KR101870011B1 - 임프린트 장치, 임프린트 방법 및 물품의 제조 방법 - Google Patents

임프린트 장치, 임프린트 방법 및 물품의 제조 방법 Download PDF

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KR101870011B1
KR101870011B1 KR1020150081090A KR20150081090A KR101870011B1 KR 101870011 B1 KR101870011 B1 KR 101870011B1 KR 1020150081090 A KR1020150081090 A KR 1020150081090A KR 20150081090 A KR20150081090 A KR 20150081090A KR 101870011 B1 KR101870011 B1 KR 101870011B1
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South Korea
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imprint material
substrate
mold
pattern
information
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KR20150141893A (ko
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히로미츠 야마구치
요시카즈 미야지마
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캐논 가부시끼가이샤
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
KR1020150081090A 2014-06-10 2015-06-09 임프린트 장치, 임프린트 방법 및 물품의 제조 방법 Active KR101870011B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014119892A JP6329437B2 (ja) 2014-06-10 2014-06-10 インプリント装置、インプリント方法、および物品の製造方法
JPJP-P-2014-119892 2014-06-10

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KR20150141893A KR20150141893A (ko) 2015-12-21
KR101870011B1 true KR101870011B1 (ko) 2018-06-22

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US (1) US10197910B2 (enExample)
JP (1) JP6329437B2 (enExample)
KR (1) KR101870011B1 (enExample)

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US10493672B2 (en) * 2017-06-26 2019-12-03 Canon Kabushiki Kaisha Imprint apparatus, method of manufacturing article, information processing apparatus, method of supporting map editing, and storage medium
US11175598B2 (en) * 2017-06-30 2021-11-16 Canon Kabushiki Kaisha Imprint apparatus and method of manufacturing article
JP6498343B2 (ja) * 2017-08-25 2019-04-10 キヤノン株式会社 インプリント装置、インプリント方法、物品製造方法、成形装置および成形方法。
US11036130B2 (en) * 2017-10-19 2021-06-15 Canon Kabushiki Kaisha Drop placement evaluation
JP7475147B2 (ja) * 2020-01-23 2024-04-26 キヤノン株式会社 表示制御方法、編集支援方法、物品製造方法、プログラムおよび情報処理装置
US11474441B2 (en) * 2020-06-25 2022-10-18 Canon Kabushiki Kaisha Systems and methods for generating drop patterns
JP7743209B2 (ja) * 2021-06-08 2025-09-24 キヤノン株式会社 成形装置、成形方法及び物品の製造方法

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JP5462903B2 (ja) * 2012-03-23 2014-04-02 株式会社東芝 滴状体配置方法、パターン形成方法、滴状体配置プログラム、滴状体配置装置、およびテンプレートのパターンの設計方法
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US9067446B1 (en) * 2014-03-31 2015-06-30 Xerox Corporation System for detecting inoperative inkjets in three-dimensional object printing using a test pattern and an ultrasonic sensor
JP6329425B2 (ja) * 2014-05-02 2018-05-23 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法
CN105313332B (zh) * 2014-06-09 2020-05-05 联合工艺公司 由两部分组成的热固性树脂增材制造系统
US10571801B2 (en) * 2014-12-09 2020-02-25 Canon Kabushiki Kaisha Coating apparatus, imprint apparatus, and method of manufacturing article
US20160288378A1 (en) * 2015-04-03 2016-10-06 Canon Kabushiki Kaisha Imprint material discharging device

Also Published As

Publication number Publication date
KR20150141893A (ko) 2015-12-21
JP2015233101A (ja) 2015-12-24
US20150352756A1 (en) 2015-12-10
JP6329437B2 (ja) 2018-05-23
US10197910B2 (en) 2019-02-05

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