KR102923641B1 - Fpd용의 포토마스크, fpd용의 포토마스크에 있어서의 위치 계측용 마크의 형성 방법 및 fpd용의 포토마스크의 제조 방법 - Google Patents

Fpd용의 포토마스크, fpd용의 포토마스크에 있어서의 위치 계측용 마크의 형성 방법 및 fpd용의 포토마스크의 제조 방법

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Publication number
KR102923641B1
KR102923641B1 KR1020230004397A KR20230004397A KR102923641B1 KR 102923641 B1 KR102923641 B1 KR 102923641B1 KR 1020230004397 A KR1020230004397 A KR 1020230004397A KR 20230004397 A KR20230004397 A KR 20230004397A KR 102923641 B1 KR102923641 B1 KR 102923641B1
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KR
South Korea
Prior art keywords
photomask
position measurement
film
fpd
mark
Prior art date
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KR1020230004397A
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English (en)
Korean (ko)
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KR20230120090A (ko
Inventor
마사노리 하시모토
Original Assignee
가부시키가이샤 에스케이 일렉트로닉스
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Publication of KR20230120090A publication Critical patent/KR20230120090A/ko
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Publication of KR102923641B1 publication Critical patent/KR102923641B1/ko
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/42—Alignment or registration features, e.g. alignment marks on the mask substrates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020230004397A 2022-02-08 2023-01-12 Fpd용의 포토마스크, fpd용의 포토마스크에 있어서의 위치 계측용 마크의 형성 방법 및 fpd용의 포토마스크의 제조 방법 Active KR102923641B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022018326A JP7802562B2 (ja) 2022-02-08 2022-02-08 Ｆｐｄ用のフォトマスク、ｆｐｄ用のフォトマスクにおける位置計測用マークの形成方法及びｆｐｄ用のフォトマスクの製造方法
JPJP-P-2022-018326 2022-02-08

Publications (2)

Publication Number Publication Date
KR20230120090A KR20230120090A (ko) 2023-08-16
KR102923641B1 true KR102923641B1 (ko) 2026-02-05

Family

ID=87540130

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020230004397A Active KR102923641B1 (ko) 2022-02-08 2023-01-12 Fpd용의 포토마스크, fpd용의 포토마스크에 있어서의 위치 계측용 마크의 형성 방법 및 fpd용의 포토마스크의 제조 방법

Country Status (4)

Country Link
JP (1) JP7802562B2 (https=)
KR (1) KR102923641B1 (https=)
CN (1) CN116577961A (https=)
TW (1) TWI866050B (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117452778B (zh) * 2023-11-08 2024-12-13 深圳清溢微电子有限公司 掩膜版二次曝光自动对位方法、装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000077308A (ja) * 1998-08-31 2000-03-14 Mitsubishi Electric Corp 半導体装置の製造方法
JP2001201844A (ja) 2000-01-21 2001-07-27 Hitachi Ltd 半導体集積回路装置の製造方法およびフォトマスクの製造方法
JP2010122349A (ja) * 2008-11-18 2010-06-03 Dainippon Printing Co Ltd 階調マスク
US20120141926A1 (en) 2010-12-03 2012-06-07 Shenzhen China Star Optoelectronics Technology Co., Ltd. Lcd panel photolithography process and mask
JP2017102304A (ja) 2015-12-02 2017-06-08 株式会社エスケーエレクトロニクス アライメントパターンを有するフォトマスクブランクスならびにそれを用いたフォトマスクおよびその製造方法

Family Cites Families (13)

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JP3372685B2 (ja) * 1994-12-15 2003-02-04 キヤノン株式会社 半導体露光装置
JPH11288076A (ja) * 1998-04-02 1999-10-19 Toshiba Corp 位相シフトマスク及びその製造方法並びに重ね合わせ精度測定用マークを用いた測定方法
JP3035297B1 (ja) * 1999-05-27 2000-04-24 株式会社ケムテックジャパン プリント基板の製造装置および製造方法
TW519701B (en) * 2001-12-28 2003-02-01 United Microelectronics Corp Overlay mark structure and its measurement application
JP4604443B2 (ja) * 2002-12-19 2011-01-05 株式会社ニコン 繋ぎ合わせ測定装置および分割露光用マスク
WO2005116577A1 (ja) * 2004-05-28 2005-12-08 Nikon Corporation 結像光学系の調整方法、結像装置、位置ずれ検出装置、マ－ク識別装置及びエッジ位置検出装置
TWI271811B (en) * 2005-01-13 2007-01-21 Ind Tech Res Inst Overlay measurement target
JP2007248802A (ja) * 2006-03-16 2007-09-27 Hoya Corp パターン形成方法及びグレートーンマスクの製造方法
JP5326282B2 (ja) * 2008-01-10 2013-10-30 富士通セミコンダクター株式会社 半導体装置とその製造方法、及び露光用マスク
JP2009282386A (ja) * 2008-05-23 2009-12-03 Toyota Motor Corp フォトマスクと半導体チップの製造方法
JP5306391B2 (ja) * 2011-03-02 2013-10-02 株式会社東芝 フォトマスク
US11048159B2 (en) * 2016-03-31 2021-06-29 Hoya Corporation Method for manufacturing reflective mask blank, reflective mask blank, method for manufacturing reflective mask, reflective mask, and method for manufacturing semiconductor device
CN109468593A (zh) * 2018-12-04 2019-03-15 京东方科技集团股份有限公司 一种显示面板的制备方法、显示面板及蒸镀装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000077308A (ja) * 1998-08-31 2000-03-14 Mitsubishi Electric Corp 半導体装置の製造方法
JP2001201844A (ja) 2000-01-21 2001-07-27 Hitachi Ltd 半導体集積回路装置の製造方法およびフォトマスクの製造方法
JP2010122349A (ja) * 2008-11-18 2010-06-03 Dainippon Printing Co Ltd 階調マスク
US20120141926A1 (en) 2010-12-03 2012-06-07 Shenzhen China Star Optoelectronics Technology Co., Ltd. Lcd panel photolithography process and mask
JP2017102304A (ja) 2015-12-02 2017-06-08 株式会社エスケーエレクトロニクス アライメントパターンを有するフォトマスクブランクスならびにそれを用いたフォトマスクおよびその製造方法

Also Published As

Publication number Publication date
JP2023115863A (ja) 2023-08-21
KR20230120090A (ko) 2023-08-16
CN116577961A (zh) 2023-08-11
TW202332984A (zh) 2023-08-16
TWI866050B (zh) 2024-12-11
JP7802562B2 (ja) 2026-01-20

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