KR20030022347A - 광안정한 실릴화 벤조트리아졸 ｕｖ 흡수제 및 이를사용하여 안정화시킨 조성물 - Google Patents
광안정한 실릴화 벤조트리아졸 ｕｖ 흡수제 및 이를사용하여 안정화시킨 조성물 Download PDFInfo
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- KR20030022347A KR20030022347A KR10-2003-7001515A KR20037001515A KR20030022347A KR 20030022347 A KR20030022347 A KR 20030022347A KR 20037001515 A KR20037001515 A KR 20037001515A KR 20030022347 A KR20030022347 A KR 20030022347A
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- South Korea
- Prior art keywords
- carbon atoms
- alkyl
- phenyl
- tert
- formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000000203 mixture Substances 0.000 title claims description 73
- 239000012964 benzotriazole Substances 0.000 title claims description 30
- 239000006096 absorbing agent Substances 0.000 title claims description 28
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 title claims description 22
- -1 alpha-cumyl Chemical group 0.000 claims abstract description 147
- 238000000576 coating method Methods 0.000 claims abstract description 46
- 125000004432 carbon atom Chemical group C* 0.000 claims description 188
- 150000001875 compounds Chemical class 0.000 claims description 146
- 125000000217 alkyl group Chemical group 0.000 claims description 76
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 69
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims description 50
- 229910052739 hydrogen Inorganic materials 0.000 claims description 46
- 239000001257 hydrogen Substances 0.000 claims description 46
- 238000000034 method Methods 0.000 claims description 45
- 125000003342 alkenyl group Chemical group 0.000 claims description 38
- 125000003884 phenylalkyl group Chemical group 0.000 claims description 38
- 229920001577 copolymer Polymers 0.000 claims description 34
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 34
- 229920000642 polymer Polymers 0.000 claims description 31
- 239000011248 coating agent Substances 0.000 claims description 29
- 150000002431 hydrogen Chemical class 0.000 claims description 27
- 239000007787 solid Substances 0.000 claims description 26
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 24
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- 239000011347 resin Substances 0.000 claims description 23
- 229920000877 Melamine resin Polymers 0.000 claims description 20
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 19
- 125000003118 aryl group Chemical group 0.000 claims description 19
- 150000001412 amines Chemical class 0.000 claims description 17
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims description 15
- 239000005977 Ethylene Substances 0.000 claims description 15
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 15
- 239000004417 polycarbonate Substances 0.000 claims description 15
- 239000004743 Polypropylene Substances 0.000 claims description 12
- 125000002947 alkylene group Chemical group 0.000 claims description 12
- 229910052736 halogen Inorganic materials 0.000 claims description 11
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- 150000002367 halogens Chemical class 0.000 claims description 10
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 claims description 10
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical group [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims description 9
