KR101968801B1 - 성막 장치 - Google Patents

성막 장치 Download PDF

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Publication number
KR101968801B1
KR101968801B1 KR1020157017934A KR20157017934A KR101968801B1 KR 101968801 B1 KR101968801 B1 KR 101968801B1 KR 1020157017934 A KR1020157017934 A KR 1020157017934A KR 20157017934 A KR20157017934 A KR 20157017934A KR 101968801 B1 KR101968801 B1 KR 101968801B1
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KR
South Korea
Prior art keywords
substrate
film forming
vacuum chamber
base
wall surface
Prior art date
Application number
KR1020157017934A
Other languages
English (en)
Korean (ko)
Other versions
KR20150096438A (ko
Inventor
히로유키 다무라
마사나오 후지츠카
데이지 다카하시
다카시 시부야
노부아키 시오이리
사토시 다카하시
게이지 우치다
Original Assignee
캐논 톡키 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 캐논 톡키 가부시키가이샤 filed Critical 캐논 톡키 가부시키가이샤
Publication of KR20150096438A publication Critical patent/KR20150096438A/ko
Application granted granted Critical
Publication of KR101968801B1 publication Critical patent/KR101968801B1/ko

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
KR1020157017934A 2012-12-18 2013-12-03 성막 장치 KR101968801B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2012275613A JP6008731B2 (ja) 2012-12-18 2012-12-18 成膜装置
JPJP-P-2012-275613 2012-12-18
PCT/JP2013/082428 WO2014097879A1 (ja) 2012-12-18 2013-12-03 成膜装置

Publications (2)

Publication Number Publication Date
KR20150096438A KR20150096438A (ko) 2015-08-24
KR101968801B1 true KR101968801B1 (ko) 2019-04-12

Family

ID=50978214

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020157017934A KR101968801B1 (ko) 2012-12-18 2013-12-03 성막 장치

Country Status (4)

Country Link
JP (1) JP6008731B2 (zh)
KR (1) KR101968801B1 (zh)
TW (1) TWI593817B (zh)
WO (1) WO2014097879A1 (zh)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101665380B1 (ko) * 2015-05-26 2016-10-13 주식회사 선익시스템 기판 증착 챔버 및 그를 구비한 기판 증착 시스템
KR101840976B1 (ko) * 2017-07-26 2018-03-21 캐논 톡키 가부시키가이샤 이동체 지지장치와, 이를 포함한 진공 증착 장치 및 증착 방법
JP7316782B2 (ja) * 2018-12-14 2023-07-28 キヤノントッキ株式会社 蒸着装置、電子デバイスの製造装置、および、蒸着方法
JP7379072B2 (ja) 2019-01-11 2023-11-14 キヤノントッキ株式会社 成膜装置、電子デバイスの製造装置、成膜方法及び電子デバイスの製造装置
JP7299725B2 (ja) * 2019-03-15 2023-06-28 キヤノントッキ株式会社 成膜装置、成膜システム
JP2021095609A (ja) * 2019-12-18 2021-06-24 キヤノントッキ株式会社 成膜装置、成膜方法及び電子デバイスの製造方法
JP7379396B2 (ja) * 2021-01-08 2023-11-14 キヤノントッキ株式会社 成膜装置、搬送方法、成膜方法及び電子デバイス製造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002348657A (ja) * 2001-03-19 2002-12-04 Shin Meiwa Ind Co Ltd 真空成膜装置
JP2012112038A (ja) 2010-11-04 2012-06-14 Canon Inc 成膜装置及びこれを用いた成膜方法
JP2012138522A (ja) 2010-12-27 2012-07-19 Canon Anelva Corp 基板搬送装置及び真空処理装置
JP2012167309A (ja) * 2011-02-10 2012-09-06 Canon Tokki Corp 蒸着装置並びに蒸着方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001181821A (ja) * 1999-12-20 2001-07-03 Murata Mfg Co Ltd 真空成膜装置
JP4704605B2 (ja) 2001-05-23 2011-06-15 淳二 城戸 連続蒸着装置、蒸着装置及び蒸着方法
JP5277060B2 (ja) 2009-04-16 2013-08-28 株式会社日立ハイテクノロジーズ 真空蒸着装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002348657A (ja) * 2001-03-19 2002-12-04 Shin Meiwa Ind Co Ltd 真空成膜装置
JP2012112038A (ja) 2010-11-04 2012-06-14 Canon Inc 成膜装置及びこれを用いた成膜方法
JP2012138522A (ja) 2010-12-27 2012-07-19 Canon Anelva Corp 基板搬送装置及び真空処理装置
JP2012167309A (ja) * 2011-02-10 2012-09-06 Canon Tokki Corp 蒸着装置並びに蒸着方法

Also Published As

Publication number Publication date
TWI593817B (zh) 2017-08-01
JP2014118611A (ja) 2014-06-30
KR20150096438A (ko) 2015-08-24
TW201430156A (zh) 2014-08-01
JP6008731B2 (ja) 2016-10-19
WO2014097879A1 (ja) 2014-06-26

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