KR101982502B1 - 감방사선성 착색 조성물, 컬러 필터 및 표시 소자 - Google Patents

감방사선성 착색 조성물, 컬러 필터 및 표시 소자 Download PDF

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Publication number
KR101982502B1
KR101982502B1 KR1020130021775A KR20130021775A KR101982502B1 KR 101982502 B1 KR101982502 B1 KR 101982502B1 KR 1020130021775 A KR1020130021775 A KR 1020130021775A KR 20130021775 A KR20130021775 A KR 20130021775A KR 101982502 B1 KR101982502 B1 KR 101982502B1
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South Korea
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color filter
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KR1020130021775A
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KR20130115116A (ko
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히로유키 고마츠
쿄우이치로우 류우
코우지 이타노
요시키 이마무라
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제이에스알 가부시끼가이샤
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Liquid Crystal (AREA)
  • Optical Filters (AREA)
KR1020130021775A 2012-04-11 2013-02-28 감방사선성 착색 조성물, 컬러 필터 및 표시 소자 KR101982502B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012090300A JP5924089B2 (ja) 2012-04-11 2012-04-11 感放射線性着色組成物、カラーフィルタ及び表示素子
JPJP-P-2012-090300 2012-04-11

Publications (2)

Publication Number Publication Date
KR20130115116A KR20130115116A (ko) 2013-10-21
KR101982502B1 true KR101982502B1 (ko) 2019-05-27

Family

ID=49461982

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020130021775A KR101982502B1 (ko) 2012-04-11 2013-02-28 감방사선성 착색 조성물, 컬러 필터 및 표시 소자

Country Status (4)

Country Link
JP (1) JP5924089B2 (zh)
KR (1) KR101982502B1 (zh)
CN (1) CN103376658B (zh)
TW (1) TWI563343B (zh)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6091198B2 (ja) * 2012-12-10 2017-03-08 株式会社Ｄｎｐファインケミカル 感光性樹脂組成物、カラーフィルタ、液晶表示装置、及び有機発光表示装置
JP6788331B2 (ja) * 2014-07-03 2020-11-25 東友ファインケム株式会社Ｄｏｎｇｗｏｏ Ｆｉｎｅ−Ｃｈｅｍ Ｃｏ．， Ｌｔｄ． 着色硬化性樹脂組成物、カラーフィルタ及び表示装置
KR102204534B1 (ko) * 2015-01-13 2021-01-20 동우 화인켐 주식회사 자발광 감광성 수지 조성물, 이로부터 제조된 색변환층을 포함하는 표시장치
KR20160094668A (ko) * 2015-02-02 2016-08-10 동우 화인켐 주식회사 착색 감광성 수지 조성물, 이로써 제조된 컬럼 스페이서 및 이를 구비한 액정 표시 장치
KR102363755B1 (ko) * 2016-03-29 2022-02-16 동우 화인켐 주식회사 착색 감광성 수지 조성물, 및 이를 이용하여 제조된 컬러필터
KR102131481B1 (ko) * 2016-07-26 2020-07-07 주식회사 엘지화학 감광성 수지 조성물 및 이를 포함하는 컬러필터
KR102092438B1 (ko) * 2016-07-26 2020-03-23 주식회사 엘지화학 감광성 수지 조성물 및 이를 포함하는 컬러필터
JP6607221B2 (ja) * 2016-08-01 2019-11-20 東洋インキＳｃホールディングス株式会社 感光性着色組成物およびカラーフィルタ
KR102398257B1 (ko) * 2016-08-01 2022-05-13 토요잉크Sc홀딩스주식회사 감광성 착색 조성물 및 컬러 필터
CN109564384B (zh) * 2016-08-01 2022-09-20 东洋油墨Sc控股株式会社 感光性着色组合物及彩色滤光片
JP7259521B2 (ja) * 2018-05-09 2023-04-18 大日本印刷株式会社 色材分散液、組成物、膜、光学フィルタ、及び表示装置
US20220013142A1 (en) * 2018-12-11 2022-01-13 Sony Group Corporation Hologram recording composition, hologram recording medium, diffraction optical element, and optical device, optical component, and image display device using diffraction optical element
CN116113649A (zh) * 2020-08-11 2023-05-12 Dnp精细化工股份有限公司 滤色器用感光性着色树脂组合物、固化物、滤色器、和显示设备

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JP2006010793A (ja) * 2004-06-23 2006-01-12 Jsr Corp 着色層形成用感放射線性組成物およびカラーフィルタ
JP2011186043A (ja) * 2010-03-05 2011-09-22 Dic Corp カラーフィルタ用青色顔料及びカラーフィルタ

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JP2891418B2 (ja) 1988-11-26 1999-05-17 凸版印刷株式会社 カラーフィルターおよびその製造方法
JPH0812292B2 (ja) 1989-07-20 1996-02-07 凸版印刷株式会社 耐熱性カラーフィルターおよびその製造方法
JPH0635188A (ja) 1992-07-15 1994-02-10 Nippon Kayaku Co Ltd カラーフィルター用光重合組成物及びカラーフィルター
JP2001081348A (ja) * 1999-07-14 2001-03-27 Nippon Kayaku Co Ltd 着色感光性組成物
JP4911666B2 (ja) * 2004-10-26 2012-04-04 昭和電工株式会社 チオール化合物およびその化合物を用いた感光性組成物
KR101225527B1 (ko) * 2004-10-26 2013-01-23 쇼와 덴코 가부시키가이샤 티올 화합물 및 이를 사용한 감광성 조성물과 블랙매트릭스 레지스트 조성물
JP5482996B2 (ja) * 2009-09-17 2014-05-07 Ｊｓｒ株式会社 着色組成物、カラーフィルタ及びカラー液晶表示素子
JP2011141521A (ja) * 2009-12-09 2011-07-21 Jsr Corp 着色組成物、カラーフィルタおよび表示素子
JP5732924B2 (ja) * 2010-03-25 2015-06-10 三菱化学株式会社 顔料分散液、着色樹脂組成物、カラーフィルタ、並びに液晶表示装置及び有機ｅｌディスプレイ
JP5657452B2 (ja) * 2010-05-07 2015-01-21 富士フイルム株式会社 着色感光性組成物、カラーフィルタの製造方法、カラーフィルタ、及び液晶表示装置
KR20110123668A (ko) * 2010-05-07 2011-11-15 후지필름 가부시키가이샤 착색 감광성 조성물, 컬러 필터의 제조 방법, 컬러 필터 및 액정 표시 장치

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006010793A (ja) * 2004-06-23 2006-01-12 Jsr Corp 着色層形成用感放射線性組成物およびカラーフィルタ
JP2011186043A (ja) * 2010-03-05 2011-09-22 Dic Corp カラーフィルタ用青色顔料及びカラーフィルタ

Also Published As

Publication number Publication date
TW201341957A (zh) 2013-10-16
JP2013218207A (ja) 2013-10-24
KR20130115116A (ko) 2013-10-21
CN103376658B (zh) 2018-06-29
JP5924089B2 (ja) 2016-05-25
CN103376658A (zh) 2013-10-30
TWI563343B (en) 2016-12-21

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