KR101601341B1 - 기판 처리 방법 및 기판 처리 장치 - Google Patents

기판 처리 방법 및 기판 처리 장치 Download PDF

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KR101601341B1
KR101601341B1 KR1020110118816A KR20110118816A KR101601341B1 KR 101601341 B1 KR101601341 B1 KR 101601341B1 KR 1020110118816 A KR1020110118816 A KR 1020110118816A KR 20110118816 A KR20110118816 A KR 20110118816A KR 101601341 B1 KR101601341 B1 KR 101601341B1
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substrate
liquid
processing
processing liquid
volatile
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Korean (ko)
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KR20120073089A (ko
Inventor
사토루 다나카
다케히코 오리이
히로타카 마루야마
데루오미 미나미
미츠노리 나카모리
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도쿄엘렉트론가부시키가이샤
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0414—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles

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  • Cleaning Or Drying Semiconductors (AREA)
KR1020110118816A 2010-12-24 2011-11-15 기판 처리 방법 및 기판 처리 장치 Active KR101601341B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JPJP-P-2010-288614 2010-12-24
JP2010288614 2010-12-24
JPJP-P-2011-223208 2011-10-07
JP2011223208A JP5712101B2 (ja) 2010-12-24 2011-10-07 基板処理方法及び基板処理装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020160016384A Division KR101864001B1 (ko) 2010-12-24 2016-02-12 기판 처리 방법 및 기판 처리 장치

Publications (2)

Publication Number Publication Date
KR20120073089A KR20120073089A (ko) 2012-07-04
KR101601341B1 true KR101601341B1 (ko) 2016-03-08

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ID=46317714

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020110118816A Active KR101601341B1 (ko) 2010-12-24 2011-11-15 기판 처리 방법 및 기판 처리 장치
KR1020160016384A Ceased KR101864001B1 (ko) 2010-12-24 2016-02-12 기판 처리 방법 및 기판 처리 장치

Family Applications After (1)

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KR1020160016384A Ceased KR101864001B1 (ko) 2010-12-24 2016-02-12 기판 처리 방법 및 기판 처리 장치

Country Status (4)

Country Link
US (1) US8978671B2 (https=)
JP (1) JP5712101B2 (https=)
KR (2) KR101601341B1 (https=)
TW (1) TWI548467B (https=)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101596750B1 (ko) * 2010-06-23 2016-02-23 도쿄엘렉트론가부시키가이샤 기판 처리 방법, 이 기판 처리 방법을 실행하기 위한 컴퓨터 프로그램이 기록된 기록 매체 및 기판 처리 장치
JP5632860B2 (ja) * 2012-01-05 2014-11-26 東京エレクトロン株式会社 基板洗浄方法、基板洗浄装置及び基板洗浄用記憶媒体
CN108155133B (zh) * 2014-02-27 2022-04-15 斯克林集团公司 基板处理装置
US9460944B2 (en) * 2014-07-02 2016-10-04 SCREEN Holdings Co., Ltd. Substrate treating apparatus and method of treating substrate
JP6588819B2 (ja) 2015-12-24 2019-10-09 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法
JP6820736B2 (ja) * 2016-12-27 2021-01-27 東京エレクトロン株式会社 基板処理方法および基板処理装置
JP6818607B2 (ja) * 2017-03-27 2021-01-20 株式会社Ｓｃｒｅｅｎホールディングス 基板処理方法および基板処理装置
JP7379042B2 (ja) * 2019-09-20 2023-11-14 東京エレクトロン株式会社 真空搬送装置および真空搬送装置の制御方法
KR20230104694A (ko) 2020-11-16 2023-07-10 도쿄엘렉트론가부시키가이샤 기판 처리 방법, 기판 처리 장치 및 컴퓨터 판독 가능한 기록 매체
KR102707901B1 (ko) * 2022-08-09 2024-09-19 세메스 주식회사 처리액 공급 유닛 및 이를 포함하는 기판 처리 장치

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002009035A (ja) 2000-06-26 2002-01-11 Toshiba Corp 基板洗浄方法及び基板洗浄装置
JP2005166957A (ja) 2003-12-02 2005-06-23 Ses Co Ltd 基板処理法及び基板処理装置
JP2009200193A (ja) 2008-02-21 2009-09-03 Dainippon Screen Mfg Co Ltd 基板処理装置および基板処理方法
JP2010528470A (ja) 2007-05-23 2010-08-19 セメス カンパニー リミテッド 基板乾燥装置及びその方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4732918B2 (ja) 2006-02-21 2011-07-27 大日本スクリーン製造株式会社 基板処理方法および基板処理装置
JP2007227764A (ja) 2006-02-24 2007-09-06 Dainippon Screen Mfg Co Ltd 基板表面処理装置、基板表面処理方法および基板処理装置
JP4791905B2 (ja) * 2006-08-04 2011-10-12 パナソニック株式会社 基板洗浄方法
JP4960075B2 (ja) 2006-12-18 2012-06-27 大日本スクリーン製造株式会社 基板処理方法および基板処理装置
KR101005889B1 (ko) 2008-10-28 2011-01-06 세메스 주식회사 구리 패턴이 노출된 기판을 건조하는 방법 및 이를 이용하는 금속 배선 형성 방법

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002009035A (ja) 2000-06-26 2002-01-11 Toshiba Corp 基板洗浄方法及び基板洗浄装置
JP2005166957A (ja) 2003-12-02 2005-06-23 Ses Co Ltd 基板処理法及び基板処理装置
JP2010528470A (ja) 2007-05-23 2010-08-19 セメス カンパニー リミテッド 基板乾燥装置及びその方法
JP2009200193A (ja) 2008-02-21 2009-09-03 Dainippon Screen Mfg Co Ltd 基板処理装置および基板処理方法

Also Published As

Publication number Publication date
KR20160022336A (ko) 2016-02-29
US20120164840A1 (en) 2012-06-28
TWI548467B (zh) 2016-09-11
KR20120073089A (ko) 2012-07-04
KR101864001B1 (ko) 2018-06-01
TW201231177A (en) 2012-08-01
US8978671B2 (en) 2015-03-17
JP5712101B2 (ja) 2015-05-07
JP2012146951A (ja) 2012-08-02

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