KR101942602B1 - 도전성 입자, 도전 재료 및 접속 구조체 - Google Patents
도전성 입자, 도전 재료 및 접속 구조체 Download PDFInfo
- Publication number
- KR101942602B1 KR101942602B1 KR1020137029906A KR20137029906A KR101942602B1 KR 101942602 B1 KR101942602 B1 KR 101942602B1 KR 1020137029906 A KR1020137029906 A KR 1020137029906A KR 20137029906 A KR20137029906 A KR 20137029906A KR 101942602 B1 KR101942602 B1 KR 101942602B1
- Authority
- KR
- South Korea
- Prior art keywords
- particles
- conductive layer
- conductive
- core material
- base
- Prior art date
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/20—Conductive material dispersed in non-conductive organic material
- H01B1/22—Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/18—Non-metallic particles coated with metal
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/52—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating using reducing agents for coating with metallic material not provided for in a single one of groups C23C18/32 - C23C18/50
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/02—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of metals or alloys
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
- H01B5/16—Non-insulated conductors or conductive bodies characterised by their form comprising conductive material in insulating or poorly conductive material, e.g. conductive rubber
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R11/00—Individual connecting elements providing two or more spaced connecting locations for conductive members which are, or may be, thereby interconnected, e.g. end pieces for wires or cables supported by the wire or cable and having means for facilitating electrical connection to some other wire, terminal, or conductive member, blocks of binding posts
- H01R11/01—Individual connecting elements providing two or more spaced connecting locations for conductive members which are, or may be, thereby interconnected, e.g. end pieces for wires or cables supported by the wire or cable and having means for facilitating electrical connection to some other wire, terminal, or conductive member, blocks of binding posts characterised by the form or arrangement of the conductive interconnection between the connecting locations
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1655—Process features
- C23C18/1662—Use of incorporated material in the solution or dispersion, e.g. particles, whiskers, wires
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Dispersion Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Conductive Materials (AREA)
- Non-Insulated Conductors (AREA)
- Chemically Coating (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Powder Metallurgy (AREA)
Applications Claiming Priority (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011280083 | 2011-12-21 | ||
JPJP-P-2011-280083 | 2011-12-21 | ||