- 125000001153 fluoro group Chemical group F* 0.000 claims description 9
- 239000011368 organic material Substances 0.000 claims description 9
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 claims description 8
- 239000004676 acrylonitrile butadiene styrene Substances 0.000 claims description 8
- 125000005010 perfluoroalkyl group Chemical group 0.000 claims description 8
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- 239000000758 substrate Substances 0.000 claims description 8
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 7
- 229920000178 Acrylic resin Polymers 0.000 claims description 7
- 239000004925 Acrylic resin Substances 0.000 claims description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 7
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- 239000004593 Epoxy Substances 0.000 claims description 6
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- 239000004814 polyurethane Substances 0.000 claims description 6
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 6
- HJIAMFHSAAEUKR-UHFFFAOYSA-N (2-hydroxyphenyl)-phenylmethanone Chemical compound OC1=CC=CC=C1C(=O)C1=CC=CC=C1 HJIAMFHSAAEUKR-UHFFFAOYSA-N 0.000 claims description 5
- 125000001309 chloro group Chemical group Cl* 0.000 claims description 5
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 5
- 125000002768 hydroxyalkyl group Chemical group 0.000 claims description 5
- 239000002530 phenolic antioxidant Substances 0.000 claims description 5
- 229910052710 silicon Inorganic materials 0.000 claims description 5
- 229920000554 ionomer Polymers 0.000 claims description 4
- 229920001707 polybutylene terephthalate Polymers 0.000 claims description 4
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- KKEYFWRCBNTPAC-UHFFFAOYSA-L terephthalate(2-) Chemical compound [O-]C(=O)C1=CC=C(C([O-])=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-L 0.000 claims description 4
- 229920002803 thermoplastic polyurethane Polymers 0.000 claims description 4
- KXDHJXZQYSOELW-UHFFFAOYSA-M Carbamate Chemical compound NC([O-])=O KXDHJXZQYSOELW-UHFFFAOYSA-M 0.000 claims description 3
- 229930040373 Paraformaldehyde Natural products 0.000 claims description 3
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 claims description 3
- 229910052799 carbon Inorganic materials 0.000 claims description 3
- 230000015556 catabolic process Effects 0.000 claims description 3
- 238000006731 degradation reaction Methods 0.000 claims description 3
- FTWUXYZHDFCGSV-UHFFFAOYSA-N n,n'-diphenyloxamide Chemical compound C=1C=CC=CC=1NC(=O)C(=O)NC1=CC=CC=C1 FTWUXYZHDFCGSV-UHFFFAOYSA-N 0.000 claims description 3
- 229920005615 natural polymer Polymers 0.000 claims description 3
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- 230000000087 stabilizing effect Effects 0.000 claims description 3
- JIHQDMXYYFUGFV-UHFFFAOYSA-N 1,3,5-triazine Chemical compound C1=NC=NC=N1 JIHQDMXYYFUGFV-UHFFFAOYSA-N 0.000 claims description 2
- OTBFZRRHDWOLTI-UHFFFAOYSA-N 1-[4-tert-butyl-2-[5-(trifluoromethyl)benzotriazol-2-yl]phenyl]-3-trimethylsilylpropan-2-ol Chemical compound CC(C)(C)C1=CC=C(CC(O)C[Si](C)(C)C)C(N2N=C3C=C(C=CC3=N2)C(F)(F)F)=C1 OTBFZRRHDWOLTI-UHFFFAOYSA-N 0.000 claims description 2
