KR102123925B1 - 기공 함유 불투명 석영 유리의 제조 방법 - Google Patents
기공 함유 불투명 석영 유리의 제조 방법 Download PDFInfo
- Publication number
- KR102123925B1 KR102123925B1 KR1020170064377A KR20170064377A KR102123925B1 KR 102123925 B1 KR102123925 B1 KR 102123925B1 KR 1020170064377 A KR1020170064377 A KR 1020170064377A KR 20170064377 A KR20170064377 A KR 20170064377A KR 102123925 B1 KR102123925 B1 KR 102123925B1
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- KR
- South Korea
- Prior art keywords
- sio
- particles
- granule
- bet
- partially densified
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 61
- 239000011148 porous material Substances 0.000 title claims abstract description 35
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 25
- 239000002245 particle Substances 0.000 claims abstract description 216
- 229910004298 SiO 2 Inorganic materials 0.000 claims abstract description 161
- 239000008187 granular material Substances 0.000 claims abstract description 124
- 238000000034 method Methods 0.000 claims abstract description 92
- 238000000227 grinding Methods 0.000 claims abstract description 39
- 238000000280 densification Methods 0.000 claims abstract description 32
- 239000006185 dispersion Substances 0.000 claims abstract description 32
- 239000007921 spray Substances 0.000 claims abstract description 29
- 238000005245 sintering Methods 0.000 claims abstract description 19
- 238000009826 distribution Methods 0.000 claims description 32
- 238000005469 granulation Methods 0.000 claims description 24
- 230000003179 granulation Effects 0.000 claims description 24
- 239000011164 primary particle Substances 0.000 claims description 17
- 239000007788 liquid Substances 0.000 claims description 14
- 238000001179 sorption measurement Methods 0.000 claims description 14
- 230000036961 partial effect Effects 0.000 claims description 10
- 238000000465 moulding Methods 0.000 claims description 8
- 230000002776 aggregation Effects 0.000 claims description 7
- 239000000460 chlorine Substances 0.000 claims description 6
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 5
- 229910052801 chlorine Inorganic materials 0.000 claims description 5
- 238000002360 preparation method Methods 0.000 claims description 5
- 238000005054 agglomeration Methods 0.000 claims description 4
- 229910021486 amorphous silicon dioxide Inorganic materials 0.000 claims description 3
- 238000007569 slipcasting Methods 0.000 abstract description 5
- 239000000377 silicon dioxide Substances 0.000 abstract description 3
- 229910052906 cristobalite Inorganic materials 0.000 abstract description 2
- 235000012239 silicon dioxide Nutrition 0.000 abstract description 2
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- 230000008569 process Effects 0.000 description 36
- 239000012634 fragment Substances 0.000 description 16
- 230000015572 biosynthetic process Effects 0.000 description 12
- 239000000463 material Substances 0.000 description 10
- 239000004071 soot Substances 0.000 description 10
- 239000007787 solid Substances 0.000 description 9
- 239000012535 impurity Substances 0.000 description 8
- 238000012545 processing Methods 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 238000001035 drying Methods 0.000 description 7
- 238000005259 measurement Methods 0.000 description 7
- 239000002105 nanoparticle Substances 0.000 description 7
- 238000001238 wet grinding Methods 0.000 description 6
- 230000007423 decrease Effects 0.000 description 5
- 239000000428 dust Substances 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 238000007711 solidification Methods 0.000 description 5
- 230000008023 solidification Effects 0.000 description 5
- 230000003068 static effect Effects 0.000 description 5
- 230000001186 cumulative effect Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 238000010298 pulverizing process Methods 0.000 description 4
- 238000004220 aggregation Methods 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- 238000005056 compaction Methods 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 239000008367 deionised water Substances 0.000 description 3
- 229910021641 deionized water Inorganic materials 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000011361 granulated particle Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000011796 hollow space material Substances 0.000 description 3
- 230000007062 hydrolysis Effects 0.000 description 3
- 238000006460 hydrolysis reaction Methods 0.000 description 3
- 230000003993 interaction Effects 0.000 description 3
- 239000013067 intermediate product Substances 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000004438 BET method Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 238000000149 argon plasma sintering Methods 0.000 description 2
- 229910052791 calcium Inorganic materials 0.000 description 2
