KR102944085B1 - 대형 포토마스크 - Google Patents

대형 포토마스크

Info

Publication number
KR102944085B1
KR102944085B1 KR1020247010297A KR20247010297A KR102944085B1 KR 102944085 B1 KR102944085 B1 KR 102944085B1 KR 1020247010297 A KR1020247010297 A KR 1020247010297A KR 20247010297 A KR20247010297 A KR 20247010297A KR 102944085 B1 KR102944085 B1 KR 102944085B1
Authority
KR
South Korea
Prior art keywords
light
film
pattern
blocking
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020247010297A
Other languages
English (en)
Korean (ko)
Other versions
KR20240046289A (ko
Inventor
후유키 곤노
다츠야 미요시
Original Assignee
다이니폰 인사츠 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 다이니폰 인사츠 가부시키가이샤 filed Critical 다이니폰 인사츠 가부시키가이샤
Publication of KR20240046289A publication Critical patent/KR20240046289A/ko
Application granted granted Critical
Publication of KR102944085B1 publication Critical patent/KR102944085B1/ko
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/46—Antireflective coatings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/58—Absorbers, e.g. of opaque materials having two or more different absorber layers, e.g. stacked multilayer absorbers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020247010297A 2018-03-15 2019-03-14 대형 포토마스크 Active KR102944085B1 (ko)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP2018048085 2018-03-15
JPJP-P-2018-048085 2018-03-15
JP2018238508 2018-12-20
JPJP-P-2018-238508 2018-12-20
PCT/JP2019/010647 WO2019177116A1 (ja) 2018-03-15 2019-03-14 大型フォトマスク
KR1020207029308A KR102653366B1 (ko) 2018-03-15 2019-03-14 대형 포토마스크

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020207029308A Division KR102653366B1 (ko) 2018-03-15 2019-03-14 대형 포토마스크

Publications (2)

Publication Number Publication Date
KR20240046289A KR20240046289A (ko) 2024-04-08
KR102944085B1 true KR102944085B1 (ko) 2026-03-27

Family

ID=67906680

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020247010297A Active KR102944085B1 (ko) 2018-03-15 2019-03-14 대형 포토마스크
KR1020207029308A Active KR102653366B1 (ko) 2018-03-15 2019-03-14 대형 포토마스크

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020207029308A Active KR102653366B1 (ko) 2018-03-15 2019-03-14 대형 포토마스크

Country Status (5)

Country Link
JP (3) JP7420065B2 (https=)
KR (2) KR102944085B1 (https=)
CN (1) CN112119352B (https=)
TW (1) TWI711878B (https=)
WO (1) WO2019177116A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2025258A (en) * 2019-05-02 2020-11-05 Asml Netherlands Bv A patterning device

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KR100619661B1 (ko) 2000-12-26 2006-09-05 신에쓰 가가꾸 고교 가부시끼가이샤 포토마스크 블랭크 및 포토마스크
JP2008090254A (ja) 2006-09-04 2008-04-17 Geomatec Co Ltd フォトマスク用基板及びフォトマスク並びにその製造方法
KR101473163B1 (ko) * 2013-07-26 2014-12-16 주식회사 에스앤에스텍 플랫 패널 디스플레이용 블랭크 마스크 및 포토 마스크
JP2015102664A (ja) * 2013-11-25 2015-06-04 Hoya株式会社 フォトマスクの製造方法、フォトマスク及びパターン転写方法