- WBVWSSAJJAYGHQ-UHFFFAOYSA-N 1-[ethoxy(dimethyl)silyl]-3-[2-[5-(trifluoromethyl)benzotriazol-2-yl]-4-(2,4,4-trimethylpentan-2-yl)phenyl]propan-2-ol Chemical compound CCO[Si](C)(C)CC(O)CC1=CC=C(C(C)(C)CC(C)(C)C)C=C1N1N=C2C=C(C(F)(F)F)C=CC2=N1 WBVWSSAJJAYGHQ-UHFFFAOYSA-N 0.000 claims description 2
- ZYZYQCACSQDPSB-UHFFFAOYSA-N 12,15-dioxatricyclo[8.6.0.02,7]hexadeca-1(10),2,4,6,8-pentaene-11,16-dione Chemical compound O=C1OCCOC(=O)C2=C1C=CC1=CC=CC=C21 ZYZYQCACSQDPSB-UHFFFAOYSA-N 0.000 claims description 2
- IJVRPNIWWODHHA-UHFFFAOYSA-N 2-cyanoprop-2-enoic acid Chemical compound OC(=O)C(=C)C#N IJVRPNIWWODHHA-UHFFFAOYSA-N 0.000 claims description 2
- UTPIWUUIAVTIJM-UHFFFAOYSA-N 3-(2,2-diethoxyethylsilyl)propyl 2-[2-hydroxy-3-(2-phenylpropan-2-yl)-5-(2,4,4-trimethylpentan-2-yl)phenyl]benzotriazole-5-carboxylate Chemical compound C(C)OC(C[SiH2]CCCOC(=O)C1=CC=2C(=NN(N=2)C2=C(C(=CC(=C2)C(C)(C)CC(C)(C)C)C(C)(C)C2=CC=CC=C2)O)C=C1)OCC UTPIWUUIAVTIJM-UHFFFAOYSA-N 0.000 claims description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 2
- BAXIUWVFHUVJRW-UHFFFAOYSA-N N-[3-(2,2-diethoxyethylsilyl)propyl]-2-[2-hydroxy-3-(2-phenylpropan-2-yl)-5-(2,4,4-trimethylpentan-2-yl)phenyl]benzotriazole-5-carboxamide Chemical compound CCOC(C[SiH2]CCCNC(=O)C1=CC2=NN(N=C2C=C1)C1=C(O)C(=CC(=C1)C(C)(C)CC(C)(C)C)C(C)(C)C1=CC=CC=C1)OCC BAXIUWVFHUVJRW-UHFFFAOYSA-N 0.000 claims description 2
- 239000004677 Nylon Substances 0.000 claims description 2
- 229930182556 Polyacetal Natural products 0.000 claims description 2
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims description 2
- 125000001118 alkylidene group Chemical group 0.000 claims description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 2
- 229920001778 nylon Polymers 0.000 claims description 2
- 229920005644 polyethylene terephthalate glycol copolymer Polymers 0.000 claims description 2
- 150000003440 styrenes Chemical class 0.000 claims description 2
- 239000000126 substance Substances 0.000 claims description 2
- 229920001059 synthetic polymer Polymers 0.000 claims description 2
- 125000006839 xylylene group Chemical group 0.000 claims description 2
- LCIYFINKFGDAHD-UHFFFAOYSA-N azepane;3-nitrobenzoic acid Chemical compound C1CCCNCC1.OC(=O)C1=CC=CC([N+]([O-])=O)=C1 LCIYFINKFGDAHD-UHFFFAOYSA-N 0.000 claims 1
- QHIWVLPBUQWDMQ-UHFFFAOYSA-N butyl prop-2-enoate;methyl 2-methylprop-2-enoate;prop-2-enoic acid Chemical compound OC(=O)C=C.COC(=O)C(C)=C.CCCCOC(=O)C=C QHIWVLPBUQWDMQ-UHFFFAOYSA-N 0.000 claims 1
- VSGYTOKLSWSEPK-UHFFFAOYSA-M diethyl-[3-(2-hydroxy-2,2-diphenylacetyl)oxypropyl]-methylazanium;chloride Chemical compound [Cl-].C=1C=CC=CC=1C(O)(C(=O)OCCC[N+](C)(CC)CC)C1=CC=CC=C1 VSGYTOKLSWSEPK-UHFFFAOYSA-M 0.000 claims 1
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 claims 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims 1
- 229920001296 polysiloxane Polymers 0.000 abstract description 18
- 125000003354 benzotriazolyl group Chemical class N1N=NC2=C1C=CC=C2* 0.000 abstract description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 41
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- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 22
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 21
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 20
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 19