- 229910002091 carbon monoxide Inorganic materials 0.000 description 2
- 238000009690 centrifugal atomisation Methods 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000004512 die casting Methods 0.000 description 2
- 238000001125 extrusion Methods 0.000 description 2
- 238000009483 freeze granulation Methods 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 229910052748 manganese Inorganic materials 0.000 description 2
- 238000000691 measurement method Methods 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 238000005457 optimization Methods 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 230000008092 positive effect Effects 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000000523 sample Substances 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 238000004017 vitrification Methods 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- 229920005372 Plexiglas® Polymers 0.000 description 1
- WGKMWBIFNQLOKM-UHFFFAOYSA-N [O].[Cl] Chemical compound [O].[Cl] WGKMWBIFNQLOKM-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 238000007908 dry granulation Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 238000009477 fluid bed granulation Methods 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 238000005816 glass manufacturing process Methods 0.000 description 1
- 238000013038 hand mixing Methods 0.000 description 1
- 238000000265 homogenisation Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000001095 inductively coupled plasma mass spectrometry Methods 0.000 description 1
- 238000002354 inductively-coupled plasma atomic emission spectroscopy Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000006101 laboratory sample Substances 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 150000003961 organosilicon compounds Chemical class 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 238000013001 point bending Methods 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000012797 qualification Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 239000013074 reference sample Substances 0.000 description 1
- 238000001878 scanning electron micrograph Methods 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 238000009864 tensile test Methods 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 238000002604 ultrasonography Methods 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 230000003313 weakening effect Effects 0.000 description 1
- 238000005550 wet granulation Methods 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/10—Forming beads
- C03B19/108—Forming porous, sintered or foamed beads
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
- C03B19/066—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction for the production of quartz or fused silica articles
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/02—Pure silica glass, e.g. pure fused quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/02—Pure silica glass, e.g. pure fused quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2204/00—Glasses, glazes or enamels with special properties
- C03C2204/04—Opaque glass, glaze or enamel
- C03C2204/06—Opaque glass, glaze or enamel opacified by gas
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Dispersion Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Silicon Compounds (AREA)
- Glass Melting And Manufacturing (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP16171047.0A EP3248950B1 (de) | 2016-05-24 | 2016-05-24 | Verfahren zur herstellung eines poren enthaltenden, opaken quarzglases |
| EP16171047.0 | 2016-05-24 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20170132696A KR20170132696A (ko) | 2017-12-04 |
| KR102123925B1 true KR102123925B1 (ko) | 2020-06-18 |
Family
ID=56080293
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020170064377A Active KR102123925B1 (ko) | 2016-05-24 | 2017-05-24 | 기공 함유 불투명 석영 유리의 제조 방법 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US10358373B2 (enExample) |
| EP (1) | EP3248950B1 (enExample) |
| JP (1) | JP6698585B2 (enExample) |
| KR (1) | KR102123925B1 (enExample) |
| CN (1) | CN107417071B (enExample) |
| TW (1) | TWI705045B (enExample) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BR112017027426A2 (pt) * | 2015-11-04 | 2018-09-04 | Unimin Corp | pó de quartzo purificado modificado para revestir cabo de fibra ótica e método de modificar um pó de quartzo altamente purificado |
| CN108563615B (zh) * | 2018-04-09 | 2022-04-01 | 清华大学深圳研究生院 | 支柱绝缘子聚氨酯孔泡的评估方法 |
| JP7157932B2 (ja) * | 2019-01-11 | 2022-10-21 | 株式会社Sumco | シリカガラスルツボの製造装置および製造方法 |
| JP6751822B1 (ja) * | 2019-06-03 | 2020-09-09 | 東ソー・クォーツ株式会社 | 不透明石英ガラス及びその製造方法 |
| CN115279705A (zh) * | 2020-02-28 | 2022-11-01 | Ａｇｃ株式会社 | 二氧化硅玻璃、使用有二氧化硅玻璃的高频装置、以及二氧化硅玻璃的制造方法 |
| CN111233308A (zh) * | 2020-03-17 | 2020-06-05 | 江苏亨通智能科技有限公司 | 一种不透明石英玻璃锭及其制备方法 |
| JPWO2022215662A1 (enExample) * | 2021-04-07 | 2022-10-13 | ||
