KR20010030407A - 반도체 처리 장치용 다중면 로봇 블레이드 - Google Patents

반도체 처리 장치용 다중면 로봇 블레이드 Download PDF

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Publication number
KR20010030407A
KR20010030407A KR1020000054286A KR20000054286A KR20010030407A KR 20010030407 A KR20010030407 A KR 20010030407A KR 1020000054286 A KR1020000054286 A KR 1020000054286A KR 20000054286 A KR20000054286 A KR 20000054286A KR 20010030407 A KR20010030407 A KR 20010030407A
Authority
KR
South Korea
Prior art keywords
substrate
blade
robot
support surface
robot blade
Prior art date
Application number
KR1020000054286A
Other languages
English (en)
Korean (ko)
Inventor
아룰쿠라마르 샨무가선드램
마이클피. 카라짐
Original Assignee
조셉 제이. 스위니
어플라이드 머티어리얼스, 인코포레이티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 조셉 제이. 스위니, 어플라이드 머티어리얼스, 인코포레이티드 filed Critical 조셉 제이. 스위니
Publication of KR20010030407A publication Critical patent/KR20010030407A/ko

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67742—Mechanical parts of transfer devices
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/137—Associated with semiconductor wafer handling including means for charging or discharging wafer cassette

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Robotics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Manipulator (AREA)
KR1020000054286A 1999-09-16 2000-09-15 반도체 처리 장치용 다중면 로봇 블레이드 KR20010030407A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US9/398,317 1999-09-16
US09/398,317 US6481951B1 (en) 1999-09-16 1999-09-16 Multiple sided robot blade for semiconductor processing equipment

Publications (1)

Publication Number Publication Date
KR20010030407A true KR20010030407A (ko) 2001-04-16

Family

ID=23574919

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020000054286A KR20010030407A (ko) 1999-09-16 2000-09-15 반도체 처리 장치용 다중면 로봇 블레이드

Country Status (5)

Country Link
US (2) US6481951B1 (fr)
EP (1) EP1085558A3 (fr)
JP (1) JP4596619B2 (fr)
KR (1) KR20010030407A (fr)
TW (1) TW473787B (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20020087160A (ko) * 2001-05-14 2002-11-22 삼성전자 주식회사 기계적 화학적 연마 설비용 웨이퍼 이송장치
KR100775026B1 (ko) * 2006-05-24 2007-11-09 주식회사 오병 수평 이동 로보트용 더스트커버 밀착장치

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW401582B (en) * 1997-05-15 2000-08-11 Tokyo Electorn Limtied Apparatus for and method of transferring substrates
US20050036855A1 (en) * 2003-08-13 2005-02-17 Texas Instruments Incorporated Robot blade for handling of semiconductor waffers
JP4705765B2 (ja) * 2004-07-21 2011-06-22 中村留精密工業株式会社 円板ワークのローダハンド
US7625027B2 (en) * 2005-05-24 2009-12-01 Aries Innovations Vacuum actuated end effector
JP4754296B2 (ja) * 2005-08-11 2011-08-24 東芝機械株式会社 産業用ロボット
JP4864379B2 (ja) * 2005-08-11 2012-02-01 東芝機械株式会社 塗装ロボット
JP4722616B2 (ja) * 2005-08-11 2011-07-13 東芝機械株式会社 産業用ロボット
JP4722617B2 (ja) * 2005-08-11 2011-07-13 東芝機械株式会社 産業用ロボット
KR20080037718A (ko) * 2005-08-16 2008-04-30 요제프 모저 양측 흡입 바아를 갖는 모션 장치
JP2008149407A (ja) * 2006-12-18 2008-07-03 Mitsubishi Heavy Ind Ltd 製造設備
US20080190364A1 (en) * 2007-02-13 2008-08-14 Applied Materials, Inc. Substrate support assembly
CN102371590A (zh) * 2010-08-25 2012-03-14 鸿富锦精密工业（深圳）有限公司 机器人的臂结构
JP6045869B2 (ja) * 2012-10-01 2016-12-14 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法
WO2016187074A1 (fr) * 2015-05-19 2016-11-24 Verselus, Llc Appareil destiné à transporter un objet d'un emplacement à un autre emplacement dans un environnement de fabrication
CN108356836B (zh) * 2018-03-22 2019-05-31 盐城国睿信科技有限公司 一种自动机器人
US20210283779A1 (en) * 2018-07-06 2021-09-16 Kawasaki Jukogyo Kabushiki Kaisha Substrate transfer robot and method of controlling the same
JP2022083862A (ja) * 2020-11-25 2022-06-06 東京エレクトロン株式会社 基板処理装置及び基板処理方法