- 238000002835 absorbance Methods 0.000 description 18
- 239000010410 layer Substances 0.000 description 18
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 17
- 150000001565 benzotriazoles Chemical class 0.000 description 16
- 239000000243 solution Substances 0.000 description 16
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 14
- 239000000047 product Substances 0.000 description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 14
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 13
- CUJRVFIICFDLGR-UHFFFAOYSA-N acetylacetonate Chemical compound CC(=O)[CH-]C(C)=O CUJRVFIICFDLGR-UHFFFAOYSA-N 0.000 description 13
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- NBBQQQJUOYRZCA-UHFFFAOYSA-N diethoxymethylsilane Chemical compound CCOC([SiH3])OCC NBBQQQJUOYRZCA-UHFFFAOYSA-N 0.000 description 6
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- ATXBGHLILIABGX-UHFFFAOYSA-N 2-nitro-4-(trifluoromethyl)aniline Chemical compound NC1=CC=C(C(F)(F)F)C=C1[N+]([O-])=O ATXBGHLILIABGX-UHFFFAOYSA-N 0.000 description 5
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- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
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- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229920002620 polyvinyl fluoride Polymers 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 125000001844 prenyl group Chemical group [H]C([*])([H])C([H])=C(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 239000003755 preservative agent Substances 0.000 description 1
- 230000002335 preservative effect Effects 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 125000004368 propenyl group Chemical group C(=CC)* 0.000 description 1
- 125000002568 propynyl group Chemical group [*]C#CC([H])([H])[H] 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 239000012744 reinforcing agent Substances 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 229910052895 riebeckite Inorganic materials 0.000 description 1
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical class OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229940116351 sebacate Drugs 0.000 description 1
- CXMXRPHRNRROMY-UHFFFAOYSA-L sebacate(2-) Chemical compound [O-]C(=O)CCCCCCCCC([O-])=O CXMXRPHRNRROMY-UHFFFAOYSA-L 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- XGVXKJKTISMIOW-ZDUSSCGKSA-N simurosertib Chemical compound N1N=CC(C=2SC=3C(=O)NC(=NC=3C=2)[C@H]2N3CCC(CC3)C2)=C1C XGVXKJKTISMIOW-ZDUSSCGKSA-N 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 239000004317 sodium nitrate Substances 0.000 description 1
- 235000010344 sodium nitrate Nutrition 0.000 description 1
- 238000000527 sonication Methods 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
- 235000019698 starch Nutrition 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229920000638 styrene acrylonitrile Polymers 0.000 description 1
- 229920003048 styrene butadiene rubber Polymers 0.000 description 1
- 125000003011 styrenyl group Chemical group [H]\C(*)=C(/[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 239000001384 succinic acid Substances 0.000 description 1
- 125000000446 sulfanediyl group Chemical group *S* 0.000 description 1
- 229920003051 synthetic elastomer Polymers 0.000 description 1
