KR101919210B1 - 편광자, 편광자의 제조 방법, 광 배향 장치 및 편광자의 장착 방법 - Google Patents

편광자, 편광자의 제조 방법, 광 배향 장치 및 편광자의 장착 방법 Download PDF

Info

Publication number
KR101919210B1
KR101919210B1 KR1020167016788A KR20167016788A KR101919210B1 KR 101919210 B1 KR101919210 B1 KR 101919210B1 KR 1020167016788 A KR1020167016788 A KR 1020167016788A KR 20167016788 A KR20167016788 A KR 20167016788A KR 101919210 B1 KR101919210 B1 KR 101919210B1
Authority
KR
South Korea
Prior art keywords
light
polarizer
shielding film
alignment
thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020167016788A
Other languages
English (en)
Korean (ko)
Other versions
KR20160105786A (ko
Inventor
유이치 이나즈키
노부히토 도야마
야스히로 오카와
아키히코 시바타
가즈오 사사모토
Original Assignee
다이니폰 인사츠 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=53542963&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=KR101919210(B1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by 다이니폰 인사츠 가부시키가이샤 filed Critical 다이니폰 인사츠 가부시키가이샤
Publication of KR20160105786A publication Critical patent/KR20160105786A/ko
Application granted granted Critical
Publication of KR101919210B1 publication Critical patent/KR101919210B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • G02B5/3025Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • G02B5/3058Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state comprising electrically conductive elements, e.g. wire grids, conductive particles
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133528Polarisers
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133528Polarisers
    • G02F1/133548Wire-grid polarisers
    • G02F2001/133548

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Liquid Crystal (AREA)
  • Polarising Elements (AREA)
KR1020167016788A 2014-01-15 2015-01-14 편광자, 편광자의 제조 방법, 광 배향 장치 및 편광자의 장착 방법 Active KR101919210B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JPJP-P-2014-005220 2014-01-15
JP2014005220 2014-01-15
JPJP-P-2014-122212 2014-06-13
JP2014122212 2014-06-13
PCT/JP2015/050822 WO2015108075A1 (ja) 2014-01-15 2015-01-14 偏光子、偏光子の製造方法、光配向装置および偏光子の装着方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020187024359A Division KR101991216B1 (ko) 2014-01-15 2015-01-14 편광자, 편광자의 제조 방법, 광 배향 장치 및 편광자의 장착 방법

Publications (2)

Publication Number Publication Date
KR20160105786A KR20160105786A (ko) 2016-09-07
KR101919210B1 true KR101919210B1 (ko) 2018-11-15

Family

ID=53542963

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020167016788A Active KR101919210B1 (ko) 2014-01-15 2015-01-14 편광자, 편광자의 제조 방법, 광 배향 장치 및 편광자의 장착 방법
KR1020187024359A Active KR101991216B1 (ko) 2014-01-15 2015-01-14 편광자, 편광자의 제조 방법, 광 배향 장치 및 편광자의 장착 방법

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020187024359A Active KR101991216B1 (ko) 2014-01-15 2015-01-14 편광자, 편광자의 제조 방법, 광 배향 장치 및 편광자의 장착 방법

Country Status (5)

Country Link
JP (2) JP6455444B2 (enExample)
KR (2) KR101919210B1 (enExample)
CN (1) CN105874365B (enExample)
TW (2) TWI564633B (enExample)
WO (1) WO2015108075A1 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6312454B2 (ja) * 2014-02-07 2018-04-18 株式会社ブイ・テクノロジー 偏光光照射装置
JP6766370B2 (ja) * 2015-02-18 2020-10-14 大日本印刷株式会社 偏光子、偏光子ホルダー、及び光配向装置
JP6884501B2 (ja) * 2015-08-25 2021-06-09 大日本印刷株式会社 偏光子
JP6270927B2 (ja) * 2016-07-08 2018-01-31 日本エイアンドエル株式会社 めっき用樹脂組成物及びめっき成形品
JP2018017952A (ja) * 2016-07-29 2018-02-01 ウシオ電機株式会社 光照射装置および光照射方法
JP2019109375A (ja) * 2017-12-19 2019-07-04 セイコーエプソン株式会社 偏光素子、偏光素子の製造方法
CN117518621A (zh) * 2023-11-07 2024-02-06 成都瑞波科材料科技有限公司 光配向装置

