DE112013003012B4 - Kryo-Probenhalter und Dewargefäss - Google Patents

Kryo-Probenhalter und Dewargefäss Download PDF

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Publication number
DE112013003012B4
DE112013003012B4 DE112013003012.8T DE112013003012T DE112013003012B4 DE 112013003012 B4 DE112013003012 B4 DE 112013003012B4 DE 112013003012 T DE112013003012 T DE 112013003012T DE 112013003012 B4 DE112013003012 B4 DE 112013003012B4
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DE
Germany
Prior art keywords
sample
cryo
dewar
heat
holder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE112013003012.8T
Other languages
German (de)
English (en)
Other versions
DE112013003012T5 (de
Inventor
c/o Hitachi High-Technologies Nagakubo Yasuhira
c/o Hitachi High-Technologies C Mizuo Takashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
Original Assignee
Hitachi High Technologies Corp
Hitachi High Tech Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi High Technologies Corp, Hitachi High Tech Corp filed Critical Hitachi High Technologies Corp
Publication of DE112013003012T5 publication Critical patent/DE112013003012T5/de
Application granted granted Critical
Publication of DE112013003012B4 publication Critical patent/DE112013003012B4/de
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means
    • H01J2237/184—Vacuum locks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2001—Maintaining constant desired temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2002—Controlling environment of sample
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202—Movement
    • H01J2237/20207—Tilt

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
DE112013003012.8T 2012-06-28 2013-06-04 Kryo-Probenhalter und Dewargefäss Expired - Fee Related DE112013003012B4 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2012-145599 2012-06-28
JP2012145599A JP5732006B2 (ja) 2012-06-28 2012-06-28 試料冷却ホルダー及び冷却源容器
PCT/JP2013/065427 WO2014002700A1 (ja) 2012-06-28 2013-06-04 試料冷却ホルダー及び冷却源容器

Publications (2)

Publication Number Publication Date
DE112013003012T5 DE112013003012T5 (de) 2015-03-05
DE112013003012B4 true DE112013003012B4 (de) 2020-02-06

Family

ID=49782866

Family Applications (1)

Application Number Title Priority Date Filing Date
DE112013003012.8T Expired - Fee Related DE112013003012B4 (de) 2012-06-28 2013-06-04 Kryo-Probenhalter und Dewargefäss

Country Status (6)

Country Link
US (1) US9543112B2 (enExample)
JP (1) JP5732006B2 (enExample)
KR (1) KR101665221B1 (enExample)
CN (1) CN104380426B (enExample)
DE (1) DE112013003012B4 (enExample)
WO (1) WO2014002700A1 (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE112015001149B4 (de) * 2014-04-03 2023-09-28 Hitachi High-Tech Corporation Kryostationssystem
JP6266119B2 (ja) 2014-10-09 2018-01-31 株式会社日立ハイテクノロジーズ 荷電粒子線装置、電子顕微鏡、試料の観察方法
JP6515320B2 (ja) * 2014-11-19 2019-05-22 日本製鉄株式会社 試料ホルダー及び透過型電子顕微鏡による観察方法
EP3032564A1 (en) * 2014-12-11 2016-06-15 FEI Company Improved cryogenic specimen holder for a charged particle microscope
DE102015100727A1 (de) 2015-01-20 2016-07-21 Leica Mikrosysteme Gmbh Probentransfereinrichtung
WO2017098574A1 (ja) 2015-12-08 2017-06-15 株式会社日立ハイテクノロジーズ アンチコンタミネーショントラップおよびその制御方法、ならびに荷電粒子線装置
JP6127191B1 (ja) * 2016-10-03 2017-05-10 株式会社メルビル 試料ホルダー
EP3477680B1 (en) 2017-10-30 2022-12-28 Gatan, Inc. Cryotransfer holder and workstation
WO2019099135A1 (en) * 2017-11-15 2019-05-23 The Coca-Cola Company System and method for rapid cooling of packaged food products
NL2020235B1 (en) * 2018-01-05 2019-07-12 Hennyz B V Vacuum transfer assembly
CN113345784B (zh) * 2020-02-18 2023-06-02 中国科学院物理研究所 一种低温原位样品杆
CN112885687B (zh) * 2021-04-15 2025-04-18 厦门超新芯科技有限公司 一种透射电镜冷冻样品杆
US12123816B2 (en) * 2021-06-21 2024-10-22 Fei Company Vibration-free cryogenic cooling
JP7734404B2 (ja) * 2021-10-05 2025-09-05 株式会社メルビル ステージ
WO2025141822A1 (ja) * 2023-12-27 2025-07-03 株式会社日立ハイテク 荷電粒子線装置、試料冷却機構、及び連続断面加工観察方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5274237A (en) * 1992-04-02 1993-12-28 North American Philips Corporation Deicing device for cryogenically cooled radiation detector
US5986270A (en) * 1996-12-23 1999-11-16 U.S. Philips Corporation Particle-optical apparatus including a low-temperature specimen holder
US20120024086A1 (en) * 2010-07-28 2012-02-02 Halina Stabacinskiene Cryogenic specimen holder

