KR101665221B1 - 시료 냉각 홀더 및 냉각원 용기 - Google Patents
시료 냉각 홀더 및 냉각원 용기 Download PDFInfo
- Publication number
- KR101665221B1 KR101665221B1 KR1020147032399A KR20147032399A KR101665221B1 KR 101665221 B1 KR101665221 B1 KR 101665221B1 KR 1020147032399 A KR1020147032399 A KR 1020147032399A KR 20147032399 A KR20147032399 A KR 20147032399A KR 101665221 B1 KR101665221 B1 KR 101665221B1
- Authority
- KR
- South Korea
- Prior art keywords
- cooling
- sample
- cooling source
- holder
- source container
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000001816 cooling Methods 0.000 title claims abstract description 192
- 238000001073 sample cooling Methods 0.000 claims abstract description 52
- 238000009413 insulation Methods 0.000 claims abstract description 4
- 239000002245 particle Substances 0.000 claims description 29
- 239000011347 resin Substances 0.000 claims description 2
- 229920005989 resin Polymers 0.000 claims description 2
- 230000000903 blocking effect Effects 0.000 claims 1
- 238000012856 packing Methods 0.000 claims 1
- 230000007246 mechanism Effects 0.000 abstract description 15
- 238000003754 machining Methods 0.000 abstract description 4
- 230000005587 bubbling Effects 0.000 abstract description 3
- 238000012545 processing Methods 0.000 description 27
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 14
- 239000010409 thin film Substances 0.000 description 12
- 238000000034 method Methods 0.000 description 10
- 230000005540 biological transmission Effects 0.000 description 9
- 239000007788 liquid Substances 0.000 description 9
- 239000002826 coolant Substances 0.000 description 8
- 238000009434 installation Methods 0.000 description 7
- 229910052757 nitrogen Inorganic materials 0.000 description 7
- 238000012546 transfer Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 230000000644 propagated effect Effects 0.000 description 5
- 239000000470 constituent Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000010894 electron beam technology Methods 0.000 description 4
- 238000010884 ion-beam technique Methods 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 3
- 238000003780 insertion Methods 0.000 description 3
- 230000037431 insertion Effects 0.000 description 3
- 230000001678 irradiating effect Effects 0.000 description 3
- 238000011160 research Methods 0.000 description 3
- 239000002184 metal Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 238000005070 sampling Methods 0.000 description 2
- 230000003685 thermal hair damage Effects 0.000 description 2
- 230000002238 attenuated effect Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000012782 phase change material Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000012916 structural analysis Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/18—Vacuum control means
- H01J2237/184—Vacuum locks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
- H01J2237/2001—Maintaining constant desired temperature
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
- H01J2237/2002—Controlling environment of sample
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
- H01J2237/202—Movement
- H01J2237/20207—Tilt
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Sampling And Sample Adjustment (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPJP-P-2012-145599 | 2012-06-28 | ||
| JP2012145599A JP5732006B2 (ja) | 2012-06-28 | 2012-06-28 | 試料冷却ホルダー及び冷却源容器 |
| PCT/JP2013/065427 WO2014002700A1 (ja) | 2012-06-28 | 2013-06-04 | 試料冷却ホルダー及び冷却源容器 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20150001842A KR20150001842A (ko) | 2015-01-06 |
| KR101665221B1 true KR101665221B1 (ko) | 2016-10-11 |
Family
ID=49782866
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020147032399A Active KR101665221B1 (ko) | 2012-06-28 | 2013-06-04 | 시료 냉각 홀더 및 냉각원 용기 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US9543112B2 (enExample) |
| JP (1) | JP5732006B2 (enExample) |
| KR (1) | KR101665221B1 (enExample) |
| CN (1) | CN104380426B (enExample) |
| DE (1) | DE112013003012B4 (enExample) |
| WO (1) | WO2014002700A1 (enExample) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE112015001149B4 (de) * | 2014-04-03 | 2023-09-28 | Hitachi High-Tech Corporation | Kryostationssystem |
| JP6266119B2 (ja) | 2014-10-09 | 2018-01-31 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置、電子顕微鏡、試料の観察方法 |
| JP6515320B2 (ja) * | 2014-11-19 | 2019-05-22 | 日本製鉄株式会社 | 試料ホルダー及び透過型電子顕微鏡による観察方法 |
| EP3032564A1 (en) * | 2014-12-11 | 2016-06-15 | FEI Company | Improved cryogenic specimen holder for a charged particle microscope |
| DE102015100727A1 (de) | 2015-01-20 | 2016-07-21 | Leica Mikrosysteme Gmbh | Probentransfereinrichtung |
| WO2017098574A1 (ja) | 2015-12-08 | 2017-06-15 | 株式会社日立ハイテクノロジーズ | アンチコンタミネーショントラップおよびその制御方法、ならびに荷電粒子線装置 |
| JP6127191B1 (ja) * | 2016-10-03 | 2017-05-10 | 株式会社メルビル | 試料ホルダー |
