JP6375387B2 - 真空処理システム、及び処理システムを取り付けるための方法 - Google Patents

真空処理システム、及び処理システムを取り付けるための方法 Download PDF

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Publication number
JP6375387B2
JP6375387B2 JP2016559546A JP2016559546A JP6375387B2 JP 6375387 B2 JP6375387 B2 JP 6375387B2 JP 2016559546 A JP2016559546 A JP 2016559546A JP 2016559546 A JP2016559546 A JP 2016559546A JP 6375387 B2 JP6375387 B2 JP 6375387B2
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Japan
Prior art keywords
chamber
processing
substrate
roll
processing system
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JP2016559546A
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Japanese (ja)
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JP2017509797A (ja
JP2017509797A5 (enExample
Inventor
フロリアン リース，
フロリアン リース，
シュテファン ハイン，
シュテファン ハイン，
ユルゲン ヘンリッヒ，
ユルゲン ヘンリッヒ，
アンドレアス ザウアー，
アンドレアス ザウアー，
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Applied Materials Inc
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Applied Materials Inc
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/52—Means for observation of the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
JP2016559546A 2014-04-02 2014-04-02 真空処理システム、及び処理システムを取り付けるための方法 Active JP6375387B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2014/056605 WO2015149849A1 (en) 2014-04-02 2014-04-02 Vacuum processing system and method for mounting a processing system

Publications (3)

Publication Number Publication Date
JP2017509797A JP2017509797A (ja) 2017-04-06
JP2017509797A5 JP2017509797A5 (enExample) 2017-05-25
JP6375387B2 true JP6375387B2 (ja) 2018-08-15

Family

ID=50440648

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016559546A Active JP6375387B2 (ja) 2014-04-02 2014-04-02 真空処理システム、及び処理システムを取り付けるための方法

Country Status (7)

Country Link
US (1) US10648072B2 (enExample)
EP (1) EP3126541A1 (enExample)
JP (1) JP6375387B2 (enExample)
KR (1) KR102196407B1 (enExample)
CN (1) CN106164330B (enExample)
TW (1) TWI727921B (enExample)
WO (1) WO2015149849A1 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3674440A1 (en) * 2016-02-12 2020-07-01 Applied Materials, Inc. Vacuum processing system and methods therefor
US10304716B1 (en) * 2017-12-20 2019-05-28 Powertech Technology Inc. Package structure and manufacturing method thereof
US20210087690A1 (en) * 2018-03-30 2021-03-25 Jfe Steel Corporation Method for producing grain-oriented electrical sheet and continuous film-forming device
US20220186360A1 (en) * 2019-03-05 2022-06-16 Xefco Pty Ltd Improved vapour deposition system, method and moisture control device
EP4088826A4 (en) * 2020-01-06 2023-07-05 Nihon Spindle Manufacturing Co., Ltd. Coating device, partition member, and coating method
WO2021185444A1 (en) * 2020-03-18 2021-09-23 Applied Materials, Inc. Vacuum processing system for a flexible substrate, method of depositing a layer stack on a flexible substrate, and layer system
WO2021247380A1 (en) * 2020-06-04 2021-12-09 Applied Materials, Inc. Vapor deposition apparatus and method for coating a substrate in a vacuum chamber
EP4200461A4 (en) * 2020-08-21 2024-09-18 Applied Materials, Inc. PROCESSING SYSTEM FOR PROCESSING A FLEXIBLE SUBSTRATE AND METHOD FOR MEASURING A PROPERTY OF A FLEXIBLE SUBSTRATE
WO2022225731A1 (en) * 2021-04-21 2022-10-27 Applied Materials, Inc. Material deposition apparatus, method of depositing material on a substrate, and material deposition system
EP4490737A1 (en) * 2022-03-08 2025-01-15 10X Genomics, Inc. In situ code design methods for minimizing optical crowding

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0466999A1 (en) * 1990-07-18 1992-01-22 Engineering Films-Establishment Process and apparatus for the surfacing of tape substrates of reels
JP3332700B2 (ja) * 1995-12-22 2002-10-07 キヤノン株式会社 堆積膜形成方法及び堆積膜形成装置
EP1534874A4 (en) * 2002-07-17 2008-02-27 Hitco Carbon Composites Inc STEAM PHASE CONTINUOUS CHEMICAL DEPOSITION METHOD AND CORRESPONDING OVEN
JP4591080B2 (ja) 2004-12-27 2010-12-01 富士電機システムズ株式会社 薄膜形成装置
US7799182B2 (en) * 2006-12-01 2010-09-21 Applied Materials, Inc. Electroplating on roll-to-roll flexible solar cell substrates
EP1988186A1 (en) * 2007-04-24 2008-11-05 Galileo Vacuum Systems S.p.A. Multichamber vacuum deposition system
KR20100126717A (ko) * 2008-03-04 2010-12-02 솔렉슨트 코포레이션 태양 전지의 제조 방법
US8117987B2 (en) * 2009-09-18 2012-02-21 Applied Materials, Inc. Hot wire chemical vapor deposition (CVD) inline coating tool
US9303316B1 (en) * 2010-01-15 2016-04-05 Apollo Precision Kunming Yuanhong Limited Continuous web apparatus and method using an air to vacuum seal and accumulator
JP2012136724A (ja) 2010-12-24 2012-07-19 Kobe Steel Ltd 巻取り式連続成膜装置
JP2013196848A (ja) * 2012-03-16 2013-09-30 Nitto Denko Corp 有機ｅｌ素子の製造方法及び製造装置

Also Published As

Publication number Publication date
TW201606110A (zh) 2016-02-16
JP2017509797A (ja) 2017-04-06
CN106164330B (zh) 2021-01-26
US20170152593A1 (en) 2017-06-01
KR102196407B1 (ko) 2020-12-29
CN106164330A (zh) 2016-11-23
WO2015149849A1 (en) 2015-10-08
US10648072B2 (en) 2020-05-12
TWI727921B (zh) 2021-05-21
KR20160142363A (ko) 2016-12-12
EP3126541A1 (en) 2017-02-08

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