KR102196407B1 - 진공 프로세싱 시스템 및 프로세싱 시스템을 탑재하기 위한 방법 - Google Patents

진공 프로세싱 시스템 및 프로세싱 시스템을 탑재하기 위한 방법 Download PDF

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KR102196407B1
KR102196407B1 KR1020167030773A KR20167030773A KR102196407B1 KR 102196407 B1 KR102196407 B1 KR 102196407B1 KR 1020167030773 A KR1020167030773 A KR 1020167030773A KR 20167030773 A KR20167030773 A KR 20167030773A KR 102196407 B1 KR102196407 B1 KR 102196407B1
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chamber
processing system
roll
process chamber
substrate
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KR20160142363A (ko
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플로리안 리즈
슈테판 하인
유르겐 헨리히
안드레아스 자우어
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어플라이드 머티어리얼스, 인코포레이티드
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/52—Means for observation of the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
KR1020167030773A 2014-04-02 2014-04-02 진공 프로세싱 시스템 및 프로세싱 시스템을 탑재하기 위한 방법 Active KR102196407B1 (ko)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2014/056605 WO2015149849A1 (en) 2014-04-02 2014-04-02 Vacuum processing system and method for mounting a processing system

Publications (2)

Publication Number Publication Date
KR20160142363A KR20160142363A (ko) 2016-12-12
KR102196407B1 true KR102196407B1 (ko) 2020-12-29

Family

ID=50440648

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020167030773A Active KR102196407B1 (ko) 2014-04-02 2014-04-02 진공 프로세싱 시스템 및 프로세싱 시스템을 탑재하기 위한 방법

Country Status (7)

Country Link
US (1) US10648072B2 (enExample)
EP (1) EP3126541A1 (enExample)
JP (1) JP6375387B2 (enExample)
KR (1) KR102196407B1 (enExample)
CN (1) CN106164330B (enExample)
TW (1) TWI727921B (enExample)
WO (1) WO2015149849A1 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3414359A2 (en) * 2016-02-12 2018-12-19 Applied Materials, Inc. Vacuum processing system and methods therefor
US10304716B1 (en) * 2017-12-20 2019-05-28 Powertech Technology Inc. Package structure and manufacturing method thereof
WO2019188976A1 (ja) * 2018-03-30 2019-10-03 Ｊｆｅスチール株式会社 方向性電磁鋼板の製造方法および連続成膜装置
EP3921453A4 (en) * 2019-03-05 2022-11-30 Xefco Pty Ltd ENHANCED VAPOR SEPARATION SYSTEM, PROCESS AND HUMIDITY REGULATOR
EP4088826A4 (en) * 2020-01-06 2023-07-05 Nihon Spindle Manufacturing Co., Ltd. Coating device, partition member, and coating method
WO2021185444A1 (en) * 2020-03-18 2021-09-23 Applied Materials, Inc. Vacuum processing system for a flexible substrate, method of depositing a layer stack on a flexible substrate, and layer system
KR102896631B1 (ko) * 2020-06-04 2025-12-04 엘리베이티드 머티어리얼스 저머니 게엠베하 진공 챔버에서 기판을 코팅하기 위한 기상 증착 장치 및 방법
JP2023538038A (ja) * 2020-08-21 2023-09-06 アプライド マテリアルズ インコーポレイテッド フレキシブル基板を処理するための処理システム並びにフレキシブル基板の特性及びフレキシブル基板上の１つ又は複数のコーティングの特性のうちの少なくとも１つを測定する方法
KR102800920B1 (ko) * 2021-04-21 2025-05-12 엘리베이티드 머티어리얼스 저머니 게엠베하 재료 증착 장치, 기판 상에 재료를 증착하는 방법, 및 재료 증착 시스템
WO2023172915A1 (en) * 2022-03-08 2023-09-14 10X Genomics, Inc. In situ code design methods for minimizing optical crowding

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006183070A (ja) 2004-12-27 2006-07-13 Fuji Electric Holdings Co Ltd 薄膜形成装置
US20090223551A1 (en) 2008-03-04 2009-09-10 Solexant Corp. Process for making solar cells
JP2012136724A (ja) 2010-12-24 2012-07-19 Kobe Steel Ltd 巻取り式連続成膜装置
JP2013196848A (ja) 2012-03-16 2013-09-30 Nitto Denko Corp 有機ｅｌ素子の製造方法及び製造装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0466999A1 (en) * 1990-07-18 1992-01-22 Engineering Films-Establishment Process and apparatus for the surfacing of tape substrates of reels
JP3332700B2 (ja) * 1995-12-22 2002-10-07 キヤノン株式会社 堆積膜形成方法及び堆積膜形成装置
CA2492597A1 (en) * 2002-07-17 2004-01-22 Hitco Carbon Composites, Inc. Continuous chemical vapor deposition process and process furnace
US7799182B2 (en) 2006-12-01 2010-09-21 Applied Materials, Inc. Electroplating on roll-to-roll flexible solar cell substrates
EP1988186A1 (en) * 2007-04-24 2008-11-05 Galileo Vacuum Systems S.p.A. Multichamber vacuum deposition system
US8117987B2 (en) * 2009-09-18 2012-02-21 Applied Materials, Inc. Hot wire chemical vapor deposition (CVD) inline coating tool
US9303316B1 (en) * 2010-01-15 2016-04-05 Apollo Precision Kunming Yuanhong Limited Continuous web apparatus and method using an air to vacuum seal and accumulator

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006183070A (ja) 2004-12-27 2006-07-13 Fuji Electric Holdings Co Ltd 薄膜形成装置
US20090223551A1 (en) 2008-03-04 2009-09-10 Solexant Corp. Process for making solar cells
JP2012136724A (ja) 2010-12-24 2012-07-19 Kobe Steel Ltd 巻取り式連続成膜装置
JP2013196848A (ja) 2012-03-16 2013-09-30 Nitto Denko Corp 有機ｅｌ素子の製造方法及び製造装置

Also Published As

Publication number Publication date
JP6375387B2 (ja) 2018-08-15
WO2015149849A1 (en) 2015-10-08
TW201606110A (zh) 2016-02-16
CN106164330B (zh) 2021-01-26
KR20160142363A (ko) 2016-12-12
US20170152593A1 (en) 2017-06-01
US10648072B2 (en) 2020-05-12
TWI727921B (zh) 2021-05-21
EP3126541A1 (en) 2017-02-08
CN106164330A (zh) 2016-11-23
JP2017509797A (ja) 2017-04-06

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