KR102177472B1 - 그래핀 옥사이드 증착용 소스 및 이를 이용한 그래핀 옥사이드 박막 형성 방법 - Google Patents

그래핀 옥사이드 증착용 소스 및 이를 이용한 그래핀 옥사이드 박막 형성 방법 Download PDF

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KR102177472B1
KR102177472B1 KR1020180107205A KR20180107205A KR102177472B1 KR 102177472 B1 KR102177472 B1 KR 102177472B1 KR 1020180107205 A KR1020180107205 A KR 1020180107205A KR 20180107205 A KR20180107205 A KR 20180107205A KR 102177472 B1 KR102177472 B1 KR 102177472B1
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South Korea
Prior art keywords
graphene oxide
thin film
source
oxide thin
based compound
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KR1020180107205A
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English (en)
Korean (ko)
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KR20190038323A (ko
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이성우
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주식회사 테스
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    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00—Carbon; Compounds thereof
    • C01B32/15—Nano-sized carbon materials
    • C01B32/182—Graphene
    • C01B32/198—Graphene oxide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/56—After-treatment

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Nanotechnology (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Chemical Vapour Deposition (AREA)
KR1020180107205A 2017-09-29 2018-09-07 그래핀 옥사이드 증착용 소스 및 이를 이용한 그래핀 옥사이드 박막 형성 방법 KR102177472B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020170127158 2017-09-29
KR20170127158 2017-09-29

Publications (2)

Publication Number Publication Date
KR20190038323A KR20190038323A (ko) 2019-04-08
KR102177472B1 true KR102177472B1 (ko) 2020-11-11

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KR1020180107205A KR102177472B1 (ko) 2017-09-29 2018-09-07 그래핀 옥사이드 증착용 소스 및 이를 이용한 그래핀 옥사이드 박막 형성 방법

Country Status (3)

Country Link
KR (1) KR102177472B1 (zh)
CN (1) CN109573996B (zh)
TW (1) TWI709658B (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20210127620A (ko) * 2020-04-13 2021-10-22 에이에스엠 아이피 홀딩 비.브이. 질소 함유 탄소 막을 형성하는 방법 및 이를 수행하기 위한 시스템
KR102483103B1 (ko) * 2020-12-30 2023-01-02 주식회사 테스 박막증착방법

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012031024A (ja) * 2010-08-02 2012-02-16 Fuji Electric Co Ltd グラフェン薄膜の製造方法
JP2013100205A (ja) * 2011-11-09 2013-05-23 Tokyo Electron Ltd 前処理方法、グラフェンの形成方法及びグラフェン製造装置
KR101395564B1 (ko) * 2012-12-26 2014-05-27 한국세라믹기술원 금속 도핑 산화아연-산화그라핀 복합체 박막의 제조방법

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101138141B1 (ko) * 2009-12-07 2012-04-23 주식회사 케이씨텍 그래핀 시트 제조방법 및 제조장치
GB201009718D0 (en) * 2010-06-10 2010-07-21 Univ Manchester Functionalised graphene
CN102417176A (zh) * 2011-09-06 2012-04-18 天津大学 基于三维网络形貌的石墨烯-碳纳米管复合薄膜的制备方法
KR102088540B1 (ko) 2012-01-06 2020-03-12 유티-배텔, 엘엘씨 화학 기상 증착에 의한 고품질의 대규모 단층 및 다층 그래핀의 제조
CN104505445B (zh) * 2014-12-17 2018-10-19 广东德力光电有限公司 一种复合透明导电电极的led芯片制作方法
CN106629675A (zh) * 2016-09-28 2017-05-10 上海理工大学 一种高导热柔性石墨烯薄膜的制备方法
CN106783217B (zh) * 2017-01-16 2018-07-13 天津大学 高效率制备氮掺杂石墨烯碳纳米管薄膜的方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012031024A (ja) * 2010-08-02 2012-02-16 Fuji Electric Co Ltd グラフェン薄膜の製造方法
JP2013100205A (ja) * 2011-11-09 2013-05-23 Tokyo Electron Ltd 前処理方法、グラフェンの形成方法及びグラフェン製造装置
KR101395564B1 (ko) * 2012-12-26 2014-05-27 한국세라믹기술원 금속 도핑 산화아연-산화그라핀 복합체 박막의 제조방법

Also Published As

Publication number Publication date
TWI709658B (zh) 2020-11-11
KR20190038323A (ko) 2019-04-08
CN109573996B (zh) 2023-02-28
TW201915195A (zh) 2019-04-16
CN109573996A (zh) 2019-04-05

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