KR20060063903A - 유기 반도체의 적층법 - Google Patents
유기 반도체의 적층법 Download PDFInfo
- Publication number
- KR20060063903A KR20060063903A KR1020067001364A KR20067001364A KR20060063903A KR 20060063903 A KR20060063903 A KR 20060063903A KR 1020067001364 A KR1020067001364 A KR 1020067001364A KR 20067001364 A KR20067001364 A KR 20067001364A KR 20060063903 A KR20060063903 A KR 20060063903A
- Authority
- KR
- South Korea
- Prior art keywords
- semiconductor
- substrate
- donor
- lamination
- deposited
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 53
- 238000000034 method Methods 0.000 title claims abstract description 21
- 239000000758 substrate Substances 0.000 claims abstract description 56
- 229920005570 flexible polymer Polymers 0.000 claims abstract description 10
- 238000000151 deposition Methods 0.000 claims description 12
- 238000010030 laminating Methods 0.000 claims description 4
- 238000003475 lamination Methods 0.000 abstract description 15
- SLIUAWYAILUBJU-UHFFFAOYSA-N pentacene Chemical compound C1=CC=CC2=CC3=CC4=CC5=CC=CC=C5C=C4C=C3C=C21 SLIUAWYAILUBJU-UHFFFAOYSA-N 0.000 description 12
- 239000010409 thin film Substances 0.000 description 9
- 230000008021 deposition Effects 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 8
- 239000010410 layer Substances 0.000 description 7
- 239000000463 material Substances 0.000 description 6
- 229920000620 organic polymer Polymers 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 238000004528 spin coating Methods 0.000 description 4
- 229920002799 BoPET Polymers 0.000 description 3
- 239000005041 Mylar™ Substances 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 239000004809 Teflon Substances 0.000 description 3
- 229920006362 Teflon® Polymers 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 229920000123 polythiophene Polymers 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000005669 field effect Effects 0.000 description 2
- 239000004816 latex Substances 0.000 description 2
- 229920000126 latex Polymers 0.000 description 2
- 238000001000 micrograph Methods 0.000 description 2
- 229920000307 polymer substrate Polymers 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- -1 (n-hexyl) phenyl bithiophene Chemical compound 0.000 description 1
- 229920003345 Elvax® Polymers 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000013068 control sample Substances 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 238000009820 dry lamination Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 229920002457 flexible plastic Polymers 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000007648 laser printing Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000000813 microcontact printing Methods 0.000 description 1
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/466—Lateral bottom-gate IGFETs comprising only a single gate
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/18—Deposition of organic active material using non-liquid printing techniques, e.g. thermal transfer printing from a donor sheet
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/50—Forming devices by joining two substrates together, e.g. lamination techniques
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
- H10K85/113—Heteroaromatic compounds comprising sulfur or selene, e.g. polythiophene
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/615—Polycyclic condensed aromatic hydrocarbons, e.g. anthracene
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/649—Aromatic compounds comprising a hetero atom
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/17—Surface bonding means and/or assemblymeans with work feeding or handling means
- Y10T156/1702—For plural parts or plural areas of single part
- Y10T156/1705—Lamina transferred to base from adhered flexible web or sheet type carrier
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Thin Film Transistor (AREA)
- Bipolar Transistors (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US48933003P | 2003-07-22 | 2003-07-22 | |
| US60/489,330 | 2003-07-22 | ||
| US50168703P | 2003-09-10 | 2003-09-10 | |
| US60/501,687 | 2003-09-10 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20060063903A true KR20060063903A (ko) | 2006-06-12 |
Family
ID=34107798
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020067001364A Ceased KR20060063903A (ko) | 2003-07-22 | 2004-07-22 | 유기 반도체의 적층법 |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US7105462B2 (https=) |
| EP (1) | EP1647063A2 (https=) |
| JP (1) | JP2006528430A (https=) |
| KR (1) | KR20060063903A (https=) |
| WO (1) | WO2005011016A2 (https=) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB0515175D0 (en) * | 2005-07-25 | 2005-08-31 | Plastic Logic Ltd | Flexible resistive touch screen |
