KR102657651B1 - 적외선 흡수 유리판 및 그 제조 방법, 그리고 고체 촬상 소자 디바이스 - Google Patents
적외선 흡수 유리판 및 그 제조 방법, 그리고 고체 촬상 소자 디바이스 Download PDFInfo
- Publication number
- KR102657651B1 KR102657651B1 KR1020187014209A KR20187014209A KR102657651B1 KR 102657651 B1 KR102657651 B1 KR 102657651B1 KR 1020187014209 A KR1020187014209 A KR 1020187014209A KR 20187014209 A KR20187014209 A KR 20187014209A KR 102657651 B1 KR102657651 B1 KR 102657651B1
- Authority
- KR
- South Korea
- Prior art keywords
- infrared
- glass plate
- absorbing glass
- base material
- manufacturing
- Prior art date
Links
- 239000011521 glass Substances 0.000 title claims abstract description 230
- 238000003384 imaging method Methods 0.000 title claims abstract description 32
- 238000004519 manufacturing process Methods 0.000 title claims description 28
- 229910019142 PO4 Inorganic materials 0.000 claims abstract description 17
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims abstract description 17
- 239000010452 phosphate Substances 0.000 claims abstract description 17
- 239000000463 material Substances 0.000 claims description 41
- 239000002585 base Substances 0.000 claims description 38
- 239000010408 film Substances 0.000 claims description 27
- 238000005498 polishing Methods 0.000 claims description 25
- 238000000034 method Methods 0.000 claims description 23
- 239000003599 detergent Substances 0.000 claims description 22
- 238000010521 absorption reaction Methods 0.000 claims description 21
- 238000005530 etching Methods 0.000 claims description 16
- 230000007423 decrease Effects 0.000 claims description 15
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 10
- 239000012788 optical film Substances 0.000 claims description 10
- 238000013001 point bending Methods 0.000 claims description 7
- 239000002253 acid Substances 0.000 claims description 6
- 239000011159 matrix material Substances 0.000 claims description 6
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims description 5
- 229910052731 fluorine Inorganic materials 0.000 claims description 5
- 239000011737 fluorine Substances 0.000 claims description 5
- 239000000853 adhesive Substances 0.000 claims description 4
- 230000001070 adhesive effect Effects 0.000 claims description 4
- 238000007517 polishing process Methods 0.000 claims description 4
- 229910052708 sodium Inorganic materials 0.000 claims description 4
- 150000001447 alkali salts Chemical class 0.000 claims description 3
- 230000003287 optical effect Effects 0.000 description 11
- 238000002844 melting Methods 0.000 description 10
- 230000008018 melting Effects 0.000 description 10
- 239000011734 sodium Substances 0.000 description 9
- 239000000203 mixture Substances 0.000 description 7
- 238000002834 transmittance Methods 0.000 description 7
- 238000000465 moulding Methods 0.000 description 6
- DWYMPOCYEZONEA-UHFFFAOYSA-L fluoridophosphate Chemical compound [O-]P([O-])(F)=O DWYMPOCYEZONEA-UHFFFAOYSA-L 0.000 description 5
- 239000012790 adhesive layer Substances 0.000 description 4
- 238000005336 cracking Methods 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 238000005520 cutting process Methods 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 239000002244 precipitate Substances 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 238000004017 vitrification Methods 0.000 description 4
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 3