- 239000005061 synthetic rubber Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- MHSKRLJMQQNJNC-UHFFFAOYSA-N terephthalamide Chemical compound NC(=O)C1=CC=C(C(N)=O)C=C1 MHSKRLJMQQNJNC-UHFFFAOYSA-N 0.000 description 1
- WEHDCBONCFYXKK-UHFFFAOYSA-N tert-butyl 3-(4-hydroxyphenyl)propanoate Chemical compound CC(C)(C)OC(=O)CCC1=CC=C(O)C=C1 WEHDCBONCFYXKK-UHFFFAOYSA-N 0.000 description 1
- WUPCFMITFBVJMS-UHFFFAOYSA-N tetrakis(1,2,2,6,6-pentamethylpiperidin-4-yl) butane-1,2,3,4-tetracarboxylate Chemical compound C1C(C)(C)N(C)C(C)(C)CC1OC(=O)CC(C(=O)OC1CC(C)(C)N(C)C(C)(C)C1)C(C(=O)OC1CC(C)(C)N(C)C(C)(C)C1)CC(=O)OC1CC(C)(C)N(C)C(C)(C)C1 WUPCFMITFBVJMS-UHFFFAOYSA-N 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 238000004809 thin layer chromatography Methods 0.000 description 1
- YONPGGFAJWQGJC-UHFFFAOYSA-K titanium(iii) chloride Chemical compound Cl[Ti](Cl)Cl YONPGGFAJWQGJC-UHFFFAOYSA-K 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
- 238000005809 transesterification reaction Methods 0.000 description 1
- CLBRRQXSGPYXBX-UHFFFAOYSA-N tribenzylsilane Chemical compound C=1C=CC=CC=1C[SiH](CC=1C=CC=CC=1)CC1=CC=CC=C1 CLBRRQXSGPYXBX-UHFFFAOYSA-N 0.000 description 1
- 125000002889 tridecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- IVIIAEVMQHEPAY-UHFFFAOYSA-N tridodecyl phosphite Chemical compound CCCCCCCCCCCCOP(OCCCCCCCCCCCC)OCCCCCCCCCCCC IVIIAEVMQHEPAY-UHFFFAOYSA-N 0.000 description 1
- 125000005591 trimellitate group Chemical group 0.000 description 1
- CNUJLMSKURPSHE-UHFFFAOYSA-N trioctadecyl phosphite Chemical compound CCCCCCCCCCCCCCCCCCOP(OCCCCCCCCCCCCCCCCCC)OCCCCCCCCCCCCCCCCCC CNUJLMSKURPSHE-UHFFFAOYSA-N 0.000 description 1
- AKQNYQDSIDKVJZ-UHFFFAOYSA-N triphenylsilane Chemical compound C1=CC=CC=C1[SiH](C=1C=CC=CC=1)C1=CC=CC=C1 AKQNYQDSIDKVJZ-UHFFFAOYSA-N 0.000 description 1
- WGKLOLBTFWFKOD-UHFFFAOYSA-N tris(2-nonylphenyl) phosphite Chemical compound CCCCCCCCCC1=CC=CC=C1OP(OC=1C(=CC=CC=1)CCCCCCCCC)OC1=CC=CC=C1CCCCCCCCC WGKLOLBTFWFKOD-UHFFFAOYSA-N 0.000 description 1
- 125000002948 undecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- 150000003672 ureas Chemical class 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- 229920006163 vinyl copolymer Polymers 0.000 description 1
- 239000004034 viscosity adjusting agent Substances 0.000 description 1
- 230000003313 weakening effect Effects 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 150000003751 zinc Chemical class 0.000 description 1
- XOOUIPVCVHRTMJ-UHFFFAOYSA-L zinc stearate Chemical compound [Zn+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O XOOUIPVCVHRTMJ-UHFFFAOYSA-L 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0803—Compounds with Si-C or Si-Si linkages
- C07F7/081—Compounds with Si-C or Si-Si linkages comprising at least one atom selected from the elements N, O, halogen, S, Se or Te
- C07F7/0812—Compounds with Si-C or Si-Si linkages comprising at least one atom selected from the elements N, O, halogen, S, Se or Te comprising a heterocyclic ring
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D249/00—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms
- C07D249/16—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms condensed with carbocyclic rings or ring systems
- C07D249/18—Benzotriazoles
- C07D249/20—Benzotriazoles with aryl radicals directly attached in position 2
