KR20020046928A - 전자 빔 처리 장치 - Google Patents

전자 빔 처리 장치 Download PDF

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Publication number
KR20020046928A
KR20020046928A KR1020010070988A KR20010070988A KR20020046928A KR 20020046928 A KR20020046928 A KR 20020046928A KR 1020010070988 A KR1020010070988 A KR 1020010070988A KR 20010070988 A KR20010070988 A KR 20010070988A KR 20020046928 A KR20020046928 A KR 20020046928A
Authority
KR
South Korea
Prior art keywords
electron beam
beam tube
tube
exit window
processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
KR1020010070988A
Other languages
English (en)
Korean (ko)
Inventor
야마구치마사노리
Original Assignee
다나카 아키히로
우시오덴키 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 다나카 아키히로, 우시오덴키 가부시키가이샤 filed Critical 다나카 아키히로
Publication of KR20020046928A publication Critical patent/KR20020046928A/ko
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J33/00—Discharge tubes with provision for emergence of electrons or ions from the vessel; Lenard tubes
    • H01J33/02—Details
    • H01J33/04—Windows
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0866—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using particle radiation
    • B29C2035/0877—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using particle radiation using electron radiation, e.g. beta-rays

Landscapes

  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physics & Mathematics (AREA)
  • Oral & Maxillofacial Surgery (AREA)
  • Thermal Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Formation Of Insulating Films (AREA)
  • Physical Vapour Deposition (AREA)
  • Welding Or Cutting Using Electron Beams (AREA)
  • Recrystallisation Techniques (AREA)
KR1020010070988A 2000-12-14 2001-11-15 전자 빔 처리 장치 Abandoned KR20020046928A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2000-00379679 2000-12-14
JP2000379679A JP2002182000A (ja) 2000-12-14 2000-12-14 電子ビーム処理装置

Publications (1)

Publication Number Publication Date
KR20020046928A true KR20020046928A (ko) 2002-06-21

Family

ID=18847995

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020010070988A Abandoned KR20020046928A (ko) 2000-12-14 2001-11-15 전자 빔 처리 장치

Country Status (5)

Country Link
US (1) US6881969B2 (enExample)
EP (1) EP1215706A3 (enExample)
JP (1) JP2002182000A (enExample)
KR (1) KR20020046928A (enExample)
TW (1) TW530318B (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7075074B2 (en) 2003-06-26 2006-07-11 Samsung Electronics Co., Ltd. Electron beam inspection apparatus and method for testing an operation state of an electron beam inspection apparatus
US7195936B2 (en) 2002-12-27 2007-03-27 Tokyo Electron Limited Thin film processing method and system

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW486716B (en) * 2000-05-12 2002-05-11 Ushio Electric Inc Electron beam processing device
WO2003067636A1 (fr) * 2002-01-22 2003-08-14 Tokyo Electron Limited Dispositif et procede de traitement de surface
GB0304386D0 (en) * 2003-02-25 2003-04-02 Glaxosmithkline Biolog Sa Novel process
JP4372442B2 (ja) * 2003-03-28 2009-11-25 東京エレクトロン株式会社 電子ビーム処理方法及び電子ビーム処理装置
JP2004335667A (ja) * 2003-05-06 2004-11-25 Tokyo Electron Ltd 表面処理装置
JP2005003564A (ja) * 2003-06-13 2005-01-06 Ushio Inc 電子ビーム管および電子ビーム取り出し用窓
JP4786368B2 (ja) * 2006-02-23 2011-10-05 株式会社アドバンテスト マルチコラム用電子ビーム生成装置
JP4544475B2 (ja) * 2006-03-30 2010-09-15 東京エレクトロン株式会社 変化率予測方法、記憶媒体及び基板処理システム
JP5329050B2 (ja) * 2007-04-20 2013-10-30 株式会社Ｓｅｎ ビーム処理装置
JP6024500B2 (ja) * 2012-03-21 2016-11-16 Ｊｆｅエンジニアリング株式会社 アレイ型粒子線照射装置及びその制御方法
US9383460B2 (en) 2012-05-14 2016-07-05 Bwxt Nuclear Operations Group, Inc. Beam imaging sensor
US9535100B2 (en) 2012-05-14 2017-01-03 Bwxt Nuclear Operations Group, Inc. Beam imaging sensor and method for using same
DE102014001344B4 (de) * 2014-02-02 2015-08-20 Crosslinking AB Elektronenstrahleinheit mit schräg zur Transportrichtung ausgerichteten Heizkathodendrähten sowie Verfahren zur Bestrahlung
DE102014001342A1 (de) * 2014-02-02 2015-08-06 Crosslinking AB Stützkonstruktion mit schräg verlaufenden Kühlkanälen für ein Elektronenaustrittsfenster
JP6532033B2 (ja) * 2015-02-20 2019-06-19 国立大学法人東京農工大学 処理装置及び薄膜の製造方法
US9981312B2 (en) * 2015-05-11 2018-05-29 Wisconsin Alumni Research Foundation Three-dimension printer with mechanically scanned cathode-comb

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3925670A (en) * 1974-01-16 1975-12-09 Systems Science Software Electron beam irradiation of materials using rapidly pulsed cold cathodes
US5414267A (en) * 1993-05-26 1995-05-09 American International Technologies, Inc. Electron beam array for surface treatment
US5909032A (en) * 1995-01-05 1999-06-01 American International Technologies, Inc. Apparatus and method for a modular electron beam system for the treatment of surfaces
US5968605A (en) * 1997-02-27 1999-10-19 Acushnet Company Electron beam radiation curable inks for game balls, golf balls and the like
DE69816426T2 (de) * 1997-03-18 2004-05-06 Dsm N.V. Verfahren zum härten von optikfaserbeschichtungen und druckfarben mittels elektronenstrahlung niedriger energie
US6140657A (en) * 1999-03-17 2000-10-31 American International Technologies, Inc. Sterilization by low energy electron beam
TW464947B (en) 1999-11-29 2001-11-21 Ushio Electric Inc Measuring apparatus of electron beam quantity and processing apparatus of electron beam irradiation

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7195936B2 (en) 2002-12-27 2007-03-27 Tokyo Electron Limited Thin film processing method and system
US7075074B2 (en) 2003-06-26 2006-07-11 Samsung Electronics Co., Ltd. Electron beam inspection apparatus and method for testing an operation state of an electron beam inspection apparatus

Also Published As

Publication number Publication date
US6881969B2 (en) 2005-04-19
TW530318B (en) 2003-05-01
EP1215706A3 (en) 2005-05-04
JP2002182000A (ja) 2002-06-26
US20020074519A1 (en) 2002-06-20
EP1215706A2 (en) 2002-06-19

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