KR20070006747A - 전자부품의 주석 표면에서 납땜성의 보존과 휘스커 증식의억제 방법 - Google Patents
전자부품의 주석 표면에서 납땜성의 보존과 휘스커 증식의억제 방법 Download PDFInfo
- Publication number
- KR20070006747A KR20070006747A KR1020067016728A KR20067016728A KR20070006747A KR 20070006747 A KR20070006747 A KR 20070006747A KR 1020067016728 A KR1020067016728 A KR 1020067016728A KR 20067016728 A KR20067016728 A KR 20067016728A KR 20070006747 A KR20070006747 A KR 20070006747A
- Authority
- KR
- South Korea
- Prior art keywords
- tin
- metal layer
- coating
- metal
- based coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/495—Lead-frames or other flat leads
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/495—Lead-frames or other flat leads
- H01L23/49579—Lead-frames or other flat leads characterised by the materials of the lead frames or layers thereon
- H01L23/49582—Metallic layers on lead frames
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R13/00—Details of coupling devices of the kinds covered by groups H01R12/70 or H01R24/00 - H01R33/00
- H01R13/02—Contact members
- H01R13/03—Contact members characterised by the material, e.g. plating, or coating materials
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/34—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
- H05K3/341—Surface mounted components
- H05K3/3421—Leaded components
- H05K3/3426—Leaded components characterised by the leads
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48245—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
- H01L2224/48247—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/484—Connecting portions
- H01L2224/48463—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond
- H01L2224/48465—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond the other connecting portion not on the bonding area being a wedge bond, i.e. ball-to-wedge, regular stitch
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
- H01L2224/491—Disposition
- H01L2224/4912—Layout
- H01L2224/49171—Fan-out arrangements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/00014—Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/0132—Binary Alloys
- H01L2924/01327—Intermediate phases, i.e. intermetallics compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/156—Material
- H01L2924/157—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2924/15738—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950 C and less than 1550 C
- H01L2924/15747—Copper [Cu] as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/1901—Structure
- H01L2924/1904—Component type
- H01L2924/19041—Component type being a capacitor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R4/00—Electrically-conductive connections between two or more conductive members in direct contact, i.e. touching one another; Means for effecting or maintaining such contact; Electrically-conductive connections having two or more spaced connecting locations for conductors and using contact members penetrating insulation
- H01R4/02—Soldered or welded connections
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/10—Details of components or other objects attached to or integrated in a printed circuit board
- H05K2201/10613—Details of electrical connections of non-printed components, e.g. special leads
- H05K2201/10742—Details of leads
- H05K2201/10886—Other details
- H05K2201/10909—Materials of terminal, e.g. of leads or electrodes of components
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12708—Sn-base component
- Y10T428/12722—Next to Group VIII metal-base component
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Metallurgy (AREA)
- Electrochemistry (AREA)
- Computer Hardware Design (AREA)
- General Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Electroplating Methods And Accessories (AREA)
- Chemically Coating (AREA)
- Details Of Resistors (AREA)
- Lead Frames For Integrated Circuits (AREA)
Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102004002982.2 | 2004-01-21 | ||
| DE102004002982 | 2004-01-21 | ||
| US10/838,571 | 2004-05-04 | ||
| US10/838,571 US20050249968A1 (en) | 2004-05-04 | 2004-05-04 | Whisker inhibition in tin surfaces of electronic components |
| US10/968,500 | 2004-10-19 | ||