- -1 Ta 2 O 5 Inorganic materials 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- CBGRVDWJLGIURA-UHFFFAOYSA-J C(C)(=O)[O-].[Na+].[Na+].[Na+].[Na+].NCCNCCN.C(C)(=O)[O-].C(C)(=O)[O-].C(C)(=O)[O-] Chemical compound C(C)(=O)[O-].[Na+].[Na+].[Na+].[Na+].NCCNCCN.C(C)(=O)[O-].C(C)(=O)[O-].C(C)(=O)[O-] CBGRVDWJLGIURA-UHFFFAOYSA-J 0.000 description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000004031 devitrification Methods 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 238000007372 rollout process Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- 229910016569 AlF 3 Inorganic materials 0.000 description 1
- 229910004261 CaF 2 Inorganic materials 0.000 description 1
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229910021193 La 2 O 3 Inorganic materials 0.000 description 1
- 229910018068 Li 2 O Inorganic materials 0.000 description 1
- QPCDCPDFJACHGM-UHFFFAOYSA-N N,N-bis{2-[bis(carboxymethyl)amino]ethyl}glycine Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(=O)O)CCN(CC(O)=O)CC(O)=O QPCDCPDFJACHGM-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000003667 anti-reflective effect Effects 0.000 description 1
- 235000019445 benzyl alcohol Nutrition 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000002738 chelating agent Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000003280 down draw process Methods 0.000 description 1
- 159000000011 group IA salts Chemical class 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- MGFYIUFZLHCRTH-UHFFFAOYSA-N nitrilotriacetic acid Chemical compound OC(=O)CN(CC(O)=O)CC(O)=O MGFYIUFZLHCRTH-UHFFFAOYSA-N 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 159000000001 potassium salts Chemical class 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- DZCAZXAJPZCSCU-UHFFFAOYSA-K sodium nitrilotriacetate Chemical compound [Na+].[Na+].[Na+].[O-]C(=O)CN(CC([O-])=O)CC([O-])=O DZCAZXAJPZCSCU-UHFFFAOYSA-K 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- UEUXEKPTXMALOB-UHFFFAOYSA-J tetrasodium;2-[2-[bis(carboxylatomethyl)amino]ethyl-(carboxylatomethyl)amino]acetate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-]C(=O)CN(CC([O-])=O)CCN(CC([O-])=O)CC([O-])=O UEUXEKPTXMALOB-UHFFFAOYSA-J 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/08—Compositions for glass with special properties for glass selectively absorbing radiation of specified wave lengths
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C19/00—Surface treatment of glass, not in the form of fibres or filaments, by mechanical means
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/12—Silica-free oxide glass compositions
- C03C3/16—Silica-free oxide glass compositions containing phosphorus
- C03C3/17—Silica-free oxide glass compositions containing phosphorus containing aluminium or beryllium
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Mechanical Engineering (AREA)
- Glass Compositions (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
- Surface Treatment Of Glass (AREA)
- Solid State Image Pick-Up Elements (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016078768 | 2016-04-11 | ||
| JPJP-P-2016-078768 | 2016-04-11 | ||
| JPJP-P-2016-153687 | 2016-08-04 | ||
| JP2016153687A JP6811053B2 (ja) | 2016-04-11 | 2016-08-04 | 赤外線吸収ガラス板及びその製造方法、並びに固体撮像素子デバイス |
| PCT/JP2017/005266 WO2017179283A1 (ja) | 2016-04-11 | 2017-02-14 | 赤外線吸収ガラス板及びその製造方法、並びに固体撮像素子デバイス |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20180132597A KR20180132597A (ko) | 2018-12-12 |
