KR102196407B1 - 진공 프로세싱 시스템 및 프로세싱 시스템을 탑재하기 위한 방법 - Google Patents
진공 프로세싱 시스템 및 프로세싱 시스템을 탑재하기 위한 방법 Download PDFInfo
- Publication number
- KR102196407B1 KR102196407B1 KR1020167030773A KR20167030773A KR102196407B1 KR 102196407 B1 KR102196407 B1 KR 102196407B1 KR 1020167030773 A KR1020167030773 A KR 1020167030773A KR 20167030773 A KR20167030773 A KR 20167030773A KR 102196407 B1 KR102196407 B1 KR 102196407B1
- Authority
- KR
- South Korea
- Prior art keywords
- chamber
- processing system
- roll
- process chamber
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000034 method Methods 0.000 title claims abstract description 416
- 238000012545 processing Methods 0.000 title claims abstract description 212
- 230000008569 process Effects 0.000 claims abstract description 382
- 239000000758 substrate Substances 0.000 claims abstract description 263
- 238000012423 maintenance Methods 0.000 claims abstract description 186
- 238000000151 deposition Methods 0.000 claims abstract description 143
- 239000000463 material Substances 0.000 claims abstract description 19
- 230000008021 deposition Effects 0.000 claims description 128
- 238000007689 inspection Methods 0.000 claims description 10
- 238000004891 communication Methods 0.000 claims 1
- 238000004804 winding Methods 0.000 description 102
- 238000000576 coating method Methods 0.000 description 19
- 239000011248 coating agent Substances 0.000 description 18
- 238000001771 vacuum deposition Methods 0.000 description 13
- 238000005229 chemical vapour deposition Methods 0.000 description 11
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 11
- 238000005240 physical vapour deposition Methods 0.000 description 10
- 238000005137 deposition process Methods 0.000 description 9
- 238000011109 contamination Methods 0.000 description 8
- 238000013461 design Methods 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 8
- 239000011888 foil Substances 0.000 description 7
- 238000004140 cleaning Methods 0.000 description 6
- 239000002245 particle Substances 0.000 description 6
- 238000000926 separation method Methods 0.000 description 6
- 230000000007 visual effect Effects 0.000 description 6
- 238000007789 sealing Methods 0.000 description 5
- 230000008859 change Effects 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000007781 pre-processing Methods 0.000 description 3
- 230000009471 action Effects 0.000 description 2
- 238000000429 assembly Methods 0.000 description 2
- 230000000712 assembly Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 238000002203 pretreatment Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 241000237858 Gastropoda Species 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000012080 ambient air Substances 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 235000015243 ice cream Nutrition 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- -1 web Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/52—Means for observation of the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/EP2014/056605 WO2015149849A1 (en) | 2014-04-02 | 2014-04-02 | Vacuum processing system and method for mounting a processing system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20160142363A KR20160142363A (ko) | 2016-12-12 |
| KR102196407B1 true KR102196407B1 (ko) | 2020-12-29 |
Family
ID=50440648
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020167030773A Active KR102196407B1 (ko) | 2014-04-02 | 2014-04-02 | 진공 프로세싱 시스템 및 프로세싱 시스템을 탑재하기 위한 방법 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US10648072B2 (enExample) |
| EP (1) | EP3126541A1 (enExample) |
| JP (1) | JP6375387B2 (enExample) |
| KR (1) | KR102196407B1 (enExample) |
| CN (1) | CN106164330B (enExample) |
| TW (1) | TWI727921B (enExample) |
| WO (1) | WO2015149849A1 (enExample) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3414359A2 (en) * | 2016-02-12 | 2018-12-19 | Applied Materials, Inc. | Vacuum processing system and methods therefor |
| US10304716B1 (en) * | 2017-12-20 | 2019-05-28 | Powertech Technology Inc. | Package structure and manufacturing method thereof |
| KR102458991B1 (ko) * | 2018-03-30 | 2022-10-25 | 제이에프이 스틸 가부시키가이샤 | 방향성 전기 강판의 제조 방법 및 연속 성막 장치 |
| EP3921453A4 (en) * | 2019-03-05 | 2022-11-30 | Xefco Pty Ltd | Improved vapour deposition system, method and moisture control device |
| EP4088826A4 (en) * | 2020-01-06 | 2023-07-05 | Nihon Spindle Manufacturing Co., Ltd. | Coating device, partition member, and coating method |
| WO2021185444A1 (en) * | 2020-03-18 | 2021-09-23 | Applied Materials, Inc. | Vacuum processing system for a flexible substrate, method of depositing a layer stack on a flexible substrate, and layer system |
| WO2021247380A1 (en) * | 2020-06-04 | 2021-12-09 | Applied Materials, Inc. | Vapor deposition apparatus and method for coating a substrate in a vacuum chamber |
