KR101755586B1 - 발광 반도체 칩 - Google Patents
발광 반도체 칩 Download PDFInfo
- Publication number
- KR101755586B1 KR101755586B1 KR1020127020140A KR20127020140A KR101755586B1 KR 101755586 B1 KR101755586 B1 KR 101755586B1 KR 1020127020140 A KR1020127020140 A KR 1020127020140A KR 20127020140 A KR20127020140 A KR 20127020140A KR 101755586 B1 KR101755586 B1 KR 101755586B1
- Authority
- KR
- South Korea
- Prior art keywords
- quantum well
- semiconductor chip
- semiconductor
- layer
- doping
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/811—Bodies having quantum effect structures or superlattices, e.g. tunnel junctions
- H10H20/812—Bodies having quantum effect structures or superlattices, e.g. tunnel junctions within the light-emitting regions, e.g. having quantum confinement structures
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
- H10H20/011—Manufacture or treatment of bodies, e.g. forming semiconductor layers
- H10H20/018—Bonding of wafers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/811—Bodies having quantum effect structures or superlattices, e.g. tunnel junctions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/816—Bodies having carrier transport control structures, e.g. highly-doped semiconductor layers or current-blocking structures
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/819—Bodies characterised by their shape, e.g. curved or truncated substrates
- H10H20/82—Roughened surfaces, e.g. at the interface between epitaxial layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/819—Bodies characterised by their shape, e.g. curved or truncated substrates
- H10H20/821—Bodies characterised by their shape, e.g. curved or truncated substrates of the light-emitting regions, e.g. non-planar junctions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/822—Materials of the light-emitting regions
- H10H20/824—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP
- H10H20/825—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP containing nitrogen, e.g. GaN
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/83—Electrodes
- H10H20/831—Electrodes characterised by their shape
- H10H20/8312—Electrodes characterised by their shape extending at least partially through the bodies
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
- H10W90/721—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors
- H10W90/724—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors between a chip and a stacked insulating package substrate, interposer or RDL
Landscapes
- Led Devices (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102009060747.1A DE102009060747B4 (de) | 2009-12-30 | 2009-12-30 | Halbleiterchip |
| DE102009060747.1 | 2009-12-30 | ||
| PCT/EP2010/070761 WO2011080249A1 (de) | 2009-12-30 | 2010-12-27 | Lichtemittierender halbleiterchip |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020177017884A Division KR20170080718A (ko) | 2009-12-30 | 2010-12-27 | 발광 반도체 칩 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20120102146A KR20120102146A (ko) | 2012-09-17 |
| KR101755586B1 true KR101755586B1 (ko) | 2017-07-07 |
Family
ID=43827573
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020127020140A Active KR101755586B1 (ko) | 2009-12-30 | 2010-12-27 | 발광 반도체 칩 |
| KR1020177017884A Ceased KR20170080718A (ko) | 2009-12-30 | 2010-12-27 | 발광 반도체 칩 |
| KR1020187018915A Ceased KR20180078359A (ko) | 2009-12-30 | 2010-12-27 | 발광 반도체 칩 |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020177017884A Ceased KR20170080718A (ko) | 2009-12-30 | 2010-12-27 | 발광 반도체 칩 |