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4033003A (en) * 1975-11-07 1977-07-05 Briles Manufacturing Head forming method
JPS52123862A (en) * 1976-04-12 1977-10-18 Hitachi Ltd Sample cooler of electron beam observation equipment
US4833330A (en) * 1987-11-03 1989-05-23 Gatan Inc. Anticontaminator for transmission electron microscopes
JP2774884B2 (ja) 1991-08-22 1998-07-09 株式会社日立製作所 試料の分離方法及びこの分離方法で得た分離試料の分析方法
JPH0739729U (ja) * 1993-12-28 1995-07-18 幾代 渡辺 真空断熱装置
US5753924A (en) 1997-03-12 1998-05-19 Gatan, Inc. Ultra-high tilt specimen cryotransfer holder for electron microscope
JPH10275582A (ja) 1997-03-28 1998-10-13 Jeol Ltd 電子顕微鏡等の試料加熱・冷却装置
JPH1196953A (ja) 1997-09-18 1999-04-09 Hitachi Ltd 冷却試料観察装置
US6414322B1 (en) * 1999-01-25 2002-07-02 Micron Technology, Inc. Sample mount for a scanning electron microscope
US6410925B1 (en) 2000-07-31 2002-06-25 Gatan, Inc. Single tilt rotation cryotransfer holder for electron microscopes
JP2007039106A (ja) * 2005-08-04 2007-02-15 Sii Nanotechnology Inc 弾性材料を使用した薄板状小片ホルダ
CN201348980Y (zh) * 2008-12-23 2009-11-18 南京师范大学 扫描电镜样品台专用复合型支架
JP5250470B2 (ja) * 2009-04-22 2013-07-31 株式会社日立ハイテクノロジーズ 試料ホールダ，該試料ホールダの使用法、及び荷電粒子装置
JP5512450B2 (ja) * 2010-07-29 2014-06-04 株式会社日立ハイテクノロジーズ イオンミリング装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5274237A (en) * 1992-04-02 1993-12-28 North American Philips Corporation Deicing device for cryogenically cooled radiation detector
US5986270A (en) * 1996-12-23 1999-11-16 U.S. Philips Corporation Particle-optical apparatus including a low-temperature specimen holder
US20120024086A1 (en) * 2010-07-28 2012-02-02 Halina Stabacinskiene Cryogenic specimen holder

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
R. C. Henderson et al., A side-entry cold holder for cryo-electron microscopy, Ultramicroscopy 35 (1991), S. 45 - 53 *

Also Published As

Publication number Publication date
CN104380426B (zh) 2017-03-08
WO2014002700A1 (ja) 2014-01-03
KR20150001842A (ko) 2015-01-06
JP2014010965A (ja) 2014-01-20
US9543112B2 (en) 2017-01-10
US20150340199A1 (en) 2015-11-26
KR101665221B1 (ko) 2016-10-11
JP5732006B2 (ja) 2015-06-10
DE112013003012T5 (de) 2015-03-05
CN104380426A (zh) 2015-02-25

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R012 Request for examination validly filed
R016 Response to examination communication
R018 Grant decision by examination section/examining division
R081 Change of applicant/patentee

Owner name: HITACHI HIGH-TECH CORPORATION, JP

Free format text: FORMER OWNER: HITACHI HIGH-TECHNOLOGIES CORPORATION, TOKYO, JP

R082 Change of representative

Representative=s name: STREHL SCHUEBEL-HOPF & PARTNER MBB PATENTANWAE, DE

R020 Patent grant now final
R119 Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee