- 239000004354 Hydroxyethyl cellulose Substances 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- 229920000881 Modified starch Polymers 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- 229910009043 WC-Co Inorganic materials 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 230000000035 biogenic effect Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 229920006317 cationic polymer Polymers 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 235000019447 hydroxyethyl cellulose Nutrition 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000002609 medium Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 235000019426 modified starch Nutrition 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000011224 oxide ceramic Substances 0.000 description 1
- 229910052574 oxide ceramic Inorganic materials 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000005518 polymer electrolyte Substances 0.000 description 1
- 238000009700 powder processing Methods 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000000527 sonication Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 238000000844 transformation Methods 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K23/00—Use of substances as emulsifying, wetting, dispersing, or foam-producing agents
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K23/00—Use of substances as emulsifying, wetting, dispersing, or foam-producing agents
- C09K23/16—Amines or polyamines
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/09—Mixtures of metallic powders
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Emulsifying, Dispersing, Foam-Producing Or Wetting Agents (AREA)
- Compositions Of Oxide Ceramics (AREA)
- Detergent Compositions (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
- Powder Metallurgy (AREA)
- Manufacture Of Metal Powder And Suspensions Thereof (AREA)
- Manufacturing Of Micro-Capsules (AREA)
Abstract
Description
72質量%のWC/Co粉末(そのうち90質量%がWCで、10質量%がCoである)を含有する水性懸濁液を、モル質量<10000g/モルを有するポリビニルアミンを、懸濁液の固体含量に対して0.15質量%で水中に溶解させ、そして次いで超硬合金粉末混合物を混ぜ入れることで製造する。WCの粒度は、0.5μmであった。磨砕機中での6時間の混合粉砕後に、剪断速度240min-1で粘度28mPa*sであった。粉砕後の酸素含量は、0.38%であった。動的移動度は、0.9m2(V*s)-1であった。添加物としてポリビニルアミンを用いないと、酸素含量は0.7%にまで高まった。
72質量%の超硬合金粉末(そのうち59質量%がWCで、16質量%がTiCで、11.2質量%がTaCで、4.8質量%がNbCで、9質量%がCoである)を含有する水性懸濁液を、モル質量45000g/モルを有するポリビニルアミンを、懸濁液の固体含量に対して0.15質量%で水中に溶解させ、そして次いで超硬合金粉末混合物を混ぜ入れることで製造する。磨砕機中での6時間の混合粉砕後に、剪断速度240min-1で粘度15mPa*sであった。粉砕後の酸素含量は、0.54%であった。動的移動度は、1.2m2(V*s)-1であった。
40質量%の窒化ケイ素セラミック粉末混合物(そのうち90質量%がSi3N4で、6質量%がY2O3で、4質量%がAl2O3である)を含有する水性懸濁液を、モル質量45000g/モルを有するポリビニルアミンを、懸濁液の固体含量に対して0.6質量%で水中に溶解させ、そして次いでセラミック粉末混合物を混ぜ入れることで製造する。研究用磨砕機中での3時間の混合粉砕後に、剪断速度240min-1で粘度32mPa*sであった。動的移動度は、1.2m2(V*s)-1であった。ポリビニルアミンを添加しないと、粘度は299mPa*sであり、かつ動的粘度は−0.9m2(V*s)-1であった。
Claims (13)
- 微細粉末を水及び水性媒体中で分散及び不動態化するための方法であって方法に応じて助剤を添加する方法において、助剤として、水溶性のポリビニルアミン及び/又はその前駆生成物を使用することを特徴とする方法。
- ポリビニルアミン及び/又はその前駆生成物が、モル質量5000〜350000を有することを特徴とする、請求項1記載の方法。
- モル質量5000〜100000を有するポリビニルアミン及び/又はその前駆生成物を使用することを特徴とする、請求項2記載の方法。
- ポリビニルアミン及び/又はその前駆生成物を、懸濁液の固体含量に対して、0.01〜10質量%の濃度で使用することを特徴とする、請求項1から3までのいずれか1項記載の方法。
- ポリビニルアミン及び/又はその前駆生成物を、懸濁液の固体含量に対して、0.1〜0.5質量%の濃度で使用することを特徴とする、請求項4記載の方法。
