KR102342193B1 - 경화성 조성물 - Google Patents

경화성 조성물 Download PDF

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Publication number
KR102342193B1
KR102342193B1 KR1020177008964A KR20177008964A KR102342193B1 KR 102342193 B1 KR102342193 B1 KR 102342193B1 KR 1020177008964 A KR1020177008964 A KR 1020177008964A KR 20177008964 A KR20177008964 A KR 20177008964A KR 102342193 B1 KR102342193 B1 KR 102342193B1
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KR
South Korea
Prior art keywords
compound
curable composition
group
resin
meth
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KR1020177008964A
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English (en)
Korean (ko)
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KR20170048529A (ko
Inventor
기미유키 시로우치
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스미또모 가가꾸 가부시키가이샤
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Publication of KR20170048529A publication Critical patent/KR20170048529A/ko
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/02—Use of particular materials as binders, particle coatings or suspension media therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F292/00—Macromolecular compounds obtained by polymerising monomers on to inorganic materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/10—Metal compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/32—Compounds containing nitrogen bound to oxygen
    • C08K5/33—Oximes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/08—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
    • C09K11/56—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing sulfur
    • C09K11/562—Chalcogenides
    • C09K11/565—Chalcogenides with zinc cadmium
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/08—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
    • C09K11/88—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing selenium, tellurium or unspecified chalcogen elements
    • C09K11/881—Chalcogenides
    • C09K11/883—Chalcogenides with zinc or cadmium
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Materials Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Nanotechnology (AREA)
  • Ceramic Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Composite Materials (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
KR1020177008964A 2014-09-05 2015-08-25 경화성 조성물 KR102342193B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2014-180956 2014-09-05
JP2014180956 2014-09-05
PCT/JP2015/073786 WO2016035603A1 (ja) 2014-09-05 2015-08-25 硬化性組成物

Publications (2)

Publication Number Publication Date
KR20170048529A KR20170048529A (ko) 2017-05-08
KR102342193B1 true KR102342193B1 (ko) 2021-12-23

Family

ID=55439669

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020177008964A KR102342193B1 (ko) 2014-09-05 2015-08-25 경화성 조성물

Country Status (5)

Country Link
JP (1) JP6666843B2 (zh)
KR (1) KR102342193B1 (zh)
CN (1) CN106795228B (zh)
TW (2) TWI656405B (zh)
WO (1) WO2016035603A1 (zh)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102092165B1 (ko) * 2014-09-23 2020-03-23 동우 화인켐 주식회사 감광성 수지 조성물
KR101995930B1 (ko) * 2015-02-25 2019-07-03 동우 화인켐 주식회사 양자점을 포함하는 경화 조성물, 이를 이용하여 제조된 컬러필터 및 화상표시장치
KR102052101B1 (ko) * 2015-02-25 2019-12-04 동우 화인켐 주식회사 자발광 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상표시장치
KR101878421B1 (ko) * 2015-07-07 2018-07-13 동우 화인켐 주식회사 양자점 분산체 및 이를 포함하는 자발광 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상표시장치
KR101811187B1 (ko) 2016-03-31 2017-12-20 하리마카세이 가부시기가이샤 금속 미립자 분산액 및 경화막
JP6196750B1 (ja) * 2016-03-31 2017-09-13 ハリマ化成株式会社 金属微粒子分散液および硬化膜
JP6856367B2 (ja) * 2016-11-30 2021-04-07 東京応化工業株式会社 感光性組成物、硬化膜、発光表示素子用の発光層、発光表示素子、及び発光層の形成方法
JP6630755B2 (ja) * 2017-02-16 2020-01-15 住友化学株式会社 硬化性樹脂組成物、硬化膜及び表示装置
JP6609337B2 (ja) * 2017-03-30 2019-11-20 住友化学株式会社 重合体及び組成物
KR102494192B1 (ko) * 2017-11-22 2023-02-02 동우 화인켐 주식회사 광변환 수지 조성물 및 이를 포함하는 광변환 적층기재, 이를 이용한 화상표시장치
CN108864384B (zh) * 2018-05-08 2020-09-15 纳晶科技股份有限公司 量子点分散树脂成型体、量子点分散胶体以及发光器件
JP2021105164A (ja) * 2019-12-26 2021-07-26 住友化学株式会社 硬化性樹脂組成物および表示装置
JP7569213B2 (ja) * 2019-12-26 2024-10-17 住友化学株式会社 感光性組成物
JP2021161392A (ja) * 2020-03-31 2021-10-11 住友化学株式会社 硬化性樹脂組成物及び表示装置

Citations (2)

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JP2002241509A (ja) * 2001-02-22 2002-08-28 Mitsubishi Chemicals Corp 超微粒子ドメインを含有する面状樹脂成形体
JP2010039475A (ja) * 2008-06-10 2010-02-18 Fujifilm Corp 紫外光レーザー露光用感光性樹脂組成物、パターン形成方法、その方法を用いて製造したカラーフィルタ、カラーフィルタの製造方法および液晶表示装置

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JP2010139692A (ja) * 2008-12-11 2010-06-24 Toppan Printing Co Ltd 感光性着色組成物、及びそれを用いるカラーフィルタ基板の製造方法
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GB201109054D0 (en) * 2011-05-31 2011-07-13 Nanoco Technologies Ltd Semiconductor nanoparticle-based materials for use in light emitting diodes, optoelectronic displays and the like
JP5514356B2 (ja) * 2012-09-28 2014-06-04 太陽インキ製造株式会社 光硬化性樹脂組成物、プリント配線板、及び光硬化性樹脂組成物の製造方法
JP6379671B2 (ja) * 2013-06-24 2018-08-29 Jsr株式会社 硬化性樹脂組成物、硬化膜、発光素子、波長変換フィルムおよび発光層の形成方法
KR102197936B1 (ko) * 2013-06-24 2021-01-04 제이에스알 가부시끼가이샤 경화성 수지 조성물, 경화막, 발광 소자, 파장 변환 필름 및 발광층의 형성 방법
CN103728837B (zh) * 2013-12-30 2016-08-31 京东方科技集团股份有限公司 感光树脂组合物及用感光树脂组合物制备量子点图案的方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002241509A (ja) * 2001-02-22 2002-08-28 Mitsubishi Chemicals Corp 超微粒子ドメインを含有する面状樹脂成形体
JP2010039475A (ja) * 2008-06-10 2010-02-18 Fujifilm Corp 紫外光レーザー露光用感光性樹脂組成物、パターン形成方法、その方法を用いて製造したカラーフィルタ、カラーフィルタの製造方法および液晶表示装置

Also Published As

Publication number Publication date
TWI656405B (zh) 2019-04-11
CN106795228A (zh) 2017-05-31
TW201923464A (zh) 2019-06-16
JPWO2016035603A1 (ja) 2017-06-15
JP6666843B2 (ja) 2020-03-18
TW201619707A (zh) 2016-06-01
WO2016035603A1 (ja) 2016-03-10
KR20170048529A (ko) 2017-05-08
CN106795228B (zh) 2019-08-30
TWI700553B (zh) 2020-08-01

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