KR102462877B1 - 감방사선성 수지 조성물, 적외선 차폐막, 그의 형성 방법, 및 고체 촬상 소자, 조도 센서 - Google Patents
감방사선성 수지 조성물, 적외선 차폐막, 그의 형성 방법, 및 고체 촬상 소자, 조도 센서 Download PDFInfo
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- KR102462877B1 KR102462877B1 KR1020160049861A KR20160049861A KR102462877B1 KR 102462877 B1 KR102462877 B1 KR 102462877B1 KR 1020160049861 A KR1020160049861 A KR 1020160049861A KR 20160049861 A KR20160049861 A KR 20160049861A KR 102462877 B1 KR102462877 B1 KR 102462877B1
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- PSUYMGPLEJLSPA-UHFFFAOYSA-N vanadium zirconium Chemical compound [V].[V].[Zr] PSUYMGPLEJLSPA-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
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- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/281—Interference filters designed for the infrared light
- G02B5/282—Interference filters designed for the infrared light reflecting for infrared and transparent for visible light, e.g. heat reflectors, laser protection
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPJP-P-2015-090891 | 2015-04-27 | ||
| JP2015090891A JP6524786B2 (ja) | 2015-04-27 | 2015-04-27 | ポジ型感放射線性樹脂組成物、赤外線遮蔽膜、その形成方法、及び固体撮像素子、照度センサー |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20160127663A KR20160127663A (ko) | 2016-11-04 |
| KR102462877B1 true KR102462877B1 (ko) | 2022-11-02 |
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| Application Number | Title | Priority Date | Filing Date |
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| KR1020160049861A KR102462877B1 (ko) | 2015-04-27 | 2016-04-25 | 감방사선성 수지 조성물, 적외선 차폐막, 그의 형성 방법, 및 고체 촬상 소자, 조도 센서 |
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| Country | Link |
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| JP (1) | JP6524786B2 (zh) |
| KR (1) | KR102462877B1 (zh) |
| CN (1) | CN106094437B (zh) |
| TW (1) | TWI682245B (zh) |
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|---|---|---|---|---|
| WO2019026675A1 (ja) * | 2017-07-31 | 2019-02-07 | Jsr株式会社 | 光電変換素子および接着剤 |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001272801A (ja) * | 2000-03-28 | 2001-10-05 | Fuji Photo Film Co Ltd | 平版印刷版の製版方法 |
| JP2002052855A (ja) * | 2000-08-10 | 2002-02-19 | Nippon Kayaku Co Ltd | レーザー直描型平板印刷版 |
| JP2003295417A (ja) * | 2002-03-29 | 2003-10-15 | Fuji Photo Film Co Ltd | 平版印刷版の製版方法 |
| JP2004145320A (ja) * | 2002-10-01 | 2004-05-20 | Toray Ind Inc | ポジ型感光性樹脂組成物 |
| JP2011123498A (ja) * | 2010-12-17 | 2011-06-23 | Hitachi Ltd | 映像処理装置 |
| WO2011118171A1 (ja) * | 2010-03-26 | 2011-09-29 | 住友ベークライト株式会社 | 感光性樹脂組成物及び受光装置 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004318360A (ja) * | 2003-04-15 | 2004-11-11 | Hitachi Maxell Ltd | 手書き入力システムと、ペン型入力装置と、手書き入力システムに使用する用紙 |
| JP5198394B2 (ja) | 2009-09-04 | 2013-05-15 | シャープ株式会社 | 近接照度センサおよびその製造方法 |
| JP5676171B2 (ja) | 2010-07-26 | 2015-02-25 | シャープ株式会社 | 固体撮像装置およびその製造方法、並びに電子機器 |
| JP5417364B2 (ja) | 2011-03-08 | 2014-02-12 | 富士フイルム株式会社 | 固体撮像素子用硬化性組成物、並びに、これを用いた感光層、永久パターン、ウエハレベルレンズ、固体撮像素子、及び、パターン形成方法 |
| KR20150097618A (ko) * | 2013-02-19 | 2015-08-26 | 후지필름 가부시키가이샤 | 근적외선 흡수성 조성물, 및 이를 이용한 근적외선 차단 필터, 및 카메라 모듈과 그 제조 방법 |
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2015
- 2015-04-27 JP JP2015090891A patent/JP6524786B2/ja active Active
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2016
- 2016-04-13 TW TW105111420A patent/TWI682245B/zh active
- 2016-04-18 CN CN201610239515.6A patent/CN106094437B/zh active Active
- 2016-04-25 KR KR1020160049861A patent/KR102462877B1/ko active IP Right Grant
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001272801A (ja) * | 2000-03-28 | 2001-10-05 | Fuji Photo Film Co Ltd | 平版印刷版の製版方法 |
| JP2002052855A (ja) * | 2000-08-10 | 2002-02-19 | Nippon Kayaku Co Ltd | レーザー直描型平板印刷版 |
| JP2003295417A (ja) * | 2002-03-29 | 2003-10-15 | Fuji Photo Film Co Ltd | 平版印刷版の製版方法 |
| JP2004145320A (ja) * | 2002-10-01 | 2004-05-20 | Toray Ind Inc | ポジ型感光性樹脂組成物 |
| WO2011118171A1 (ja) * | 2010-03-26 | 2011-09-29 | 住友ベークライト株式会社 | 感光性樹脂組成物及び受光装置 |
| JP2011123498A (ja) * | 2010-12-17 | 2011-06-23 | Hitachi Ltd | 映像処理装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN106094437A (zh) | 2016-11-09 |
| CN106094437B (zh) | 2020-08-04 |
| JP6524786B2 (ja) | 2019-06-05 |
| KR20160127663A (ko) | 2016-11-04 |
| JP2016206558A (ja) | 2016-12-08 |
| TWI682245B (zh) | 2020-01-11 |
| TW201638666A (zh) | 2016-11-01 |
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