KR102481090B1 - 고굴절률 경화막 형성용 수지 조성물 - Google Patents
고굴절률 경화막 형성용 수지 조성물 Download PDFInfo
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- KR102481090B1 KR102481090B1 KR1020227005530A KR20227005530A KR102481090B1 KR 102481090 B1 KR102481090 B1 KR 102481090B1 KR 1020227005530 A KR1020227005530 A KR 1020227005530A KR 20227005530 A KR20227005530 A KR 20227005530A KR 102481090 B1 KR102481090 B1 KR 102481090B1
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- meth
- refractive index
- cured film
- high refractive
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
- C08F297/02—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
- C08F297/026—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type polymerising acrylic acid, methacrylic acid or derivatives thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/04—Acids; Metal salts or ammonium salts thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/10—Esters
- C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
- C08F222/103—Esters of polyhydric alcohols or polyhydric phenols of trialcohols, e.g. trimethylolpropane tri(meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/10—Esters
- C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
- C08F222/104—Esters of polyhydric alcohols or polyhydric phenols of tetraalcohols, e.g. pentaerythritol tetra(meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/10—Esters
- C08F222/12—Esters of phenols or saturated alcohols
- C08F222/20—Esters containing oxygen in addition to the carboxy oxygen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
- C08F297/02—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
- C08F297/023—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type using a coupling agent
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Theoretical Computer Science (AREA)
- Inorganic Chemistry (AREA)
- Human Computer Interaction (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Polymerisation Methods In General (AREA)
- Graft Or Block Polymers (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2016-070687 | 2016-03-31 | ||
JP2016070687 | 2016-03-31 | ||
PCT/JP2017/012864 WO2017170668A1 (ja) | 2016-03-31 | 2017-03-29 | 高屈折率硬化膜形成用樹脂組成物 |
KR1020187028073A KR20180132657A (ko) | 2016-03-31 | 2017-03-29 | 고굴절률 경화막 형성용 수지 조성물 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020187028073A Division KR20180132657A (ko) | 2016-03-31 | 2017-03-29 | 고굴절률 경화막 형성용 수지 조성물 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20220027275A KR20220027275A (ko) | 2022-03-07 |
KR102481090B1 true KR102481090B1 (ko) | 2022-12-27 |
Family
ID=59965938
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020187028073A KR20180132657A (ko) | 2016-03-31 | 2017-03-29 | 고굴절률 경화막 형성용 수지 조성물 |
KR1020227005530A KR102481090B1 (ko) | 2016-03-31 | 2017-03-29 | 고굴절률 경화막 형성용 수지 조성물 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020187028073A KR20180132657A (ko) | 2016-03-31 | 2017-03-29 | 고굴절률 경화막 형성용 수지 조성물 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP6992741B2 (zh) |
KR (2) | KR20180132657A (zh) |
CN (1) | CN109071693B (zh) |
TW (1) | TWI777951B (zh) |
WO (1) | WO2017170668A1 (zh) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111100237B (zh) * | 2019-12-23 | 2022-03-11 | 无锡德贝尔光电材料有限公司 | 高折射率的碱水可溶性树脂与制备方法及高折射率光刻胶 |
CN115895313B (zh) * | 2021-09-30 | 2024-05-10 | 新应材股份有限公司 | 树脂组合物以及硬化膜 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012133237A (ja) | 2010-12-22 | 2012-07-12 | Hitachi Chem Co Ltd | 光導波路形成用樹脂組成物及びこれを用いた光導波路形成用樹脂フィルム、並びにこれらを用いた光導波路 |