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
- C08K5/3472—Five-membered rings
- C08K5/3475—Five-membered rings condensed with carbocyclic rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/544—Silicon-containing compounds containing nitrogen
- C08K5/5477—Silicon-containing compounds containing nitrogen containing nitrogen in a heterocyclic ring
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Paints Or Removers (AREA)
- Paper (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US22278300P | 2000-08-03 | 2000-08-03 | |
| US60/222,783 | 2000-08-03 | ||
| US30304801P | 2001-07-05 | 2001-07-05 | |
| US60/303,048 | 2001-07-05 | ||
| PCT/EP2001/008663 WO2002012252A1 (en) | 2000-08-03 | 2001-07-26 | Photostable, silylated benzotriazole uv absorbers and compositions stabilized therewith |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20030022347A true KR20030022347A (ko) | 2003-03-15 |
Family
ID=26917137
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR10-2003-7001515A Ceased KR20030022347A (ko) | 2000-08-03 | 2001-07-26 | 광안정한 실릴화 벤조트리아졸 ｕｖ 흡수제 및 이를사용하여 안정화시킨 조성물 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US6677392B2 (https=) |
| EP (1) | EP1305320B1 (https=) |
| JP (1) | JP4912561B2 (https=) |
| KR (1) | KR20030022347A (https=) |
| AT (1) | ATE327997T1 (https=) |
| AU (1) | AU2001293708A1 (https=) |
| DE (1) | DE60120178T2 (https=) |
| TW (1) | TW548303B (https=) |
| WO (1) | WO2002012252A1 (https=) |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2003044600A1 (en) * | 2001-11-15 | 2003-05-30 | Honeywell International Inc. | Spin-on anti-reflective coatings for photolithography |
| JP3829933B2 (ja) * | 2002-05-16 | 2006-10-04 | 信越化学工業株式会社 | 難燃性シリコーン組成物 |
| US20040185269A1 (en) * | 2003-03-18 | 2004-09-23 | Loper Scott W. | Scratch and mar resistant low VOC coating composition |
| MXPA05011847A (es) * | 2003-05-06 | 2006-01-26 | Ciba Sc Holding Ag | Revestimientos fotocurados y estabilizados. |
| US8053159B2 (en) * | 2003-11-18 | 2011-11-08 | Honeywell International Inc. | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
| JP2005343969A (ja) * | 2004-06-01 | 2005-12-15 | Showa Techno Coat Kk | 紫外線遮蔽塗料 |
| US7642303B2 (en) * | 2004-10-15 | 2010-01-05 | Shakely Thomas L | Thermoplastic articles for packaging UV sensitive materials, processes for the articles production and use and novel UV absorbers |
| US7364672B2 (en) * | 2004-12-06 | 2008-04-29 | Arlon, Inc. | Low loss prepregs, compositions useful for the preparation thereof and uses therefor |
| JP4595060B2 (ja) * | 2005-03-24 | 2010-12-08 | 東レ・モノフィラメント株式会社 | 工業織物用ポリアミドモノフィラメントおよび工業織物 |
| JP4595061B2 (ja) * | 2005-03-24 | 2010-12-08 | 東レ・モノフィラメント株式会社 | 工業布帛用ポリアミドステープルおよび工業布帛 |
| JP2007231099A (ja) * | 2006-02-28 | 2007-09-13 | Fujifilm Corp | 分散物 |
| US20080009211A1 (en) * | 2006-07-07 | 2008-01-10 | Matthew Raymond Himes | Assemblies useful for the preparation of electronic components and methods for making same |
| WO2008010421A1 (en) * | 2006-07-21 | 2008-01-24 | Konica Minolta Opto, Inc. | Optical film, process for producing the same, polarizing plate and liquid crystal display device |
| JP5190650B2 (ja) * | 2007-02-14 | 2013-04-24 | シプロ化成株式会社 | ベンゾトリアゾール誘導体化合物 |
