KR20050010835A - 대역 판을 포함하는 다중 영상화 시스템을 사용하는 원소특이성 x-선 형광 현미경 - Google Patents
대역 판을 포함하는 다중 영상화 시스템을 사용하는 원소특이성 x-선 형광 현미경 Download PDFInfo
- Publication number
- KR20050010835A KR20050010835A KR10-2004-7019083A KR20047019083A KR20050010835A KR 20050010835 A KR20050010835 A KR 20050010835A KR 20047019083 A KR20047019083 A KR 20047019083A KR 20050010835 A KR20050010835 A KR 20050010835A
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- South Korea
- Prior art keywords
- imaging
- radiation
- ray fluorescence
- fluorescence microscope
- detector
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- 238000003384 imaging method Methods 0.000 title claims abstract description 103
- 238000004876 x-ray fluorescence Methods 0.000 title claims description 73
- 238000012360 testing method Methods 0.000 claims abstract description 66
- 239000010949 copper Substances 0.000 claims abstract description 46
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 32
- 229910052802 copper Inorganic materials 0.000 claims abstract description 31
- 230000003287 optical effect Effects 0.000 claims abstract description 20
- 230000005865 ionizing radiation Effects 0.000 claims abstract description 18
- 150000001875 compounds Chemical class 0.000 claims abstract description 15
- 230000003595 spectral effect Effects 0.000 claims abstract description 14
- 230000005855 radiation Effects 0.000 claims description 94
- 238000000034 method Methods 0.000 claims description 32
- 239000000463 material Substances 0.000 claims description 21
- 238000010521 absorption reaction Methods 0.000 claims description 11
- 239000013078 crystal Substances 0.000 claims description 10
- 229910052698 phosphorus Inorganic materials 0.000 claims description 9
- 239000011574 phosphorus Substances 0.000 claims description 9
- 229910052715 tantalum Inorganic materials 0.000 claims description 9
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical group [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 8
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical group [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 8
- 229910052796 boron Inorganic materials 0.000 claims description 8
- 238000000576 coating method Methods 0.000 claims description 8
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical group [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical group [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 7
- 229910052782 aluminium Inorganic materials 0.000 claims description 7
- 210000001747 pupil Anatomy 0.000 claims description 7
- 239000011248 coating agent Substances 0.000 claims description 5
- -1 phosphorus compound Chemical class 0.000 claims description 2
- 230000001678 irradiating effect Effects 0.000 claims 12
- 238000001914 filtration Methods 0.000 claims 3
- 150000001639 boron compounds Chemical class 0.000 claims 1
- 230000002708 enhancing effect Effects 0.000 claims 1
- 230000001737 promoting effect Effects 0.000 claims 1
- 239000007787 solid Substances 0.000 description 20
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 9
- 229910052710 silicon Inorganic materials 0.000 description 9
- 239000010703 silicon Substances 0.000 description 9
- 238000002213 X-ray fluorescence microscopy Methods 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 8
- 239000000758 substrate Substances 0.000 description 7
- 239000003990 capacitor Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 239000000523 sample Substances 0.000 description 6
- 230000008901 benefit Effects 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 5
- 230000007547 defect Effects 0.000 description 5
- 238000009826 distribution Methods 0.000 description 5
- 229910052721 tungsten Inorganic materials 0.000 description 5
- 230000008859 change Effects 0.000 description 4
- 239000000470 constituent Substances 0.000 description 4
- 230000005284 excitation Effects 0.000 description 4
- 238000005286 illumination Methods 0.000 description 4
- 230000001965 increasing effect Effects 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 4
- 239000010937 tungsten Substances 0.000 description 4
- 229910052581 Si3N4 Inorganic materials 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 2
- 238000000560 X-ray reflectometry Methods 0.000 description 2
- 230000002745 absorbent Effects 0.000 description 2
- 239000002250 absorbent Substances 0.000 description 2
- 235000019169 all-trans-retinol Nutrition 0.000 description 2
- 229910052785 arsenic Inorganic materials 0.000 description 2
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 210000000988 bone and bone Anatomy 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 239000000356 contaminant Substances 0.000 description 2