- ポリビニルアミン及び/又はその前駆生成物を、撹拌しつつ水中に溶解させてから、微細粉末を導入することを特徴とする、請求項1から5までのいずれか1項記載の方法。
- 助剤として、ポリビニルアミンの前駆生成物を使用することを特徴とする、請求項1から6までのいずれか1項記載の方法。
- ポリビニルホルムアミドを使用することを特徴とする、請求項1から6までのいずれか1項記載の方法。
- 微細粉末として、超硬合金粉末、非酸化物のセラミック粉末及び/又は元素粉末を使用することを特徴とする、請求項1から8までのいずれか1項記載の方法。
- 超硬合金粉末として、PSE(元素の周期系)の第IV副族、第V副族及び/又は第VI副族の元素の炭化物、窒化物及び/又は炭窒化物とFe、Co、Niとを、単独で、混合させて又は合金化させて、結合金属相を含む粉末として使用することを特徴とする、請求項9記載の方法。
- 非酸化物のセラミック粉末として、窒化物、炭化物、ホウ化物及び/又はケイ化物を使用することを特徴とする、請求項9記載の方法。
- 元素粉末として、元素の周期系の第3主族及び第4主族の結晶質及び/又は非晶質の元素を使用することを特徴とする、請求項9記載の方法。
- 使用される非酸化物の微細粉末、例えば超硬合金粉末、セラミック粉末及び元素粉末が、その酸素含量において増大しない又は僅かしか増大しないことを特徴とする、請求項1から12までのいずれか1項記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102004020559A DE102004020559A1 (de) | 2004-04-27 | 2004-04-27 | Verfahren zur Dispergierung und Passivierung von feinteiligen Pulvern in Wassern und wässrigen Medien |
DE102004020559.0 | 2004-04-27 | ||
PCT/EP2005/003886 WO2005107934A1 (de) | 2004-04-27 | 2005-04-13 | Verfahren zur dispergierung und passivierung von feinteiligen pulvern in wasser und wässrigen medien |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007534476A true JP2007534476A (ja) | 2007-11-29 |
JP4792589B2 JP4792589B2 (ja) | 2011-10-12 |
Family
ID=34964742
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007509912A Expired - Fee Related JP4792589B2 (ja) | 2004-04-27 | 2005-04-13 | 微細粉末を水及び水性媒体中で分散及び不動態化するための方法 |
Country Status (12)
Country | Link |
---|---|
US (1) | US20070259970A1 (ja) |
EP (1) | EP1742726B1 (ja) |
JP (1) | JP4792589B2 (ja) |
KR (1) | KR100881072B1 (ja) |
CN (1) | CN101027120B (ja) |
AT (1) | ATE497835T1 (ja) |
CA (1) | CA2564450C (ja) |
DE (2) | DE102004020559A1 (ja) |
ES (1) | ES2362739T3 (ja) |
IL (1) | IL178780A (ja) |
NO (1) | NO20065421L (ja) |
WO (1) | WO2005107934A1 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9475945B2 (en) | 2013-10-03 | 2016-10-25 | Kennametal Inc. | Aqueous slurry for making a powder of hard material |
IN2013CH04500A (ja) | 2013-10-04 | 2015-04-10 | Kennametal India Ltd |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005048122A (ja) * | 2003-07-31 | 2005-02-24 | Hitachi Chem Co Ltd | Cmp研磨剤、研磨方法及び半導体装置の製造方法 |
Family Cites Families (18)
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US3917778A (en) * | 1968-04-13 | 1975-11-04 | Tdk Electronics Co Ltd | Method for slip casting soft ferromagnetic ferrites |
NL141316B (nl) * | 1968-04-13 | 1974-02-15 | Tdk Electronics Co Ltd | Werkwijze voor het maken van magnetische lichamen, alsmede op deze wijze gemaakte magnetische lichamen. |
US4070184A (en) * | 1976-09-24 | 1978-01-24 | Gte Sylvania Incorporated | Process for producing refractory carbide grade powder |
US4610726A (en) * | 1984-06-29 | 1986-09-09 | Eltech Systems Corporation | Dense cermets containing fine grained ceramics and their manufacture |
DE4212514A1 (de) * | 1992-04-14 | 1993-10-21 | Inst Neue Mat Gemein Gmbh | Verfahren zur Herstellung von Siliciumcarbid-Grünkörpern |
DE4212633A1 (de) | 1992-04-15 | 1993-10-21 | Inst Neue Mat Gemein Gmbh | Verfahren zur Herstellung oberflächenmodifizierter nanoskaliger keramischer Pulver |
DE4336694A1 (de) | 1993-10-27 | 1995-05-04 | Inst Neue Mat Gemein Gmbh | Verfahren zur Herstellung von Metall- und Keramiksinterkörpern und -schichten |