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004271558A (ja) * 2003-03-05 2004-09-30 Ricoh Opt Ind Co Ltd 偏光光学素子とその製造方法
JP2006126464A (ja) * 2004-10-28 2006-05-18 Ushio Inc 偏光素子ユニット及び偏光光照射装置
JP2007114647A (ja) * 2005-10-24 2007-05-10 Ushio Inc 光配向用偏光光照射装置
JP2007169716A (ja) * 2005-12-22 2007-07-05 Dainippon Printing Co Ltd メタルマスク、メタルマスク位置アラインメント方法及び装置
JP2010078437A (ja) * 2008-09-25 2010-04-08 Toshiba Corp 偏光状態検査装置および偏光状態検査方法
JP2011248284A (ja) * 2010-05-31 2011-12-08 Sony Chemical & Information Device Corp 偏光板及び偏光板の製造方法
JP5344105B1 (ja) * 2013-03-08 2013-11-20 ウシオ電機株式会社 光配向用偏光光照射装置及び光配向用偏光光照射方法

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5534574B2 (enExample) 1972-11-10 1980-09-08
JP2003131356A (ja) * 2001-10-25 2003-05-09 Hitachi Ltd ホトマスクの製造方法および描画装置
KR100732749B1 (ko) * 2001-12-28 2007-06-27 주식회사 하이닉스반도체 미세 패턴 형성용 마스크
US20040174596A1 (en) * 2003-03-05 2004-09-09 Ricoh Optical Industries Co., Ltd. Polarization optical device and manufacturing method therefor
KR100614651B1 (ko) * 2004-10-11 2006-08-22 삼성전자주식회사 회로 패턴의 노광을 위한 장치 및 방법, 사용되는포토마스크 및 그 설계 방법, 그리고 조명계 및 그 구현방법
JP2007178763A (ja) 2005-12-28 2007-07-12 Seiko Epson Corp 光学素子の製造方法、液晶装置、及び投射型表示装置
JP2008083215A (ja) * 2006-09-26 2008-04-10 Seiko Epson Corp 配向膜製造用マスク及び液晶装置の製造方法
JP5109520B2 (ja) * 2007-07-27 2012-12-26 セイコーエプソン株式会社 光学素子、液晶装置、液晶装置用マザー基板、及び電子機器、並びにワイヤグリッド偏光素子
JP4968165B2 (ja) 2008-04-24 2012-07-04 ウシオ電機株式会社 光配向用偏光光照射装置
KR20110033025A (ko) * 2009-09-22 2011-03-30 주식회사 엘지화학 광배향막 제조용 자외선 고투과 이중 선 격자 편광판 및 이의 제조방법
JP2011186394A (ja) * 2010-03-11 2011-09-22 Toppan Printing Co Ltd マスクパターンの白欠陥修正方法およびマスクパターン
JP2011203669A (ja) * 2010-03-26 2011-10-13 Toppan Printing Co Ltd 偏光露光装置
JP5682437B2 (ja) * 2010-09-07 2015-03-11 ソニー株式会社 固体撮像素子、固体撮像装置、撮像機器、及び、偏光素子の製造方法
US8873144B2 (en) * 2011-05-17 2014-10-28 Moxtek, Inc. Wire grid polarizer with multiple functionality sections
JP5077465B2 (ja) * 2011-07-14 2012-11-21 ウシオ電機株式会社 光配向用偏光光照射装置
JP4977794B2 (ja) * 2011-09-21 2012-07-18 信越化学工業株式会社 パターン転写方法およびフォトマスク
JP2013145863A (ja) 2011-11-29 2013-07-25 Gigaphoton Inc 2光束干渉装置および2光束干渉露光システム
US8922890B2 (en) * 2012-03-21 2014-12-30 Moxtek, Inc. Polarizer edge rib modification
CN104395785B (zh) * 2012-06-21 2017-04-12 日立麦克赛尔株式会社 光学元件、光学元件的制造方法和光学装置
JP6308816B2 (ja) * 2013-03-07 2018-04-11 株式会社ブイ・テクノロジー 光配向用偏光照射装置
JP6428171B2 (ja) * 2013-11-13 2018-11-28 大日本印刷株式会社 偏光子、偏光子用基板および光配向装置

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004271558A (ja) * 2003-03-05 2004-09-30 Ricoh Opt Ind Co Ltd 偏光光学素子とその製造方法
JP2006126464A (ja) * 2004-10-28 2006-05-18 Ushio Inc 偏光素子ユニット及び偏光光照射装置
JP2007114647A (ja) * 2005-10-24 2007-05-10 Ushio Inc 光配向用偏光光照射装置
JP2007169716A (ja) * 2005-12-22 2007-07-05 Dainippon Printing Co Ltd メタルマスク、メタルマスク位置アラインメント方法及び装置
JP2010078437A (ja) * 2008-09-25 2010-04-08 Toshiba Corp 偏光状態検査装置および偏光状態検査方法
JP2011248284A (ja) * 2010-05-31 2011-12-08 Sony Chemical & Information Device Corp 偏光板及び偏光板の製造方法
JP5344105B1 (ja) * 2013-03-08 2013-11-20 ウシオ電機株式会社 光配向用偏光光照射装置及び光配向用偏光光照射方法