| US10/968,500 US20050249969A1 (en) | 2004-05-04 | 2004-10-19 | Preserving solderability and inhibiting whisker growth in tin surfaces of electronic components |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20070006747A true KR20070006747A (ko) | 2007-01-11 |
Family
ID=34830753
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020067016728A Withdrawn KR20070006747A (ko) | 2004-01-21 | 2005-01-21 | 전자부품의 주석 표면에서 납땜성의 보존과 휘스커 증식의억제 방법 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20080261071A1 (enExample) |
| EP (1) | EP1716732A2 (enExample) |
| JP (1) | JP2007519261A (enExample) |
| KR (1) | KR20070006747A (enExample) |
| TW (1) | TW200530433A (enExample) |
| WO (1) | WO2005074026A2 (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8258538B2 (en) | 2009-03-10 | 2012-09-04 | Lg Innotek Co., Ltd. | Light emitting device package |
| US8610156B2 (en) | 2009-03-10 | 2013-12-17 | Lg Innotek Co., Ltd. | Light emitting device package |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100451171C (zh) * | 2005-09-27 | 2009-01-14 | 北京东方新材科技有限公司 | 提高金属焊接性能的表面处理方法及用该方法处理的工件 |
| US20070287022A1 (en) * | 2006-06-07 | 2007-12-13 | Honeywell International, Inc. | Intumescent paint coatings for inhibiting tin whisker growth and methods of making and using the same |
| DK2279545T3 (da) * | 2008-05-19 | 2013-02-11 | Phoenix Contact Gmbh & Co | Kontaktenhed og fremgangsmåde til fremstilling af en kontaktenhed |
| CN102177265B (zh) * | 2008-10-31 | 2014-07-09 | 松德维希尔铜管厂有限责任两合公司 | 铜锡合金、复合材料及其用途 |
| WO2010051341A1 (en) * | 2008-10-31 | 2010-05-06 | Sundew Technologies, Llc | Coatings for suppressing metallic whiskers |
| TWI405876B (zh) * | 2010-04-13 | 2013-08-21 | Univ Nat Taiwan Science Tech | 抑制錫鬚晶生長的方法 |
| CN103367325A (zh) * | 2012-04-03 | 2013-10-23 | 鸿富锦精密工业(深圳)有限公司 | 具触觉效果的电子元件 |
| EP2799595A1 (de) | 2013-05-03 | 2014-11-05 | Delphi Technologies, Inc. | Elektrisches Kontaktelement |
| JP6365182B2 (ja) * | 2014-09-26 | 2018-08-01 | 株式会社オートネットワーク技術研究所 | コネクタ用電気接点材料及びその製造方法 |
| DE102018109059B4 (de) * | 2018-01-15 | 2020-07-23 | Doduco Solutions Gmbh | Elektrischer Einpress-Kontaktstift |
| JP7061247B1 (ja) * | 2020-12-28 | 2022-04-28 | 松田産業株式会社 | ニッケル電解めっき皮膜及びめっき構造体 |
Family Cites Families (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4504427A (en) * | 1983-06-17 | 1985-03-12 | At&T Bell Laboratories | Solder preform stabilization for lead frames |
| GB2157319A (en) * | 1984-04-13 | 1985-10-23 | Toyo Kohan Co Ltd | Tin free steel and its production |
| US4749626A (en) * | 1985-08-05 | 1988-06-07 | Olin Corporation | Whisker resistant tin coatings and baths and methods for making such coatings |
| US4786324A (en) * | 1986-01-10 | 1988-11-22 | Rieger Franz Metallveredelung | Nickel-plating bath |
| US4959278A (en) * | 1988-06-16 | 1990-09-25 | Nippon Mining Co., Ltd. | Tin whisker-free tin or tin alloy plated article and coating technique thereof |
| US5393573A (en) * | 1991-07-16 | 1995-02-28 | Microelectronics And Computer Technology Corporation | Method of inhibiting tin whisker growth |
| US5675177A (en) * | 1995-06-26 | 1997-10-07 | Lucent Technologies Inc. | Ultra-thin noble metal coatings for electronic packaging |
| US5916696A (en) * | 1996-06-06 | 1999-06-29 | Lucent Technologies Inc. | Conformable nickel coating and process for coating an article with a conformable nickel coating |
| US5750017A (en) * | 1996-08-21 | 1998-05-12 | Lucent Technologies Inc. | Tin electroplating process |
| US6136460A (en) * | 1998-04-03 | 2000-10-24 | Olin Corporation | Tin coatings incorporating selected elemental additions to reduce discoloration |
| WO2000015876A1 (en) * | 1998-09-11 | 2000-03-23 | Nippon Mining & Metals Co., Ltd. | Metal material |
| JP2000144482A (ja) * | 1998-09-11 | 2000-05-26 | Nippon Mining & Metals Co Ltd | 金属材料 |
| US6248455B1 (en) * | 1998-12-22 | 2001-06-19 | International Business Machines Corporation | Alloy-plated sheet steel cured with a thin layer of insulating polymer material forming an electrically nonconductive breachable metal substrate |
| JP4489232B2 (ja) * | 1999-06-14 | 2010-06-23 | 日鉱金属株式会社 | コネクタ用めっき材料 |
| US6361823B1 (en) * | 1999-12-03 | 2002-03-26 | Atotech Deutschland Gmbh | Process for whisker-free aqueous electroless tin plating |
