KR101697240B1 - 광학 검사 시스템 및 방법 - Google Patents

광학 검사 시스템 및 방법 Download PDF

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Publication number
KR101697240B1
KR101697240B1 KR1020107022152A KR20107022152A KR101697240B1 KR 101697240 B1 KR101697240 B1 KR 101697240B1 KR 1020107022152 A KR1020107022152 A KR 1020107022152A KR 20107022152 A KR20107022152 A KR 20107022152A KR 101697240 B1 KR101697240 B1 KR 101697240B1
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South Korea
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delete delete
image
beam path
wafer
lens
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Expired - Fee Related
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Korean (ko)
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KR20110000560A (ko
Inventor
라스 마르크보르트
라제시와르 치베르
클라우스 엑컬
노르베르트 하렌트
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난다 테크놀로지스 게엠베하
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G01N2021/8822—Dark field detection
    • G01N2021/8825—Separate detection of dark field and bright field
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • H10P74/20—Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by the properties tested or measured, e.g. structural or electrical properties
    • H10P74/203—Structural properties, e.g. testing or measuring thicknesses, line widths, warpage, bond strengths or physical defects

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
KR1020107022152A 2008-04-04 2009-04-03 광학 검사 시스템 및 방법 Expired - Fee Related KR101697240B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US6494908P 2008-04-04 2008-04-04
US61/064,949 2008-04-04
PCT/EP2009/002482 WO2009121628A2 (en) 2008-04-04 2009-04-03 Optical inspection system and method

Publications (2)

Publication Number Publication Date
KR20110000560A KR20110000560A (ko) 2011-01-03
KR101697240B1 true KR101697240B1 (ko) 2017-01-17

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Country Link
US (4) US8072591B2 (https=)
JP (1) JP5749641B2 (https=)
KR (1) KR101697240B1 (https=)
CN (1) CN102016554B (https=)
DE (1) DE112009000832T5 (https=)
TW (1) TWI479583B (https=)
WO (1) WO2009121628A2 (https=)

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US9377596B2 (en) * 2014-07-22 2016-06-28 Unimicron Technology Corp. Optical-electro circuit board, optical component and manufacturing method thereof
WO2016015734A1 (en) * 2014-08-01 2016-02-04 Dfm A/S A scatterometer apparatus
KR101741659B1 (ko) 2014-11-03 2017-05-31 주식회사 엠티엠 카메라 모듈 이물 검사를 위한 광원장치
IL243167B (en) * 2014-12-18 2021-02-28 Gordon Noam Multiple light sources that can be separated by optical inspection
IL243166B2 (en) * 2014-12-18 2023-10-01 Camtek Imaging Tech Suzhou Co Ltd Modification of the optical properties of line-scan illumination depending on the light angle along the line axis
JP6024056B2 (ja) * 2015-01-13 2016-11-09 新一 土坂 球面検査装置
US10309907B2 (en) * 2015-03-04 2019-06-04 Kla-Tencor Corporation All reflective wafer defect inspection and review systems and methods
KR102450005B1 (ko) * 2016-02-03 2022-09-30 케이엘에이 코포레이션 웨이퍼 결함 검사 및 리뷰 시스템
ES2819699T3 (es) 2016-03-07 2021-04-19 Hyla Inc Detección de daño de pantalla para dispositivos
US10281408B2 (en) * 2016-04-12 2019-05-07 Nippon Steel & Sumitomo Metal Corporation Inspection object imaging apparatus, inspection object imaging method, surface inspection apparatus, and surface inspection method
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US10422984B2 (en) * 2017-05-12 2019-09-24 Applied Materials, Inc. Flexible mode scanning optical microscopy and inspection system
US11777603B2 (en) * 2019-01-16 2023-10-03 X Development Llc High magnification afocal telescope with high index field curvature corrector
JP7175214B2 (ja) * 2019-02-13 2022-11-18 リコーインダストリアルソリューションズ株式会社 検査装置
EP4032017B1 (en) 2019-09-16 2025-11-12 Assurant, Inc. Method, apparatus, and computer program product for utilizing machine learning to process an image of a mobile device to determine a mobile device integrity status
US11580627B2 (en) 2020-01-06 2023-02-14 Assurant, Inc. Systems and methods for automatically grading pre-owned electronic devices
WO2021216032A1 (en) * 2020-04-20 2021-10-28 Applied Materials, Inc. Methods and apparatus for correcting lithography systems
US12339235B2 (en) 2021-11-18 2025-06-24 Onto Innovation Inc. Simultaneous back and/or front and/or bulk defect detection
KR102830664B1 (ko) * 2023-11-08 2025-07-07 (주)뮤텍코리아 반도체 웨이퍼의 나노급 파티클 검사를 위한 광학 시스템
CN120314303B (zh) * 2025-03-13 2025-12-23 飞测思凯浦(上海)半导体科技有限公司 一种成像调节装置和光学检测设备

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Publication number Publication date
US8368881B2 (en) 2013-02-05
TW200952102A (en) 2009-12-16
DE112009000832T5 (de) 2011-07-28
US20120133760A1 (en) 2012-05-31
US20100231902A1 (en) 2010-09-16
TWI479583B (zh) 2015-04-01
JP5749641B2 (ja) 2015-07-15
US20110043798A1 (en) 2011-02-24
KR20110000560A (ko) 2011-01-03
US20110043796A1 (en) 2011-02-24
US8072591B2 (en) 2011-12-06
WO2009121628A2 (en) 2009-10-08
CN102016554B (zh) 2013-01-30
CN102016554A (zh) 2011-04-13
US8102521B2 (en) 2012-01-24
JP2011516844A (ja) 2011-05-26
US8345232B2 (en) 2013-01-01
WO2009121628A9 (en) 2009-11-26

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