CN106164330B - 真空处理系统以及用于装配处理系统的方法 - Google Patents

真空处理系统以及用于装配处理系统的方法 Download PDF

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Publication number
CN106164330B
CN106164330B CN201480077772.3A CN201480077772A CN106164330B CN 106164330 B CN106164330 B CN 106164330B CN 201480077772 A CN201480077772 A CN 201480077772A CN 106164330 B CN106164330 B CN 106164330B
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China
Prior art keywords
chamber
processing system
process chamber
substrate
roll
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CN201480077772.3A
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English (en)
Chinese (zh)
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CN106164330A (zh
Inventor
F·里斯
S·海因
J·亨里奇
A·索尔
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Applied Materials Inc
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Applied Materials Inc
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/52—Means for observation of the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
CN201480077772.3A 2014-04-02 2014-04-02 真空处理系统以及用于装配处理系统的方法 Active CN106164330B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2014/056605 WO2015149849A1 (en) 2014-04-02 2014-04-02 Vacuum processing system and method for mounting a processing system

Publications (2)

Publication Number Publication Date
CN106164330A CN106164330A (zh) 2016-11-23
CN106164330B true CN106164330B (zh) 2021-01-26

Family

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CN201480077772.3A Active CN106164330B (zh) 2014-04-02 2014-04-02 真空处理系统以及用于装配处理系统的方法

Country Status (7)

Country Link
US (1) US10648072B2 (enExample)
EP (1) EP3126541A1 (enExample)
JP (1) JP6375387B2 (enExample)
KR (1) KR102196407B1 (enExample)
CN (1) CN106164330B (enExample)
TW (1) TWI727921B (enExample)
WO (1) WO2015149849A1 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3414359A2 (en) * 2016-02-12 2018-12-19 Applied Materials, Inc. Vacuum processing system and methods therefor
US10304716B1 (en) * 2017-12-20 2019-05-28 Powertech Technology Inc. Package structure and manufacturing method thereof
KR102458991B1 (ko) * 2018-03-30 2022-10-25 제이에프이 스틸 가부시키가이샤 방향성 전기 강판의 제조 방법 및 연속 성막 장치
EP3921453A4 (en) * 2019-03-05 2022-11-30 Xefco Pty Ltd Improved vapour deposition system, method and moisture control device
EP4088826A4 (en) * 2020-01-06 2023-07-05 Nihon Spindle Manufacturing Co., Ltd. Coating device, partition member, and coating method
WO2021185444A1 (en) * 2020-03-18 2021-09-23 Applied Materials, Inc. Vacuum processing system for a flexible substrate, method of depositing a layer stack on a flexible substrate, and layer system
WO2021247380A1 (en) * 2020-06-04 2021-12-09 Applied Materials, Inc. Vapor deposition apparatus and method for coating a substrate in a vacuum chamber
EP4200461A4 (en) * 2020-08-21 2024-09-18 Applied Materials, Inc. PROCESSING SYSTEM FOR PROCESSING A FLEXIBLE SUBSTRATE AND METHOD FOR MEASURING A PROPERTY OF A FLEXIBLE SUBSTRATE
WO2022225731A1 (en) 2021-04-21 2022-10-27 Applied Materials, Inc. Material deposition apparatus, method of depositing material on a substrate, and material deposition system
EP4490737A1 (en) * 2022-03-08 2025-01-15 10X Genomics, Inc. In situ code design methods for minimizing optical crowding

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0466999A1 (en) * 1990-07-18 1992-01-22 Engineering Films-Establishment Process and apparatus for the surfacing of tape substrates of reels
JP3332700B2 (ja) * 1995-12-22 2002-10-07 キヤノン株式会社 堆積膜形成方法及び堆積膜形成装置
AU2003259147A1 (en) * 2002-07-17 2004-02-02 Hitco Carbon Composites, Inc. Continuous chemical vapor deposition process and process furnace
JP4591080B2 (ja) * 2004-12-27 2010-12-01 富士電機システムズ株式会社 薄膜形成装置
US7799182B2 (en) * 2006-12-01 2010-09-21 Applied Materials, Inc. Electroplating on roll-to-roll flexible solar cell substrates
EP1988186A1 (en) * 2007-04-24 2008-11-05 Galileo Vacuum Systems S.p.A. Multichamber vacuum deposition system
AU2009220188A1 (en) * 2008-03-04 2009-09-11 Solexant Corp. Process for making solar cells
US8117987B2 (en) * 2009-09-18 2012-02-21 Applied Materials, Inc. Hot wire chemical vapor deposition (CVD) inline coating tool
US9303316B1 (en) * 2010-01-15 2016-04-05 Apollo Precision Kunming Yuanhong Limited Continuous web apparatus and method using an air to vacuum seal and accumulator
JP2012136724A (ja) 2010-12-24 2012-07-19 Kobe Steel Ltd 巻取り式連続成膜装置
JP2013196848A (ja) * 2012-03-16 2013-09-30 Nitto Denko Corp 有機ｅｌ素子の製造方法及び製造装置

Also Published As

Publication number Publication date
US10648072B2 (en) 2020-05-12
WO2015149849A1 (en) 2015-10-08
JP2017509797A (ja) 2017-04-06
TW201606110A (zh) 2016-02-16
KR20160142363A (ko) 2016-12-12
TWI727921B (zh) 2021-05-21
KR102196407B1 (ko) 2020-12-29
US20170152593A1 (en) 2017-06-01
JP6375387B2 (ja) 2018-08-15
CN106164330A (zh) 2016-11-23
EP3126541A1 (en) 2017-02-08

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