RU2144910C1 (ru) | 1994-07-15 | 2000-01-27 | Фраунхофер - Гезельшафт Цур Фердерунг Дер Ангевандтен Форшунг Е.Ф. | Способ получения спекаемых полуфабрикатов |
WO1998000256A1 (en) | 1996-06-28 | 1998-01-08 | Sandvik Ab (Publ) | Method of spray drying powder mixtures |
DE19749082A1 (de) * | 1997-11-06 | 1999-05-12 | Bayer Ag | Nanoskalige anorganische Pigmente enthaltende Ink-Jet-Tinten |
DE19751355A1 (de) | 1997-11-20 | 1999-05-27 | Fraunhofer Ges Forschung | Verfahren zur Dispergierung von feinstteiligen anorganischen Pulvern |
DE19800310A1 (de) | 1998-01-07 | 1999-07-08 | Bayer Ag | Oberflächenbelegte, nichtoxidische Keramiken |
DE19846096A1 (de) | 1998-10-07 | 2000-04-13 | Bayer Ag | Präparation von Suspensionen ternärer Oxide für Drucktinten |
GB9922039D0 (en) * | 1999-09-18 | 1999-11-17 | Avecia Ltd | Polyester dispersants |
SE516324C2 (sv) | 2000-05-09 | 2001-12-17 | Sandvik Ab | Framställning av väldispergerade suspensioner lämpliga för spraytorkning |
US6964923B1 (en) * | 2000-05-24 | 2005-11-15 | International Business Machines Corporation | Selective polishing with slurries containing polyelectrolytes |
JP4289802B2 (ja) * | 2001-02-06 | 2009-07-01 | キヤノン株式会社 | トナー及びトナーの製造方法 |
DE10130161B4 (de) | 2001-06-22 | 2011-10-20 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Konditionierung nichtoxidischer Feinstpulver |
-
2004
- 2004-04-27 DE DE102004020559A patent/DE102004020559A1/de not_active Ceased
-
2005
- 2005-04-13 JP JP2007509912A patent/JP4792589B2/ja not_active Expired - Fee Related
- 2005-04-13 US US11/568,374 patent/US20070259970A1/en not_active Abandoned
- 2005-04-13 KR KR1020067022263A patent/KR100881072B1/ko active IP Right Grant
- 2005-04-13 EP EP05732731A patent/EP1742726B1/de active Active
- 2005-04-13 DE DE502005010955T patent/DE502005010955D1/de active Active
- 2005-04-13 ES ES05732731T patent/ES2362739T3/es active Active
- 2005-04-13 WO PCT/EP2005/003886 patent/WO2005107934A1/de active Application Filing
- 2005-04-13 CA CA2564450A patent/CA2564450C/en not_active Expired - Fee Related
- 2005-04-13 AT AT05732731T patent/ATE497835T1/de active
- 2005-04-13 CN CN2005800135991A patent/CN101027120B/zh active Active
-
2006
- 2006-10-22 IL IL178780A patent/IL178780A/en active IP Right Grant
- 2006-11-24 NO NO20065421A patent/NO20065421L/no not_active Application Discontinuation
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005048122A (ja) * | 2003-07-31 | 2005-02-24 | Hitachi Chem Co Ltd | Cmp研磨剤、研磨方法及び半導体装置の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
DE102004020559A1 (de) | 2005-12-01 |
JP4792589B2 (ja) | 2011-10-12 |
CN101027120B (zh) | 2011-05-11 |
ATE497835T1 (de) | 2011-02-15 |
IL178780A0 (en) | 2007-03-08 |
ES2362739T3 (es) | 2011-07-12 |
EP1742726A1 (de) | 2007-01-17 |
IL178780A (en) | 2013-05-30 |
KR20070026481A (ko) | 2007-03-08 |
CN101027120A (zh) | 2007-08-29 |
NO20065421L (no) | 2006-11-24 |
KR100881072B1 (ko) | 2009-01-30 |
CA2564450C (en) | 2011-06-14 |
EP1742726B1 (de) | 2011-02-09 |
DE502005010955D1 (de) | 2011-03-24 |
US20070259970A1 (en) | 2007-11-08 |
CA2564450A1 (en) | 2005-11-17 |
WO2005107934A1 (de) | 2005-11-17 |
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