TWI563343B - Radiation-sensitive coloring composition, color filter and display device - Google Patents

Radiation-sensitive coloring composition, color filter and display device

Info

Publication number
TWI563343B
TWI563343B TW102112590A TW102112590A TWI563343B TW I563343 B TWI563343 B TW I563343B TW 102112590 A TW102112590 A TW 102112590A TW 102112590 A TW102112590 A TW 102112590A TW I563343 B TWI563343 B TW I563343B
Authority
TW
Taiwan
Prior art keywords
radiation
display device
color filter
coloring composition
sensitive coloring
Prior art date
Application number
TW102112590A
Other languages
English (en)
Other versions
TW201341957A (zh
Inventor
Hiroyuki Komatsu
Kyouichirou Ryuu
Kouji Itano
yoshiki Imamura
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=49461982&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=TWI563343(B) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Jsr Corp filed Critical Jsr Corp
Publication of TW201341957A publication Critical patent/TW201341957A/zh
Application granted granted Critical
Publication of TWI563343B publication Critical patent/TWI563343B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
TW102112590A 2012-04-11 2013-04-10 Radiation-sensitive coloring composition, color filter and display device TWI563343B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012090300A JP5924089B2 (ja) 2012-04-11 2012-04-11 感放射線性着色組成物、カラーフィルタ及び表示素子

Publications (2)

Publication Number Publication Date
TW201341957A TW201341957A (zh) 2013-10-16
TWI563343B true TWI563343B (en) 2016-12-21

Family

ID=49461982

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102112590A TWI563343B (en) 2012-04-11 2013-04-10 Radiation-sensitive coloring composition, color filter and display device

Country Status (4)

Country Link
JP (1) JP5924089B2 (zh)
KR (1) KR101982502B1 (zh)
CN (1) CN103376658B (zh)
TW (1) TWI563343B (zh)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6091198B2 (ja) * 2012-12-10 2017-03-08 株式会社Ｄｎｐファインケミカル 感光性樹脂組成物、カラーフィルタ、液晶表示装置、及び有機発光表示装置
CN105278245B (zh) * 2014-07-03 2020-11-06 东友精细化工有限公司 着色固化性树脂组合物
KR102204534B1 (ko) * 2015-01-13 2021-01-20 동우 화인켐 주식회사 자발광 감광성 수지 조성물, 이로부터 제조된 색변환층을 포함하는 표시장치
KR20160094668A (ko) * 2015-02-02 2016-08-10 동우 화인켐 주식회사 착색 감광성 수지 조성물, 이로써 제조된 컬럼 스페이서 및 이를 구비한 액정 표시 장치
KR102363755B1 (ko) * 2016-03-29 2022-02-16 동우 화인켐 주식회사 착색 감광성 수지 조성물, 및 이를 이용하여 제조된 컬러필터
KR102092438B1 (ko) * 2016-07-26 2020-03-23 주식회사 엘지화학 감광성 수지 조성물 및 이를 포함하는 컬러필터
KR102131481B1 (ko) * 2016-07-26 2020-07-07 주식회사 엘지화학 감광성 수지 조성물 및 이를 포함하는 컬러필터
JP6607221B2 (ja) * 2016-08-01 2019-11-20 東洋インキＳｃホールディングス株式会社 感光性着色組成物およびカラーフィルタ
KR102398257B1 (ko) * 2016-08-01 2022-05-13 토요잉크Sc홀딩스주식회사 감광성 착색 조성물 및 컬러 필터
CN109564384B (zh) * 2016-08-01 2022-09-20 东洋油墨Sc控股株式会社 感光性着色组合物及彩色滤光片
JP7259521B2 (ja) * 2018-05-09 2023-04-18 大日本印刷株式会社 色材分散液、組成物、膜、光学フィルタ、及び表示装置
EP3896530B1 (en) * 2018-12-11 2023-05-24 Sony Group Corporation Hologram recording composition, hologram recording medium, diffraction optical element, and optical device, optical component, and image display device in which diffraction optical element is used
JPWO2022034816A1 (zh) * 2020-08-11 2022-02-17

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006010793A (ja) * 2004-06-23 2006-01-12 Jsr Corp 着色層形成用感放射線性組成物およびカラーフィルタ
JP2011186043A (ja) * 2010-03-05 2011-09-22 Dic Corp カラーフィルタ用青色顔料及びカラーフィルタ

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0812292B2 (ja) 1989-07-20 1996-02-07 凸版印刷株式会社 耐熱性カラーフィルターおよびその製造方法
JP2891418B2 (ja) 1988-11-26 1999-05-17 凸版印刷株式会社 カラーフィルターおよびその製造方法
JPH0635188A (ja) 1992-07-15 1994-02-10 Nippon Kayaku Co Ltd カラーフィルター用光重合組成物及びカラーフィルター
JP2001081348A (ja) * 1999-07-14 2001-03-27 Nippon Kayaku Co Ltd 着色感光性組成物
JP4911666B2 (ja) * 2004-10-26 2012-04-04 昭和電工株式会社 チオール化合物およびその化合物を用いた感光性組成物
KR101225527B1 (ko) * 2004-10-26 2013-01-23 쇼와 덴코 가부시키가이샤 티올 화합물 및 이를 사용한 감광성 조성물과 블랙매트릭스 레지스트 조성물
JP5482996B2 (ja) * 2009-09-17 2014-05-07 Ｊｓｒ株式会社 着色組成物、カラーフィルタ及びカラー液晶表示素子
JP2011141521A (ja) * 2009-12-09 2011-07-21 Jsr Corp 着色組成物、カラーフィルタおよび表示素子
JP5732924B2 (ja) * 2010-03-25 2015-06-10 三菱化学株式会社 顔料分散液、着色樹脂組成物、カラーフィルタ、並びに液晶表示装置及び有機ｅｌディスプレイ
JP5657452B2 (ja) * 2010-05-07 2015-01-21 富士フイルム株式会社 着色感光性組成物、カラーフィルタの製造方法、カラーフィルタ、及び液晶表示装置
KR20110123668A (ko) * 2010-05-07 2011-11-15 후지필름 가부시키가이샤 착색 감광성 조성물, 컬러 필터의 제조 방법, 컬러 필터 및 액정 표시 장치

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006010793A (ja) * 2004-06-23 2006-01-12 Jsr Corp 着色層形成用感放射線性組成物およびカラーフィルタ
JP2011186043A (ja) * 2010-03-05 2011-09-22 Dic Corp カラーフィルタ用青色顔料及びカラーフィルタ

Also Published As

Publication number Publication date
JP2013218207A (ja) 2013-10-24
CN103376658A (zh) 2013-10-30
TW201341957A (zh) 2013-10-16
CN103376658B (zh) 2018-06-29
KR101982502B1 (ko) 2019-05-27
JP5924089B2 (ja) 2016-05-25
KR20130115116A (ko) 2013-10-21

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