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US4178403A (en) * 1977-08-04 1979-12-11 Konishiroku Photo Industry Co., Ltd. Mask blank and mask
JPH11125896A (ja) * 1997-08-19 1999-05-11 Toppan Printing Co Ltd フォトマスクブランクス及びフォトマスク
DE60238195D1 (de) * 2001-05-31 2010-12-16 Nichia Corp Halbleiterlaserelement
JP4389440B2 (ja) * 2002-10-29 2009-12-24 凸版印刷株式会社 転写マスク及びその作製方法
KR101029162B1 (ko) * 2003-02-03 2011-04-12 호야 가부시키가이샤 포토마스크 블랭크, 포토마스크 및 포토마스크를 이용한 패턴 전사 방법
JP2007156365A (ja) * 2005-12-09 2007-06-21 Canon Inc 反射防止膜、光学素子、光学系、露光装置及びデバイス製造方法
TW200745630A (en) * 2006-04-24 2007-12-16 Asahi Glass Co Ltd Blank, black matrix, and color filter
US8198118B2 (en) * 2006-10-31 2012-06-12 Taiwan Semiconductor Manufacturing Co. Method for forming a robust mask with reduced light scattering
JP2008311498A (ja) * 2007-06-15 2008-12-25 Orc Mfg Co Ltd 反射型露光装置
WO2008139904A1 (ja) * 2007-04-27 2008-11-20 Hoya Corporation フォトマスクブランク及びフォトマスク
JP2009229868A (ja) * 2008-03-24 2009-10-08 Hoya Corp グレートーンマスクの製造方法及びグレートーンマスク、並びにパターン転写方法
KR20090110240A (ko) * 2008-04-16 2009-10-21 지오마텍 가부시키가이샤 포토마스크용 기판, 포토마스크 및 그의 제조방법
KR20110115058A (ko) * 2010-04-14 2011-10-20 주식회사 에스앤에스텍 포토마스크 블랭크, 포토마스크 및 패턴 형성 방법
WO2013058385A1 (ja) * 2011-10-21 2013-04-25 大日本印刷株式会社 大型位相シフトマスクおよび大型位相シフトマスクの製造方法
JP6080915B2 (ja) 2014-08-25 2017-02-15 エスアンドエス テック カンパニー リミテッド 位相反転ブランクマスク及びフォトマスク
JP6594742B2 (ja) * 2014-11-20 2019-10-23 Ｈｏｙａ株式会社 フォトマスクブランク及びそれを用いたフォトマスクの製造方法、並びに表示装置の製造方法
JP6301383B2 (ja) * 2015-03-27 2018-03-28 Hoya株式会社 フォトマスクブランク及びこれを用いたフォトマスクの製造方法、並びに表示装置の製造方法
KR101846065B1 (ko) * 2015-03-27 2018-04-05 호야 가부시키가이샤 포토마스크 블랭크 및 이것을 사용한 포토마스크의 제조 방법, 및 표시 장치의 제조 방법
KR20160129789A (ko) * 2015-04-30 2016-11-09 주식회사 에스앤에스텍 플랫 패널 디스플레이용 위상반전 블랭크 마스크 및 포토마스크
JP6352224B2 (ja) 2015-07-17 2018-07-04 Hoya株式会社 位相シフトマスクブランク及びこれを用いた位相シフトマスクの製造方法、並びに表示装置の製造方法
JP6853957B2 (ja) * 2015-07-23 2021-04-07 三菱瓦斯化学株式会社 新規（メタ）アクリロイル化合物及びその製造方法
JP6451561B2 (ja) * 2015-09-03 2019-01-16 信越化学工業株式会社 フォトマスクブランク
JP7125835B2 (ja) * 2016-04-05 2022-08-25 旭化成株式会社 ペリクル
JP6891099B2 (ja) 2017-01-16 2021-06-18 Hoya株式会社 位相シフトマスクブランクおよびこれを用いた位相シフトマスクの製造方法、並びに表示装置の製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100619661B1 (ko) 2000-12-26 2006-09-05 신에쓰 가가꾸 고교 가부시끼가이샤 포토마스크 블랭크 및 포토마스크
JP2008090254A (ja) 2006-09-04 2008-04-17 Geomatec Co Ltd フォトマスク用基板及びフォトマスク並びにその製造方法
KR101473163B1 (ko) * 2013-07-26 2014-12-16 주식회사 에스앤에스텍 플랫 패널 디스플레이용 블랭크 마스크 및 포토 마스크
JP2015102664A (ja) * 2013-11-25 2015-06-04 Hoya株式会社 フォトマスクの製造方法、フォトマスク及びパターン転写方法

Also Published As

Publication number Publication date
TWI711878B (zh) 2020-12-01
TW201945832A (zh) 2019-12-01
JP2024001250A (ja) 2024-01-09
JPWO2019177116A1 (ja) 2021-02-25
CN112119352B (zh) 2024-07-26
KR102653366B1 (ko) 2024-04-02
JP7420065B2 (ja) 2024-01-23
WO2019177116A1 (ja) 2019-09-19
KR20240046289A (ko) 2024-04-08
JP2025122138A (ja) 2025-08-20
CN112119352A (zh) 2020-12-22
KR20200128141A (ko) 2020-11-11

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