| US8642246B2 (en) * | 2007-02-26 | 2014-02-04 | Honeywell International Inc. | Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof |
| US7772355B2 (en) * | 2008-01-28 | 2010-08-10 | The United States Of America As Represented By The Secretary Of The Navy | Divinylsilane-terminated aromatic ether-aromatic ketone-containing compounds |
| US8557877B2 (en) | 2009-06-10 | 2013-10-15 | Honeywell International Inc. | Anti-reflective coatings for optically transparent substrates |
| JP5907588B2 (ja) * | 2011-04-04 | 2016-04-26 | 関西ペイント株式会社 | シルセスキオキサン化合物及びこれを含むコーティング組成物 |
| US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |
| EP2781555A4 (en) * | 2011-11-18 | 2015-10-07 | Adeka Corp | NEW CONNECTION AND CARRIER TO SUPPORT THIS NEW CONNECTION |
| JP5910478B2 (ja) * | 2012-12-07 | 2016-04-27 | 信越化学工業株式会社 | 樹脂用コーティング剤組成物 |
| US9085692B1 (en) | 2014-02-25 | 2015-07-21 | The Government Of The United States Of America, As Represented By The Secretary Of The Navy | Synthesis of oligomeric divinyldialkylsilane containing compositions |
| EP3591001A1 (en) | 2014-11-20 | 2020-01-08 | Cytec Industries Inc. | Stabilizer compositions and methods for using same for protecting organic materials from uv light and thermal degradation |
| JP6803842B2 (ja) | 2015-04-13 | 2020-12-23 | ハネウェル・インターナショナル・インコーポレーテッドＨｏｎｅｙｗｅｌｌ Ｉｎｔｅｒｎａｔｉｏｎａｌ Ｉｎｃ． | オプトエレクトロニクス用途のためのポリシロキサン製剤及びコーティング |
| EP3319947B1 (en) | 2015-07-07 | 2022-05-04 | 3M Innovative Properties Company | Substituted benzotriazole phenols |
| WO2017122503A1 (ja) | 2016-01-12 | 2017-07-20 | 富士フイルム株式会社 | 組成物、膜、ガラス物品、化合物、高純度組成物、化合物の製造方法および膜の製造方法 |
| EP3707191A1 (en) * | 2017-11-10 | 2020-09-16 | Merck Patent GmbH | Organic semiconducting compounds |
| EP3578599A1 (en) | 2018-06-08 | 2019-12-11 | Cytec Industries Inc. | Granular stabilizer compositions for use in polymer resins and methods of making same |
| CN113728070B (zh) * | 2019-04-26 | 2024-03-08 | 三吉油脂株式会社 | 耐热性优异和长波长吸收优异的紫外线吸收剂 |
| CN111548659A (zh) * | 2020-06-01 | 2020-08-18 | 烟台布莱特光电材料有限公司 | 一种新型的uv固化物及其制备的mini led荧光膜片 |
| WO2024083872A1 (en) | 2022-10-18 | 2024-04-25 | Cytec Industries Inc. | Synergistic stabilizer compositions and methods for using same for protecting organic materials from uv light and thermal degradation |
| TWI832549B (zh) | 2022-11-11 | 2024-02-11 | 財團法人工業技術研究院 | 核殼粒子與鋰離子電池 |
| CN121925446A (zh) | 2023-09-13 | 2026-04-24 | 塞特工业公司 | 具有改善的耐变色性的稳定的聚合物组合物 |
| CN121451351A (zh) * | 2026-01-06 | 2026-02-03 | 石狮市益盛化纤织造有限公司 | 一种耐紫外黄化的纺织纤维布料的制备方法 |
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|---|---|---|---|---|
| US4373060A (en) * | 1980-05-30 | 1983-02-08 | General Electric Company | Silicone coating for unprimed plastic substrate and coated articles |
| US4316033A (en) * | 1980-05-30 | 1982-02-16 | General Electric Company | Alkoxysilylbenzotriazoles |
| US4373061A (en) | 1980-05-30 | 1983-02-08 | General Electric Company | Silicone coating for unprimed plastic substrate and coated articles |
| US4322455A (en) | 1980-09-15 | 1982-03-30 | General Electric Company | Process for producing an ultraviolet radiation stabilized polymeric article |
| US4439494A (en) * | 1982-03-01 | 1984-03-27 | General Electric Company | Silyl-polyacrylates for polycarbonate substrates |
| JPH0730251B2 (ja) * | 1987-10-09 | 1995-04-05 | 旭電化工業株式会社 | 耐光性の改善された高分子材料組成物 |
