TWI727921B - 真空處理系統以及用於固定其之方法 - Google Patents
真空處理系統以及用於固定其之方法 Download PDFInfo
- Publication number
- TWI727921B TWI727921B TW104110479A TW104110479A TWI727921B TW I727921 B TWI727921 B TW I727921B TW 104110479 A TW104110479 A TW 104110479A TW 104110479 A TW104110479 A TW 104110479A TW I727921 B TWI727921 B TW I727921B
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- Prior art keywords
- chamber
- processing
- processing system
- vacuum
- substrate
- Prior art date
Links
- 238000012545 processing Methods 0.000 title claims abstract description 616
- 238000000034 method Methods 0.000 title claims abstract description 88
- 239000000758 substrate Substances 0.000 claims abstract description 281
- 238000012423 maintenance Methods 0.000 claims abstract description 191
- 238000000151 deposition Methods 0.000 claims abstract description 120
- 230000008569 process Effects 0.000 claims abstract description 61
- 239000000463 material Substances 0.000 claims abstract description 21
- 238000004804 winding Methods 0.000 claims description 154
- 230000008021 deposition Effects 0.000 claims description 105
- 238000007689 inspection Methods 0.000 claims description 10
- 238000000576 coating method Methods 0.000 description 23
- 239000011248 coating agent Substances 0.000 description 22
- 239000010410 layer Substances 0.000 description 16
- 238000005229 chemical vapour deposition Methods 0.000 description 13
- 238000005240 physical vapour deposition Methods 0.000 description 13
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 11
- 238000012546 transfer Methods 0.000 description 10
- 238000005137 deposition process Methods 0.000 description 9
- 238000011109 contamination Methods 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 8
- 238000005192 partition Methods 0.000 description 8
- 238000013461 design Methods 0.000 description 7
- 239000011888 foil Substances 0.000 description 7
- 230000004888 barrier function Effects 0.000 description 6
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- 229910052751 metal Inorganic materials 0.000 description 6
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- 239000002245 particle Substances 0.000 description 6
- 230000000007 visual effect Effects 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 238000001771 vacuum deposition Methods 0.000 description 5
- 230000008901 benefit Effects 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- 239000011229 interlayer Substances 0.000 description 4
- 238000000926 separation method Methods 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 238000001816 cooling Methods 0.000 description 3
- 230000007613 environmental effect Effects 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
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- 230000006978 adaptation Effects 0.000 description 2
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- 238000012544 monitoring process Methods 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 238000012805 post-processing Methods 0.000 description 2
- 238000007781 pre-processing Methods 0.000 description 2
- 238000005096 rolling process Methods 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- RICKKZXCGCSLIU-UHFFFAOYSA-N 2-[2-[carboxymethyl-[[3-hydroxy-5-(hydroxymethyl)-2-methylpyridin-4-yl]methyl]amino]ethyl-[[3-hydroxy-5-(hydroxymethyl)-2-methylpyridin-4-yl]methyl]amino]acetic acid Chemical compound CC1=NC=C(CO)C(CN(CCN(CC(O)=O)CC=2C(=C(C)N=CC=2CO)O)CC(O)=O)=C1O RICKKZXCGCSLIU-UHFFFAOYSA-N 0.000 description 1
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- 230000003213 activating effect Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
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- 239000003989 dielectric material Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
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- 150000003384 small molecules Chemical class 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
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- 238000009423 ventilation Methods 0.000 description 1
- 238000013022 venting Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/52—Means for observation of the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| WOPCT/EP2014/056605 | 2014-04-02 | ||
| PCT/EP2014/056605 WO2015149849A1 (en) | 2014-04-02 | 2014-04-02 | Vacuum processing system and method for mounting a processing system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201606110A TW201606110A (zh) | 2016-02-16 |
