KR20010031185A - 다층 포토레지스트 공정에 사용하기 위한 열경화성폴리에스테르 반사방지 코팅 - Google Patents

다층 포토레지스트 공정에 사용하기 위한 열경화성폴리에스테르 반사방지 코팅 Download PDF

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Publication number
KR20010031185A
KR20010031185A KR1020007004121A KR20007004121A KR20010031185A KR 20010031185 A KR20010031185 A KR 20010031185A KR 1020007004121 A KR1020007004121 A KR 1020007004121A KR 20007004121 A KR20007004121 A KR 20007004121A KR 20010031185 A KR20010031185 A KR 20010031185A
Authority
KR
South Korea
Prior art keywords
composition
antireflective coating
polyester resin
mixture
hydroxyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020007004121A
Other languages
English (en)
Korean (ko)
Inventor
샤오자이
헤스터콜린
플레임토니디.
브루어테리엘.
Original Assignee
브루어 테리 엘.
브루어 사이언스 인코퍼레이티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 브루어 테리 엘., 브루어 사이언스 인코퍼레이티드 filed Critical 브루어 테리 엘.
Publication of KR20010031185A publication Critical patent/KR20010031185A/ko
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D167/00—Coating compositions based on polyesters obtained by reactions forming a carboxylic ester link in the main chain; Coating compositions based on derivatives of such polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/109—Polyester

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Paints Or Removers (AREA)
  • Materials For Photolithography (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020007004121A 1997-10-20 1998-10-20 다층 포토레지스트 공정에 사용하기 위한 열경화성폴리에스테르 반사방지 코팅 Ceased KR20010031185A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US8/954,425 1997-10-20
US08/954,425 US5935760A (en) 1997-10-20 1997-10-20 Thermosetting polyester anti-reflective coatings for multilayer photoresist processes
PCT/US1998/022143 WO1999021058A1 (en) 1997-10-20 1998-10-20 Thermosetting polyester anti-reflective coatings for multilayer photoresist processes

Publications (1)

Publication Number Publication Date
KR20010031185A true KR20010031185A (ko) 2001-04-16

Family

ID=25495407

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020007004121A Ceased KR20010031185A (ko) 1997-10-20 1998-10-20 다층 포토레지스트 공정에 사용하기 위한 열경화성폴리에스테르 반사방지 코팅

Country Status (9)

Country Link
US (3) US5935760A (enExample)
EP (1) EP1025462B1 (enExample)
JP (2) JP4374483B2 (enExample)
KR (1) KR20010031185A (enExample)
CN (1) CN1276883A (enExample)
CA (1) CA2305461A1 (enExample)
DE (1) DE69807913T2 (enExample)
TW (1) TW446738B (enExample)
WO (1) WO1999021058A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100934436B1 (ko) * 2001-09-26 2009-12-29 롬 앤드 하스 일렉트로닉 머트어리얼즈, 엘.엘.씨 오버코팅된 포토레지스트와 함께 사용하기 위한 코팅 조성물

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US20060057501A1 (en) * 2004-09-15 2006-03-16 Hengpeng Wu Antireflective compositions for photoresists
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Also Published As

Publication number Publication date
TW446738B (en) 2001-07-21
JP2009048210A (ja) 2009-03-05
JP2001521187A (ja) 2001-11-06
EP1025462A4 (en) 2001-01-17
US6080530A (en) 2000-06-27
JP4374483B2 (ja) 2009-12-02
EP1025462B1 (en) 2002-09-11
EP1025462A1 (en) 2000-08-09
CN1276883A (zh) 2000-12-13
US6042990A (en) 2000-03-28
US5935760A (en) 1999-08-10
DE69807913D1 (de) 2002-10-17
WO1999021058A1 (en) 1999-04-29
JP4374502B2 (ja) 2009-12-02
CA2305461A1 (en) 1999-04-29
DE69807913T2 (de) 2003-01-30

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