KR101638766B1 - 비임렛 블랭커 배열체 - Google Patents

비임렛 블랭커 배열체 Download PDF

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Publication number
KR101638766B1
KR101638766B1 KR1020157020023A KR20157020023A KR101638766B1 KR 101638766 B1 KR101638766 B1 KR 101638766B1 KR 1020157020023 A KR1020157020023 A KR 1020157020023A KR 20157020023 A KR20157020023 A KR 20157020023A KR 101638766 B1 KR101638766 B1 KR 101638766B1
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South Korea
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array
delete delete
beamlet
deflector
charged particle
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Korean (ko)
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KR20150091417A (ko
Inventor
얀 자코 윌랜드
알렉산더 헨드릭 빈센트 반 빈
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마퍼 리쏘그라피 아이피 비.브이.
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Assigned to 에이에스엠엘 네델란즈 비.브이. reassignment 에이에스엠엘 네델란즈 비.브이. 권리의 전부이전등록 Assignors: 마퍼 리쏘그라피 아이피 비.브이.
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes
    • H10P76/2042—Photolithographic processes using lasers
    • H01L21/0275—
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H01J37/3177—Multi-beam, e.g. fly's eye, comb probe
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/049—Focusing means
    • H01J2237/0492—Lens systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10—Lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Electron Beam Exposure (AREA)
  • Optics & Photonics (AREA)
KR1020157020023A 2008-04-15 2009-04-15 비임렛 블랭커 배열체 Active KR101638766B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US4524308P 2008-04-15 2008-04-15
US61/045,243 2008-04-15
PCT/EP2009/054468 WO2009127659A2 (en) 2008-04-15 2009-04-15 Beamlet blanker arrangement

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020107025645A Division KR20110015555A (ko) 2008-04-15 2009-04-15 비임렛 블랭커 배열체

Publications (2)

Publication Number Publication Date
KR20150091417A KR20150091417A (ko) 2015-08-10
KR101638766B1 true KR101638766B1 (ko) 2016-07-13

Family

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Family Applications (4)

Application Number Title Priority Date Filing Date
KR1020157020023A Active KR101638766B1 (ko) 2008-04-15 2009-04-15 비임렛 블랭커 배열체
KR1020107025644A Active KR101605865B1 (ko) 2008-04-15 2009-04-15 투사 렌즈 배열체
KR1020107025645A Withdrawn KR20110015555A (ko) 2008-04-15 2009-04-15 비임렛 블랭커 배열체
KR1020157021939A Active KR101678823B1 (ko) 2008-04-15 2009-04-15 투사 렌즈 배열체

Family Applications After (3)

Application Number Title Priority Date Filing Date
KR1020107025644A Active KR101605865B1 (ko) 2008-04-15 2009-04-15 투사 렌즈 배열체
KR1020107025645A Withdrawn KR20110015555A (ko) 2008-04-15 2009-04-15 비임렛 블랭커 배열체
KR1020157021939A Active KR101678823B1 (ko) 2008-04-15 2009-04-15 투사 렌즈 배열체

Country Status (7)

Country Link
EP (3) EP2279515B1 (https=)
JP (4) JP5268170B2 (https=)
KR (4) KR101638766B1 (https=)
CN (2) CN102067271B (https=)
AT (1) ATE535932T1 (https=)
TW (3) TWI534849B (https=)
WO (2) WO2009127658A1 (https=)

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WO2012055936A1 (en) 2010-10-26 2012-05-03 Mapper Lithography Ip B.V. Lithography system, modulation device and method of manufacturing a fiber fixation substrate
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TWI514089B (zh) 2011-04-28 2015-12-21 瑪波微影Ｉｐ公司 在微影系統中用於轉移基板的設備
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JP2016207925A (ja) 2015-04-27 2016-12-08 株式会社アドバンテスト 素子、製造方法、および露光装置
KR102358009B1 (ko) * 2015-11-10 2022-02-04 삼성전자주식회사 빔 투사 장치 및 빔 투사 장치를 이용하여 빔을 투사하는 방법
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CN112041965B (zh) * 2018-05-01 2025-01-14 Asml荷兰有限公司 多束检查装置
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Also Published As

Publication number Publication date
ATE535932T1 (de) 2011-12-15
TWI474360B (zh) 2015-02-21
KR20150099617A (ko) 2015-08-31
JP2013140998A (ja) 2013-07-18
EP2279515A1 (en) 2011-02-02
CN102067272A (zh) 2011-05-18
CN102067272B (zh) 2014-04-30
TW201003713A (en) 2010-01-16
EP2402979B1 (en) 2013-10-23
JP2013140997A (ja) 2013-07-18
EP2402979A2 (en) 2012-01-04
JP5475155B2 (ja) 2014-04-16
KR101605865B1 (ko) 2016-03-24
EP2402979A3 (en) 2012-06-27
CN102067271B (zh) 2014-05-21
KR20110015555A (ko) 2011-02-16
KR20110007199A (ko) 2011-01-21
EP2281296A2 (en) 2011-02-09
TW201515044A (zh) 2015-04-16
WO2009127659A3 (en) 2009-12-10
JP5384759B2 (ja) 2014-01-08
KR20150091417A (ko) 2015-08-10
JP5268170B2 (ja) 2013-08-21
CN102067271A (zh) 2011-05-18
JP2011517130A (ja) 2011-05-26
JP2011517131A (ja) 2011-05-26
WO2009127659A2 (en) 2009-10-22
KR101678823B1 (ko) 2016-11-23
TWI534849B (zh) 2016-05-21
TW201003711A (en) 2010-01-16
WO2009127658A1 (en) 2009-10-22
EP2279515B1 (en) 2011-11-30

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