| KR102657651B1 true KR102657651B1 (ko) | 2024-04-15 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020187014209A KR102657651B1 (ko) | 2016-04-11 | 2017-02-14 | 적외선 흡수 유리판 및 그 제조 방법, 그리고 고체 촬상 소자 디바이스 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP6811053B2 (ja) |
| KR (1) | KR102657651B1 (ja) |
| CN (1) | CN108367966B (ja) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2019055889A (ja) * | 2017-09-20 | 2019-04-11 | 日本電気硝子株式会社 | 赤外線吸収ガラス板及びその製造方法、並びに固体撮像素子デバイス |
| WO2020059431A1 (ja) | 2018-09-20 | 2020-03-26 | 日本電気硝子株式会社 | 赤外線吸収ガラスの製造方法 |
| JP7445189B2 (ja) | 2019-03-22 | 2024-03-07 | 日本電気硝子株式会社 | ガラス板及びその製造方法 |
| WO2020195438A1 (ja) * | 2019-03-22 | 2020-10-01 | 日本電気硝子株式会社 | ガラス板及びその製造方法 |
| CN113511813B (zh) * | 2021-06-28 | 2022-03-04 | 成都光明光电有限责任公司 | 一种用于激光玻璃的包边玻璃及其制备方法和应用 |
Citations (5)
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|---|---|---|---|---|
| JP2007317719A (ja) * | 2006-05-23 | 2007-12-06 | Fujitsu Ltd | 撮像装置及びその製造方法 |
| JP2010168262A (ja) * | 2008-03-31 | 2010-08-05 | Asahi Glass Co Ltd | 板状光学ガラス及び板状光学ガラスの端面処理方法 |
| JP5126111B2 (ja) * | 2009-02-24 | 2013-01-23 | 旭硝子株式会社 | 近赤外線カットフィルタガラスおよびその製造方法 |
| JP2014222330A (ja) * | 2013-05-14 | 2014-11-27 | 株式会社ニコン | ガラス基板の表面処理方法およびフォトマスクの再生方法 |
| JP2015089855A (ja) * | 2013-11-05 | 2015-05-11 | 日本電気硝子株式会社 | 近赤外線吸収ガラス |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5126111B2 (ja) * | 1971-10-29 | 1976-08-04 | ||
| JPS6049142B2 (ja) * | 1978-04-17 | 1985-10-31 | 株式会社保谷硝子 | カラ−・テレビジョン・カメラ用近赤外吸収フイルタ− |
| JPH0578148A (ja) * | 1991-02-28 | 1993-03-30 | Asahi Glass Co Ltd | 近赤外カツトフイルターガラス |
| JP4034056B2 (ja) * | 2000-09-13 | 2008-01-16 | 日本板硝子株式会社 | 非晶質材料の加工方法 |
| JP2006248850A (ja) * | 2005-03-11 | 2006-09-21 | Sumita Optical Glass Inc | 近赤外吸収フィルタ用ガラス |
| JP5609090B2 (ja) * | 2009-12-08 | 2014-10-22 | 旭硝子株式会社 | 近赤外線カットフィルタガラス |
| JP5445197B2 (ja) * | 2010-02-12 | 2014-03-19 | 旭硝子株式会社 | 近赤外線カットフィルタガラスおよび近赤外線カットフィルタガラスの製造方法 |
| JP5659499B2 (ja) * | 2010-02-19 | 2015-01-28 | 旭硝子株式会社 | 近赤外線カットフィルタガラス |
| JPWO2011132786A1 (ja) * | 2010-04-23 | 2013-07-18 | 旭硝子株式会社 | 紫外線透過型近赤外線カットフィルタガラス |
| US20120052302A1 (en) * | 2010-08-24 | 2012-03-01 | Matusick Joseph M | Method of strengthening edge of glass article |
| JP2012083659A (ja) * | 2010-10-14 | 2012-04-26 | Nsc:Kk | 電子装置用ガラス基板の製造方法 |
| DE102012103077B4 (de) * | 2012-04-10 | 2017-06-22 | Schott Ag | Infrarot-absorbierender Glas-Wafer und Verfahren zu dessen Herstellung |
| DE102012210552B4 (de) * | 2012-06-22 | 2014-06-05 | Schott Ag | Farbgläser, Verfahren zu ihrer Herstellung und Verwendung |
| WO2015182300A1 (ja) * | 2014-05-29 | 2015-12-03 | 旭硝子株式会社 | 光学ガラスおよびガラス基板の切断方法 |
-
2016
- 2016-08-04 JP JP2016153687A patent/JP6811053B2/ja active Active
-
2017
- 2017-02-14 KR KR1020187014209A patent/KR102657651B1/ko active IP Right Grant
- 2017-02-14 CN CN201780004742.3A patent/CN108367966B/zh active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007317719A (ja) * | 2006-05-23 | 2007-12-06 | Fujitsu Ltd | 撮像装置及びその製造方法 |
| JP2010168262A (ja) * | 2008-03-31 | 2010-08-05 | Asahi Glass Co Ltd | 板状光学ガラス及び板状光学ガラスの端面処理方法 |
| JP5126111B2 (ja) * | 2009-02-24 | 2013-01-23 | 旭硝子株式会社 | 近赤外線カットフィルタガラスおよびその製造方法 |
| JP2014222330A (ja) * | 2013-05-14 | 2014-11-27 | 株式会社ニコン | ガラス基板の表面処理方法およびフォトマスクの再生方法 |
| JP2015089855A (ja) * | 2013-11-05 | 2015-05-11 | 日本電気硝子株式会社 | 近赤外線吸収ガラス |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20180132597A (ko) | 2018-12-12 |
| JP6811053B2 (ja) | 2021-01-13 |
| CN108367966B (zh) | 2021-07-27 |
| CN108367966A (zh) | 2018-08-03 |
| JP2017190282A (ja) | 2017-10-19 |
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