WO2016013543A1 (ja) * | 2014-07-23 | 2016-01-28 | 日産化学工業株式会社 | 硬化膜形成用樹脂組成物、硬化膜、導電性部材、及びマイグレーションの抑制方法 |
Family Cites Families (20)
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EP2045629B1 (en) * | 2006-07-25 | 2013-09-04 | Hitachi Chemical Company, Ltd. | Resin composition for optical waveguide, resin film for optical waveguide, and optical waveguide |
JP2009192790A (ja) * | 2008-02-14 | 2009-08-27 | Toray Ind Inc | 光導波路フィルム |
JP5118168B2 (ja) * | 2009-07-10 | 2013-01-16 | 株式会社豊田中央研究所 | 光学装置及びその製造方法 |
JP2012082386A (ja) * | 2010-09-14 | 2012-04-26 | Dic Corp | 光学材料用高屈折組成物およびその硬化物 |
JP2012078185A (ja) * | 2010-09-30 | 2012-04-19 | Toshiba Corp | 光導波路型バイオセンサチップおよび光導波路型バイオセンサチップの製造方法 |
JP5729865B2 (ja) * | 2011-03-31 | 2015-06-03 | 旭化成ケミカルズ株式会社 | オルガノポリシロキサンを含有する光硬化性樹脂組成物およびその用途 |
KR20140076607A (ko) * | 2011-10-12 | 2014-06-20 | 토요잉크Sc홀딩스주식회사 | 수지 조성물, 도막, 및 터치패널용 절연막 |
JP5991063B2 (ja) * | 2012-07-31 | 2016-09-14 | 東洋インキScホールディングス株式会社 | 樹脂組成物、ならびにそれを用いた塗膜 |
JP6024375B2 (ja) | 2011-11-21 | 2016-11-16 | 東洋インキScホールディングス株式会社 | 樹脂組成物、ならびにそれを用いた保護膜およびタッチパネル用絶縁膜 |
JP2013227392A (ja) * | 2012-04-25 | 2013-11-07 | Nippon Kayaku Co Ltd | 光学レンズシート用エネルギー線硬化型樹脂組成物及びその硬化物(3) |
JP5966615B2 (ja) * | 2012-05-25 | 2016-08-10 | 日油株式会社 | コロイド結晶用組成物、及び、これより得られるコロイド結晶硬化膜とその製造方法 |
JP6066394B2 (ja) * | 2012-06-04 | 2017-01-25 | 日本化薬株式会社 | 光学レンズシート用エネルギー線硬化型樹脂組成物及びその硬化物 |
KR102058263B1 (ko) * | 2013-01-31 | 2019-12-20 | 산요가세이고교 가부시키가이샤 | 광학 부품용 활성 에너지선 경화성 조성물, 경화물 및 그 경화물을 사용한 광학 렌즈, 광학 렌즈용 시트 또는 필름 |
US10254649B2 (en) * | 2013-10-21 | 2019-04-09 | Tokai University Educational System | Method for producing optical waveguide |
CN105723260A (zh) * | 2013-12-04 | 2016-06-29 | 日东电工株式会社 | 光波导和光电混载基板 |
JP2015172674A (ja) * | 2014-03-12 | 2015-10-01 | 日立化成株式会社 | 感光性樹脂組成物、感光性エレメント、硬化膜付き透明基板の製造方法及び硬化膜付き透明基板 |
CN103881028A (zh) * | 2014-04-01 | 2014-06-25 | 张家港康得新光电材料有限公司 | 耐磨光学材料及其制备方法和应用 |
JP6555485B2 (ja) * | 2014-04-18 | 2019-08-07 | 日産化学株式会社 | 反応性シリコーン化合物を含む重合性樹脂組成物 |
WO2015181984A1 (ja) * | 2014-05-30 | 2015-12-03 | 電気化学工業株式会社 | 光硬化性樹脂組成物 |
JP2015179283A (ja) * | 2015-05-25 | 2015-10-08 | 日立化成株式会社 | 光導波路、光電気複合基板、光導波路の製造方法、及び光電気複合基板の製造方法 |
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2017
- 2017-03-29 JP JP2018508137A patent/JP6992741B2/ja active Active
- 2017-03-29 KR KR1020187028073A patent/KR20180132657A/ko not_active IP Right Cessation
- 2017-03-29 WO PCT/JP2017/012864 patent/WO2017170668A1/ja active Application Filing
- 2017-03-29 CN CN201780020815.8A patent/CN109071693B/zh active Active
- 2017-03-29 KR KR1020227005530A patent/KR102481090B1/ko active IP Right Grant
- 2017-03-31 TW TW106111192A patent/TWI777951B/zh active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012133237A (ja) | 2010-12-22 | 2012-07-12 | Hitachi Chem Co Ltd | 光導波路形成用樹脂組成物及びこれを用いた光導波路形成用樹脂フィルム、並びにこれらを用いた光導波路 |
WO2016013543A1 (ja) * | 2014-07-23 | 2016-01-28 | 日産化学工業株式会社 | 硬化膜形成用樹脂組成物、硬化膜、導電性部材、及びマイグレーションの抑制方法 |
Also Published As
Publication number | Publication date |
---|---|
CN109071693B (zh) | 2021-05-11 |
WO2017170668A1 (ja) | 2017-10-05 |
CN109071693A (zh) | 2018-12-21 |
TWI777951B (zh) | 2022-09-21 |
JPWO2017170668A1 (ja) | 2019-02-07 |
JP6992741B2 (ja) | 2022-01-13 |
KR20180132657A (ko) | 2018-12-12 |
TW201809022A (zh) | 2018-03-16 |
KR20220027275A (ko) | 2022-03-07 |
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