KR102848182B1 - 벌크 음향 파 공진기 - Google Patents
벌크 음향 파 공진기Info
- Publication number
- KR102848182B1 KR102848182B1 KR1020190035987A KR20190035987A KR102848182B1 KR 102848182 B1 KR102848182 B1 KR 102848182B1 KR 1020190035987 A KR1020190035987 A KR 1020190035987A KR 20190035987 A KR20190035987 A KR 20190035987A KR 102848182 B1 KR102848182 B1 KR 102848182B1
- Authority
- KR
- South Korea
- Prior art keywords
- layer
- piezoelectric layer
- overmode
- baw resonator
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/02—Details
- H03H9/02007—Details of bulk acoustic wave devices
- H03H9/02062—Details relating to the vibration mode
- H03H9/02078—Details relating to the vibration mode the vibration mode being overmoded
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
- H03H9/17—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
- H03H9/17—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
- H03H9/171—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator implemented with thin-film techniques, i.e. of the film bulk acoustic resonator [FBAR] type
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/02—Details
- H03H9/02007—Details of bulk acoustic wave devices
- H03H9/02015—Characteristics of piezoelectric layers, e.g. cutting angles
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/02—Details
- H03H9/02007—Details of bulk acoustic wave devices
- H03H9/02047—Treatment of substrates
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/02—Details
- H03H9/02007—Details of bulk acoustic wave devices
- H03H9/02157—Dimensional parameters, e.g. ratio between two dimension parameters, length, width or thickness
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/02—Details
- H03H9/125—Driving means, e.g. electrodes, coils
- H03H9/13—Driving means, e.g. electrodes, coils for networks consisting of piezoelectric or electrostrictive materials
- H03H9/131—Driving means, e.g. electrodes, coils for networks consisting of piezoelectric or electrostrictive materials consisting of a multilayered structure
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
- H03H9/17—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
- H03H9/171—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator implemented with thin-film techniques, i.e. of the film bulk acoustic resonator [FBAR] type
- H03H9/172—Means for mounting on a substrate, i.e. means constituting the material interface confining the waves to a volume
- H03H9/174—Membranes
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
- H03H9/17—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
- H03H9/171—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator implemented with thin-film techniques, i.e. of the film bulk acoustic resonator [FBAR] type
- H03H9/172—Means for mounting on a substrate, i.e. means constituting the material interface confining the waves to a volume
- H03H9/175—Acoustic mirrors
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020250113019A KR20250128936A (ko) | 2018-03-28 | 2025-08-14 | 벌크 음향 파 공진기 |
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201862649343P | 2018-03-28 | 2018-03-28 | |
| US62/649,343 | 2018-03-28 | ||
| US16/290,175 US11152913B2 (en) | 2018-03-28 | 2019-03-01 | Bulk acoustic wave (BAW) resonator |
| US16/290,175 | 2019-03-01 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020250113019A Division KR20250128936A (ko) | 2018-03-28 | 2025-08-14 | 벌크 음향 파 공진기 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20190113674A KR20190113674A (ko) | 2019-10-08 |
| KR102848182B1 true KR102848182B1 (ko) | 2025-08-21 |
Family
ID=68055068
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020190035987A Active KR102848182B1 (ko) | 2018-03-28 | 2019-03-28 | 벌크 음향 파 공진기 |
| KR1020250113019A Pending KR20250128936A (ko) | 2018-03-28 | 2025-08-14 | 벌크 음향 파 공진기 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020250113019A Pending KR20250128936A (ko) | 2018-03-28 | 2025-08-14 | 벌크 음향 파 공진기 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US11152913B2 (https=) |
| JP (3) | JP2019176475A (https=) |
| KR (2) | KR102848182B1 (https=) |
| CN (2) | CN120377860A (https=) |
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| US10333494B2 (en) | 2014-12-24 | 2019-06-25 | Qorvo Us, Inc. | Simplified acoustic RF resonator parallel capacitance compensation |
| US10581403B2 (en) | 2016-07-11 | 2020-03-03 | Qorvo Us, Inc. | Device having a titanium-alloyed surface |