| KR1020187018915A Ceased KR20180078359A (ko) | 2009-12-30 | 2010-12-27 | 발광 반도체 칩 |
Country Status (8)
| Country | Link |
|---|---|
| US (4) | US9012885B2 (cg-RX-API-DMAC7.html) |
| EP (1) | EP2519980B1 (cg-RX-API-DMAC7.html) |
| JP (1) | JP5735984B2 (cg-RX-API-DMAC7.html) |
| KR (3) | KR101755586B1 (cg-RX-API-DMAC7.html) |
| CN (2) | CN106229395B (cg-RX-API-DMAC7.html) |
| DE (1) | DE102009060747B4 (cg-RX-API-DMAC7.html) |
| TW (1) | TWI449212B (cg-RX-API-DMAC7.html) |
| WO (1) | WO2011080249A1 (cg-RX-API-DMAC7.html) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102009060747B4 (de) | 2009-12-30 | 2025-01-09 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Halbleiterchip |
| WO2011083940A2 (ko) * | 2010-01-05 | 2011-07-14 | 서울옵토디바이스주식회사 | 발광 다이오드 및 그것을 제조하는 방법 |
| DE102011100037A1 (de) | 2011-04-29 | 2012-10-31 | Osram Opto Semiconductors Gmbh | Strahlung emittierender Halbleiterchip mit integriertem ESD-Schutz |
| JP5123414B2 (ja) * | 2011-05-16 | 2013-01-23 | 株式会社東芝 | 半導体発光素子、窒化物半導体ウェーハ及び窒化物半導体層の製造方法 |
| US9070613B2 (en) * | 2011-09-07 | 2015-06-30 | Lg Innotek Co., Ltd. | Light emitting device |
| DE102013103602A1 (de) * | 2013-04-10 | 2014-10-16 | Osram Opto Semiconductors Gmbh | Optoelektronischer Halbleiterchip und Verfahren zu seiner Herstellung |
| DE102013104272B4 (de) * | 2013-04-26 | 2026-06-03 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Optoelektronisches Bauelement und Verfahren zu seiner Herstellung |
| DE102014111058A1 (de) * | 2014-08-04 | 2016-02-04 | Osram Opto Semiconductors Gmbh | Optoelektronisches Bauelement und Verfahren zur Herstellung |
| CN104701431B (zh) * | 2014-11-27 | 2017-03-29 | 厦门市三安光电科技有限公司 | 一种发光二极管的外延结构及其制作方法 |
| KR102391513B1 (ko) | 2015-10-05 | 2022-04-27 | 삼성전자주식회사 | 물질막 적층체, 발광 소자, 발광 패키지, 및 발광 소자의 제조 방법 |
| KR102189614B1 (ko) * | 2016-07-28 | 2020-12-11 | 루미레즈 엘엘씨 | 초격자를 갖는 iii-p 발광 디바이스 |
| US20180033912A1 (en) * | 2016-07-28 | 2018-02-01 | Lumileds Llc | Iii-p light emitting device with a superlattice |
| DE102016120419B4 (de) * | 2016-10-26 | 2025-12-31 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Halbleiterkörper |
| DE102016123262B4 (de) * | 2016-12-01 | 2025-07-24 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Strahlungsemittierender Halbleiterkörper und Verfahren zur Herstellung einer Halbleiterschichtenfolge |
| DE102017104370A1 (de) * | 2017-03-02 | 2018-09-06 | Osram Opto Semiconductors Gmbh | Halbleiterkörper |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008294482A (ja) * | 2002-01-28 | 2008-12-04 | Nichia Corp | 窒化物半導体素子 |
Family Cites Families (42)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07263748A (ja) * | 1994-03-22 | 1995-10-13 | Toyoda Gosei Co Ltd | 3族窒化物半導体発光素子及びその製造方法 |
| JP3374737B2 (ja) * | 1997-01-09 | 2003-02-10 | 日亜化学工業株式会社 | 窒化物半導体素子 |
| US6677619B1 (en) | 1997-01-09 | 2004-01-13 | Nichia Chemical Industries, Ltd. | Nitride semiconductor device |
| JP3429446B2 (ja) | 1998-03-19 | 2003-07-22 | シャープ株式会社 | 半導体発光素子 |
| US6563850B1 (en) | 1997-10-06 | 2003-05-13 | Sharp Kabushiki Kaisha | Light-emitting device and fabricating method thereof |
| JP3622562B2 (ja) * | 1998-03-12 | 2005-02-23 | 日亜化学工業株式会社 | 窒化物半導体発光ダイオード |
| KR100589621B1 (ko) | 1998-03-12 | 2006-06-19 | 니치아 카가쿠 고교 가부시키가이샤 | 질화물 반도체 소자 |
| JP4629178B2 (ja) | 1998-10-06 | 2011-02-09 | 日亜化学工業株式会社 | 窒化物半導体素子 |