- 238000012937 correction Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 238000000921 elemental analysis Methods 0.000 description 2
- 238000004880 explosion Methods 0.000 description 2
- 238000000799 fluorescence microscopy Methods 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 239000011229 interlayer Substances 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000011800 void material Substances 0.000 description 2
- 238000004846 x-ray emission Methods 0.000 description 2
- 238000003963 x-ray microscopy Methods 0.000 description 2
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910002794 Si K Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000000441 X-ray spectroscopy Methods 0.000 description 1
- 238000002083 X-ray spectrum Methods 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 239000013590 bulk material Substances 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 230000002301 combined effect Effects 0.000 description 1
- 230000001010 compromised effect Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000009304 pastoral farming Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000005191 phase separation Methods 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000001454 recorded image Methods 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 230000001235 sensitizing effect Effects 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000005469 synchrotron radiation Effects 0.000 description 1
- 238000007751 thermal spraying Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000007794 visualization technique Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
- G21K1/062—Devices having a multilayer structure
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/07—Investigating materials by wave or particle radiation secondary emission
- G01N2223/076—X-ray fluorescence
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Nanotechnology (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- High Energy & Nuclear Physics (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Engineering & Computer Science (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/157,089 | 2002-05-29 | ||
| US10/157,089 US7245696B2 (en) | 2002-05-29 | 2002-05-29 | Element-specific X-ray fluorescence microscope and method of operation |
| PCT/US2003/016913 WO2003102564A2 (en) | 2002-05-29 | 2003-05-29 | Element-specific x-ray fluorescence microscope using multiple imaging systems comprising a zone plate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20050010835A true KR20050010835A (ko) | 2005-01-28 |
Family
ID=29582384
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR10-2004-7019083A Withdrawn KR20050010835A (ko) | 2002-05-29 | 2003-05-29 | 대역 판을 포함하는 다중 영상화 시스템을 사용하는 원소특이성 x-선 형광 현미경 |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US7245696B2 (enExample) |
| EP (1) | EP1511994A2 (enExample) |
| JP (1) | JP2005527833A (enExample) |
| KR (1) | KR20050010835A (enExample) |
| CN (1) | CN1656373B (enExample) |
| AU (1) | AU2003232417A1 (enExample) |
| WO (1) | WO2003102564A2 (enExample) |
Families Citing this family (121)
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|---|---|---|---|---|
| GB9618897D0 (en) | 1996-09-10 | 1996-10-23 | Bio Rad Micromeasurements Ltd | Micro defects in silicon wafers |
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| US20050282300A1 (en) * | 2002-05-29 | 2005-12-22 | Xradia, Inc. | Back-end-of-line metallization inspection and metrology microscopy system and method using x-ray fluorescence |
| US7245696B2 (en) * | 2002-05-29 | 2007-07-17 | Xradia, Inc. | Element-specific X-ray fluorescence microscope and method of operation |
| KR100524211B1 (ko) * | 2003-02-28 | 2005-10-26 | 삼성전자주식회사 | 반도체 소자 제조과정에서의 박막의 불순물 농도 측정방법및 제어방법 |
| US7202475B1 (en) * | 2003-03-06 | 2007-04-10 | Kla-Tencor Technologies Corporation | Rapid defect composition mapping using multiple X-ray emission perspective detection scheme |
| GB0308182D0 (en) * | 2003-04-09 | 2003-05-14 | Aoti Operating Co Inc | Detection method and apparatus |
| US20080152090A1 (en) * | 2003-08-25 | 2008-06-26 | Takashi Yamada | Euv Light Source |
| US7394890B1 (en) * | 2003-11-07 | 2008-07-01 | Xradia, Inc. | Optimized x-ray energy for high resolution imaging of integrated circuits structures |
| EP1718958B1 (en) * | 2004-02-20 | 2012-08-29 | Philips Intellectual Property & Standards GmbH | Device and method for mapping the distribution of an x-ray fluorescence marker |
| WO2006010091A2 (en) * | 2004-07-09 | 2006-01-26 | Xradia, Inc. | Copper metallization analysis system and method using x-ray fluorescence |
| JP2006029921A (ja) * | 2004-07-14 | 2006-02-02 | Institute Of Physical & Chemical Research | フローサイトメーター |
| US7466796B2 (en) * | 2004-08-05 | 2008-12-16 | Gatan, Inc. | Condenser zone plate illumination for point X-ray sources |