| US6452258B1 (en) * | 2000-11-06 | 2002-09-17 | Lucent Technologies Inc. | Ultra-thin composite surface finish for electronic packaging |
| JP2003049293A (ja) * | 2001-03-16 | 2003-02-21 | Shipley Co Llc | 錫メッキ |
| JP2002302790A (ja) * | 2001-04-06 | 2002-10-18 | Ishihara Chem Co Ltd | スズ−銅合金メッキ方法 |
| US20020192492A1 (en) * | 2001-05-11 | 2002-12-19 | Abys Joseph Anthony | Metal article coated with near-surface doped tin or tin alloy |
| US20020185716A1 (en) * | 2001-05-11 | 2002-12-12 | Abys Joseph Anthony | Metal article coated with multilayer finish inhibiting whisker growth |
| US20030025182A1 (en) * | 2001-06-22 | 2003-02-06 | Abys Joseph A. | Metal article coated with tin or tin alloy under tensile stress to inhibit whisker growth |
| DE10159890B4 (de) * | 2001-12-06 | 2006-02-16 | Federal-Mogul Burscheid Gmbh | Verfahren für das Beschichten von Aluminiumwerkstoffen mit Funktionsschichten aus Eisen |
| JP4897187B2 (ja) * | 2002-03-05 | 2012-03-14 | ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. | スズメッキ方法 |
| US6860981B2 (en) * | 2002-04-30 | 2005-03-01 | Technic, Inc. | Minimizing whisker growth in tin electrodeposits |
| US6982030B2 (en) * | 2002-11-27 | 2006-01-03 | Technic, Inc. | Reduction of surface oxidation during electroplating |
-
2005
- 2005-01-21 EP EP05706011A patent/EP1716732A2/en not_active Withdrawn
- 2005-01-21 US US10/597,374 patent/US20080261071A1/en not_active Abandoned
- 2005-01-21 JP JP2006551316A patent/JP2007519261A/ja active Pending
- 2005-01-21 WO PCT/US2005/001999 patent/WO2005074026A2/en not_active Ceased
- 2005-01-21 TW TW094101907A patent/TW200530433A/zh unknown
- 2005-01-21 KR KR1020067016728A patent/KR20070006747A/ko not_active Withdrawn
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8258538B2 (en) | 2009-03-10 | 2012-09-04 | Lg Innotek Co., Ltd. | Light emitting device package |
| US8610156B2 (en) | 2009-03-10 | 2013-12-17 | Lg Innotek Co., Ltd. | Light emitting device package |
| US8987775B2 (en) | 2009-03-10 | 2015-03-24 | Lg Innotek Co., Ltd. | Light emitting device package |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2005074026A2 (en) | 2005-08-11 |
| TW200530433A (en) | 2005-09-16 |
| US20080261071A1 (en) | 2008-10-23 |
| JP2007519261A (ja) | 2007-07-12 |
| WO2005074026A3 (en) | 2005-10-06 |
| EP1716732A2 (en) | 2006-11-02 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP1257004B1 (en) | Metal article with multilayer coating | |
| US20050249969A1 (en) | Preserving solderability and inhibiting whisker growth in tin surfaces of electronic components | |
| EP1256981A1 (en) | Metal article coated with near-surface doped tin or tin alloy | |
| JP2726434B2 (ja) | SnまたはSn合金被覆材料 | |
| US20050249968A1 (en) | Whisker inhibition in tin surfaces of electronic components | |
| JPH11350188A (ja) | 電気・電子部品用材料とその製造方法、およびその材料を用いた電気・電子部品 | |
| KR20070006747A (ko) | 전자부품의 주석 표면에서 납땜성의 보존과 휘스커 증식의억제 방법 | |
| US6090263A (en) | Process for coating an article with a conformable nickel coating | |
| JPH11222659A (ja) | 金属複合帯板を製造する方法 | |
| KR20190117596A (ko) | 전자 부품용 금속 재료 및 그 제조 방법, 그것을 사용한 커넥터 단자, 커넥터 및 전자 부품 | |
| US6207298B1 (en) | Connector surface-treated with a Sn-Ni alloy | |
| US8389854B2 (en) | Metal strip, connector, and method of manufacturing metal strip | |
| US6982030B2 (en) | Reduction of surface oxidation during electroplating | |
| US7233072B2 (en) | Electronic part and surface treatment method of the same | |
| CN100548090C (zh) | 在电子部件的锡表面中保持可焊性及抑制晶须生长的方法 | |
| JP2005307240A (ja) | Sn被覆導電材及びその製造方法 | |
| JPH0529517A (ja) | 半導体装置用リードフレーム | |
| JP2006083410A (ja) | 電子部品の製造方法 | |
| JP2004238689A (ja) | めっき材及び電子部品用端子、コネクタ、リード部材及び半導体装置 | |
| JPH03188253A (ja) | Snめっき銅合金材 | |
| KR930005262B1 (ko) | 동합금용 땜납도금품 및 동합금용 주석도금품 | |
| US20060240276A1 (en) | Underlayer for reducing surface oxidation of plated deposits | |
| JPH0397888A (ja) | 銅合金用錫めっき品 | |
| JP2008240018A (ja) | すずメッキ皮膜およびウィスカー防止方法 | |
| JPH10102266A (ja) | 電気・電子回路部品 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0105 | International application |
Patent event date: 20060821 Patent event code: PA01051R01D Comment text: International Patent Application |
|
| PG1501 | Laying open of application | ||
| PC1203 | Withdrawal of no request for examination | ||
| WITN | Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid |