KR102078079B1 - 노광 장치, 노광 방법, 및 물품의 제조 방법 - Google Patents

노광 장치, 노광 방법, 및 물품의 제조 방법 Download PDF

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Publication number
KR102078079B1
KR102078079B1 KR1020190024474A KR20190024474A KR102078079B1 KR 102078079 B1 KR102078079 B1 KR 102078079B1 KR 1020190024474 A KR1020190024474 A KR 1020190024474A KR 20190024474 A KR20190024474 A KR 20190024474A KR 102078079 B1 KR102078079 B1 KR 102078079B1
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KR
South Korea
Prior art keywords
substrate
exposure
height
height information
exposure area
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KR1020190024474A
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English (en)
Korean (ko)
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KR20190026709A (ko
Inventor
미츠히데 니시무라
Original Assignee
캐논 가부시끼가이샤
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Publication of KR20190026709A publication Critical patent/KR20190026709A/ko
Application granted granted Critical
Publication of KR102078079B1 publication Critical patent/KR102078079B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/22—Exposing sequentially with the same light pattern different positions of the same surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/201—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G03F9/7015—Reference, i.e. alignment of original or workpiece with respect to a reference not on the original or workpiece

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020190024474A 2015-04-15 2019-03-04 노광 장치, 노광 방법, 및 물품의 제조 방법 KR102078079B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2015083484 2015-04-15
JPJP-P-2015-083484 2015-04-15
JP2016067408A JP6762746B2 (ja) 2015-04-15 2016-03-30 露光装置および露光方法、ならびに物品の製造方法
JPJP-P-2016-067408 2016-03-30

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020160043951A Division KR20160123236A (ko) 2015-04-15 2016-04-11 노광 장치, 노광 방법, 및 물품의 제조 방법

Publications (2)

Publication Number Publication Date
KR20190026709A KR20190026709A (ko) 2019-03-13
KR102078079B1 true KR102078079B1 (ko) 2020-02-17

Family

ID=57487205

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020190024474A KR102078079B1 (ko) 2015-04-15 2019-03-04 노광 장치, 노광 방법, 및 물품의 제조 방법

Country Status (3)

Country Link
JP (1) JP6762746B2 (ja)
KR (1) KR102078079B1 (ja)
TW (1) TWI637242B (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6591482B2 (ja) 2017-05-22 2019-10-16 株式会社東海理化電機製作所 露光方法
NL2020956A (en) * 2017-06-08 2018-12-13 Asml Netherlands Bv System and method for measurement of alignment
JP2024062787A (ja) 2022-10-25 2024-05-10 キヤノン株式会社 露光装置および物品製造方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5742067A (en) 1994-11-29 1998-04-21 Nikon Corporation Exposure method and apparatus therefor
JP2001093813A (ja) 1999-09-22 2001-04-06 Nec Corp ステッパ式露光方法
JP2010283037A (ja) 2009-06-02 2010-12-16 Canon Inc 露光装置およびデバイス製造方法
JP2012133122A (ja) 2010-12-21 2012-07-12 Nsk Technology Co Ltd 近接露光装置及びそのギャップ測定方法
JP2014099562A (ja) 2012-11-15 2014-05-29 Canon Inc 露光装置、露光方法及びデバイスの製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4598902B2 (ja) * 1998-05-20 2010-12-15 キヤノン株式会社 走査露光装置およびデバイス製造方法
JP2002164276A (ja) * 2000-11-28 2002-06-07 Nikon Corp 焦点合わせ方法、アライメント方法、露光方法、露光装置、並びにデバイスの製造方法
WO2005088686A1 (ja) * 2004-03-16 2005-09-22 Nikon Corporation 段差計測方法及び装置、並びに露光方法及び装置
JP2006222312A (ja) * 2005-02-10 2006-08-24 Canon Inc ステージ制御装置及びその方法、ステージ装置並びに露光装置
JP2013246258A (ja) * 2012-05-24 2013-12-09 Nikon Corp 焦点位置補正方法、露光方法、デバイス製造方法及び露光装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5742067A (en) 1994-11-29 1998-04-21 Nikon Corporation Exposure method and apparatus therefor
JP2001093813A (ja) 1999-09-22 2001-04-06 Nec Corp ステッパ式露光方法
JP2010283037A (ja) 2009-06-02 2010-12-16 Canon Inc 露光装置およびデバイス製造方法
JP2012133122A (ja) 2010-12-21 2012-07-12 Nsk Technology Co Ltd 近接露光装置及びそのギャップ測定方法
JP2014099562A (ja) 2012-11-15 2014-05-29 Canon Inc 露光装置、露光方法及びデバイスの製造方法

Also Published As

Publication number Publication date
JP2016206654A (ja) 2016-12-08
KR20190026709A (ko) 2019-03-13
JP6762746B2 (ja) 2020-09-30
TW201636744A (zh) 2016-10-16
TWI637242B (zh) 2018-10-01

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