| EP3477680B1 (en) | 2017-10-30 | 2022-12-28 | Gatan, Inc. | Cryotransfer holder and workstation |
| WO2019099135A1 (en) * | 2017-11-15 | 2019-05-23 | The Coca-Cola Company | System and method for rapid cooling of packaged food products |
| NL2020235B1 (en) * | 2018-01-05 | 2019-07-12 | Hennyz B V | Vacuum transfer assembly |
| CN113345784B (zh) * | 2020-02-18 | 2023-06-02 | 中国科学院物理研究所 | 一种低温原位样品杆 |
| CN112885687B (zh) * | 2021-04-15 | 2025-04-18 | 厦门超新芯科技有限公司 | 一种透射电镜冷冻样品杆 |
| US12123816B2 (en) * | 2021-06-21 | 2024-10-22 | Fei Company | Vibration-free cryogenic cooling |
| JP7734404B2 (ja) * | 2021-10-05 | 2025-09-05 | 株式会社メルビル | ステージ |
| WO2025141822A1 (ja) * | 2023-12-27 | 2025-07-03 | 株式会社日立ハイテク | 荷電粒子線装置、試料冷却機構、及び連続断面加工観察方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010257617A (ja) * | 2009-04-22 | 2010-11-11 | Hitachi High-Technologies Corp | 試料ホールダ,該試料ホールダの使用法、及び荷電粒子装置 |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4033003A (en) * | 1975-11-07 | 1977-07-05 | Briles Manufacturing | Head forming method |
| JPS52123862A (en) * | 1976-04-12 | 1977-10-18 | Hitachi Ltd | Sample cooler of electron beam observation equipment |
| US4833330A (en) * | 1987-11-03 | 1989-05-23 | Gatan Inc. | Anticontaminator for transmission electron microscopes |
| JP2774884B2 (ja) | 1991-08-22 | 1998-07-09 | 株式会社日立製作所 | 試料の分離方法及びこの分離方法で得た分離試料の分析方法 |
| US5274237A (en) * | 1992-04-02 | 1993-12-28 | North American Philips Corporation | Deicing device for cryogenically cooled radiation detector |
| JPH0739729U (ja) * | 1993-12-28 | 1995-07-18 | 幾代 渡辺 | 真空断熱装置 |
| EP1102304B1 (en) | 1996-12-23 | 2010-02-24 | Fei Company | Particle-optical apparatus including a low-temperature specimen holder |
| US5753924A (en) | 1997-03-12 | 1998-05-19 | Gatan, Inc. | Ultra-high tilt specimen cryotransfer holder for electron microscope |
| JPH10275582A (ja) | 1997-03-28 | 1998-10-13 | Jeol Ltd | 電子顕微鏡等の試料加熱・冷却装置 |
| JPH1196953A (ja) | 1997-09-18 | 1999-04-09 | Hitachi Ltd | 冷却試料観察装置 |
| US6414322B1 (en) * | 1999-01-25 | 2002-07-02 | Micron Technology, Inc. | Sample mount for a scanning electron microscope |
| US6410925B1 (en) | 2000-07-31 | 2002-06-25 | Gatan, Inc. | Single tilt rotation cryotransfer holder for electron microscopes |
| JP2007039106A (ja) * | 2005-08-04 | 2007-02-15 | Sii Nanotechnology Inc | 弾性材料を使用した薄板状小片ホルダ |
| CN201348980Y (zh) * | 2008-12-23 | 2009-11-18 | 南京师范大学 | 扫描电镜样品台专用复合型支架 |
| US8336405B2 (en) * | 2010-07-28 | 2012-12-25 | E.A. Fischione Instruments, Inc. | Cryogenic specimen holder |
| JP5512450B2 (ja) * | 2010-07-29 | 2014-06-04 | 株式会社日立ハイテクノロジーズ | イオンミリング装置 |
-
2012
- 2012-06-28 JP JP2012145599A patent/JP5732006B2/ja active Active
-
2013
- 2013-06-04 US US14/410,235 patent/US9543112B2/en active Active
- 2013-06-04 WO PCT/JP2013/065427 patent/WO2014002700A1/ja not_active Ceased
- 2013-06-04 KR KR1020147032399A patent/KR101665221B1/ko active Active
- 2013-06-04 DE DE112013003012.8T patent/DE112013003012B4/de not_active Expired - Fee Related
- 2013-06-04 CN CN201380033422.2A patent/CN104380426B/zh active Active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010257617A (ja) * | 2009-04-22 | 2010-11-11 | Hitachi High-Technologies Corp | 試料ホールダ,該試料ホールダの使用法、及び荷電粒子装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN104380426B (zh) | 2017-03-08 |
| DE112013003012B4 (de) | 2020-02-06 |
| WO2014002700A1 (ja) | 2014-01-03 |
| KR20150001842A (ko) | 2015-01-06 |
| JP2014010965A (ja) | 2014-01-20 |
| US9543112B2 (en) | 2017-01-10 |
| US20150340199A1 (en) | 2015-11-26 |
| JP5732006B2 (ja) | 2015-06-10 |
| DE112013003012T5 (de) | 2015-03-05 |
| CN104380426A (zh) | 2015-02-25 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A201 | Request for examination | ||
| PA0105 | International application |
Patent event date: 20141119 Patent event code: PA01051R01D Comment text: International Patent Application |
|
| PA0201 | Request for examination | ||
| PG1501 | Laying open of application | ||
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20160425 Patent event code: PE09021S01D |
|
| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration |
Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 20160818 |
|
| GRNT | Written decision to grant | ||
| PR0701 | Registration of establishment |
Comment text: Registration of Establishment Patent event date: 20161005 Patent event code: PR07011E01D |
|
| PR1002 | Payment of registration fee |
Payment date: 20161005 End annual number: 3 Start annual number: 1 |
|
| PG1601 | Publication of registration | ||
| PR1001 | Payment of annual fee |
Payment date: 20220919 Start annual number: 7 End annual number: 7 |
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| PR1001 | Payment of annual fee |
Payment date: 20230919 Start annual number: 8 End annual number: 8 |