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US5125790A (en) * 1982-05-24 1992-06-30 Proconics International, Inc. Wafer transfer apparatus
US4915564A (en) * 1986-04-04 1990-04-10 Materials Research Corporation Method and apparatus for handling and processing wafer-like materials
DE3925567A1 (de) * 1989-08-02 1991-02-07 Werner & Kolb Werkzeugmasch Handhabungsgeraet fuer bearbeitungszentren der spanabhebenden fertigung
US5236295A (en) * 1990-06-15 1993-08-17 Tokyo Electron Sagami Limited Arm apparatus for conveying semiconductor wafer and processing system using same
JP2622046B2 (ja) * 1991-11-26 1997-06-18 大日本スクリーン製造株式会社 基板搬送装置
JP2867194B2 (ja) * 1992-02-05 1999-03-08 東京エレクトロン株式会社 処理装置及び処理方法
JP3217110B2 (ja) * 1992-03-16 2001-10-09 富士通株式会社 搬送装置
JPH06318628A (ja) * 1993-05-07 1994-11-15 Fujitsu Ltd 部品搬送方法とそのための装置
JPH07307374A (ja) * 1994-05-10 1995-11-21 Dainippon Screen Mfg Co Ltd 基板保持チャック、基板保持ユニット及び基板処理装置
JP2599571B2 (ja) * 1994-05-11 1997-04-09 ダイトロンテクノロジー株式会社 基板搬送ロボット
US5664925A (en) * 1995-07-06 1997-09-09 Brooks Automation, Inc. Batchloader for load lock
KR100432975B1 (ko) * 1995-07-27 2004-10-22 닛토덴코 가부시키가이샤 반도체웨이퍼의수납·인출장치및이것에이용되는반도체웨이퍼의운반용기
JP3539814B2 (ja) * 1995-10-05 2004-07-07 大日本スクリーン製造株式会社 基板処理装置
US5738574A (en) 1995-10-27 1998-04-14 Applied Materials, Inc. Continuous processing system for chemical mechanical polishing
US5789878A (en) * 1996-07-15 1998-08-04 Applied Materials, Inc. Dual plane robot
US5907895A (en) * 1997-03-03 1999-06-01 Taiwan Semiconductor Manufacturing Co., Ltd. Wafer tweezer assembling device
JP4087925B2 (ja) * 1997-06-12 2008-05-21 大日本印刷株式会社 基板搬送システム
JPH1177566A (ja) * 1997-09-08 1999-03-23 Mecs:Kk 薄型基板の搬送ロボット
US6071055A (en) * 1997-09-30 2000-06-06 Applied Materials, Inc. Front end vacuum processing environment
US5967578A (en) * 1998-05-29 1999-10-19 Sez North America, Inc. Tool for the contact-free support of plate-like substrates

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20020087160A (ko) * 2001-05-14 2002-11-22 삼성전자 주식회사 기계적 화학적 연마 설비용 웨이퍼 이송장치
KR100775026B1 (ko) * 2006-05-24 2007-11-09 주식회사 오병 수평 이동 로보트용 더스트커버 밀착장치

Also Published As

Publication number Publication date
JP2001127139A (ja) 2001-05-11
US20030053903A1 (en) 2003-03-20
US6481951B1 (en) 2002-11-19
EP1085558A3 (fr) 2009-04-29
TW473787B (en) 2002-01-21
US6648588B2 (en) 2003-11-18
JP4596619B2 (ja) 2010-12-08
EP1085558A2 (fr) 2001-03-21

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