| TWI727921B true TWI727921B (zh) | 2021-05-21 |
Family
ID=50440648
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW104110479A TWI727921B (zh) | 2014-04-02 | 2015-03-31 | 真空處理系統以及用於固定其之方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US10648072B2 (enExample) |
| EP (1) | EP3126541A1 (enExample) |
| JP (1) | JP6375387B2 (enExample) |
| KR (1) | KR102196407B1 (enExample) |
| CN (1) | CN106164330B (enExample) |
| TW (1) | TWI727921B (enExample) |
| WO (1) | WO2015149849A1 (enExample) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6803917B2 (ja) * | 2016-02-12 | 2020-12-23 | アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ | 真空処理システム及び真空処理を行う方法 |
| US10304716B1 (en) * | 2017-12-20 | 2019-05-28 | Powertech Technology Inc. | Package structure and manufacturing method thereof |
| CN111918981A (zh) * | 2018-03-30 | 2020-11-10 | 杰富意钢铁株式会社 | 取向性电磁钢板的制造方法及连续成膜装置 |
| WO2020176942A1 (en) * | 2019-03-05 | 2020-09-10 | Xefco Pty Ltd | Improved vapour deposition system, method and moisture control device |
| EP4088826A4 (en) * | 2020-01-06 | 2023-07-05 | Nihon Spindle Manufacturing Co., Ltd. | Coating device, partition member, and coating method |
| WO2021185444A1 (en) * | 2020-03-18 | 2021-09-23 | Applied Materials, Inc. | Vacuum processing system for a flexible substrate, method of depositing a layer stack on a flexible substrate, and layer system |
| CN115667574A (zh) * | 2020-06-04 | 2023-01-31 | 应用材料公司 | 气相沉积设备和在真空腔室中涂覆基板的方法 |
| EP4200461A4 (en) * | 2020-08-21 | 2024-09-18 | Applied Materials, Inc. | PROCESSING SYSTEM FOR PROCESSING A FLEXIBLE SUBSTRATE AND METHOD FOR MEASURING A PROPERTY OF A FLEXIBLE SUBSTRATE |
| CN117120659A (zh) | 2021-04-21 | 2023-11-24 | 应用材料公司 | 材料沉积设备、在基板上沉积材料的方法以及材料沉积系统 |
| WO2023172915A1 (en) * | 2022-03-08 | 2023-09-14 | 10X Genomics, Inc. | In situ code design methods for minimizing optical crowding |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1988186A1 (en) * | 2007-04-24 | 2008-11-05 | Galileo Vacuum Systems S.p.A. | Multichamber vacuum deposition system |
| US20090223551A1 (en) * | 2008-03-04 | 2009-09-10 | Solexant Corp. | Process for making solar cells |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0466999A1 (en) | 1990-07-18 | 1992-01-22 | Engineering Films-Establishment | Process and apparatus for the surfacing of tape substrates of reels |
| JP3332700B2 (ja) * | 1995-12-22 | 2002-10-07 | キヤノン株式会社 | 堆積膜形成方法及び堆積膜形成装置 |
| CN1681963A (zh) * | 2002-07-17 | 2005-10-12 | 希特科碳组合物公司 | 连续化学气相沉积工艺和加工炉 |
| JP4591080B2 (ja) * | 2004-12-27 | 2010-12-01 | 富士電機システムズ株式会社 | 薄膜形成装置 |
| US7799182B2 (en) * | 2006-12-01 | 2010-09-21 | Applied Materials, Inc. | Electroplating on roll-to-roll flexible solar cell substrates |
| US8117987B2 (en) * | 2009-09-18 | 2012-02-21 | Applied Materials, Inc. | Hot wire chemical vapor deposition (CVD) inline coating tool |
| US9303316B1 (en) * | 2010-01-15 | 2016-04-05 | Apollo Precision Kunming Yuanhong Limited | Continuous web apparatus and method using an air to vacuum seal and accumulator |
| JP2012136724A (ja) | 2010-12-24 | 2012-07-19 | Kobe Steel Ltd | 巻取り式連続成膜装置 |
| JP2013196848A (ja) | 2012-03-16 | 2013-09-30 | Nitto Denko Corp | 有機ｅｌ素子の製造方法及び製造装置 |
-
2014
- 2014-04-02 EP EP14715572.5A patent/EP3126541A1/en not_active Withdrawn
- 2014-04-02 JP JP2016559546A patent/JP6375387B2/ja active Active
- 2014-04-02 KR KR1020167030773A patent/KR102196407B1/ko active Active
- 2014-04-02 WO PCT/EP2014/056605 patent/WO2015149849A1/en not_active Ceased
- 2014-04-02 US US15/300,321 patent/US10648072B2/en active Active
- 2014-04-02 CN CN201480077772.3A patent/CN106164330B/zh active Active
-
2015
- 2015-03-31 TW TW104110479A patent/TWI727921B/zh active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1988186A1 (en) * | 2007-04-24 | 2008-11-05 | Galileo Vacuum Systems S.p.A. | Multichamber vacuum deposition system |
| US20090223551A1 (en) * | 2008-03-04 | 2009-09-10 | Solexant Corp. | Process for making solar cells |
Also Published As
| Publication number | Publication date |
|---|---|
| JP6375387B2 (ja) | 2018-08-15 |
| US10648072B2 (en) | 2020-05-12 |
| CN106164330B (zh) | 2021-01-26 |
| KR20160142363A (ko) | 2016-12-12 |
| CN106164330A (zh) | 2016-11-23 |
| US20170152593A1 (en) | 2017-06-01 |
| JP2017509797A (ja) | 2017-04-06 |
| EP3126541A1 (en) | 2017-02-08 |
| TW201606110A (zh) | 2016-02-16 |
| KR102196407B1 (ko) | 2020-12-29 |
| WO2015149849A1 (en) | 2015-10-08 |
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