KR102001363B1 - 원통형 스퍼터링 타겟 및 그 제조 방법 - Google Patents

원통형 스퍼터링 타겟 및 그 제조 방법 Download PDF

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KR102001363B1
KR102001363B1 KR1020190070769A KR20190070769A KR102001363B1 KR 102001363 B1 KR102001363 B1 KR 102001363B1 KR 1020190070769 A KR1020190070769 A KR 1020190070769A KR 20190070769 A KR20190070769 A KR 20190070769A KR 102001363 B1 KR102001363 B1 KR 102001363B1
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cylindrical
sintered body
oxygen
cylinder
sintering
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KR20190071656A (ko
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사토루 타테노
코조 오사다
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제이엑스금속주식회사
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    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/64—Burning or sintering processes
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/453—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates
    • C04B35/457—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates based on tin oxides or stannates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30—Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3293—Tin oxides, stannates or oxide forming salts thereof, e.g. indium tin oxide [ITO]
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/65—Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes
    • C04B2235/658—Atmosphere during thermal treatment
    • C04B2235/6583—Oxygen containing atmosphere, e.g. with changing oxygen pressures
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/65—Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes
    • C04B2235/658—Atmosphere during thermal treatment
    • C04B2235/6586—Processes characterised by the flow of gas

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Structural Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physical Vapour Deposition (AREA)
KR1020190070769A 2016-03-28 2019-06-14 원통형 스퍼터링 타겟 및 그 제조 방법 Active KR102001363B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JPJP-P-2016-064132 2016-03-28
JP2016064132 2016-03-28
JP2016214323A JP6397869B2 (ja) 2016-03-28 2016-11-01 円筒型スパッタリングターゲット及びその製造方法
JPJP-P-2016-214323 2016-11-01

Related Parent Applications (1)

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KR1020170025870A Division KR20170113075A (ko) 2016-03-28 2017-02-28 원통형 스퍼터링 타겟 및 그 제조 방법

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KR20190071656A KR20190071656A (ko) 2019-06-24
KR102001363B1 true KR102001363B1 (ko) 2019-07-17

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KR1020190070769A Active KR102001363B1 (ko) 2016-03-28 2019-06-14 원통형 스퍼터링 타겟 및 그 제조 방법

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JP (3) JP6397869B2 (enrdf_load_stackoverflow)
KR (1) KR102001363B1 (enrdf_load_stackoverflow)
TW (4) TWI698542B (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6523510B1 (ja) * 2018-03-30 2019-06-05 Ｊｘ金属株式会社 スパッタリングターゲット
BE1028482B1 (nl) * 2020-07-14 2022-02-14 Soleras Advanced Coatings Bv Vervaardiging en hervullen van sputterdoelen
BE1028481B1 (nl) 2020-07-14 2022-02-14 Soleras Advanced Coatings Bv Sputterdoel met grote densiteit

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0776672B2 (ja) * 1986-08-26 1995-08-16 川崎重工業株式会社 流動層炉の分散板ノズル
JPH08144056A (ja) * 1994-11-22 1996-06-04 Mitsubishi Materials Corp 高強度を有するｉｔｏ薄膜形成用スパッタリングターゲット材の製造法
JP4227227B2 (ja) * 1998-10-30 2009-02-18 Ｄｏｗａホールディングス株式会社 Ｉｔｏスパッタリングターゲットの製造方法
JP2005069668A (ja) * 2003-08-01 2005-03-17 Asahi Glass Co Ltd 窒化ケイ素質セラミックス用焼成容器
TWI390062B (zh) * 2004-03-05 2013-03-21 Tosoh Corp 圓柱形濺射標靶，陶瓷燒結體，以及製造燒結體的方法
JP5299415B2 (ja) * 2010-12-13 2013-09-25 住友金属鉱山株式会社 円筒形スパッタリングターゲット用酸化物焼結体およびその製造方法
JP5750060B2 (ja) * 2012-01-18 2015-07-15 三井金属鉱業株式会社 セラミックス円筒形スパッタリングターゲット材およびその製造方法
TW201410904A (zh) * 2012-07-30 2014-03-16 Tosoh Corp 氧化物燒結體、濺鍍靶及其製造方法
JP6186649B2 (ja) * 2013-07-09 2017-08-30 株式会社大一商会 遊技機
JP5799154B2 (ja) * 2013-12-13 2015-10-21 Jx日鉱日石金属株式会社 スパッタリングターゲット及びその製造方法
JP5887391B1 (ja) * 2014-08-22 2016-03-16 三井金属鉱業株式会社 スパッタリングターゲット用ターゲット材の製造方法および爪部材
JP6464776B2 (ja) * 2014-10-29 2019-02-06 住友金属鉱山株式会社 円筒形セラミックス焼結体およびその製造方法
JP2016117950A (ja) 2014-12-22 2016-06-30 住友化学株式会社 円筒型ターゲット材の製造方法および円筒型ターゲット材
JP5887625B1 (ja) * 2015-03-27 2016-03-16 Ｊｘ金属株式会社 円筒型スパッタリングターゲット、円筒型焼結体、円筒型成形体及びそれらの製造方法
JP6532287B2 (ja) * 2015-05-14 2019-06-19 キヤノン株式会社 医療診断支援装置、情報処理方法及びプログラム
JP2016014191A (ja) * 2015-07-21 2016-01-28 三井金属鉱業株式会社 セラミックス円筒形スパッタリングターゲット材およびその製造方法

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JP6397869B2 (ja) 2018-09-26
JP6967372B2 (ja) 2021-11-17
JP2017178784A (ja) 2017-10-05
TW201819660A (zh) 2018-06-01
TW202014543A (zh) 2020-04-16
JP2017197425A (ja) 2017-11-02
TWI704243B (zh) 2020-09-11
TWI635194B (zh) 2018-09-11
TWI699444B (zh) 2020-07-21
TW202035740A (zh) 2020-10-01
JP2018009251A (ja) 2018-01-18
KR20190071656A (ko) 2019-06-24
TWI698542B (zh) 2020-07-11
TW201734240A (zh) 2017-10-01
JP7244989B2 (ja) 2023-03-23

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