JP2011280084 | 2011-12-21 | ||
JPJP-P-2011-280082 | 2011-12-21 | ||
JPJP-P-2011-280084 | 2011-12-21 | ||
JP2011280082 | 2011-12-21 | ||
PCT/JP2012/082910 WO2013094636A1 (ja) | 2011-12-21 | 2012-12-19 | 導電性粒子、導電材料及び接続構造体 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20140106384A KR20140106384A (ko) | 2014-09-03 |
KR101942602B1 true KR101942602B1 (ko) | 2019-01-25 |
Family
ID=48668520
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020137029906A KR101942602B1 (ko) | 2011-12-21 | 2012-12-19 | 도전성 입자, 도전 재료 및 접속 구조체 |
Country Status (5)
Country | Link |
---|---|
JP (2) | JP6049461B2 (zh) |
KR (1) | KR101942602B1 (zh) |
CN (2) | CN103748636A (zh) |
TW (1) | TWI615858B (zh) |
WO (1) | WO2013094636A1 (zh) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6470518B2 (ja) * | 2013-07-16 | 2019-02-13 | 積水化学工業株式会社 | 導電性粒子、導電材料及び接続構造体 |
JP6352103B2 (ja) * | 2013-08-12 | 2018-07-04 | 積水化学工業株式会社 | 導電性粒子、導電材料及び接続構造体 |
JP6355474B2 (ja) * | 2013-08-12 | 2018-07-11 | 積水化学工業株式会社 | 導電性粒子、導電材料及び接続構造体 |
JP6453032B2 (ja) * | 2013-10-21 | 2019-01-16 | 積水化学工業株式会社 | 導電性粒子、導電材料及び接続構造体 |
JP6445833B2 (ja) * | 2013-10-21 | 2018-12-26 | 積水化学工業株式会社 | 導電性粒子、導電材料及び接続構造体 |
JP6345075B2 (ja) * | 2013-10-23 | 2018-06-20 | 積水化学工業株式会社 | 導電性粒子、導電材料及び接続構造体 |
JP6739894B2 (ja) * | 2013-11-18 | 2020-08-12 | 積水化学工業株式会社 | 導電性粒子、導電材料及び接続構造体 |
JP2015195178A (ja) * | 2014-03-26 | 2015-11-05 | デクセリアルズ株式会社 | 導電性粒子、導電性接着剤、接続体の製造方法、電子部品の接続方法、及び接続体 |
JP6340876B2 (ja) * | 2014-03-31 | 2018-06-13 | 日立化成株式会社 | 導電粒子 |
JP6684052B2 (ja) * | 2014-06-11 | 2020-04-22 | 積水化学工業株式会社 | 導電性粒子、導電性粒子の製造方法、導電材料及び接続構造体 |
JP6379761B2 (ja) * | 2014-07-09 | 2018-08-29 | 日立化成株式会社 | 導電粒子、絶縁被覆導電粒子、異方導電性接着剤、接続構造体及び導電粒子の製造方法 |
JP6507551B2 (ja) * | 2014-10-03 | 2019-05-08 | 日立化成株式会社 | 導電粒子 |
CN106605273A (zh) * | 2014-10-22 | 2017-04-26 | 积水化学工业株式会社 | 导电性粒子、导电材料及连接结构体 |
JP2016089153A (ja) * | 2014-10-29 | 2016-05-23 | デクセリアルズ株式会社 | 導電材料 |
TWI740807B (zh) * | 2014-10-29 | 2021-10-01 | 日商迪睿合股份有限公司 | 導電材料、連接構造體、及連接構造體之製造方法 |
CN111508635B (zh) * | 2016-02-08 | 2021-12-28 | 积水化学工业株式会社 | 导电性粒子、导电材料及连接结构体 |
CN108701508B (zh) * | 2016-02-10 | 2020-03-24 | 日立化成株式会社 | 导电粒子、绝缘被覆导电粒子、各向异性导电性粘接剂、连接结构体和导电粒子的制造方法 |
CN114951647A (zh) * | 2022-05-31 | 2022-08-30 | 安徽安坤新材科技有限公司 | 一种铜铝复合材料的制备方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010027569A (ja) * | 2008-07-24 | 2010-02-04 | Sony Chemical & Information Device Corp | 導電性粒子、異方性導電フィルム、及び接合体、並びに、接続方法 |
JP2011204531A (ja) * | 2010-03-26 | 2011-10-13 | Sekisui Chem Co Ltd | 導電性粒子、導電性粒子の製造方法、異方性導電材料及び接続構造体 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3696429B2 (ja) | 1999-02-22 | 2005-09-21 | 日本化学工業株式会社 | 導電性無電解めっき粉体とその製造方法並びに該めっき粉体からなる導電性材料 |
CN100437838C (zh) * | 2003-07-07 | 2008-11-26 | 积水化学工业株式会社 | 包覆导电性粒子、各向异性导电材料以及导电连接结构体 |
CN1906705B (zh) * | 2004-01-30 | 2010-04-21 | 积水化学工业株式会社 | 导电性微粒和各向异性导电材料 |