| JP2007067390A (ja) * | 2005-08-05 | 2007-03-15 | Sony Corp | 半導体装置の製造方法および半導体装置の製造装置 |
| JP4892894B2 (ja) * | 2005-08-31 | 2012-03-07 | 株式会社島津製作所 | 光または放射線検出ユニットの製造方法、およびその製造方法で製造された光または放射線検出ユニット |
| JP4857669B2 (ja) * | 2005-09-02 | 2012-01-18 | 大日本印刷株式会社 | 有機トランジスタ及びその作製方法並びに有機トランジスタシート |
| JP4831406B2 (ja) | 2006-01-10 | 2011-12-07 | ソニー株式会社 | 半導体装置の製造方法 |
| US8138075B1 (en) | 2006-02-06 | 2012-03-20 | Eberlein Dietmar C | Systems and methods for the manufacture of flat panel devices |
| GB0611032D0 (en) * | 2006-06-05 | 2006-07-12 | Plastic Logic Ltd | Multi-touch active display keyboard |
| US7976045B2 (en) * | 2006-09-21 | 2011-07-12 | Felt Racing, Llc | Bicycle front fork assembly |
| US7571920B2 (en) * | 2006-09-21 | 2009-08-11 | Felt Racing, Llc | Bicycle front fork assembly |
| JP2008103680A (ja) * | 2006-09-22 | 2008-05-01 | Konica Minolta Holdings Inc | ドナーシートの製造方法、ドナーシート、及び有機薄膜トランジスタの製造方法 |
| JP5181515B2 (ja) * | 2007-04-12 | 2013-04-10 | ソニー株式会社 | パターン形成方法および電子素子の製造方法 |
| GB2453766A (en) * | 2007-10-18 | 2009-04-22 | Novalia Ltd | Method of fabricating an electronic device |
| AU2012216352B2 (en) | 2012-08-22 | 2015-02-12 | Woodside Energy Technologies Pty Ltd | Modular LNG production facility |
| US9583426B2 (en) | 2014-11-05 | 2017-02-28 | Invensas Corporation | Multi-layer substrates suitable for interconnection between circuit modules |
| US10283492B2 (en) | 2015-06-23 | 2019-05-07 | Invensas Corporation | Laminated interposers and packages with embedded trace interconnects |
| US9852994B2 (en) | 2015-12-14 | 2017-12-26 | Invensas Corporation | Embedded vialess bridges |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6197663B1 (en) | 1999-12-07 | 2001-03-06 | Lucent Technologies Inc. | Process for fabricating integrated circuit devices having thin film transistors |
| US6335263B1 (en) * | 2000-03-22 | 2002-01-01 | The Regents Of The University Of California | Method of forming a low temperature metal bond for use in the transfer of bulk and thin film materials |
| US6852355B2 (en) | 2001-03-01 | 2005-02-08 | E. I. Du Pont De Nemours And Company | Thermal imaging processes and products of electroactive organic material |
| JP2002260854A (ja) * | 2001-03-02 | 2002-09-13 | Fuji Photo Film Co Ltd | 転写材料及び有機薄膜素子の製造方法 |
| EP1237207B1 (en) | 2001-03-02 | 2012-01-04 | FUJIFILM Corporation | Method for producing organic thin film device |
| US6485884B2 (en) | 2001-04-27 | 2002-11-26 | 3M Innovative Properties Company | Method for patterning oriented materials for organic electronic displays and devices |
| JP3812935B2 (ja) | 2001-10-22 | 2006-08-23 | シャープ株式会社 | 液晶表示装置 |
| JP2003187972A (ja) * | 2001-12-20 | 2003-07-04 | Dainippon Printing Co Ltd | 有機el素子の製造方法および有機el転写体と被転写体 |
| JP4360801B2 (ja) * | 2001-12-25 | 2009-11-11 | シャープ株式会社 | トランジスタおよびそれを用いた表示装置 |
| US6852996B2 (en) * | 2002-09-25 | 2005-02-08 | Stmicroelectronics, Inc. | Organic semiconductor sensor device |
| US6918982B2 (en) * | 2002-12-09 | 2005-07-19 | International Business Machines Corporation | System and method of transfer printing an organic semiconductor |
| US7141893B2 (en) * | 2005-03-30 | 2006-11-28 | Motorola, Inc. | Highly available power distribution system |
-
2004
- 2004-07-21 US US10/895,599 patent/US7105462B2/en not_active Expired - Fee Related
- 2004-07-22 EP EP04757163A patent/EP1647063A2/en not_active Withdrawn
- 2004-07-22 KR KR1020067001364A patent/KR20060063903A/ko not_active Ceased
- 2004-07-22 WO PCT/US2004/023375 patent/WO2005011016A2/en not_active Ceased
- 2004-07-22 JP JP2006521198A patent/JP2006528430A/ja active Pending
-
2006
- 2006-07-26 US US11/493,050 patent/US20070004229A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| US20070004229A1 (en) | 2007-01-04 |
| US20050035374A1 (en) | 2005-02-17 |
| WO2005011016A3 (en) | 2005-03-03 |
| WO2005011016A2 (en) | 2005-02-03 |
| JP2006528430A (ja) | 2006-12-14 |
| EP1647063A2 (en) | 2006-04-19 |
| US7105462B2 (en) | 2006-09-12 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0105 | International application |
Patent event date: 20060120 Patent event code: PA01051R01D Comment text: International Patent Application |
|
| PG1501 | Laying open of application | ||
| A201 | Request for examination | ||
| PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 20090414 Comment text: Request for Examination of Application |
|
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20101111 Patent event code: PE09021S01D |
|
| E601 | Decision to refuse application | ||
| PE0601 | Decision on rejection of patent |
Patent event date: 20110624 Comment text: Decision to Refuse Application Patent event code: PE06012S01D Patent event date: 20101111 Comment text: Notification of reason for refusal Patent event code: PE06011S01I |