| US6649942B2 (en) * | 2001-05-23 | 2003-11-18 | Sanyo Electric Co., Ltd. | Nitride-based semiconductor light-emitting device |
| US6717969B2 (en) * | 2001-07-16 | 2004-04-06 | Fuji Photo Film Co., Ltd. | Semiconductor laser device which includes current confinement structure and trenches formed through current stopping layer down to active layer |
| SG115549A1 (en) * | 2002-07-08 | 2005-10-28 | Sumitomo Chemical Co | Epitaxial substrate for compound semiconductor light emitting device, method for producing the same and light emitting device |
| JP2005093682A (ja) * | 2003-09-17 | 2005-04-07 | Toyoda Gosei Co Ltd | GaN系半導体発光素子及びその製造方法 |
| KR100456063B1 (ko) | 2004-02-13 | 2004-11-10 | 에피밸리 주식회사 | Ⅲ-질화물 반도체 발광소자 |
| JP2005277374A (ja) * | 2004-02-26 | 2005-10-06 | Toyoda Gosei Co Ltd | Iii族窒化物系化合物半導体発光素子及びその製造方法 |
| CN1324719C (zh) | 2004-04-01 | 2007-07-04 | 光磊科技股份有限公司 | 一种发光二极管 |
| TWI250666B (en) | 2004-05-03 | 2006-03-01 | Osram Opto Semiconductors Gmbh | Method to produce a radiation-emitting semiconductor-chip and said produced semiconductor-chip |
| US7943949B2 (en) * | 2004-09-09 | 2011-05-17 | Bridgelux, Inc. | III-nitride based on semiconductor device with low-resistance ohmic contacts |
| US7042018B2 (en) * | 2004-09-22 | 2006-05-09 | Formosa Epitaxy Incorporation | Structure of GaN light-emitting diode |
| US7042019B1 (en) | 2004-10-12 | 2006-05-09 | Formosa Epitaxy Incorporation | Gallium-nitride based multi-quantum well light-emitting diode n-type contact layer structure |
| KR100631971B1 (ko) * | 2005-02-28 | 2006-10-11 | 삼성전기주식회사 | 질화물 반도체 발광 소자 |
| US7446345B2 (en) | 2005-04-29 | 2008-11-04 | Cree, Inc. | Light emitting devices with active layers that extend into opened pits |
| WO2007102627A1 (en) * | 2005-07-06 | 2007-09-13 | Lg Innotek Co., Ltd | Nitride semiconductor led and fabrication metho thereof |
| JP2007042751A (ja) * | 2005-08-01 | 2007-02-15 | Hitachi Cable Ltd | 半導体発光素子 |
| KR100674862B1 (ko) * | 2005-08-25 | 2007-01-29 | 삼성전기주식회사 | 질화물 반도체 발광 소자 |
| US20070051962A1 (en) * | 2005-09-08 | 2007-03-08 | Mu-Jen Lai | Gallium nitride semiconductor light emitting device |
| JP2007201195A (ja) * | 2006-01-26 | 2007-08-09 | Sumitomo Electric Ind Ltd | 窒化物半導体発光素子 |
| TWI325641B (en) * | 2006-09-04 | 2010-06-01 | Huga Optotech Inc | Light emitting device and methods for forming the same |
| DE102007019776A1 (de) | 2007-04-26 | 2008-10-30 | Osram Opto Semiconductors Gmbh | Optoelektronisches Bauelement und Verfahren zur Herstellung einer Mehrzahl optoelektronischer Bauelemente |
| DE102007022947B4 (de) | 2007-04-26 | 2022-05-05 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Optoelektronischer Halbleiterkörper und Verfahren zur Herstellung eines solchen |
| KR101164026B1 (ko) | 2007-07-12 | 2012-07-18 | 삼성전자주식회사 | 질화물계 반도체 발광소자 및 그 제조방법 |
| DE102007046027A1 (de) | 2007-09-26 | 2009-04-02 | Osram Opto Semiconductors Gmbh | Optoelektronischer Halbleiterchip mit einer Mehrfachquantentopfstruktur |
| WO2009045005A2 (en) | 2007-10-02 | 2009-04-09 | Epivalley Co., Ltd. | Iii-nitride semiconductor light emitting device |
| KR20090034163A (ko) | 2007-10-02 | 2009-04-07 | 주식회사 에피밸리 | 3족 질화물 반도체 발광소자 |
| DE102007057674A1 (de) | 2007-11-30 | 2009-06-04 | Osram Opto Semiconductors Gmbh | LED mit Stromaufweitungsschicht |
| KR100903103B1 (ko) | 2007-12-05 | 2009-06-16 | 우리엘에스티 주식회사 | 화합물 반도체를 이용한 발광소자 |
| JP2009200084A (ja) | 2008-02-19 | 2009-09-03 | Seiko Instruments Inc | 発光デバイス |