JP4563110B2 (ja) * | 2004-08-20 | 2010-10-13 | 積水化学工業株式会社 | 導電性微粒子の製造方法 |
JP4860163B2 (ja) | 2005-02-15 | 2012-01-25 | 積水化学工業株式会社 | 導電性微粒子の製造方法 |
JP2007207665A (ja) * | 2006-02-03 | 2007-08-16 | Sekisui Chem Co Ltd | 導電性粒子の製造方法、導電性粒子及び異方性導電材料 |
CN101529574A (zh) * | 2006-10-31 | 2009-09-09 | 日立化成工业株式会社 | 电路连接结构体 |
JP2009032397A (ja) * | 2007-07-24 | 2009-02-12 | Sekisui Chem Co Ltd | 導電性微粒子 |
JP2011100605A (ja) * | 2009-11-05 | 2011-05-19 | Hitachi Chem Co Ltd | 回路接続材料及び、これを用いた回路部材の接続構造 |
JP5589361B2 (ja) | 2009-11-16 | 2014-09-17 | 日立化成株式会社 | 導電粒子及びその製造方法 |
CN102272863B (zh) * | 2010-03-17 | 2013-09-04 | 积水化学工业株式会社 | 导电性粒子、导电性粒子的制造方法、各向异性导电材料及连接结构体 |
JP5476210B2 (ja) * | 2010-05-19 | 2014-04-23 | 積水化学工業株式会社 | 導電性粒子、異方性導電材料及び接続構造体 |
JP5940760B2 (ja) * | 2010-05-19 | 2016-06-29 | 積水化学工業株式会社 | 導電性粒子、異方性導電材料及び接続構造体 |
-
2012
- 2012-12-19 CN CN201280040642.3A patent/CN103748636A/zh active Pending
- 2012-12-19 CN CN201810695985.2A patent/CN108806824B/zh active Active
- 2012-12-19 WO PCT/JP2012/082910 patent/WO2013094636A1/ja active Application Filing
- 2012-12-19 KR KR1020137029906A patent/KR101942602B1/ko active IP Right Grant
- 2012-12-19 JP JP2012558095A patent/JP6049461B2/ja active Active
- 2012-12-21 TW TW101149093A patent/TWI615858B/zh active
-
2016
- 2016-11-21 JP JP2016225787A patent/JP6247371B2/ja active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010027569A (ja) * | 2008-07-24 | 2010-02-04 | Sony Chemical & Information Device Corp | 導電性粒子、異方性導電フィルム、及び接合体、並びに、接続方法 |
CN102089832A (zh) | 2008-07-24 | 2011-06-08 | 索尼化学&信息部件株式会社 | 导电性粒子、各向异性导电膜、接合体以及连接方法 |
JP2011204531A (ja) * | 2010-03-26 | 2011-10-13 | Sekisui Chem Co Ltd | 導電性粒子、導電性粒子の製造方法、異方性導電材料及び接続構造体 |
Also Published As
Publication number | Publication date |
---|---|
CN108806824A (zh) | 2018-11-13 |
KR20140106384A (ko) | 2014-09-03 |
CN108806824B (zh) | 2023-07-25 |
JPWO2013094636A1 (ja) | 2015-04-27 |
TWI615858B (zh) | 2018-02-21 |
CN103748636A (zh) | 2014-04-23 |
WO2013094636A1 (ja) | 2013-06-27 |
TW201333980A (zh) | 2013-08-16 |
JP6049461B2 (ja) | 2016-12-21 |
JP6247371B2 (ja) | 2017-12-13 |
JP2017084794A (ja) | 2017-05-18 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR101942602B1 (ko) | 도전성 입자, 도전 재료 및 접속 구조체 | |
JP6475805B2 (ja) | 絶縁性粒子付き導電性粒子、導電材料及び接続構造体 | |
KR101987509B1 (ko) | 도전성 입자, 도전 재료 및 접속 구조체 | |
JP6034177B2 (ja) | 導電性粒子、導電材料及び接続構造体 | |
KR101815336B1 (ko) | 도전성 입자, 이방성 도전 재료 및 접속 구조체 | |
KR20140043305A (ko) | 도전성 입자, 도전 재료 및 접속 구조체 | |
JP5636118B2 (ja) | 導電性粒子、導電材料及び接続構造体 | |
JP6276351B2 (ja) | 導電性粒子、導電材料及び接続構造体 | |
JP2014026971A (ja) | 導電性粒子、導電材料及び接続構造体 | |
JP6478308B2 (ja) | 導電性粒子、導電材料及び接続構造体 | |
JP6200318B2 (ja) | 導電性粒子、導電材料及び接続構造体 | |
JP7180981B2 (ja) | 導電性粒子、導電材料及び接続構造体 | |
JP6441555B2 (ja) | 導電性粒子、導電材料及び接続構造体 | |
KR20190008828A (ko) | 도전성 입자, 도전 재료 및 접속 구조체 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant |