KR101608341B1 - 인라인 화학기상증착시스템 - Google Patents

인라인 화학기상증착시스템 Download PDF

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Publication number
KR101608341B1
KR101608341B1 KR1020140094720A KR20140094720A KR101608341B1 KR 101608341 B1 KR101608341 B1 KR 101608341B1 KR 1020140094720 A KR1020140094720 A KR 1020140094720A KR 20140094720 A KR20140094720 A KR 20140094720A KR 101608341 B1 KR101608341 B1 KR 101608341B1
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South Korea
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KR1020140094720A
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English (en)
Korean (ko)
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KR20160012715A (ko
Inventor
박근노
이문경
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(주)나인테크
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Priority to KR1020140094720A priority Critical patent/KR101608341B1/ko
Priority to CN201510393924.7A priority patent/CN105316658B/zh
Publication of KR20160012715A publication Critical patent/KR20160012715A/ko
Application granted granted Critical
Publication of KR101608341B1 publication Critical patent/KR101608341B1/ko

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)
KR1020140094720A 2014-07-25 2014-07-25 인라인 화학기상증착시스템 KR101608341B1 (ko)

Priority Applications (2)

Application Number Priority Date Filing Date Title
KR1020140094720A KR101608341B1 (ko) 2014-07-25 2014-07-25 인라인 화학기상증착시스템
CN201510393924.7A CN105316658B (zh) 2014-07-25 2015-07-07 直列式化学气相沉积系统

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020140094720A KR101608341B1 (ko) 2014-07-25 2014-07-25 인라인 화학기상증착시스템

Publications (2)

Publication Number Publication Date
KR20160012715A KR20160012715A (ko) 2016-02-03
KR101608341B1 true KR101608341B1 (ko) 2016-04-01

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ID=55244950

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020140094720A KR101608341B1 (ko) 2014-07-25 2014-07-25 인라인 화학기상증착시스템

Country Status (2)

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KR (1) KR101608341B1 (zh)
CN (1) CN105316658B (zh)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002222846A (ja) 2001-01-26 2002-08-09 Shin Meiwa Ind Co Ltd 真空搬送装置
JP2014056944A (ja) 2012-09-12 2014-03-27 Ulvac Japan Ltd 真空処理装置

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3909888B2 (ja) * 1996-04-17 2007-04-25 キヤノンアネルバ株式会社 トレイ搬送式インライン成膜装置
KR20070117312A (ko) * 2006-06-08 2007-12-12 주성엔지니어링(주) 발열수단을 가지는 트레이 및 이를 이용하는 기판처리장치
KR20090116809A (ko) * 2007-03-02 2009-11-11 오를리콘 트레이딩 아크티엔게젤샤프트, 트뤼프바흐 진공 코팅 장치
CN201309965Y (zh) * 2008-12-17 2009-09-16 中国科学院沈阳科学仪器研制中心有限公司 全自动大型平板式pecvd晶硅光伏减反射覆膜制备设备
CN101748386B (zh) * 2008-12-18 2013-06-05 北京北方微电子基地设备工艺研究中心有限责任公司 一种等离子体加工设备
CN201386135Y (zh) * 2009-04-03 2010-01-20 中国科学院沈阳科学仪器研制中心有限公司 一种全自动大型平板pecvd氮化硅覆膜制备系统
DE102009018393B4 (de) * 2009-04-22 2017-05-24 Atotech Deutschland Gmbh Verfahren, Haltemittel, Vorrichtung und System zum Transportieren eines flächigen Behandlungsgutes und Be- oder Entladeeinrichtung
CN101893879B (zh) * 2010-06-01 2012-08-22 北京北方微电子基地设备工艺研究中心有限责任公司 等离子体化学气相沉积设备的载板传输控制方法及系统
CN101845621A (zh) * 2010-06-07 2010-09-29 刘忆军 大面积平板式等离子体增强化学气相沉积系统
CN103459664B (zh) * 2011-03-25 2015-10-07 Lg电子株式会社 等离子体增强式化学气相沉积设备及其控制方法
CN102296285A (zh) * 2011-09-09 2011-12-28 汉能科技有限公司 一种线列式有机金属化合物气相淀积系统及方法
CN102560408A (zh) * 2012-01-20 2012-07-11 纳峰真空镀膜（上海）有限公司 连续真空镀膜装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002222846A (ja) 2001-01-26 2002-08-09 Shin Meiwa Ind Co Ltd 真空搬送装置
JP2014056944A (ja) 2012-09-12 2014-03-27 Ulvac Japan Ltd 真空処理装置

Also Published As

Publication number Publication date
CN105316658B (zh) 2018-04-10
CN105316658A (zh) 2016-02-10
KR20160012715A (ko) 2016-02-03

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