| DE102008016525A1 (de) | 2008-03-31 | 2009-11-26 | Osram Opto Semiconductors Gmbh | Optoelektronischer Halbleiterkörper und Verfahren zur Herstellung eines solchen |
| KR101571577B1 (ko) * | 2008-02-29 | 2015-11-24 | 오스람 옵토 세미컨덕터스 게엠베하 | 모놀리식 광전자 반도체 본체 및 그 제조 방법 |
| US8536615B1 (en) * | 2009-12-16 | 2013-09-17 | Cree, Inc. | Semiconductor device structures with modulated and delta doping and related methods |
| DE102009060747B4 (de) * | 2009-12-30 | 2025-01-09 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Halbleiterchip |
| WO2011083940A2 (ko) * | 2010-01-05 | 2011-07-14 | 서울옵토디바이스주식회사 | 발광 다이오드 및 그것을 제조하는 방법 |
| CN101789473B (zh) | 2010-02-23 | 2013-03-20 | 厦门大学 | 一种GaN基垂直结构发光二极管及其制备方法 |
-
2009
- 2009-12-30 DE DE102009060747.1A patent/DE102009060747B4/de active Active
-
2010
- 2010-12-27 WO PCT/EP2010/070761 patent/WO2011080249A1/de not_active Ceased
- 2010-12-27 CN CN201610643061.9A patent/CN106229395B/zh active Active
- 2010-12-27 KR KR1020127020140A patent/KR101755586B1/ko active Active
- 2010-12-27 CN CN201080060204.4A patent/CN102687290B/zh active Active
- 2010-12-27 TW TW099146097A patent/TWI449212B/zh not_active IP Right Cessation
- 2010-12-27 KR KR1020177017884A patent/KR20170080718A/ko not_active Ceased
- 2010-12-27 EP EP10798567.3A patent/EP2519980B1/de active Active
- 2010-12-27 KR KR1020187018915A patent/KR20180078359A/ko not_active Ceased
- 2010-12-27 US US13/518,809 patent/US9012885B2/en active Active
- 2010-12-27 JP JP2012546427A patent/JP5735984B2/ja active Active
-
2015
- 2015-03-18 US US14/662,037 patent/US9530931B2/en active Active
-
2016
- 2016-10-06 US US15/287,140 patent/US9799797B2/en active Active
-
2017
- 2017-07-21 US US15/656,169 patent/US10388828B2/en active Active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008294482A (ja) * | 2002-01-28 | 2008-12-04 | Nichia Corp | 窒化物半導体素子 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP2519980B1 (de) | 2019-04-03 |
| KR20180078359A (ko) | 2018-07-09 |
| US9799797B2 (en) | 2017-10-24 |
| US20120298964A1 (en) | 2012-11-29 |
| US20170025570A1 (en) | 2017-01-26 |
| WO2011080249A1 (de) | 2011-07-07 |
| CN102687290B (zh) | 2016-08-17 |
| EP2519980A1 (de) | 2012-11-07 |
| KR20120102146A (ko) | 2012-09-17 |
| TWI449212B (zh) | 2014-08-11 |
| TW201135968A (en) | 2011-10-16 |
| DE102009060747A1 (de) | 2011-07-07 |
| CN106229395B (zh) | 2020-08-14 |
| US20170324001A1 (en) | 2017-11-09 |
| JP5735984B2 (ja) | 2015-06-17 |
| US20150194570A1 (en) | 2015-07-09 |
| JP2013516751A (ja) | 2013-05-13 |
| KR20170080718A (ko) | 2017-07-10 |
| US10388828B2 (en) | 2019-08-20 |
| DE102009060747B4 (de) | 2025-01-09 |
| CN102687290A (zh) | 2012-09-19 |
| US9530931B2 (en) | 2016-12-27 |
| CN106229395A (zh) | 2016-12-14 |
| US9012885B2 (en) | 2015-04-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR20180078359A (ko) | 발광 반도체 칩 | |
| US7939833B2 (en) | Nitride semiconductor light emitting device | |
| US8330174B2 (en) | LED having current spreading layer | |
| KR101466674B1 (ko) | 방사선을 방출하는 반도체 몸체 | |
| US8847271B2 (en) | Semiconductor light emitting device | |
| KR20110072424A (ko) | 발광 소자, 발광 소자 패키지 및 발광 소자 제조방법 | |
| US7791081B2 (en) | Radiation-emitting semiconductor chip | |
| KR101221067B1 (ko) | 리지 도파형 반도체 레이저 다이오드 | |
| KR100900114B1 (ko) | 반도체 층 내부에 전기 전도도가 감소하는 영역을 형성하기위한 방법 및 광전 반도체 소자 | |
| RU2277736C1 (ru) | Полупроводниковый элемент, излучающий свет в синей области видимого спектра | |
| CN113823722A (zh) | 发光元件及其制造方法 | |
| JP7064269B2 (ja) | 半導体発光素子 | |
| JP2021197533A (ja) | 発光素子 | |