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| US7312448B2 (en) * | 2005-04-06 | 2007-12-25 | Carl Zeiss Nts Gmbh | Method and apparatus for quantitative three-dimensional reconstruction in scanning electron microscopy |
| US7166838B1 (en) | 2005-05-23 | 2007-01-23 | Kla-Tencor Technologies Corporation | X-ray imaging for patterned film measurement |
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| TWI391645B (zh) * | 2005-07-06 | 2013-04-01 | Nanometrics Inc | 晶圓或其他工作表面下污染物及缺陷非接觸測量之差分波長光致發光 |
| TWI439684B (zh) | 2005-07-06 | 2014-06-01 | Nanometrics Inc | 具自晶圓或其他工件特定材料層所發射光致發光信號優先偵測之光致發光成像 |
| US20070008526A1 (en) * | 2005-07-08 | 2007-01-11 | Andrzej Buczkowski | Apparatus and method for non-contact assessment of a constituent in semiconductor workpieces |
| JP5028787B2 (ja) * | 2005-11-04 | 2012-09-19 | カシオ計算機株式会社 | Epma装置 |
| US20070108387A1 (en) * | 2005-11-14 | 2007-05-17 | Xradia, Inc. | Tunable x-ray fluorescence imager for multi-element analysis |
| AU2007208311A1 (en) * | 2006-01-24 | 2007-08-02 | Brookhaven Science Associates | Systems and methods for detecting an image of an object by use of an X-ray beam having a polychromatic distribution |
| US20070176119A1 (en) * | 2006-01-30 | 2007-08-02 | Accent Optical Technologies, Inc. | Apparatuses and methods for analyzing semiconductor workpieces |
| US7796726B1 (en) * | 2006-02-14 | 2010-09-14 | University Of Maryland, Baltimore County | Instrument and method for X-ray diffraction, fluorescence, and crystal texture analysis without sample preparation |
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| US20080253527A1 (en) * | 2007-04-11 | 2008-10-16 | Searete Llc, A Limited Liability Corporation Of The State Of Delaware | Limiting compton scattered x-ray visualizing, imaging, or information providing at particular regions |
| US20080253525A1 (en) * | 2007-04-11 | 2008-10-16 | Boyden Edward S | Compton scattered x-ray visualizing, imaging, or information providing of at least some dissimilar matter |
| US8837677B2 (en) * | 2007-04-11 | 2014-09-16 | The Invention Science Fund I Llc | Method and system for compton scattered X-ray depth visualization, imaging, or information provider |
| US8000438B2 (en) * | 2007-09-28 | 2011-08-16 | The Invention Science Fund I, Llc | Tool based X-ray fluorescence visualizing, imaging, or information providing |
| US7724867B2 (en) | 2007-09-28 | 2010-05-25 | Invention Science Fund I, Llc | Proximity-based X-Ray fluorescence visualizer, imager, or information provider |
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| US7738627B2 (en) * | 2007-09-28 | 2010-06-15 | The Invention Science Fund I, Llc | Geometric X-ray fluorescence visualizer, imager, or information provider |
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| US7773722B2 (en) * | 2007-09-28 | 2010-08-10 | The Invention Science Fund I, Llc | Personal transportable X-ray fluorescence visualizing, imaging, or information providing |
| US8041005B2 (en) * | 2007-09-28 | 2011-10-18 | The Invention Science Fund I, Llc | X-ray fluorescence visualizer, imager, or information provider |
| US7825376B2 (en) * | 2007-09-28 | 2010-11-02 | The Invention Science Fund I | Scintillator aspects for X-ray fluorescence visualizer, imager, or information provider |
| AU2009212187B2 (en) * | 2008-02-06 | 2014-05-01 | Fei Company | A method and system for spectrum data analysis |
| DE102008019128A1 (de) * | 2008-04-16 | 2009-10-29 | Siemens Aktiengesellschaft | Vorrichtung zur Durchführung einer Bestrahlung und Verfahren zur Überwachung einer solchen |
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2002
- 2002-05-29 US US10/157,089 patent/US7245696B2/en not_active Expired - Lifetime
-
2003
- 2003-05-29 WO PCT/US2003/016913 patent/WO2003102564A2/en not_active Ceased
- 2003-05-29 KR KR10-2004-7019083A patent/KR20050010835A/ko not_active Withdrawn
- 2003-05-29 JP JP2004509399A patent/JP2005527833A/ja active Pending
- 2003-05-29 EP EP03756253A patent/EP1511994A2/en not_active Withdrawn
- 2003-05-29 CN CN038123215A patent/CN1656373B/zh not_active Expired - Lifetime
- 2003-05-29 AU AU2003232417A patent/AU2003232417A1/en not_active Abandoned
-
2004
- 2004-11-23 US US10/995,642 patent/US7183547B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| US7183547B2 (en) | 2007-02-27 |
| AU2003232417A1 (en) | 2003-12-19 |
| US20050109936A1 (en) | 2005-05-26 |
| CN1656373A (zh) | 2005-08-17 |
| WO2003102564A3 (en) | 2004-03-18 |
| EP1511994A2 (en) | 2005-03-09 |
| AU2003232417A8 (en) | 2003-12-19 |
| CN1656373B (zh) | 2010-06-02 |
| JP2005527833A (ja) | 2005-09-15 |
| WO2003102564A2 (en) | 2003-12-11 |
| US20030223536A1 (en) | 2003-12-04 |
| US7245696B2 (en) | 2007-07-17 |
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