| US4859759A (en) | 1988-04-14 | 1989-08-22 | Kimberly-Clark Corporation | Siloxane containing benzotriazolyl/tetraalkylpiperidyl substituent |
| IT1243409B (it) | 1990-12-17 | 1994-06-10 | Ciba Geigy Spa | Composti piperidinici contenenti gruppi silenici atti all'impiego come stabilizzanti per materiali organici |
| ES2083136T3 (es) | 1991-03-05 | 1996-04-01 | Ciba Geigy Ag | 2-(2-hidroxifenil)-4,6-diaril-1,3,5-triazinas sililadas. |
| JPH06115270A (ja) * | 1992-10-01 | 1994-04-26 | Fuji Photo Film Co Ltd | 熱転写受像材料 |
| IT1270870B (it) | 1993-03-11 | 1997-05-13 | Ciba Geigy Ag | Composti polimetilipeperidinici contenenti gruppi silanici atti all'impiego come stabilizzanti per materiali organici |
| DE59510278D1 (de) | 1994-02-10 | 2002-08-22 | Ciba Sc Holding Ag | Holzschutzanstrich |
| US5391795A (en) | 1994-02-18 | 1995-02-21 | General Electric Company | Silylated agents useful for absorbing ultraviolet light |
| US6576797B1 (en) | 1994-03-31 | 2003-06-10 | Ciba Specialty Chemicals Corporation | Thioether substituted hydroxybenzophenones and stabilized compositions |
| FR2726561B1 (fr) * | 1994-11-08 | 1996-12-13 | Oreal | Nouveaux filtres solaires, compositions cosmetiques photoprotectrices les contenant et utilisations |
| JP3524617B2 (ja) * | 1995-03-13 | 2004-05-10 | 新日本石油株式会社 | 紫外線吸収剤及びコーティング材料 |
| TW325490B (en) | 1995-06-23 | 1998-01-21 | Ciba Sc Holding Ag | Polysiloxane light stabilizers |
| JPH11508629A (ja) | 1995-07-03 | 1999-07-27 | チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド | ポリシラン |
| JP3752010B2 (ja) * | 1995-07-04 | 2006-03-08 | 新日本石油株式会社 | 調光素子 |
| US6166218A (en) | 1996-11-07 | 2000-12-26 | Ciba Specialty Chemicals Corporation | Benzotriazole UV absorbers having enhanced durability |
| US5679820A (en) | 1996-12-16 | 1997-10-21 | General Electric Company | Silylated ultraviolet light absorbers having resistance to humidity |
| JPH10219231A (ja) * | 1997-01-31 | 1998-08-18 | Nippon Oil Co Ltd | 紫外線吸収材料の製造方法 |
| JP4092525B2 (ja) * | 2000-02-04 | 2008-05-28 | 信越化学工業株式会社 | コーティング剤組成物並びにコーティング方法及びコーティング物品 |
-
2001
- 2001-07-26 KR KR10-2003-7001515A patent/KR20030022347A/ko not_active Ceased
- 2001-07-26 JP JP2002518227A patent/JP4912561B2/ja not_active Expired - Fee Related
- 2001-07-26 WO PCT/EP2001/008663 patent/WO2002012252A1/en not_active Ceased
- 2001-07-26 AU AU2001293708A patent/AU2001293708A1/en not_active Abandoned
- 2001-07-26 AT AT01974090T patent/ATE327997T1/de not_active IP Right Cessation
- 2001-07-26 DE DE60120178T patent/DE60120178T2/de not_active Expired - Lifetime
- 2001-07-26 EP EP01974090A patent/EP1305320B1/en not_active Expired - Lifetime
- 2001-08-01 TW TW090118730A patent/TW548303B/zh not_active IP Right Cessation
- 2001-08-01 US US09/919,974 patent/US6677392B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2004505984A (ja) | 2004-02-26 |
| US6677392B2 (en) | 2004-01-13 |
| DE60120178D1 (de) | 2006-07-06 |
| ATE327997T1 (de) | 2006-06-15 |
| US20020115753A1 (en) | 2002-08-22 |
| JP4912561B2 (ja) | 2012-04-11 |
| EP1305320B1 (en) | 2006-05-31 |
| DE60120178T2 (de) | 2007-04-26 |
| WO2002012252A1 (en) | 2002-02-14 |
| AU2001293708A1 (en) | 2002-02-18 |
| TW548303B (en) | 2003-08-21 |
| EP1305320A1 (en) | 2003-05-02 |
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