KR102132094B1 - 전자 부품 실장 장치 및 전자 부품 실장 방법 - Google Patents

전자 부품 실장 장치 및 전자 부품 실장 방법 Download PDF

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Publication number
KR102132094B1
KR102132094B1 KR1020180156920A KR20180156920A KR102132094B1 KR 102132094 B1 KR102132094 B1 KR 102132094B1 KR 1020180156920 A KR1020180156920 A KR 1020180156920A KR 20180156920 A KR20180156920 A KR 20180156920A KR 102132094 B1 KR102132094 B1 KR 102132094B1
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KR
South Korea
Prior art keywords
substrate
chip component
mirror
chip
recognition
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KR1020180156920A
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English (en)
Korean (ko)
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KR20190068467A (ko
Inventor
아끼따까 야마기시
겐고 미야사까
나오또 가미지마
히로또시 혼도
Original Assignee
아스리트 에프에이 가부시키가이샤
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Publication of KR20190068467A publication Critical patent/KR20190068467A/ko
Application granted granted Critical
Publication of KR102132094B1 publication Critical patent/KR102132094B1/ko

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67144Apparatus for mounting on conductive members, e.g. leadframes or conductors on insulating substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/52Mounting semiconductor bodies in containers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67092Apparatus for mechanical treatment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67121Apparatus for making assemblies not otherwise provided for, e.g. package constructions
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67259Position monitoring, e.g. misposition detection or presence detection
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/682Mask-wafer alignment

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Supply And Installment Of Electrical Components (AREA)
  • Wire Bonding (AREA)
  • Die Bonding (AREA)
KR1020180156920A 2017-12-08 2018-12-07 전자 부품 실장 장치 및 전자 부품 실장 방법 KR102132094B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2017-235988 2017-12-08
JP2017235988A JP2019102771A (ja) 2017-12-08 2017-12-08 電子部品実装装置及び電子部品実装方法

Publications (2)

Publication Number Publication Date
KR20190068467A KR20190068467A (ko) 2019-06-18
KR102132094B1 true KR102132094B1 (ko) 2020-07-08

Family

ID=66943307

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020180156920A KR102132094B1 (ko) 2017-12-08 2018-12-07 전자 부품 실장 장치 및 전자 부품 실장 방법

Country Status (3)

Country Link
JP (1) JP2019102771A (ja)
KR (1) KR102132094B1 (ja)
CN (1) CN109906029B (ja)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110854045A (zh) * 2019-11-20 2020-02-28 西北电子装备技术研究所(中国电子科技集团公司第二研究所) 利用准直光路调整芯片吸盘与基板吸盘平行度的方法
JP7436251B2 (ja) * 2020-03-16 2024-02-21 ファスフォードテクノロジ株式会社 ダイボンディング装置および半導体装置の製造方法
JP7451259B2 (ja) * 2020-03-26 2024-03-18 芝浦メカトロニクス株式会社 電子部品の実装装置
JP7450429B2 (ja) * 2020-03-26 2024-03-15 芝浦メカトロニクス株式会社 電子部品の実装装置
KR102590191B1 (ko) * 2020-06-30 2023-10-16 시바우라 메카트로닉스 가부시끼가이샤 실장 장치 및 실장 방법
CN115836383A (zh) 2020-07-13 2023-03-21 东丽工程株式会社 安装装置及安装方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003077955A (ja) 2001-09-05 2003-03-14 Toshiba Corp ボンディング方法及びボンディング装置
KR100540934B1 (ko) * 2002-08-30 2006-01-11 가부시키가이샤 무라타 세이사쿠쇼 부품 장착 방법 및 부품 장착 장치

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3209623B2 (ja) * 1993-08-31 2001-09-17 エヌイーシーマシナリー株式会社 マウンタ
JP4065805B2 (ja) * 2003-04-10 2008-03-26 富士機械製造株式会社 撮像装置
CN100533132C (zh) * 2004-09-06 2009-08-26 欧姆龙株式会社 基板检查方法及基板检查装置
KR101245995B1 (ko) 2005-05-31 2013-03-20 토레 엔지니어링 가부시키가이샤 본딩장치
JP4642565B2 (ja) * 2005-06-29 2011-03-02 東レエンジニアリング株式会社 実装方法および実装装置
JP5008952B2 (ja) 2006-11-15 2012-08-22 キヤノンマシナリー株式会社 ダイボンダおよびダイボンディング方法
JP2010283010A (ja) * 2009-06-02 2010-12-16 Adwelds:Kk アライメント装置、この装置を備えた実装装置およびアライメント方法
JP6388338B2 (ja) * 2014-11-11 2018-09-12 ボンドテック株式会社 電子部品装着装置および電子部品装着方法
JP6681241B2 (ja) * 2016-03-30 2020-04-15 アスリートFa株式会社 電子部品実装装置および電子部品製造方法
CN107371360B (zh) * 2016-05-11 2019-07-05 松下知识产权经营株式会社 部件安装装置
JP6390925B2 (ja) * 2016-05-11 2018-09-19 パナソニックIpマネジメント株式会社 部品実装装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003077955A (ja) 2001-09-05 2003-03-14 Toshiba Corp ボンディング方法及びボンディング装置
KR100540934B1 (ko) * 2002-08-30 2006-01-11 가부시키가이샤 무라타 세이사쿠쇼 부품 장착 방법 및 부품 장착 장치

Also Published As

Publication number Publication date
KR20190068467A (ko) 2019-06-18
CN109906029A (zh) 2019-06-18
CN109906029B (zh) 2021-01-01
JP2019102771A (ja) 2019-06-24

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