| CN104584242B (zh) | 光电子半导体本体和光电子半导体芯片 | |
| US8354687B1 (en) | Efficient thermal management and packaging for group III nitride based UV devices | |
| US20140353578A1 (en) | Light-emitting device | |
| CN103828072A (zh) | 发射辐射的半导体芯片 | |
| JP2026018158A (ja) | 半導体発光素子 | |
| KR101172136B1 (ko) | 발광소자, 발광소자의 제조방법 및 발광소자 패키지 | |
| Khan | III-N multiple quantum wells based 285-to 340-nm deep-ultraviolet light-emitting diodes over sapphire | |
| JPWO2016157739A1 (ja) | 半導体発光素子 | |
| KR20110101116A (ko) | 발광소자 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0105 | International application |
St.27 status event code: A-0-1-A10-A15-nap-PA0105 |
|
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
|
| R15-X000 | Change to inventor requested |
St.27 status event code: A-3-3-R10-R15-oth-X000 |
|
| R16-X000 | Change to inventor recorded |
St.27 status event code: A-3-3-R10-R16-oth-X000 |
|
| PG1501 | Laying open of application |
St.27 status event code: A-1-1-Q10-Q12-nap-PG1501 |
|
| R17-X000 | Change to representative recorded |
St.27 status event code: A-3-3-R10-R17-oth-X000 |
|
| A201 | Request for examination | ||
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
|
| PA0201 | Request for examination |
St.27 status event code: A-1-2-D10-D11-exm-PA0201 |
|
| P22-X000 | Classification modified |
St.27 status event code: A-2-2-P10-P22-nap-X000 |
|
| P22-X000 | Classification modified |
St.27 status event code: A-2-2-P10-P22-nap-X000 |
|
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
St.27 status event code: A-1-2-D10-D21-exm-PE0902 |
|
| E13-X000 | Pre-grant limitation requested |
St.27 status event code: A-2-3-E10-E13-lim-X000 |
|
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
|
| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration |
St.27 status event code: A-1-2-D10-D22-exm-PE0701 |
|
| A107 | Divisional application of patent | ||
| PA0104 | Divisional application for international application |
St.27 status event code: A-0-1-A10-A18-div-PA0104 St.27 status event code: A-0-1-A10-A16-div-PA0104 |
|
| GRNT | Written decision to grant | ||
| PR0701 | Registration of establishment |
St.27 status event code: A-2-4-F10-F11-exm-PR0701 |
|
| PR1002 | Payment of registration fee |
St.27 status event code: A-2-2-U10-U12-oth-PR1002 Fee payment year number: 1 |
|
| PG1601 | Publication of registration |
St.27 status event code: A-4-4-Q10-Q13-nap-PG1601 |
|
| FPAY | Annual fee payment |
Payment date: 20200626 Year of fee payment: 4 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 4 |
|
| FPAY | Annual fee payment |
Payment date: 20210625 Year of fee payment: 5 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 5 |
|
| FPAY | Annual fee payment |
Payment date: 20220624 Year of fee payment: 6 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 6 |
|
| PN2301 | Change of applicant |
St.27 status event code: A-5-5-R10-R13-asn-PN2301 St.27 status event code: A-5-5-R10-R11-asn-PN2301 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 7 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 8 |
|
| P22-X000 | Classification modified |
St.27 status event code: A-4-4-P10-P22-nap-X000 |
|
| P22-X000 | Classification modified |
St.27 status event code: A-4-4-P10-P22-nap-X000 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 9 |
|
| U11 | Full renewal or maintenance fee paid |
Free format text: ST27 STATUS EVENT CODE: A-4-4-U10-U11-OTH-PR1001 (AS PROVIDED BY THE NATIONAL OFFICE) Year of fee payment: 9 |