KR102153141B1 - 플라즈마 균일성 튜닝을 위한 멀티-무선주파수 임피던스 제어 - Google Patents

플라즈마 균일성 튜닝을 위한 멀티-무선주파수 임피던스 제어 Download PDF

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KR102153141B1
KR102153141B1 KR1020130033059A KR20130033059A KR102153141B1 KR 102153141 B1 KR102153141 B1 KR 102153141B1 KR 1020130033059 A KR1020130033059 A KR 1020130033059A KR 20130033059 A KR20130033059 A KR 20130033059A KR 102153141 B1 KR102153141 B1 KR 102153141B1
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power source
upper electrode
frequency
resonant circuit
coupled
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알렉세이 마라크타노프
라진더 딘드사
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램 리써치 코포레이션
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32091—Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/3065—Plasma etching; Reactive-ion etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32155—Frequency modulation
    • H01J37/32165—Plural frequencies
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H7/00—Multiple-port networks comprising only passive electrical elements as network components
    • H03H7/38—Impedance-matching networks
    • H03H7/40—Automatic matching of load impedance to source impedance
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • Filters And Equalizers (AREA)
KR1020130033059A 2012-03-28 2013-03-27 플라즈마 균일성 튜닝을 위한 멀티-무선주파수 임피던스 제어 Active KR102153141B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/433,004 2012-03-28
US13/433,004 US9881772B2 (en) 2012-03-28 2012-03-28 Multi-radiofrequency impedance control for plasma uniformity tuning

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KR20130110104A KR20130110104A (ko) 2013-10-08
KR102153141B1 true KR102153141B1 (ko) 2020-09-07

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US (2) US9881772B2 (enExample)
JP (2) JP2013225672A (enExample)
KR (1) KR102153141B1 (enExample)
CN (1) CN103367206B (enExample)
SG (2) SG193760A1 (enExample)
TW (2) TWI589192B (enExample)

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KR20250006402A (ko) 2023-07-03 2025-01-13 코스맥스 주식회사 비피도박테리움 애니멀리스 서브스페시스 락티스 균주 및 그의 모발 또는 두피 상태 개선 용도

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KR20250006402A (ko) 2023-07-03 2025-01-13 코스맥스 주식회사 비피도박테리움 애니멀리스 서브스페시스 락티스 균주 및 그의 모발 또는 두피 상태 개선 용도

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TWI589192B (zh) 2017-06-21
US9881772B2 (en) 2018-01-30
CN103367206A (zh) 2013-10-23
JP2018164093A (ja) 2018-10-18
TW201349946A (zh) 2013-12-01
SG10201507984VA (en) 2015-10-29
US20130260567A1 (en) 2013-10-03
JP6623256B2 (ja) 2019-12-18
SG193760A1 (en) 2013-10-30
US20180166256A1 (en) 2018-06-14
US10593516B2 (en) 2020-03-17
TWI538571B (zh) 2016-06-11
CN103367206B (zh) 2017-07-18
JP2013225672A (ja) 2013-10-31
KR20130110104A (ko) 2013-10-08
TW201622492A (zh) 2016-06-16

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