KR102314688B1 - 조성물 및 신규 화합물 - Google Patents

조성물 및 신규 화합물 Download PDF

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Publication number
KR102314688B1
KR102314688B1 KR1020187016787A KR20187016787A KR102314688B1 KR 102314688 B1 KR102314688 B1 KR 102314688B1 KR 1020187016787 A KR1020187016787 A KR 1020187016787A KR 20187016787 A KR20187016787 A KR 20187016787A KR 102314688 B1 KR102314688 B1 KR 102314688B1
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KR
South Korea
Prior art keywords
group
carbon atoms
substituent
general formula
represented
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KR1020187016787A
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English (en)
Korean (ko)
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KR20180132600A (ko
Inventor
이즈미 마츠이
마사키 키무라
토모미 스즈키
미츠히로 오카다
Original Assignee
가부시키가이샤 아데카
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Publication of KR102314688B1 publication Critical patent/KR102314688B1/ko

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/005—Stabilisers against oxidation, heat, light, ozone
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C43/00—Ethers; Compounds having groups, groups or groups
    • C07C43/02—Ethers
    • C07C43/20—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring
    • C07C43/205—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring the aromatic ring being a non-condensed ring
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D249/00—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms
    • C07D249/16—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms condensed with carbocyclic rings or ring systems
    • C07D249/18—Benzotriazoles
    • C07D249/20—Benzotriazoles with aryl radicals directly attached in position 2
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D251/00—Heterocyclic compounds containing 1,3,5-triazine rings
    • C07D251/02—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
    • C07D251/12—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members
    • C07D251/14—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom
    • C07D251/24—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom to three ring carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D493/00—Heterocyclic compounds containing oxygen atoms as the only ring hetero atoms in the condensed system
    • C07D493/12—Heterocyclic compounds containing oxygen atoms as the only ring hetero atoms in the condensed system in which the condensed system contains three hetero rings
    • C07D493/20—Spiro-condensed systems
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F16/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical
    • C08F16/12—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical by an ether radical
    • C08F16/32—Monomers containing two or more unsaturated aliphatic radicals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/06—Ethers; Acetals; Ketals; Ortho-esters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Optical Filters (AREA)
KR1020187016787A 2016-03-31 2017-03-23 조성물 및 신규 화합물 KR102314688B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2016-073406 2016-03-31
JP2016073406 2016-03-31
PCT/JP2017/011886 WO2017170183A1 (ja) 2016-03-31 2017-03-23 組成物及び新規化合物

Publications (2)

Publication Number Publication Date
KR20180132600A KR20180132600A (ko) 2018-12-12
KR102314688B1 true KR102314688B1 (ko) 2021-10-19

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020187016787A KR102314688B1 (ko) 2016-03-31 2017-03-23 조성물 및 신규 화합물

Country Status (5)

Country Link
JP (1) JP6875376B2 (zh)
KR (1) KR102314688B1 (zh)
CN (1) CN108699183A (zh)
TW (1) TWI737705B (zh)
WO (1) WO2017170183A1 (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7469224B2 (ja) * 2018-05-08 2024-04-16 株式会社Adeka 化合物、潜在性添加剤、組成物、硬化物、硬化物の製造方法及び組成物の製造方法
JP7436176B2 (ja) * 2018-10-25 2024-02-21 株式会社Adeka 組成物、ソルダーレジスト組成物、硬化物及び硬化物の製造方法
JP2021178941A (ja) * 2020-05-15 2021-11-18 株式会社ダイセル 新規エポキシ樹脂及びエポキシ樹脂組成物
WO2023176725A1 (ja) * 2022-03-16 2023-09-21 本州化学工業株式会社 アリルエーテル化合物及びその製造方法、硬化性樹脂組成物、ワニス、プリプレグ、硬化物、ポリフェニレンエーテル樹脂硬化剤及び結晶とその製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002356668A (ja) * 2001-05-30 2002-12-13 Fuji Photo Film Co Ltd 紫外線吸収剤及びその製造方法、紫外線吸収剤を含有する組成物、ならびに画像形成方法
US20090018239A1 (en) 2004-01-26 2009-01-15 Henkel Corporation Underfill adhesives

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JPH07103002B2 (ja) * 1987-01-19 1995-11-08 長谷川香料株式会社 ゴキブリ忌避剤
JP2739082B2 (ja) * 1989-07-20 1998-04-08 旭電化工業株式会社 イソペンテニルオキシトラン化合物
JP2958072B2 (ja) * 1990-08-20 1999-10-06 旭電化工業株式会社 ネマチック液晶組成物
JPH04120550A (ja) * 1990-09-11 1992-04-21 Mita Ind Co Ltd 電子写真感光体
DE59306590D1 (de) * 1992-12-04 1997-07-03 Ocg Microelectronic Materials Positiv-Photoresist mit verbesserten Prozesseigenschaften
US5902838A (en) * 1996-10-01 1999-05-11 Loctite Corporation Process for the assembly of glass devices subjected to high temperatures, compositions therefor and novel polymers for rheological control of such compositions
JP2008164925A (ja) * 2006-12-28 2008-07-17 Hayashi Telempu Co Ltd 位相差フィルムおよびその製造方法
JP2011048382A (ja) 2010-10-01 2011-03-10 Kodak Japan Ltd 感光性組成物、感光性平版印刷版および平版印刷版の作成方法
WO2014021023A1 (ja) 2012-07-31 2014-02-06 株式会社Adeka 潜在性添加剤及び該添加剤を含有する組成物
EP2899593A4 (en) * 2012-09-10 2016-06-22 Jsr Corp COMPOSITION FOR FORMING A LACQUER LAYER FILM AND METHOD FOR STRUCTURED FORMING
JP6049521B2 (ja) 2013-03-29 2016-12-21 富士フイルム株式会社 感光性樹脂組成物、硬化膜、画像形成方法、固体撮像素子、カラーフィルタおよび紫外線吸収剤
JP2015108649A (ja) 2013-12-03 2015-06-11 凸版印刷株式会社 青色感光性組成物およびカラーフィルタ基板
JP2015132791A (ja) 2013-12-13 2015-07-23 株式会社Adeka 着色感光性組成物

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002356668A (ja) * 2001-05-30 2002-12-13 Fuji Photo Film Co Ltd 紫外線吸収剤及びその製造方法、紫外線吸収剤を含有する組成物、ならびに画像形成方法
US20090018239A1 (en) 2004-01-26 2009-01-15 Henkel Corporation Underfill adhesives

Non-Patent Citations (1)

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Title
비특허문헌

Also Published As

Publication number Publication date
JP6875376B2 (ja) 2021-05-26
TW201806917A (zh) 2018-03-01
TWI737705B (zh) 2021-09-01
CN108699183A (zh) 2018-10-23
WO2017170183A1 (ja) 2017-10-05
KR20180132600A (ko) 2018-12-12
JPWO2017170183A1 (ja) 2019-02-07

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