KR101992866B1 - 착색 감광성 수지 조성물 - Google Patents

착색 감광성 수지 조성물 Download PDF

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Publication number
KR101992866B1
KR101992866B1 KR1020130013376A KR20130013376A KR101992866B1 KR 101992866 B1 KR101992866 B1 KR 101992866B1 KR 1020130013376 A KR1020130013376 A KR 1020130013376A KR 20130013376 A KR20130013376 A KR 20130013376A KR 101992866 B1 KR101992866 B1 KR 101992866B1
Authority
KR
South Korea
Prior art keywords
resin composition
photosensitive resin
compound
colored photosensitive
group
Prior art date
Application number
KR1020130013376A
Other languages
English (en)
Korean (ko)
Other versions
KR20140100266A (ko
Inventor
김봉규
신규철
Original Assignee
동우 화인켐 주식회사
스미또모 가가꾸 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 동우 화인켐 주식회사, 스미또모 가가꾸 가부시키가이샤 filed Critical 동우 화인켐 주식회사
Priority to KR1020130013376A priority Critical patent/KR101992866B1/ko
Priority to CN201410045197.0A priority patent/CN103969953B/zh
Publication of KR20140100266A publication Critical patent/KR20140100266A/ko
Application granted granted Critical
Publication of KR101992866B1 publication Critical patent/KR101992866B1/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
KR1020130013376A 2013-02-06 2013-02-06 착색 감광성 수지 조성물 KR101992866B1 (ko)

Priority Applications (2)

Application Number Priority Date Filing Date Title
KR1020130013376A KR101992866B1 (ko) 2013-02-06 2013-02-06 착색 감광성 수지 조성물
CN201410045197.0A CN103969953B (zh) 2013-02-06 2014-02-07 着色感光性树脂组合物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020130013376A KR101992866B1 (ko) 2013-02-06 2013-02-06 착색 감광성 수지 조성물

Publications (2)

Publication Number Publication Date
KR20140100266A KR20140100266A (ko) 2014-08-14
KR101992866B1 true KR101992866B1 (ko) 2019-06-25

Family

ID=51239620

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020130013376A KR101992866B1 (ko) 2013-02-06 2013-02-06 착색 감광성 수지 조성물

Country Status (2)

Country Link
KR (1) KR101992866B1 (zh)
CN (1) CN103969953B (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101992867B1 (ko) * 2013-03-29 2019-06-25 동우 화인켐 주식회사 착색 감광성 수지 조성물
KR102348810B1 (ko) * 2015-10-01 2022-01-07 동우 화인켐 주식회사 착색 감광성 수지 조성물, 이를 포함하는 컬러필터 및 표시장치
CN107861336B (zh) * 2016-09-21 2021-10-29 东友精细化工有限公司 红色固化性树脂组合物、由红色固化性树脂组合物形成的滤色器、包含滤色器的显示装置
KR102510668B1 (ko) * 2017-02-01 2023-03-16 동우 화인켐 주식회사 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상표시장치
KR102494967B1 (ko) * 2017-02-01 2023-02-02 동우 화인켐 주식회사 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상표시장치
KR102355812B1 (ko) * 2017-12-05 2022-01-26 동우 화인켐 주식회사 착색 감광성 수지 조성물, 컬러필터 및 화상표시장치
KR102456397B1 (ko) * 2018-03-08 2022-10-19 동우 화인켐 주식회사 적색 감광성 수지 조성물 및 이를 포함하는 컬러필터
CN116736635B (zh) * 2023-06-14 2024-04-19 珦盛新材料(珠海)有限公司 感光性树脂组合物、粘合剂聚合物、单体、元件、抗蚀剂图形制造方法和印刷线路制造方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7636857B2 (en) 2004-05-24 2009-12-22 Interdigital Technology Corporation Data-mover controller with plural registers for supporting ciphering operations
JP4621036B2 (ja) * 2005-02-08 2011-01-26 太陽ホールディングス株式会社 感光性樹脂組成物、及びその硬化物並びに該硬化物からなる表示パネル用スペーサー
JP2006220790A (ja) * 2005-02-09 2006-08-24 Taiyo Ink Mfg Ltd 表示パネル用感光性樹脂組成物、及びその硬化物並びに表示パネル用スペーサー
JP5317396B2 (ja) 2006-07-03 2013-10-16 キヤノン株式会社 インクジェット記録装置
KR100881860B1 (ko) 2007-01-17 2009-02-06 제일모직주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한 이미지센서컬러필터
KR20090110787A (ko) * 2008-04-18 2009-10-22 스미또모 가가꾸 가부시키가이샤 착색 감광성 수지 조성물
JP5504627B2 (ja) * 2008-07-01 2014-05-28 住友化学株式会社 着色感光性樹脂組成物
CN101565472B (zh) * 2009-05-19 2011-05-04 常州强力电子新材料有限公司 酮肟酯类光引发剂
KR20120088026A (ko) * 2010-10-14 2012-08-08 동우 화인켐 주식회사 착색 감광성 수지 조성물, 컬러필터 및 이를 구비한 액정표시장치
KR20120056201A (ko) * 2010-11-24 2012-06-01 후지필름 가부시키가이샤 착색 감광성 수지 조성물, 패턴형성방법, 컬러필터의 제조방법, 컬러필터 및 그것을 구비한 표시장치
JP4911253B1 (ja) * 2011-04-28 2012-04-04 大日本印刷株式会社 染料分散液、カラーフィルター用感光性樹脂組成物、カラーフィルター、液晶表示装置及び、有機発光表示装置
JP6060539B2 (ja) * 2011-07-08 2017-01-18 住友化学株式会社 感光性樹脂組成物

Also Published As

Publication number Publication date
KR20140100266A (ko) 2014-08-14
CN103969953A (zh) 2014-08-06
CN103969953B (zh) 2017-06-30

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