Also Published As

Publication number Publication date
JP2019008318A (ja) 2019-01-17
CN105874365A (zh) 2016-08-17
TWI564633B (zh) 2017-01-01
JP6620854B2 (ja) 2019-12-18
TW201706688A (zh) 2017-02-16
TW201531776A (zh) 2015-08-16
WO2015108075A1 (ja) 2015-07-23
KR20160105786A (ko) 2016-09-07
TWI612362B (zh) 2018-01-21
CN105874365B (zh) 2019-08-09
JP6455444B2 (ja) 2019-01-23
KR20180098688A (ko) 2018-09-04
JPWO2015108075A1 (ja) 2017-03-23
KR101991216B1 (ko) 2019-06-19

Similar Documents

Publication Publication Date Title
KR101919210B1 (ko) 편광자, 편광자의 제조 방법, 광 배향 장치 및 편광자의 장착 방법
JP6093117B2 (ja) フォトマスク、フォトマスクの製造方法及びパターンの転写方法
CN110632823B (zh) 光掩模及其制造方法、图案转印方法、显示装置的制造方法
JP2019008318A5 (enExample)
KR102384667B1 (ko) 포토마스크의 수정 방법, 포토마스크의 제조 방법, 포토마스크 및 표시 장치의 제조 방법
KR101593366B1 (ko) 근접 노광용 포토 마스크
CN105659119A (zh) 偏振片、偏振片用基板及光取向装置
US8883372B2 (en) Reticle with composite polarizer and method of simultaneous optimization of imaging of a set of different patterns
JP6372205B2 (ja) 偏光子、偏光子の製造方法、および光配向装置
CN110703489A (zh) 掩膜版和显示面板及其制备方法
TWI461839B (zh) 光罩及其製造方法、圖案轉印方法及護膜
KR101346121B1 (ko) 하프톤 패턴 및 광근접보정 패턴을 포함하는 포토 마스크 및 그 제조 방법
JP6628121B2 (ja) 偏光子の製造方法および電子線照射装置
JP6409295B2 (ja) 偏光子および光配向装置
KR101926614B1 (ko) 위상반전 마스크
JPH07307278A (ja) 投影露光装置
JP6884501B2 (ja) 偏光子
TWI664455B (zh) 偏振元件及光配向裝置

Legal Events

Date Code Title Description
PA0105 International application

Patent event date: 20160623

Patent event code: PA01051R01D

Comment text: International Patent Application

A201 Request for examination
AMND Amendment
PA0201 Request for examination

Patent event code: PA02012R01D

Patent event date: 20160803

Comment text: Request for Examination of Application

PG1501 Laying open of application
E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 20170519

Patent event code: PE09021S01D

AMND Amendment
E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 20171227

Patent event code: PE09021S01D

E601 Decision to refuse application
PE0601 Decision on rejection of patent

Patent event date: 20180628

Comment text: Decision to Refuse Application

Patent event code: PE06012S01D

Patent event date: 20171227

Comment text: Notification of reason for refusal

Patent event code: PE06011S01I

Patent event date: 20170519

Comment text: Notification of reason for refusal

Patent event code: PE06011S01I

AMND Amendment
PA0104 Divisional application for international application

Comment text: Divisional Application for International Patent

Patent event code: PA01041R01D

Patent event date: 20180823

PX0901 Re-examination

Patent event code: PX09011S01I

Patent event date: 20180628

Comment text: Decision to Refuse Application

Patent event code: PX09012R01I

Patent event date: 20170807

Comment text: Amendment to Specification, etc.

Patent event code: PX09012R01I

Patent event date: 20160803

Comment text: Amendment to Specification, etc.

PX0701 Decision of registration after re-examination

Patent event date: 20180927

Comment text: Decision to Grant Registration

Patent event code: PX07013S01D

Patent event date: 20180823

Comment text: Amendment to Specification, etc.

Patent event code: PX07012R01I

Patent event date: 20180628

Comment text: Decision to Refuse Application

Patent event code: PX07011S01I

Patent event date: 20170807

Comment text: Amendment to Specification, etc.

Patent event code: PX07012R01I

Patent event date: 20160803

Comment text: Amendment to Specification, etc.

Patent event code: PX07012R01I

X701 Decision to grant (after re-examination)
PR0701 Registration of establishment

Comment text: Registration of Establishment

Patent event date: 20181109

Patent event code: PR07011E01D

PR1002 Payment of registration fee

Payment date: 20181109

End annual number: 3

Start annual number: 1

PG1601 Publication of registration
PR1001 Payment of annual fee

Payment date: 20211029

Start annual number: 4

End annual number: 4

PR1001 Payment of annual fee

Payment date: 20221028

Start annual number: 5

End annual number: 5