KR101971033B1 - 진공증착장치 및 진공증착장치에 있어서의 도가니 교환방법 - Google Patents

진공증착장치 및 진공증착장치에 있어서의 도가니 교환방법 Download PDF

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KR101971033B1
KR101971033B1 KR1020130021154A KR20130021154A KR101971033B1 KR 101971033 B1 KR101971033 B1 KR 101971033B1 KR 1020130021154 A KR1020130021154 A KR 1020130021154A KR 20130021154 A KR20130021154 A KR 20130021154A KR 101971033 B1 KR101971033 B1 KR 101971033B1
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KR
South Korea
Prior art keywords
evaporation
crucible
valve
pipe
vacuum
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KR1020130021154A
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English (en)
Korean (ko)
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KR20130110015A (ko
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에이지 후지모토
유지 마쓰모토
히로유키 다이쿠
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히다치 조센 가부시키가이샤
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Publication of KR20130110015A publication Critical patent/KR20130110015A/ko
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
KR1020130021154A 2012-03-28 2013-02-27 진공증착장치 및 진공증착장치에 있어서의 도가니 교환방법 KR101971033B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012072638A JP6021377B2 (ja) 2012-03-28 2012-03-28 真空蒸着装置および真空蒸着装置におけるるつぼ交換方法
JPJP-P-2012-072638 2012-03-28

Publications (2)

Publication Number Publication Date
KR20130110015A KR20130110015A (ko) 2013-10-08
KR101971033B1 true KR101971033B1 (ko) 2019-04-22

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KR1020130021154A KR101971033B1 (ko) 2012-03-28 2013-02-27 진공증착장치 및 진공증착장치에 있어서의 도가니 교환방법

Country Status (4)

Country Link
JP (1) JP6021377B2 (zh)
KR (1) KR101971033B1 (zh)
CN (1) CN103361607B (zh)
TW (1) TWI606130B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20210082784A (ko) 2019-12-26 2021-07-06 주식회사 선익시스템 승강형 도가니를 갖는 도가니장치 및 상기 도가니장치 취급기구

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102192500B1 (ko) * 2013-10-24 2020-12-17 히다치 조센 가부시키가이샤 진공증착장치용 매니폴드
JP6241903B2 (ja) * 2014-03-11 2017-12-06 株式会社Ｊｏｌｅｄ 蒸着装置及び蒸着装置を用いた蒸着方法、及びデバイスの製造方法
KR102228880B1 (ko) * 2014-05-12 2021-03-17 엘지전자 주식회사 증착 장치
KR102319998B1 (ko) * 2015-01-22 2021-11-01 삼성디스플레이 주식회사 볼륨 가변형 도가니를 구비한 증착원
CN104593731B (zh) * 2015-02-04 2017-05-03 深圳市华星光电技术有限公司 蒸镀换料一体化设备及其使用方法
KR102608846B1 (ko) * 2015-10-06 2023-12-01 삼성디스플레이 주식회사 증착원 및 그 제조 방법
TWI580807B (zh) * 2016-10-28 2017-05-01 財團法人工業技術研究院 蒸鍍設備與利用此設備之蒸鍍方法
CN107604318B (zh) * 2017-09-27 2019-10-15 京东方科技集团股份有限公司 坩埚加热装置
CN108103448A (zh) * 2017-12-30 2018-06-01 凯盛光伏材料有限公司 一种连续低沸点材料热蒸发镀膜装置
CN108103447A (zh) * 2017-12-30 2018-06-01 凯盛光伏材料有限公司 一种自封防漏低沸点材料热蒸发镀膜装置
CN108660420A (zh) * 2018-07-25 2018-10-16 华夏易能（广东）新能源科技有限公司 真空蒸镀设备及蒸发源装置
KR102609612B1 (ko) * 2018-07-30 2023-12-05 삼성디스플레이 주식회사 표시 장치의 제조장치 및 표시 장치의 제조방법
CN109321884A (zh) * 2018-10-17 2019-02-12 武汉华星光电半导体显示技术有限公司 蒸镀装置
CN109487216A (zh) * 2018-12-29 2019-03-19 深圳市华星光电半导体显示技术有限公司 线源装置和oled蒸镀机
KR102243901B1 (ko) * 2019-07-15 2021-04-23 프리시스 주식회사 박막증착장치
KR102257220B1 (ko) * 2019-07-15 2021-05-27 프리시스 주식회사 박막증착장치
JP7200083B2 (ja) 2019-10-31 2023-01-06 日立造船株式会社 真空蒸着装置の制御方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005281808A (ja) * 2004-03-30 2005-10-13 Tohoku Pioneer Corp 成膜源、成膜装置、成膜方法、有機ｅｌパネルの製造方法、有機ｅｌパネル
JP2008075095A (ja) * 2006-09-19 2008-04-03 Hitachi Zosen Corp 真空蒸着装置および真空蒸着方法
JP2011195916A (ja) 2010-03-23 2011-10-06 Hitachi Zosen Corp 蒸着装置

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002030418A (ja) * 2000-07-13 2002-01-31 Denso Corp 蒸着装置
JP4570403B2 (ja) * 2004-06-28 2010-10-27 日立造船株式会社 蒸発装置、蒸着装置および蒸着装置における蒸発装置の切替方法
JP4545028B2 (ja) * 2005-03-30 2010-09-15 日立造船株式会社 蒸着装置
JP5452178B2 (ja) * 2009-11-12 2014-03-26 株式会社日立ハイテクノロジーズ 真空蒸着装置、真空蒸着方法、および、有機ｅｌ表示装置の製造方法
WO2011074551A1 (ja) * 2009-12-18 2011-06-23 平田機工株式会社 真空蒸着方法及び装置
JP2011256427A (ja) * 2010-06-09 2011-12-22 Hitachi Zosen Corp 真空蒸着装置における蒸着材料の蒸発、昇華方法および真空蒸着用るつぼ装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005281808A (ja) * 2004-03-30 2005-10-13 Tohoku Pioneer Corp 成膜源、成膜装置、成膜方法、有機ｅｌパネルの製造方法、有機ｅｌパネル
JP2008075095A (ja) * 2006-09-19 2008-04-03 Hitachi Zosen Corp 真空蒸着装置および真空蒸着方法
JP2011195916A (ja) 2010-03-23 2011-10-06 Hitachi Zosen Corp 蒸着装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20210082784A (ko) 2019-12-26 2021-07-06 주식회사 선익시스템 승강형 도가니를 갖는 도가니장치 및 상기 도가니장치 취급기구

Also Published As

Publication number Publication date
TW201339338A (zh) 2013-10-01
JP2013204073A (ja) 2013-10-07
KR20130110015A (ko) 2013-10-08
JP6021377B2 (ja) 2016-11-09
CN103361607A (zh) 2013-10-23
CN103361607B (zh) 2017-03-01
TWI606130B (zh) 2017-11-21

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