| EP4200461A4 (en) * | 2020-08-21 | 2024-09-18 | Applied Materials, Inc. | PROCESSING SYSTEM FOR PROCESSING A FLEXIBLE SUBSTRATE AND METHOD FOR MEASURING A PROPERTY OF A FLEXIBLE SUBSTRATE |
| WO2022225731A1 (en) | 2021-04-21 | 2022-10-27 | Applied Materials, Inc. | Material deposition apparatus, method of depositing material on a substrate, and material deposition system |
| EP4490737A1 (en) * | 2022-03-08 | 2025-01-15 | 10X Genomics, Inc. | In situ code design methods for minimizing optical crowding |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006183070A (ja) | 2004-12-27 | 2006-07-13 | Fuji Electric Holdings Co Ltd | 薄膜形成装置 |
| US20090223551A1 (en) | 2008-03-04 | 2009-09-10 | Solexant Corp. | Process for making solar cells |
| JP2012136724A (ja) | 2010-12-24 | 2012-07-19 | Kobe Steel Ltd | 巻取り式連続成膜装置 |
| JP2013196848A (ja) | 2012-03-16 | 2013-09-30 | Nitto Denko Corp | 有機ｅｌ素子の製造方法及び製造装置 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0466999A1 (en) * | 1990-07-18 | 1992-01-22 | Engineering Films-Establishment | Process and apparatus for the surfacing of tape substrates of reels |
| JP3332700B2 (ja) * | 1995-12-22 | 2002-10-07 | キヤノン株式会社 | 堆積膜形成方法及び堆積膜形成装置 |
| AU2003259147A1 (en) * | 2002-07-17 | 2004-02-02 | Hitco Carbon Composites, Inc. | Continuous chemical vapor deposition process and process furnace |
| US7799182B2 (en) * | 2006-12-01 | 2010-09-21 | Applied Materials, Inc. | Electroplating on roll-to-roll flexible solar cell substrates |
| EP1988186A1 (en) * | 2007-04-24 | 2008-11-05 | Galileo Vacuum Systems S.p.A. | Multichamber vacuum deposition system |
| US8117987B2 (en) * | 2009-09-18 | 2012-02-21 | Applied Materials, Inc. | Hot wire chemical vapor deposition (CVD) inline coating tool |
| US9303316B1 (en) * | 2010-01-15 | 2016-04-05 | Apollo Precision Kunming Yuanhong Limited | Continuous web apparatus and method using an air to vacuum seal and accumulator |
-
2014
- 2014-04-02 KR KR1020167030773A patent/KR102196407B1/ko active Active
- 2014-04-02 EP EP14715572.5A patent/EP3126541A1/en not_active Withdrawn
- 2014-04-02 JP JP2016559546A patent/JP6375387B2/ja active Active
- 2014-04-02 CN CN201480077772.3A patent/CN106164330B/zh active Active
- 2014-04-02 US US15/300,321 patent/US10648072B2/en active Active
- 2014-04-02 WO PCT/EP2014/056605 patent/WO2015149849A1/en not_active Ceased
-
2015
- 2015-03-31 TW TW104110479A patent/TWI727921B/zh active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006183070A (ja) | 2004-12-27 | 2006-07-13 | Fuji Electric Holdings Co Ltd | 薄膜形成装置 |
| US20090223551A1 (en) | 2008-03-04 | 2009-09-10 | Solexant Corp. | Process for making solar cells |
| JP2012136724A (ja) | 2010-12-24 | 2012-07-19 | Kobe Steel Ltd | 巻取り式連続成膜装置 |
| JP2013196848A (ja) | 2012-03-16 | 2013-09-30 | Nitto Denko Corp | 有機ｅｌ素子の製造方法及び製造装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| US10648072B2 (en) | 2020-05-12 |
| WO2015149849A1 (en) | 2015-10-08 |
| JP2017509797A (ja) | 2017-04-06 |
| CN106164330B (zh) | 2021-01-26 |
| TW201606110A (zh) | 2016-02-16 |
| KR20160142363A (ko) | 2016-12-12 |
| TWI727921B (zh) | 2021-05-21 |
| US20170152593A1 (en) | 2017-06-01 |
| JP6375387B2 (ja) | 2018-08-15 |
| CN106164330A (zh) | 2016-11-23 |
| EP3126541A1 (en) | 2017-02-08 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR102196407B1 (ko) | 진공 프로세싱 시스템 및 프로세싱 시스템을 탑재하기 위한 방법 | |
| US20200299842A1 (en) | Deposition platform for flexible substrates and method of operation thereof | |
| JP6803917B2 (ja) | 真空処理システム及び真空処理を行う方法 | |
| EP2762608B1 (en) | Gas separation by adjustable separation wall | |
| EP2762607B1 (en) | Deposition source with adjustable electrode | |
| US9873945B2 (en) | Common deposition platform, processing station, and method of operation thereof | |
| CN108474112A (zh) | 膜形成设备 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0105 | International application |
Patent event date: 20161102 Patent event code: PA01051R01D Comment text: International Patent Application |
|
| PG1501 | Laying open of application | ||
| A201 | Request for examination | ||
| PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 20190327 Comment text: Request for Examination of Application |
|
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20200612 Patent event code: PE09021S01D |
|
| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration |
Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 20201110 |
|
| GRNT | Written decision to grant | ||
| PR0701 | Registration of establishment |
Comment text: Registration of Establishment Patent event date: 20201222 Patent event code: PR07011E01D |
|
| PR1002 | Payment of registration fee |
Payment date: 20201222 End annual number: 3 Start annual number: 1 |
|
| PG1601 | Publication of registration | ||
| PR1001 | Payment of annual fee |
Payment date: 20231214 Start annual number: 4 End annual number: 4 |
|
| PR1001 | Payment of annual fee |
Payment date: 20241213 Start annual number: 5 End annual number: 5 |