JP4786368B2 - マルチコラム用電子ビーム生成装置 - Google Patents
マルチコラム用電子ビーム生成装置 Download PDFInfo
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- JP4786368B2 JP4786368B2 JP2006046578A JP2006046578A JP4786368B2 JP 4786368 B2 JP4786368 B2 JP 4786368B2 JP 2006046578 A JP2006046578 A JP 2006046578A JP 2006046578 A JP2006046578 A JP 2006046578A JP 4786368 B2 JP4786368 B2 JP 4786368B2
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
- H01J37/3177—Multi-beam, e.g. fly's eye, comb probe
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/061—Construction
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Analytical Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Theoretical Computer Science (AREA)
- Mathematical Physics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Electron Sources, Ion Sources (AREA)
- Electron Beam Exposure (AREA)
Description
図2は、本実施形態に係るマルチコラム電子ビーム露光装置の概略構成図である。
図4は本発明に係るマルチコラム用電子ビーム生成装置101の概略構成図である。
図5は本発明に係るマルチコラム用電子ビーム生成装置の構成の一例を示す図である。本実施形態では、コラムが2つの場合について説明する。
エミッション電流の変動が過渡的な場合とは、例えば、コラム内で放電等が発生し、エミッション電流の変動が極短期間であり、グリッド電圧源の値を変化させることができない場合である。
図6はシングルコラムに対してエミッション電流の安定化を図るセルフバイアス抵抗48を使用した構成をマルチコラムに適用した例を示している。
Claims (3)
- 熱電子を発生させる複数のカソードと、
前記複数のカソードに共通に設けられ、前記カソードに前記熱電子を加速させるための電圧を印加する加速電圧源と、
前記加速電圧源と前記複数のカソードとの間に共通に設けられ、前記複数のカソードからのエミッション電流に応じた電圧降下を生じさせるセルフバイアス抵抗と、
前記複数のカソードの各々に設けられ、前記カソードから放出された前記熱電子を収束させて電子ビームを形成するグリッドと、
前記グリッド毎に設けられ、前記グリッドと前記加速電圧源との間に接続されて前記グリッドに前記カソードの電位に対して負の電圧を印加するグリッド電圧源と、
前記グリッド毎に設けられ、前記カソードとグリッドとの間の電圧を検出する電圧検出器と、
前記グリッド毎に設けられ、前記電圧検出器の出力に基づいて前記カソードとグリッドとの間の電圧の変動を抑制するように前記グリッド電圧源の電圧を制御するグリッド電圧制御部と、
前記グリッド毎に設けられ、前記グリッド電圧源と前記加速電圧源との間に接続されたグリッド抵抗と、
前記グリッド毎に設けられ、前記グリッド電圧源の正極側と前記カソードとの間に接続されて前記グリッド電圧源側から前記カソード側に向かう方向の電流を選択的に通過させる電流方向規制素子と、
を有することを特徴とするマルチコラム用電子ビーム生成装置。 - 前記電流方向規制素子は、ダイオード又はバリスタであることを特徴とする請求項1に記載のマルチコラム用電子ビーム生成装置。
- 前記ダイオードは、前記グリッド電圧源側をアノードとすることを特徴とする請求項2に記載のマルチコラム用電子ビーム生成装置。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006046578A JP4786368B2 (ja) | 2006-02-23 | 2006-02-23 | マルチコラム用電子ビーム生成装置 |
US11/703,848 US7423390B2 (en) | 2006-02-23 | 2007-02-08 | Electron beam generator for multiple columns |
DE102007008228.4A DE102007008228B4 (de) | 2006-02-23 | 2007-02-20 | Elektronenstrahlgenerator für mehrere Säulen |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006046578A JP4786368B2 (ja) | 2006-02-23 | 2006-02-23 | マルチコラム用電子ビーム生成装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007227140A JP2007227140A (ja) | 2007-09-06 |
JP4786368B2 true JP4786368B2 (ja) | 2011-10-05 |
Family
ID=38320075
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006046578A Active JP4786368B2 (ja) | 2006-02-23 | 2006-02-23 | マルチコラム用電子ビーム生成装置 |
Country Status (3)
Country | Link |
---|---|
US (1) | US7423390B2 (ja) |
JP (1) | JP4786368B2 (ja) |
DE (1) | DE102007008228B4 (ja) |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4929090B1 (ja) * | 1970-06-09 | 1974-08-01 | ||
DE3020809A1 (de) * | 1980-06-02 | 1981-12-10 | M.A.N. Maschinenfabrik Augsburg-Nürnberg AG, 8000 München | Verfahren zur herstellung eines elektronenstrahlaustrittsfensters |
US5557105A (en) * | 1991-06-10 | 1996-09-17 | Fujitsu Limited | Pattern inspection apparatus and electron beam apparatus |
DE19621874C2 (de) * | 1996-05-31 | 2000-10-12 | Karlsruhe Forschzent | Quelle zur Erzeugung von großflächigen, gepulsten Ionen- und Elektronenstrahlen |
US6545398B1 (en) * | 1998-12-10 | 2003-04-08 | Advanced Electron Beams, Inc. | Electron accelerator having a wide electron beam that extends further out and is wider than the outer periphery of the device |
JP4246372B2 (ja) * | 2000-11-27 | 2009-04-02 | 株式会社アドバンテスト | 電子ビーム生成装置及び電子ビーム露光装置 |
JP2002182000A (ja) * | 2000-12-14 | 2002-06-26 | Ushio Inc | 電子ビーム処理装置 |
JP2005026241A (ja) * | 2001-04-13 | 2005-01-27 | Advantest Corp | 電子ビーム生成装置、及び電子ビーム露光装置 |
JP2006344527A (ja) * | 2005-06-09 | 2006-12-21 | Tdk Corp | イオン源 |
-
2006
- 2006-02-23 JP JP2006046578A patent/JP4786368B2/ja active Active
-
2007
- 2007-02-08 US US11/703,848 patent/US7423390B2/en active Active
- 2007-02-20 DE DE102007008228.4A patent/DE102007008228B4/de active Active
Also Published As
Publication number | Publication date |
---|---|
US20070296343A1 (en) | 2007-12-27 |
JP2007227140A (ja) | 2007-09-06 |
DE102007008228A1 (de) | 2007-08-30 |
US7423390B2 (en) | 2008-09-09 |
DE102007008228B4 (de) | 2017-05-24 |
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