| US11165413B2 (en) | 2017-01-30 | 2021-11-02 | Qorvo Us, Inc. | Coupled resonator structure |
| US11165412B2 (en) | 2017-01-30 | 2021-11-02 | Qorvo Us, Inc. | Zero-output coupled resonator filter and related radio frequency filter circuit |
| US10873318B2 (en) | 2017-06-08 | 2020-12-22 | Qorvo Us, Inc. | Filter circuits having acoustic wave resonators in a transversal configuration |
| US11146247B2 (en) | 2019-07-25 | 2021-10-12 | Qorvo Us, Inc. | Stacked crystal filter structures |
| WO2021021723A1 (en) * | 2019-07-31 | 2021-02-04 | QXONIX Inc. | Acoustic device structures, devices and systems |
| US20230246629A1 (en) * | 2019-07-31 | 2023-08-03 | QXONIX Inc. | Layers, structures, acoustic wave resonators, devices, circuits and systems |
| US11757430B2 (en) | 2020-01-07 | 2023-09-12 | Qorvo Us, Inc. | Acoustic filter circuit for noise suppression outside resonance frequency |
| US11146245B2 (en) | 2020-01-13 | 2021-10-12 | Qorvo Us, Inc. | Mode suppression in acoustic resonators |
| US11146246B2 (en) | 2020-01-13 | 2021-10-12 | Qorvo Us, Inc. | Phase shift structures for acoustic resonators |
| JP2021136675A (ja) * | 2020-02-28 | 2021-09-13 | 学校法人早稲田大学 | 圧電素子 |
| US11632097B2 (en) | 2020-11-04 | 2023-04-18 | Qorvo Us, Inc. | Coupled resonator filter device |
| CN112615599B (zh) * | 2020-11-27 | 2022-11-15 | 中国电子科技集团公司第十三研究所 | 薄膜腔声谐振器的Mason电路模型 |
| US11575363B2 (en) | 2021-01-19 | 2023-02-07 | Qorvo Us, Inc. | Hybrid bulk acoustic wave filter |
| JP7627174B2 (ja) * | 2021-05-31 | 2025-02-05 | 太陽誘電株式会社 | ラダー型フィルタおよびマルチプレクサ |
| US12362724B2 (en) * | 2021-08-20 | 2025-07-15 | Raytheon Company | N-polar rare-earth III-nitride bulk acoustic wave resonator |
| US12170515B2 (en) | 2022-01-31 | 2024-12-17 | Qorvo Us, Inc. | Reversed semilattice filter |
| DE102022203971A1 (de) | 2022-04-25 | 2023-10-26 | Robert Bosch Gesellschaft mit beschränkter Haftung | Volumenakustische Vorrichtung und Verfahren zum Herstellen einer volumenakustischen Vorrichtung |
| US12562713B2 (en) * | 2023-02-03 | 2026-02-24 | Qorvo Us, Inc. | Acoustic resonator structure with improved temperature coefficient of frequency (TCF) |
| CN116169972B (zh) * | 2023-02-10 | 2026-04-24 | 武汉敏声新技术有限公司 | 谐振器的制作方法及谐振器 |
| WO2024187579A1 (zh) * | 2023-03-10 | 2024-09-19 | 中国科学院上海微系统与信息技术研究所 | 体声波谐振器及其制备方法 |
| US12587172B2 (en) | 2023-03-15 | 2026-03-24 | Qorvo Us, Inc. | Pin reconfigurable baw filters |
| US20250141425A1 (en) * | 2023-10-30 | 2025-05-01 | Avago Technologies International Sales Pte. Limited | Acoustic resonator devices operating at high-order modes |
| CN118249774B (zh) * | 2024-05-21 | 2024-09-20 | 河源市艾佛光通科技有限公司 | 一种体声波谐振器及其制备方法 |
| CN119582788B (zh) * | 2025-02-08 | 2025-06-06 | 深圳新声半导体有限公司 | 一种用于体声波滤波器的制作方法以及体声波滤波器 |
Citations (2)
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| US20130193808A1 (en) * | 2012-01-31 | 2013-08-01 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Film bulk acoustic resonator with multi-layers of different piezoelectric materials and method of making |
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2019
- 2019-03-01 US US16/290,175 patent/US11152913B2/en active Active
- 2019-03-25 CN CN202510444667.9A patent/CN120377860A/zh active Pending
- 2019-03-25 CN CN201910229019.6A patent/CN110324020B/zh active Active
- 2019-03-26 JP JP2019058733A patent/JP2019176475A/ja not_active Ceased
- 2019-03-28 KR KR1020190035987A patent/KR102848182B1/ko active Active
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2023
- 2023-12-26 JP JP2023219116A patent/JP7678869B2/ja active Active
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2025
- 2025-05-02 JP JP2025076565A patent/JP7833595B2/ja active Active
- 2025-08-14 KR KR1020250113019A patent/KR20250128936A/ko active Pending
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Also Published As
| Publication number | Publication date |
|---|---|
| JP7833595B2 (ja) | 2026-03-19 |
| US20190305752A1 (en) | 2019-10-03 |
| JP2025111783A (ja) | 2025-07-30 |
| CN110324020A (zh) | 2019-10-11 |
| CN120377860A (zh) | 2025-07-25 |
| KR20250128936A (ko) | 2025-08-28 |
| JP2019176475A (ja) | 2019-10-10 |
| JP2024029118A (ja) | 2024-03-05 |
| US11152913B2 (en) | 2021-10-19 |
| JP7678869B2 (ja) | 2025-05-16 |
| KR20190113674A (ko) | 2019-10-08 |
| CN110324020B (zh) | 2025-04-08 |
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