| EP4108641A1 (de) * | 2021-06-24 | 2022-12-28 | Heraeus Quarzglas GmbH & Co. KG | Formkörper aus opakem quarzglas sowie verfahren zur herstellung desselben |
| CN116375315B (zh) * | 2022-11-29 | 2024-11-22 | 湖北菲利华石英玻璃股份有限公司 | 一种掺钛合成石英砂的制备方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004131378A (ja) | 2002-09-21 | 2004-04-30 | Heraeus Quarzglas Gmbh & Co Kg | 不透明石英ガラス材の製造方法 |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4042361A (en) | 1976-04-26 | 1977-08-16 | Corning Glass Works | Method of densifying metal oxides |
| GB8627735D0 (en) * | 1986-11-20 | 1986-12-17 | Tsl Group Plc | Vitreous silica |
| US4872895A (en) * | 1986-12-11 | 1989-10-10 | American Telephone And Telegraph Company, At&T Bell Laboratories | Method for fabricating articles which include high silica glass bodies |
| DE3814863A1 (de) * | 1988-05-02 | 1989-11-16 | Siemens Ag | Verfahren zum herstellen von vielschichtenkeramik auf silikatbasis |
| DE19962451C1 (de) * | 1999-12-22 | 2001-08-30 | Heraeus Quarzglas | Verfahren für die Herstellung von opakem Quarzglas und für die Durchführung des Verfahrens geeignetes Si0¶2¶-Granulat |
| DE10019693B4 (de) | 2000-04-20 | 2006-01-19 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung eines Bauteils aus opakem, synthetischen Quarzglas, nach dem Verfahren hergestelltes Quarzglasrohr, sowie Verwendung desselben |
| EP1328482A1 (en) * | 2000-09-28 | 2003-07-23 | Corning Incorporated | Optical glass silica soot particles and method of making same |
| DE10114484C2 (de) * | 2001-03-24 | 2003-10-16 | Heraeus Quarzglas | Verfahren für die Herstellung eines Komposit-Werkstoffs mit einem SiO¶2¶-Gehalt von mindestens 99 Gew.-%, und Verwendung des nach dem Verfahren erhaltenen Komposit-Werkstoffs |
| DE10262015B3 (de) * | 2002-09-20 | 2004-07-15 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren für die Herstellung eines opaken Quarzglas-Kompositwerkstoffs |
| DE10243954B3 (de) * | 2002-09-20 | 2004-07-08 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren für die Herstellung eines opaken Quarzglas-Kompositwerkstoffs sowie Verwendung desselben |
| FR2858611B1 (fr) * | 2003-08-07 | 2006-11-24 | Saint Gobain Ct Recherches | Procede de fabrication d'une piece en silice amorphe frittee, moule et barbotine mis en oeuvre dans ce procede |
| JP2005097103A (ja) * | 2003-09-22 | 2005-04-14 | Heraeus Quarzglas Gmbh & Co Kg | 複合材料からキャスティングを製造する方法とセラミックもしくはガラス質の複合材料のキャスティング |
| DE102006052512A1 (de) * | 2006-11-06 | 2008-05-08 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung von opakem Quarzglas, nach dem Verfahren erhaltenes Halbzeug sowie daraus hergestelltes Bauteil |
| DE102007030698B4 (de) * | 2007-06-30 | 2009-06-10 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung eines Verbundkörpers aus einem Basiskörper aus opakem Quarzglas und einer dichten Versiegelungsschicht sowie Verwendung des Verbundkörpers |
| JP2011207719A (ja) * | 2010-03-30 | 2011-10-20 | Mitsubishi Materials Corp | 合成非晶質シリカ粉末とその製造方法 |
| CN102167500B (zh) * | 2011-01-10 | 2013-01-09 | 圣戈班石英（锦州）有限公司 | 一种不透明石英实验室器皿的制备方法 |
| DE102012004564A1 (de) | 2012-03-09 | 2013-09-12 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung einer pastösen SIO2-Masse,sowie deren Verwendlung |
| US9463997B2 (en) * | 2013-08-28 | 2016-10-11 | Shin-Etsu Chemical Co., Ltd. | Composite particle, method of producing same, resin composition containing the particle, reflector formed from the composition, and light-emitting semiconductor device using the reflector |
| EP2878584B1 (de) * | 2013-11-28 | 2017-01-04 | Heraeus Quarzglas GmbH & Co. KG | Verfahren zur Herstellung eines beschichteten Bauteils aus Quarzglas oder Quarzgut |
| EP3000790B2 (de) * | 2014-09-29 | 2023-07-26 | Heraeus Quarzglas GmbH & Co. KG | Verfahren für die Herstellung von Bauteilen aus synthetischem Quarzglas aus SiO2-Granulat |
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2016
- 2016-05-24 EP EP16171047.0A patent/EP3248950B1/de active Active
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- 2017-05-24 KR KR1020170064377A patent/KR102123925B1/ko active Active
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP2004131378A (ja) | 2002-09-21 | 2004-04-30 | Heraeus Quarzglas Gmbh & Co Kg | 不透明石英ガラス材の製造方法 |
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| Publication number | Publication date |
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| CN107417071A (zh) | 2017-12-01 |
| CN107417071B (zh) | 2021-08-17 |
| US10358373B2 (en) | 2019-07-23 |
| JP2017210403A (ja) | 2017-11-30 |
| TW201741256A (zh) | 2017-12-01 |
| KR20170132696A (ko) | 2017-12-04 |
| EP3248950B1 (de) | 2020-08-05 |
| TWI705045B (zh) | 2020-09-21 |
| US20170341968A1 (en) | 2017-11-30 |
| EP3248950A1 (de) | 2017-11-29 |
| JP6698585B2 (ja) | 2020-05-27 |
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